JPH055368B2 - - Google Patents
Info
- Publication number
- JPH055368B2 JPH055368B2 JP62260224A JP26022487A JPH055368B2 JP H055368 B2 JPH055368 B2 JP H055368B2 JP 62260224 A JP62260224 A JP 62260224A JP 26022487 A JP26022487 A JP 26022487A JP H055368 B2 JPH055368 B2 JP H055368B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- stage
- wafer
- alignment
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012546 transfer Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 19
- 235000012431 wafers Nutrition 0.000 description 48
- 238000010586 diagram Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62260224A JPH01101629A (ja) | 1987-10-14 | 1987-10-14 | マスクとウェハのプリアライメント方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62260224A JPH01101629A (ja) | 1987-10-14 | 1987-10-14 | マスクとウェハのプリアライメント方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01101629A JPH01101629A (ja) | 1989-04-19 |
JPH055368B2 true JPH055368B2 (zh) | 1993-01-22 |
Family
ID=17345075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62260224A Granted JPH01101629A (ja) | 1987-10-14 | 1987-10-14 | マスクとウェハのプリアライメント方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01101629A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0683276U (ja) * | 1993-05-12 | 1994-11-29 | 株式会社日立ビルシステムサービス | プリント板取外し治具 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH098103A (ja) * | 1995-06-19 | 1997-01-10 | Nikon Corp | 投影露光装置及び投影露光方法 |
JP2005340315A (ja) * | 2004-05-25 | 2005-12-08 | Nikon Corp | 位置合わせ装置、露光装置、位置合わせ方法及び露光方法、並びにデバイス製造方法及び較正用(工具)レチクル |
-
1987
- 1987-10-14 JP JP62260224A patent/JPH01101629A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0683276U (ja) * | 1993-05-12 | 1994-11-29 | 株式会社日立ビルシステムサービス | プリント板取外し治具 |
Also Published As
Publication number | Publication date |
---|---|
JPH01101629A (ja) | 1989-04-19 |
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