JPH0553872B2 - - Google Patents
Info
- Publication number
- JPH0553872B2 JPH0553872B2 JP60243663A JP24366385A JPH0553872B2 JP H0553872 B2 JPH0553872 B2 JP H0553872B2 JP 60243663 A JP60243663 A JP 60243663A JP 24366385 A JP24366385 A JP 24366385A JP H0553872 B2 JPH0553872 B2 JP H0553872B2
- Authority
- JP
- Japan
- Prior art keywords
- lid
- vacuum chamber
- aluminum
- main body
- cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 19
- 238000001312 dry etching Methods 0.000 claims description 17
- 238000005260 corrosion Methods 0.000 claims description 16
- 230000007797 corrosion Effects 0.000 claims description 16
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- 239000011247 coating layer Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000005468 ion implantation Methods 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 20
- 239000010935 stainless steel Substances 0.000 description 10
- 229910001220 stainless steel Inorganic materials 0.000 description 10
- 239000000463 material Substances 0.000 description 6
- -1 oxygen ions Chemical class 0.000 description 6
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24366385A JPS62103380A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24366385A JPS62103380A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62103380A JPS62103380A (ja) | 1987-05-13 |
| JPH0553872B2 true JPH0553872B2 (fr) | 1993-08-11 |
Family
ID=17107150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24366385A Granted JPS62103380A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62103380A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112006002987T5 (de) | 2005-11-17 | 2008-10-02 | Kabushiki Kaisha Kobe Seiko Sho | Aluminiumlegierungselement mit hervorragender Korrosionsbeständigkeit |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6383964B1 (en) | 1998-11-27 | 2002-05-07 | Kyocera Corporation | Ceramic member resistant to halogen-plasma corrosion |
| JP4512603B2 (ja) * | 2007-02-26 | 2010-07-28 | トーカロ株式会社 | 耐ハロゲンガス性の半導体加工装置用部材 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6021382A (ja) * | 1983-07-15 | 1985-02-02 | Canon Inc | プラズマｃｖｄ装置 |
-
1985
- 1985-10-29 JP JP24366385A patent/JPS62103380A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6021382A (ja) * | 1983-07-15 | 1985-02-02 | Canon Inc | プラズマｃｖｄ装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112006002987T5 (de) | 2005-11-17 | 2008-10-02 | Kabushiki Kaisha Kobe Seiko Sho | Aluminiumlegierungselement mit hervorragender Korrosionsbeständigkeit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62103380A (ja) | 1987-05-13 |
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