JPH0557839U - Substrate rotary development processing equipment - Google Patents

Abstract

(57) [Abstract] [Purpose] To prevent the developer mist from adhering to the surface of the substrate as much as possible and improve the quality of the substrate. [Structure] A spin chuck 2 which holds a substrate 1 substantially horizontally and rotates, a nozzle 8 which supplies a developing solution to the substrate 1 held by the spin chuck 2, and an upper cylinder cover 14 which is vertically separable.
And a bottom cover 15 having a skirt-like shape, and a shatterproof cover 1 that surrounds the substrate 1 when the substrate 1 is rotated.
A rotary developing processing device is constituted by 3 and an outer container 20 which is provided so as to surround the scattering prevention cover 13 and collects the processing liquid. An exhaust outlet 23a is opened in a region of the bottom wall 20a of the outer container 20 surrounded by the scattering prevention cover 13, and communicates with the negative pressure exhaust passage 23. An exhaust guide plate 15c is formed at the lower end of the lower cylinder cover 15 so as to have a smaller diameter toward the lower side. This exhaust guide plate 15c
Effectively flows down the air containing the developer mist, which stays between the scattering prevention cover 13 and the outer container 20.

Description

[Detailed description of the device]

[0001]

[Industrial application]

 In this invention, a semiconductor wafer, a glass substrate for an LCD, a glass substrate for a photomask, a substrate for an optical disk, etc. (hereinafter simply referred to as a substrate) are rotatably held by a spin chuck, and a positive photo film applied on the substrate. The present invention relates to a substrate rotary developing apparatus for developing a photosensitive resin such as a resist or a negative photoresist.

[0002]

[Basic structure of the present invention]

 This rotary development processing apparatus is premised on having a basic structure as shown in FIGS. 1 and 3, for example. That is, this rotary development processing apparatus has a spin chuck 2 that holds and rotates the substrate 1 substantially horizontally, and a nozzle 8 that supplies a developing solution to the upper surface of the substrate 1 held by the spin chuck 2, and is separated vertically. It is composed of an upper cylinder cover 14 that can be combined and a lower cylinder cover 15 having a hem-like shape, and is provided so as to surround the substrate 1 when the substrate 1 is rotated, and the scattering liquid cover 13 is provided so as to surround the substrate 1. And a negative pressure exhaust passage 23 in which the exhaust outlet 23a is opened in the bottom wall 20a of the outer container 20 in the area surrounded by the scattering prevention cover 13. It should be noted that the upper cylinder cover 14 and the lower cylinder cover 15 are formed so that a slight gap d is formed at the joint between the upper cylinder cover 14 and the lower cylinder cover 15 in order to avoid generation of abrasion dust during the separation and combination. ..

[0003]

[Prior Art]

 In the above-described basic structure, the lower cylinder cover 15 having a skirt-like shape is conventionally formed so that its lower end portion 15b is directed straight downward, as shown in FIG. In this rotary development processing apparatus, for example, the development processing of the substrate is performed by the procedure shown in FIGS. That is, in the same figure (a), in a state where the upper cylinder cover 14 and the lower cylinder cover 15 are united, the spin chuck 2 rises to the upper side of the scattering prevention cover 13, receives the substrate 1, and returns to the original position. To descend. In the same figure (b), only the upper cylinder cover 14 rises and both covers 14 and 15 are separated. In the separated state, the developing solution is supplied from the nozzle 8 to the substrate 1, and the spin chuck 2 is stationary or rotates at a low speed. While developing the photoresist on the substrate surface.

In FIG. 1C, with the upper cylinder cover 14 and the lower cylinder cover 15 combined, the entire shatterproof cover 13 rises, and the inclined wall surface 15 a of the lower cylinder cover 15 rises above the substrate holding surface. Position, the spin chuck 2 is rotated at a high speed to shake off the developing solution, and then the cleaning solution is supplied to the surface of the substrate 1 for rinsing. In addition, in FIGS. 8B to 8C, the process is performed while forcibly exhausting the inside of the outer container 20. In the same figure (d), with the upper cylinder cover 14 and the lower cylinder cover 15 combined, the entire shatterproof cover 13 descends and returns to its original position, and the spin chuck 2 rises to raise the substrate. Deliver 1. By repeating the series of operations (a) to (d), the development processing of the substrates is performed one after another.

[0005]

[Problems to be solved by the device]

 However, in the conventional example, there is a problem that the mist of the developing solution adheres to the surface of the substrate 1 to generate particles when the developing solution is shaken off as shown in FIG. 4C. .. The present invention has been made in consideration of such circumstances, and an object of the present invention is to prevent the developer mist from adhering to the surface of the substrate 1 and improve the quality of the substrate.

[0006]

[Development process]

 As a result of intensive studies by the present inventors in order to solve such a technical problem, they found out that the causes of the problems are as follows, and conceived the present invention. That is, when supplying the developing solution in the cover-separated state of FIG. 4B, the mist of the developing solution entered the space between the outer container 20 and the scattering prevention cover 13. On the other hand, in the cover united state of FIG. 4C, at the position where the scattering prevention cover 13 is raised, even if the inside of the scattering prevention cover 13 is forcibly exhausted, the space between the outer container 20 and the scattering prevention cover 13 is Air cannot be sucked and exhausted sufficiently, and the air near the lower end of the lower cylinder cover 15, which contains a large amount of developer mist, leaks into the space between the outer container 20 and the scattering prevention cover 13. It was accumulated there.

Then, as shown in FIG. 5, the air containing a large amount of the developer mist accumulated between the outer container 20 and the anti-scattering cover 13 forms the upper cylinder cover 14 and the lower cylinder cover 15 as shown in FIG. The developer mist was adhered to the surface of the substrate 1 by being sucked into the anti-scattering cover 13 which has a low pressure due to the exhaust air from the gap d of the joint and entering the anti-scattering cover 13. There was found.

[0008]

[Means for Solving the Problems]

 The present invention has been made as a result of intensive studies by the present inventors in order to solve the above problems, and is configured as shown in FIGS. 1 and 2, for example. That is, in the substrate rotary developing apparatus having the basic structure, an exhaust guide plate 15c having a smaller diameter toward the lower side is formed at the lower end of the lower cylinder cover 15.

[0009]

[Work]

 In the present invention, since the exhaust guide plate 15c having a smaller diameter toward the lower side is formed at the lower end portion of the lower cylinder cover 15, it operates as follows. When the upper cylinder cover 14 and the lower cylinder cover 15 are united and the air inside the shatterproof cover 13 is forcibly discharged at a position where they are raised, the air inside the shatterproof cover 13 is formed at the lower end of the lower cylinder cover 15. Along the inner surface of the exhaust guide plate 15c, the exhaust gas is exhausted by flowing downward in the direction of the smaller diameter. Therefore, the air containing a large amount of mist of the developer does not leak out and accumulate. On the other hand, the outer surface of the exhaust guide plate 15c is pulled by the air flowing along the inner surface of the exhaust guide plate 15c, and the exhaust of the outer air is promoted by the principle of aspiration. As a result, the air containing a large amount of mist of the developer between the outer container 20 and the scattering prevention cover 13 is sucked and exhausted downward, and the gap d between the joint between the upper cylinder cover 14 and the lower cylinder cover 15 is d. Therefore, it does not enter the scattering prevention cover 13.

[0010]

【Example】

 Hereinafter, embodiments of the present invention will be described in more detail with reference to the drawings. FIG. 1 is a vertical cross-sectional view of a rotary developing processing apparatus according to an embodiment of the present invention, and FIG. 2 is a vertical cross-sectional view showing the action of a scattering prevention cover in the processing for shaking off the developing solution. This rotary developing processing apparatus has the above-mentioned basic structure. That is, the spin chuck 2 that holds the substrate 1 substantially horizontally and rotates, the nozzle 8 that supplies the developing solution to the upper surface of the substrate 1 held by the spin chuck 2, and the substrate 1 that surrounds the substrate 1 when the substrate 1 is rotated. A cylindrical anti-scattering cover 13, an outer container 20 that is provided so as to surround the anti-scattering cover 13 and has a substantially rectangular shape in plan view for collecting the processing liquid, and an outer container 20 within the enclosing region of the anti-scattering cover 13. The bottom wall 20a is provided with a negative pressure exhaust passage 23 having an exhaust outlet 23a opened. Further, the upper cylinder cover 14 and the lower cylinder cover 15 are formed so that a small gap d is formed at the joint between the upper cylinder cover 14 and the lower cylinder cover 15 in the combined state.

As shown in FIG. 1, the spin chuck 2 is rotatably supported by a rotation shaft 3 thereof, and is provided with a transfer position for transferring the substrate 1 and a processing position for supplying a processing liquid to the substrate 1. It is supported so that it can be moved up and down. In the figure, reference numeral 4 is an outer cylinder cover of the rotary shaft 3, 5 is a drive motor for rotating the rotary shaft 3, and 6 is a lifting guide.

The scattering prevention cover 13 is composed of an upper cylinder cover 14 that can be separated into upper and lower parts and a lower cylinder cover 15 having a skirt-like shape, and is provided in an outer container 20 for collecting the processing liquid. The upper cylinder cover 14 and the lower cylinder cover 15 are individually supported by the fixing fittings 16a and 16b, the support arms 17a and 17b, the columns 18a and 18b, and the air cylinders 19a and 19b so as to be able to move up and down. When supplying the developing solution to the two, they are supported in a separated state, and in this separated state, the upper cylinder cover 14 is located at a predetermined height, and the lower cylinder cover 15 has its upper end at the substrate of the spin chuck 2. It is located below the holding surface.

An exhaust guide plate 15c is formed at the lower end of the lower cylinder cover 15 so as to decrease in diameter downward. The exhaust guide plate 15c is set such that its constriction angle θ is about 36 ° with respect to the horizontal plane, and the constricted portion length h is about 10 mm. As a result, as shown in FIG. 2, the exhaust guide plate 15c acts as follows, for example, in the developing liquid shake-off process step.

That is, when the upper cylinder cover 14 and the lower cylinder cover 15 are united, and the inside of the shatterproof cover 13 is forcibly exhausted at a position where they are raised, the air inside the shatterproof cover 13 is at the lower end of the lower cylinder cover 15. Along the inner surface of the exhaust guide plate 15c formed at the portion, the exhaust gas is exhausted by flowing downward in the direction of the smaller diameter. Therefore, the air containing a large amount of the mist of the developer does not leak to the outside, that is, the side between the scattering prevention cover 13 and the outer container 20, and is accumulated. On the other hand, on the outer surface side of the exhaust guide plate 15c, the air flowing down along the inner surface of the exhaust guide plate 15c is pulled, and the exhaust of the outer air is promoted by the principle of aspiration. As a result, the air containing a large amount of mist of the developer between the outer container 20 and the scattering prevention cover 13 is sucked and exhausted downward, and the gap d between the joint between the upper cylinder cover 14 and the lower cylinder cover 15 is d. Therefore, it does not enter the scattering prevention cover 13.

The nozzle 8 for supplying the developing solution is fixed to a support arm 10, is supported by a support shaft 11 so as to be horizontally swingable, and is horizontally swung by a nozzle sweeping motor 12 while the substrate 1 is being swung. It is configured to supply the developing solution to the upper surface. A pipe for supplying a developing solution and a pipe for supplying pure water are connected to the nozzle 8, and one of the two liquids is selected and supplied from a single discharge nozzle 8. .. In addition to the nozzle 8, a pre-wet nozzle, a rinse liquid supply nozzle, an N ₂ gas supply nozzle, and the like, which are not shown, are appropriately installed.

It should be noted that the nozzle 8 is provided so as to be positioned within the separation height between the upper cylinder cover 14 and the lower cylinder cover 15, and the drive motor 12 is normally rotated in a state where both are separated. As a result, the developing solution is ejected from the nozzle 8 while sweeping the support arm 10 of the nozzle 8 on the substrate 1. The nozzle 8 sprays the developer in a fan shape in plan view.

The outer container 20 is provided so as to surround the shatterproof cover 13, and the bottom wall 20a thereof has a drain outlet 22a and an exhaust outlet 23a for collecting the treatment liquid. The exhaust outlet 23a is opened so as to be located inside the enclosing region of the shatterproof cover 13, that is, at the inclined portion of the bottom wall 20a near the spin chuck 1, and the drain drain 22 is provided at the drain outlet 22a. A negative pressure exhaust passage 23 is connected to the exhaust outlet 23a, and a forced exhaust means (not shown) is connected to the negative pressure exhaust passage 23. Reference numeral 21 is a support for the outer container 20.

The apparatus of the above-described embodiment is configured to perform the development processing of the substrates one after another by repeating a series of operations similar to those in FIGS. 4A to 4D. The present invention is not limited to the above-described embodiment, and the exhaust outlet 23a may be inside the area where the scattering prevention cover 13 is enclosed, and the shapes of the side wall and the bottom wall of the outer container 20 may be appropriately changed. It does not require a lot of words to be able to carry out by adding.

[0019]

[Effect of the device]

 As described above, according to the present invention, since the exhaust guide plate having a smaller diameter toward the lower side is formed at the lower end portion of the lower cylinder cover, a large amount of the developer mist existing in the space between the outer container and the scattering prevention cover is formed. The contained air is sucked and exhausted downward by the principle of aspiration, and does not enter into the scattering prevention cover through the gap between the upper cylinder cover and the lower cylinder cover. This can prevent the developer mist from adhering to the surface of the substrate and improve the quality of the substrate.

[Brief description of drawings]

FIG. 1 is a vertical sectional view of a rotary developing processing apparatus according to an embodiment of the present invention.

FIG. 2 is a vertical cross-sectional view showing the action of a scattering prevention cover in the developing solution shaking-off process of the present embodiment.

FIG. 3 is a vertical cross-sectional view of a rotary development processing apparatus according to a conventional example.

FIG. 4 is a diagram illustrating a general operation of a rotary development processing apparatus.

FIG. 5 is a vertical cross-sectional view showing the action of a scattering prevention cover in a conventional developer shaking-off process.

[Explanation of symbols]

1 ... Substrate, 2 ... Spin chuck, 8
... Development liquid supply nozzle, 13 ... Splash prevention cover, 14
… Upper cylinder cover, 15… Lower cylinder cover, 15c…
Exhaust guide plate, 20 ... Outer container, 23 ... Negative pressure exhaust passage, 23a ... Exhaust outlet.

Claims (1)

[Scope of utility model registration request] 1. A spin chuck that holds a substrate substantially horizontally and rotates, a nozzle that supplies a developing solution to the upper surface of the substrate held by the spin chuck, an upper cylinder cover that can be separated into upper and lower parts, and a hem-shaped bottom part. It consists of a cylinder cover, which is integrated to enclose the substrate when the substrate is rotated, an outer container that is provided to enclose the anti-scatter cover and collects the processing liquid, and an area within the enclosing region of the anti-scatter cover. In a rotary developing apparatus for a substrate, which comprises a negative pressure exhaust passage having an exhaust outlet opened in a bottom wall of the outer container, an exhaust guide plate having a diameter decreasing downward at a lower end portion of the lower cylinder cover. A rotary development processing apparatus for a substrate, characterized in that.