JPH0560797B2 - - Google Patents
Info
- Publication number
- JPH0560797B2 JPH0560797B2 JP62131282A JP13128287A JPH0560797B2 JP H0560797 B2 JPH0560797 B2 JP H0560797B2 JP 62131282 A JP62131282 A JP 62131282A JP 13128287 A JP13128287 A JP 13128287A JP H0560797 B2 JPH0560797 B2 JP H0560797B2
- Authority
- JP
- Japan
- Prior art keywords
- recording
- recording film
- film
- teo
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 50
- 229910052760 oxygen Inorganic materials 0.000 claims description 26
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 22
- 239000001301 oxygen Substances 0.000 claims description 22
- 239000000956 alloy Substances 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 19
- 229910052714 tellurium Inorganic materials 0.000 claims description 18
- 229910052718 tin Inorganic materials 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 229910052737 gold Inorganic materials 0.000 claims description 8
- 230000005496 eutectics Effects 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 5
- 239000010408 film Substances 0.000 description 77
- 238000000034 method Methods 0.000 description 18
- 229910052710 silicon Inorganic materials 0.000 description 14
- 230000004913 activation Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910020923 Sn-O Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910003069 TeO2 Inorganic materials 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62131282A JPS63298838A (ja) | 1987-05-29 | 1987-05-29 | 光情報記録用記録膜材料の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62131282A JPS63298838A (ja) | 1987-05-29 | 1987-05-29 | 光情報記録用記録膜材料の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63298838A JPS63298838A (ja) | 1988-12-06 |
| JPH0560797B2 true JPH0560797B2 (enrdf_load_stackoverflow) | 1993-09-03 |
Family
ID=15054301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62131282A Granted JPS63298838A (ja) | 1987-05-29 | 1987-05-29 | 光情報記録用記録膜材料の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63298838A (enrdf_load_stackoverflow) |
-
1987
- 1987-05-29 JP JP62131282A patent/JPS63298838A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63298838A (ja) | 1988-12-06 |
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