JPH0556847B2 - - Google Patents

Info

Publication number
JPH0556847B2
JPH0556847B2 JP61034136A JP3413686A JPH0556847B2 JP H0556847 B2 JPH0556847 B2 JP H0556847B2 JP 61034136 A JP61034136 A JP 61034136A JP 3413686 A JP3413686 A JP 3413686A JP H0556847 B2 JPH0556847 B2 JP H0556847B2
Authority
JP
Japan
Prior art keywords
resist
wafer
rotation speed
speed
coating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61034136A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62190838A (ja
Inventor
Juji Ashikaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP3413686A priority Critical patent/JPS62190838A/ja
Publication of JPS62190838A publication Critical patent/JPS62190838A/ja
Publication of JPH0556847B2 publication Critical patent/JPH0556847B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3413686A 1986-02-18 1986-02-18 レジスト塗布方法 Granted JPS62190838A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3413686A JPS62190838A (ja) 1986-02-18 1986-02-18 レジスト塗布方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3413686A JPS62190838A (ja) 1986-02-18 1986-02-18 レジスト塗布方法

Publications (2)

Publication Number Publication Date
JPS62190838A JPS62190838A (ja) 1987-08-21
JPH0556847B2 true JPH0556847B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-08-20

Family

ID=12405802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3413686A Granted JPS62190838A (ja) 1986-02-18 1986-02-18 レジスト塗布方法

Country Status (1)

Country Link
JP (1) JPS62190838A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102351607B1 (ko) * 2021-06-18 2022-01-18 한국수자원공사 수계로부터 플라스틱을 분리하는 장치 및 이를 이용한 분리방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3280791B2 (ja) 1994-02-17 2002-05-13 東京応化工業株式会社 塗膜形成方法
JP3824334B2 (ja) 1995-08-07 2006-09-20 東京応化工業株式会社 シリカ系被膜形成用塗布液及び被膜形成方法
JP5401763B2 (ja) * 2007-03-30 2014-01-29 富士通セミコンダクター株式会社 塗布液の塗布方法及び半導体装置の製造方法
CN111266265B (zh) * 2018-12-05 2021-10-08 长鑫存储技术有限公司 一种半导体的涂布设备及涂布方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154444A (ja) * 1983-02-23 1984-09-03 Toshiba Corp レジスト塗布方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102351607B1 (ko) * 2021-06-18 2022-01-18 한국수자원공사 수계로부터 플라스틱을 분리하는 장치 및 이를 이용한 분리방법

Also Published As

Publication number Publication date
JPS62190838A (ja) 1987-08-21

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