JPH0565585B2 - - Google Patents

Info

Publication number
JPH0565585B2
JPH0565585B2 JP59002917A JP291784A JPH0565585B2 JP H0565585 B2 JPH0565585 B2 JP H0565585B2 JP 59002917 A JP59002917 A JP 59002917A JP 291784 A JP291784 A JP 291784A JP H0565585 B2 JPH0565585 B2 JP H0565585B2
Authority
JP
Japan
Prior art keywords
boat
vapor deposition
plate
view
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59002917A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60149767A (ja
Inventor
Masaki Ito
Sotaro Edokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP291784A priority Critical patent/JPS60149767A/ja
Publication of JPS60149767A publication Critical patent/JPS60149767A/ja
Publication of JPH0565585B2 publication Critical patent/JPH0565585B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP291784A 1984-01-11 1984-01-11 蒸着用ボ−ト Granted JPS60149767A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP291784A JPS60149767A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP291784A JPS60149767A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Publications (2)

Publication Number Publication Date
JPS60149767A JPS60149767A (ja) 1985-08-07
JPH0565585B2 true JPH0565585B2 (enrdf_load_html_response) 1993-09-20

Family

ID=11542698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP291784A Granted JPS60149767A (ja) 1984-01-11 1984-01-11 蒸着用ボ−ト

Country Status (1)

Country Link
JP (1) JPS60149767A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080046267A (ko) * 2005-09-20 2008-05-26 고쿠리츠다이가쿠호진 도호쿠다이가쿠 성막 장치, 증발 지그, 및, 측정 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59113174A (ja) * 1982-12-17 1984-06-29 Matsushita Electric Ind Co Ltd 薄膜形成方法および薄膜形成装置

Also Published As

Publication number Publication date
JPS60149767A (ja) 1985-08-07

Similar Documents

Publication Publication Date Title
US4173522A (en) Method and apparatus for producing carbon coatings by sputtering
US4105807A (en) Production of thin, stable, solid electrolyte films of high ionic conductivity
US4128680A (en) Silicon coated ceramic substrate with improvements for making electrical contact to the interface surface of the silicon
JPH0565585B2 (enrdf_load_html_response)
US5068126A (en) Process for producing graphite electrodes
US5169508A (en) Graphite electrode
JPH0534426B2 (enrdf_load_html_response)
JPH05190877A (ja) ダイオード素子の製造方法
JP2847680B2 (ja) セラミック電子部品及びその製造方法
JPH0133909B2 (enrdf_load_html_response)
JPH0565584B2 (enrdf_load_html_response)
JPH0749862Y2 (ja) 水晶振動子
JPS59113174A (ja) 薄膜形成方法および薄膜形成装置
JPS6134509B2 (enrdf_load_html_response)
EP0027354A3 (en) Substrates for semiconductor materials, processes for preparing them and electrodes for photoelectrochemical cells
JPS6326485B2 (enrdf_load_html_response)
JPH01255284A (ja) 圧電フィルム
JPS5887077A (ja) サ−マルヘツド
JPS5827980A (ja) 真空蒸着法
JPS61146796A (ja) タンタル酸リチウム単結晶の単一分域化方法
Komashko Effect of Forming Conditions on the Structure of Vacuum Tantalum Condensates
JPS59167071A (ja) アモルフアスシリコン太陽電池
JPH03197668A (ja) 蒸発源およびそれを用いた蒸発装置
JPS6333760B2 (enrdf_load_html_response)
JPH0241165Y2 (enrdf_load_html_response)