JPH0562721B2 - - Google Patents

Info

Publication number
JPH0562721B2
JPH0562721B2 JP59152502A JP15250284A JPH0562721B2 JP H0562721 B2 JPH0562721 B2 JP H0562721B2 JP 59152502 A JP59152502 A JP 59152502A JP 15250284 A JP15250284 A JP 15250284A JP H0562721 B2 JPH0562721 B2 JP H0562721B2
Authority
JP
Japan
Prior art keywords
optical system
plane
partial optical
partial
reflective surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59152502A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6129815A (ja
Inventor
Koichi Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP15250284A priority Critical patent/JPS6129815A/ja
Publication of JPS6129815A publication Critical patent/JPS6129815A/ja
Priority to US07/171,169 priority patent/US4812028A/en
Publication of JPH0562721B2 publication Critical patent/JPH0562721B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP15250284A 1984-07-23 1984-07-23 反射縮小投影光学系 Granted JPS6129815A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP15250284A JPS6129815A (ja) 1984-07-23 1984-07-23 反射縮小投影光学系
US07/171,169 US4812028A (en) 1984-07-23 1988-03-21 Reflection type reduction projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15250284A JPS6129815A (ja) 1984-07-23 1984-07-23 反射縮小投影光学系

Publications (2)

Publication Number Publication Date
JPS6129815A JPS6129815A (ja) 1986-02-10
JPH0562721B2 true JPH0562721B2 (de) 1993-09-09

Family

ID=15541861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15250284A Granted JPS6129815A (ja) 1984-07-23 1984-07-23 反射縮小投影光学系

Country Status (1)

Country Link
JP (1) JPS6129815A (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
JPS61204935A (ja) * 1985-03-07 1986-09-11 Seiko Epson Corp 反射縮小投影露光装置
JPS63106739A (ja) * 1986-10-24 1988-05-11 Canon Inc ミラ−光学系
US4747678A (en) * 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JP2593111B2 (ja) * 1991-04-15 1997-03-26 株式会社キトー 巻上機支持兼長尺物支持用旋回アームを有するトラッククレーン
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JP2565149B2 (ja) * 1995-04-05 1996-12-18 キヤノン株式会社 回路の製造方法及び露光装置
JP2005345582A (ja) * 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置

Also Published As

Publication number Publication date
JPS6129815A (ja) 1986-02-10

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term