JPH0553871B2 - - Google Patents
Info
- Publication number
- JPH0553871B2 JPH0553871B2 JP24366285A JP24366285A JPH0553871B2 JP H0553871 B2 JPH0553871 B2 JP H0553871B2 JP 24366285 A JP24366285 A JP 24366285A JP 24366285 A JP24366285 A JP 24366285A JP H0553871 B2 JPH0553871 B2 JP H0553871B2
- Authority
- JP
- Japan
- Prior art keywords
- lid
- main body
- dry etching
- vacuum chamber
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005260 corrosion Methods 0.000 claims description 20
- 230000007797 corrosion Effects 0.000 claims description 20
- 238000001312 dry etching Methods 0.000 claims description 20
- 238000007733 ion plating Methods 0.000 claims description 16
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 29
- 229910001220 stainless steel Inorganic materials 0.000 description 9
- 239000010935 stainless steel Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24366285A JPS62103379A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24366285A JPS62103379A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62103379A JPS62103379A (ja) | 1987-05-13 |
| JPH0553871B2 true JPH0553871B2 (enrdf_load_stackoverflow) | 1993-08-11 |
Family
ID=17107136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24366285A Granted JPS62103379A (ja) | 1985-10-29 | 1985-10-29 | Ｃｖｄ装置およびドライ・エツチング装置における真空チヤンバの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62103379A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112006002987T5 (de) | 2005-11-17 | 2008-10-02 | Kabushiki Kaisha Kobe Seiko Sho | Aluminiumlegierungselement mit hervorragender Korrosionsbeständigkeit |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004076711A1 (ja) * | 1995-10-03 | 2004-09-10 | Seigo Yamamoto | 耐ハロゲン系ガス腐食性及び耐ハロゲン系プラズマ腐食性に優れたコーティング膜、該コーティング膜を施した積層構造体並びにそれらの製造方法 |
| US6790242B2 (en) | 2000-12-29 | 2004-09-14 | Lam Research Corporation | Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof |
| US6537429B2 (en) | 2000-12-29 | 2003-03-25 | Lam Research Corporation | Diamond coatings on reactor wall and method of manufacturing thereof |
| US6533910B2 (en) | 2000-12-29 | 2003-03-18 | Lam Research Corporation | Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof |
| US6613442B2 (en) | 2000-12-29 | 2003-09-02 | Lam Research Corporation | Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| US7128804B2 (en) | 2000-12-29 | 2006-10-31 | Lam Research Corporation | Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
| US6620520B2 (en) | 2000-12-29 | 2003-09-16 | Lam Research Corporation | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| US6830622B2 (en) | 2001-03-30 | 2004-12-14 | Lam Research Corporation | Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof |
-
1985
- 1985-10-29 JP JP24366285A patent/JPS62103379A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112006002987T5 (de) | 2005-11-17 | 2008-10-02 | Kabushiki Kaisha Kobe Seiko Sho | Aluminiumlegierungselement mit hervorragender Korrosionsbeständigkeit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62103379A (ja) | 1987-05-13 |
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