JPH05500435A - シリコン加熱エレメント - Google Patents
シリコン加熱エレメントInfo
- Publication number
- JPH05500435A JPH05500435A JP50221391A JP50221391A JPH05500435A JP H05500435 A JPH05500435 A JP H05500435A JP 50221391 A JP50221391 A JP 50221391A JP 50221391 A JP50221391 A JP 50221391A JP H05500435 A JPH05500435 A JP H05500435A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- silicon
- heating element
- silicon layer
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title claims description 58
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 56
- 229910052710 silicon Inorganic materials 0.000 title claims description 56
- 239000010703 silicon Substances 0.000 title claims description 56
- 239000010410 layer Substances 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 14
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 13
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000003870 refractory metal Substances 0.000 claims description 8
- 239000002019 doping agent Substances 0.000 claims description 6
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 claims description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 3
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 239000011819 refractory material Substances 0.000 claims 1
- 239000003352 sequestering agent Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 10
- 238000012546 transfer Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005485 electric heating Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/148—Silicon, e.g. silicon carbide, magnesium silicide, heating transistors or diodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Resistance Heating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| YU247189A YU247189A (en) | 1989-12-27 | 1989-12-27 | Silicon heating element |
| YU2471/89 | 1989-12-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05500435A true JPH05500435A (ja) | 1993-01-28 |
Family
ID=25558050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50221391A Pending JPH05500435A (ja) | 1989-12-27 | 1990-12-21 | シリコン加熱エレメント |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0460175A1 (fr) |
| JP (1) | JPH05500435A (fr) |
| CA (1) | CA2047193A1 (fr) |
| WO (1) | WO1991010336A1 (fr) |
| YU (1) | YU247189A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102269962A (zh) * | 2010-06-03 | 2011-12-07 | 柯尼卡美能达商用科技株式会社 | 定影装置及图像形成装置 |
| US8639171B2 (en) | 2010-06-03 | 2014-01-28 | Konica Minolta Business Technologies, Inc. | Fixing device and image forming apparatus with a mechanism to extend a life of a fixing belt |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0656739B1 (fr) * | 1993-12-02 | 2001-03-07 | E.G.O. Elektro-Gerätebau GmbH | Chauffage avec une unité de chauffage |
| SE506968C2 (sv) * | 1996-07-25 | 1998-03-09 | Electrolux Ab | Keramisk spishäll och förfarande för framställning av filmskiktsbeläggning |
| DE19724734C2 (de) * | 1997-06-12 | 2000-06-29 | Behr Gmbh & Co | Elektrische Heizeinrichtung, insbesondere für ein Kraftfahrzeug |
| JP4998597B2 (ja) | 2010-06-03 | 2012-08-15 | コニカミノルタビジネステクノロジーズ株式会社 | 定着装置および画像形成装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3742192A (en) * | 1972-02-02 | 1973-06-26 | J Brzuszek | Electrical heating device and method |
| DE2749251C3 (de) * | 1977-11-03 | 1981-10-08 | Danfoss A/S, 6430 Nordborg | Regelbare Heizvorrichtung für kleine Massen, insbesondere das Ausdehnungsmittel in Wärmestellvorrichtungen |
| DE3432029A1 (de) * | 1984-08-31 | 1986-03-13 | Kromberg & Schubert, 5600 Wuppertal | Elektrisches heizelement, insbesondere zum erhitzen von durchlaufenden fluessigkeiten, insbesondere wasser |
| US4648175A (en) * | 1985-06-12 | 1987-03-10 | Ncr Corporation | Use of selectively deposited tungsten for contact formation and shunting metallization |
| DE3527857A1 (de) * | 1985-08-02 | 1987-02-05 | Roland Schuhwerk | Elektrisches heizelement |
| US4719477A (en) * | 1986-01-17 | 1988-01-12 | Hewlett-Packard Company | Integrated thermal ink jet printhead and method of manufacture |
| US5128514A (en) * | 1987-07-31 | 1992-07-07 | Siemens Aktiengesellschaft | Black radiator for use as an emitter in calibratable gas sensors |
-
1989
- 1989-12-27 YU YU247189A patent/YU247189A/xx unknown
-
1990
- 1990-12-21 JP JP50221391A patent/JPH05500435A/ja active Pending
- 1990-12-21 WO PCT/EP1990/002272 patent/WO1991010336A1/fr not_active Application Discontinuation
- 1990-12-21 EP EP19910901791 patent/EP0460175A1/fr not_active Withdrawn
- 1990-12-21 CA CA 2047193 patent/CA2047193A1/fr not_active Abandoned
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102269962A (zh) * | 2010-06-03 | 2011-12-07 | 柯尼卡美能达商用科技株式会社 | 定影装置及图像形成装置 |
| US8639170B2 (en) | 2010-06-03 | 2014-01-28 | Konica Minolta Business Technologies, Inc. | Fixing device and image forming apparatus with a mechanism to extend life of a fixing belt |
| US8639171B2 (en) | 2010-06-03 | 2014-01-28 | Konica Minolta Business Technologies, Inc. | Fixing device and image forming apparatus with a mechanism to extend a life of a fixing belt |
Also Published As
| Publication number | Publication date |
|---|---|
| YU247189A (en) | 1991-10-31 |
| WO1991010336A1 (fr) | 1991-07-11 |
| EP0460175A1 (fr) | 1991-12-11 |
| CA2047193A1 (fr) | 1991-06-28 |
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