JPH0554253B2 - - Google Patents
Info
- Publication number
- JPH0554253B2 JPH0554253B2 JP58145507A JP14550783A JPH0554253B2 JP H0554253 B2 JPH0554253 B2 JP H0554253B2 JP 58145507 A JP58145507 A JP 58145507A JP 14550783 A JP14550783 A JP 14550783A JP H0554253 B2 JPH0554253 B2 JP H0554253B2
- Authority
- JP
- Japan
- Prior art keywords
- molecular beam
- beam source
- shutter
- source cell
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14550783A JPS6057611A (ja) | 1983-08-09 | 1983-08-09 | 分子線源シヤツタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14550783A JPS6057611A (ja) | 1983-08-09 | 1983-08-09 | 分子線源シヤツタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6057611A JPS6057611A (ja) | 1985-04-03 |
JPH0554253B2 true JPH0554253B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-08-12 |
Family
ID=15386846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14550783A Granted JPS6057611A (ja) | 1983-08-09 | 1983-08-09 | 分子線源シヤツタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6057611A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6359318U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1986-10-07 | 1988-04-20 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4813515U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1971-07-02 | 1973-02-15 | ||
JPS54122766U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1978-02-15 | 1979-08-28 | ||
JPS54180662U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1978-06-12 | 1979-12-20 | ||
JPS60129126U (ja) * | 1984-02-06 | 1985-08-30 | 日本電気株式会社 | 分子線エピタキシ装置 |
JPS6150326A (ja) * | 1984-08-20 | 1986-03-12 | Fujitsu Ltd | 半導体結晶成長装置 |
-
1983
- 1983-08-09 JP JP14550783A patent/JPS6057611A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6057611A (ja) | 1985-04-03 |