JPH0553073B2 - - Google Patents
Info
- Publication number
- JPH0553073B2 JPH0553073B2 JP61079419A JP7941986A JPH0553073B2 JP H0553073 B2 JPH0553073 B2 JP H0553073B2 JP 61079419 A JP61079419 A JP 61079419A JP 7941986 A JP7941986 A JP 7941986A JP H0553073 B2 JPH0553073 B2 JP H0553073B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- gate
- semiconductor device
- impurity density
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
- H10D12/212—Gated diodes having PN junction gates, e.g. field controlled diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/60—Gate-turn-off devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/50—Physical imperfections
- H10D62/53—Physical imperfections the imperfections being within the semiconductor body
Landscapes
- Thyristors (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61079419A JPS62235782A (ja) | 1986-04-07 | 1986-04-07 | 半導体装置 |
US06/912,578 US4752818A (en) | 1985-09-28 | 1986-09-26 | Semiconductor device with multiple recombination center layers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61079419A JPS62235782A (ja) | 1986-04-07 | 1986-04-07 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62235782A JPS62235782A (ja) | 1987-10-15 |
JPH0553073B2 true JPH0553073B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-08-09 |
Family
ID=13689346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61079419A Granted JPS62235782A (ja) | 1985-09-28 | 1986-04-07 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62235782A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2213988B (en) * | 1987-12-18 | 1992-02-05 | Matsushita Electric Works Ltd | Semiconductor device |
JPH0671078B2 (ja) * | 1988-04-23 | 1994-09-07 | 松下電工株式会社 | 半導体装置 |
JP2604832B2 (ja) * | 1988-10-19 | 1997-04-30 | 松下電工株式会社 | 半導体装置 |
JP2526653B2 (ja) * | 1989-01-25 | 1996-08-21 | 富士電機株式会社 | 伝導度変調型mosfet |
EP1039547B1 (en) | 1998-09-10 | 2016-03-23 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
DE10048345A1 (de) * | 2000-09-29 | 2002-05-16 | Eupec Gmbh & Co Kg | Körper aus Halbleitermaterial mit reduzierter mittlerer freier Weglänge |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53108387A (en) * | 1977-02-07 | 1978-09-21 | Gen Electric | Junction semiconductor and method of producing same |
US4311534A (en) * | 1980-06-27 | 1982-01-19 | Westinghouse Electric Corp. | Reducing the reverse recovery charge of thyristors by nuclear irradiation |
EP0130457A1 (de) * | 1983-07-01 | 1985-01-09 | Hahn-Meitner-Institut Berlin Gesellschaft mit beschränkter Haftung | Halbleiter-Bauelement mit mindestens einem pn-Übergang und mit in der Tiefe der Basisschicht scharf lokalisierten Ionen, Verfahren zu dessen Herstellung und seine Verwendung |
-
1986
- 1986-04-07 JP JP61079419A patent/JPS62235782A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62235782A (ja) | 1987-10-15 |
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