JPH0562911B2 - - Google Patents
Info
- Publication number
- JPH0562911B2 JPH0562911B2 JP60284291A JP28429185A JPH0562911B2 JP H0562911 B2 JPH0562911 B2 JP H0562911B2 JP 60284291 A JP60284291 A JP 60284291A JP 28429185 A JP28429185 A JP 28429185A JP H0562911 B2 JPH0562911 B2 JP H0562911B2
- Authority
- JP
- Japan
- Prior art keywords
- ink
- printing
- paper
- wax
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60284291A JPS62143983A (ja) | 1985-12-19 | 1985-12-19 | 印刷インキ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60284291A JPS62143983A (ja) | 1985-12-19 | 1985-12-19 | 印刷インキ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62143983A JPS62143983A (ja) | 1987-06-27 |
JPH0562911B2 true JPH0562911B2 (enrdf_load_stackoverflow) | 1993-09-09 |
Family
ID=17676625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60284291A Granted JPS62143983A (ja) | 1985-12-19 | 1985-12-19 | 印刷インキ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62143983A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7547615B2 (en) | 2001-02-12 | 2009-06-16 | Asm America, Inc. | Deposition over mixed substrates using trisilane |
US7553516B2 (en) | 2005-12-16 | 2009-06-30 | Asm International N.V. | System and method of reducing particle contamination of semiconductor substrates |
US7629267B2 (en) | 2005-03-07 | 2009-12-08 | Asm International N.V. | High stress nitride film and method for formation thereof |
US7629256B2 (en) | 2007-05-14 | 2009-12-08 | Asm International N.V. | In situ silicon and titanium nitride deposition |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4403478A1 (de) * | 1994-02-04 | 1995-08-10 | Basf Ag | Verfahren zur Erzeugung von Drucken nach dem Offset-Heatset-Verfahren |
JP4710361B2 (ja) * | 2005-03-11 | 2011-06-29 | 東洋インキScホールディングス株式会社 | 印刷インキ組成物 |
JP2010047670A (ja) * | 2008-08-20 | 2010-03-04 | Nippon Synthetic Chem Ind Co Ltd:The | 印刷液用組成物およびこれを用いた印刷液 |
US9296243B2 (en) | 2010-07-28 | 2016-03-29 | Michael Stevenson & Kathleen Stevenson | Printing ink, transfers, and methods of decorating polyolefin articles |
US8349917B2 (en) * | 2010-07-28 | 2013-01-08 | Michael J. Stevenson | Printing ink, transfers, and methods of decorating polyolefin articles |
JP6056820B2 (ja) * | 2014-09-04 | 2017-01-11 | 東洋インキScホールディングス株式会社 | 平版印刷インキ組成物 |
JP6060949B2 (ja) * | 2014-09-05 | 2017-01-18 | 東洋インキScホールディングス株式会社 | 平版印刷インキ組成物 |
AU2019290457B2 (en) | 2018-06-18 | 2021-03-04 | The Michael And Kathleen Stevenson Family Limited Partnership | Ink, transfers, methods of making transfers, and methods of using transfers to decorate plastic articles |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE218471C (enrdf_load_stackoverflow) * | ||||
US4162997A (en) * | 1978-03-02 | 1979-07-31 | Hercules Incorporated | Heat-fusible pastes for printing inks, adhesives and moldings |
JPS59159863A (ja) * | 1983-03-01 | 1984-09-10 | Daikin Ind Ltd | 印刷インク用組成物 |
DE3533436A1 (de) * | 1985-09-19 | 1987-03-26 | Huels Chemische Werke Ag | Verfahren zur herstellung mikronisierter wachse |
-
1985
- 1985-12-19 JP JP60284291A patent/JPS62143983A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7547615B2 (en) | 2001-02-12 | 2009-06-16 | Asm America, Inc. | Deposition over mixed substrates using trisilane |
US7629267B2 (en) | 2005-03-07 | 2009-12-08 | Asm International N.V. | High stress nitride film and method for formation thereof |
US7553516B2 (en) | 2005-12-16 | 2009-06-30 | Asm International N.V. | System and method of reducing particle contamination of semiconductor substrates |
US7629256B2 (en) | 2007-05-14 | 2009-12-08 | Asm International N.V. | In situ silicon and titanium nitride deposition |
Also Published As
Publication number | Publication date |
---|---|
JPS62143983A (ja) | 1987-06-27 |
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