JPH0555012B2 - - Google Patents

Info

Publication number
JPH0555012B2
JPH0555012B2 JP23354585A JP23354585A JPH0555012B2 JP H0555012 B2 JPH0555012 B2 JP H0555012B2 JP 23354585 A JP23354585 A JP 23354585A JP 23354585 A JP23354585 A JP 23354585A JP H0555012 B2 JPH0555012 B2 JP H0555012B2
Authority
JP
Japan
Prior art keywords
group
phenylxanthene
parts
dimethoxy
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP23354585A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6294841A (ja
Inventor
Hideyuki Sensui
Michihiro Gonda
Toshio Ohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hodogaya Chemical Co Ltd
Original Assignee
Hodogaya Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hodogaya Chemical Co Ltd filed Critical Hodogaya Chemical Co Ltd
Priority to JP23354585A priority Critical patent/JPS6294841A/ja
Publication of JPS6294841A publication Critical patent/JPS6294841A/ja
Publication of JPH0555012B2 publication Critical patent/JPH0555012B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP23354585A 1985-10-21 1985-10-21 画像形成組成物 Granted JPS6294841A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23354585A JPS6294841A (ja) 1985-10-21 1985-10-21 画像形成組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23354585A JPS6294841A (ja) 1985-10-21 1985-10-21 画像形成組成物

Publications (2)

Publication Number Publication Date
JPS6294841A JPS6294841A (ja) 1987-05-01
JPH0555012B2 true JPH0555012B2 (enExample) 1993-08-16

Family

ID=16956735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23354585A Granted JPS6294841A (ja) 1985-10-21 1985-10-21 画像形成組成物

Country Status (1)

Country Link
JP (1) JPS6294841A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10259374A1 (de) 2002-12-18 2004-07-08 Atto-Tec Gmbh Carboxamid-substituierte Farbstoffe für analytische Anwendungen
US10377734B2 (en) 2013-02-08 2019-08-13 Mitsubishi Gas Chemical Company, Inc. Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition
WO2016104214A1 (ja) * 2014-12-25 2016-06-30 三菱瓦斯化学株式会社 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法及び精製方法
CN107428717B (zh) 2015-03-31 2021-04-23 三菱瓦斯化学株式会社 抗蚀剂组合物、抗蚀图案形成方法、及用于其的多酚化合物
WO2016158168A1 (ja) 2015-03-31 2016-10-06 三菱瓦斯化学株式会社 化合物、レジスト組成物及びそれを用いるレジストパターン形成方法
CN107949808B (zh) 2015-08-31 2021-10-22 三菱瓦斯化学株式会社 光刻用下层膜形成材料、光刻用下层膜形成用组合物、光刻用下层膜及其制造方法
EP3346334B1 (en) 2015-08-31 2020-08-12 Mitsubishi Gas Chemical Company, Inc. Use of a composition for forming a photoresist underlayer film for lithography, photoresist underlayer film for lithography and method for producing same, and resist pattern forming method
KR102687507B1 (ko) 2015-09-10 2024-07-24 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 수지, 레지스트 조성물 또는 감방사선성 조성물, 레지스트 패턴 형성방법, 아몰퍼스막의 제조방법, 리소그래피용 하층막 형성재료, 리소그래피용 하층막 형성용 조성물, 회로패턴의 형성방법 및 정제방법

Also Published As

Publication number Publication date
JPS6294841A (ja) 1987-05-01

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