JPH0563010B2 - - Google Patents

Info

Publication number
JPH0563010B2
JPH0563010B2 JP61278328A JP27832886A JPH0563010B2 JP H0563010 B2 JPH0563010 B2 JP H0563010B2 JP 61278328 A JP61278328 A JP 61278328A JP 27832886 A JP27832886 A JP 27832886A JP H0563010 B2 JPH0563010 B2 JP H0563010B2
Authority
JP
Japan
Prior art keywords
film thickness
resist
wafer
reflectance
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61278328A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63131517A (ja
Inventor
Sachiko Ogawa
Masayuki Nakajima
Akira Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61278328A priority Critical patent/JPS63131517A/ja
Publication of JPS63131517A publication Critical patent/JPS63131517A/ja
Publication of JPH0563010B2 publication Critical patent/JPH0563010B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61278328A 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置 Granted JPS63131517A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61278328A JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61278328A JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6206922A Division JP2613183B2 (ja) 1994-08-31 1994-08-31 レジスト膜形成装置

Publications (2)

Publication Number Publication Date
JPS63131517A JPS63131517A (ja) 1988-06-03
JPH0563010B2 true JPH0563010B2 (show.php) 1993-09-09

Family

ID=17595796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61278328A Granted JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Country Status (1)

Country Link
JP (1) JPS63131517A (show.php)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0239520A (ja) * 1988-07-29 1990-02-08 Tokyo Electron Ltd レジスト膜厚の測定方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257136A (ja) * 1984-06-01 1985-12-18 Hitachi Ltd フオトレジストの膜厚測定装置
JPS62235734A (ja) * 1986-04-04 1987-10-15 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS63131517A (ja) 1988-06-03

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Legal Events

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