JPH054606B2 - - Google Patents
Info
- Publication number
- JPH054606B2 JPH054606B2 JP62184250A JP18425087A JPH054606B2 JP H054606 B2 JPH054606 B2 JP H054606B2 JP 62184250 A JP62184250 A JP 62184250A JP 18425087 A JP18425087 A JP 18425087A JP H054606 B2 JPH054606 B2 JP H054606B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- measured
- incident
- angle
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62184250A JPS6428509A (en) | 1987-07-23 | 1987-07-23 | Apparatus for measuring thickness of film |
US07/223,275 US4872758A (en) | 1987-07-23 | 1988-07-22 | Film thickness-measuring apparatus |
DE3889026A DE3889026D1 (de) | 1987-07-23 | 1988-07-25 | Dickenmessgerät für Schichten. |
DE3889026T DE3889026T4 (de) | 1987-07-23 | 1988-07-25 | Dickenmessgerät für Schichten. |
EP88111960A EP0300508B1 (en) | 1987-07-23 | 1988-07-25 | Film thickness-measuring apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62184250A JPS6428509A (en) | 1987-07-23 | 1987-07-23 | Apparatus for measuring thickness of film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6428509A JPS6428509A (en) | 1989-01-31 |
JPH054606B2 true JPH054606B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-01-20 |
Family
ID=16150019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62184250A Granted JPS6428509A (en) | 1987-07-23 | 1987-07-23 | Apparatus for measuring thickness of film |
Country Status (4)
Families Citing this family (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2691056B2 (ja) * | 1990-07-17 | 1997-12-17 | 三菱重工業株式会社 | 印刷機の版面上の水膜検出器 |
JP2502443B2 (ja) * | 1991-01-30 | 1996-05-29 | 日本鋼管株式会社 | エリプソメ―タ及びこれを用いた塗布厚制御方法 |
US5438415A (en) * | 1991-01-30 | 1995-08-01 | Nkk Corporation | Ellipsometer and method of controlling coating thickness therewith |
JPH05113371A (ja) * | 1991-08-29 | 1993-05-07 | Nkk Corp | エリプソパラメータ測定方法及びエリプソメータ |
JPH05157521A (ja) * | 1991-08-29 | 1993-06-22 | Nkk Corp | エリプソパラメータ測定方法及びエリプソメータ |
US5232547A (en) * | 1992-07-01 | 1993-08-03 | Motorola, Inc. | Simultaneously measuring thickness and composition of a film |
US5657126A (en) * | 1992-12-21 | 1997-08-12 | The Board Of Regents Of The University Of Nebraska | Ellipsometer |
US5416588A (en) * | 1992-12-21 | 1995-05-16 | The Board Of Regents Of The University Of Nebraska | Small modulation ellipsometry |
US5412473A (en) * | 1993-07-16 | 1995-05-02 | Therma-Wave, Inc. | Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices |
EP0838026B1 (en) * | 1995-06-15 | 2003-03-19 | British Nuclear Fuels PLC | Inspecting the surface of an object |
GB9514487D0 (en) * | 1995-07-14 | 1995-09-13 | Univ Sheffield | Optical collector head etc |
US5717490A (en) * | 1996-10-17 | 1998-02-10 | Lsi Logic Corporation | Method for identifying order skipping in spectroreflective film measurement equipment |
US5798837A (en) | 1997-07-11 | 1998-08-25 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
US6278519B1 (en) | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
DE19734646A1 (de) * | 1997-08-11 | 1999-03-04 | Bosch Gmbh Robert | Ellipsometer-Meßvorrichtung |
US6134011A (en) | 1997-09-22 | 2000-10-17 | Hdi Instrumentation | Optical measurement system using polarized light |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
US6370395B1 (en) * | 1999-03-19 | 2002-04-09 | Ericsson Inc. | Interactive office nameplate |
DE19943312A1 (de) * | 1999-09-10 | 2001-03-15 | Haverkamp Mark | Vorrichtung und Verfahren zur on-line-Dickenmessung transparenter Schichten/ Medien durch Transmissions-Ellipsometrie |
KR100574776B1 (ko) * | 2004-01-15 | 2006-04-28 | 한국표준과학연구원 | 분광결상을 이용한 타원계측 장치 및 타원계측 방법 |
US7206066B2 (en) * | 2004-03-19 | 2007-04-17 | Kla-Tencor Technologies Corporation | Reflectance surface analyzer |
US7515253B2 (en) | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
EP1835257B1 (de) | 2006-03-14 | 2010-05-12 | Betriebsforschungsinstitut VDEh Institut für angewandte Forschung GmbH | Verfahren zur Bestimmung der Auflage auf einem bewegten Metallband |
JP5410806B2 (ja) * | 2009-03-27 | 2014-02-05 | 浜松ホトニクス株式会社 | 膜厚測定装置及び測定方法 |
US7985188B2 (en) * | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
RU2523773C2 (ru) | 2009-05-13 | 2014-07-20 | СиО2 Медикал Продактс, Инк., | Способ по выделению газа для инспектирования поверхности с покрытием |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
CN102483320B (zh) | 2009-10-13 | 2014-04-02 | 浜松光子学株式会社 | 膜厚测定装置及膜厚测定方法 |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US8997572B2 (en) | 2011-02-11 | 2015-04-07 | Washington University | Multi-focus optical-resolution photoacoustic microscopy with ultrasonic array detection |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
JP6095678B2 (ja) | 2011-11-11 | 2017-03-15 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 薬剤パッケージ用の不動態化、pH保護又は滑性皮膜、被覆プロセス及び装置 |
US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
WO2014063005A1 (en) | 2012-10-18 | 2014-04-24 | Washington University | Transcranialphotoacoustic/thermoacoustic tomography brain imaging informed by adjunct image data |
CN104854257B (zh) | 2012-11-01 | 2018-04-13 | Sio2医药产品公司 | 涂层检查方法 |
WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
AU2013352436B2 (en) | 2012-11-30 | 2018-10-25 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like |
WO2014134577A1 (en) | 2013-03-01 | 2014-09-04 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
US9863758B2 (en) * | 2013-03-15 | 2018-01-09 | Sensory Analytics, Llc | Method and system for real-time in-process measurement of coating thickness |
WO2015077355A1 (en) | 2013-11-19 | 2015-05-28 | Washington University | Systems and methods of grueneisen-relaxation photoacoustic microscopy and photoacoustic wavefront shaping |
WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
BR112018003051B1 (pt) | 2015-08-18 | 2022-12-06 | Sio2 Medical Products, Inc | Tubo de coleta de sangue submetido a vácuo |
JP6387952B2 (ja) * | 2015-12-21 | 2018-09-12 | 横河電機株式会社 | 偏光検査装置 |
WO2018209046A1 (en) | 2017-05-10 | 2018-11-15 | Washington University | Snapshot photoacoustic photography using an ergodic relay |
WO2020037082A1 (en) | 2018-08-14 | 2020-02-20 | California Institute Of Technology | Multifocal photoacoustic microscopy through an ergodic relay |
US11592652B2 (en) | 2018-09-04 | 2023-02-28 | California Institute Of Technology | Enhanced-resolution infrared photoacoustic microscopy and spectroscopy |
US11369280B2 (en) | 2019-03-01 | 2022-06-28 | California Institute Of Technology | Velocity-matched ultrasonic tagging in photoacoustic flowgraphy |
WO2021092250A1 (en) | 2019-11-05 | 2021-05-14 | California Institute Of Technology | Spatiotemporal antialiasing in photoacoustic computed tomography |
US11193882B2 (en) * | 2019-11-26 | 2021-12-07 | Samsung Electronics Co., Ltd. | Ellipsometer and inspection device for semiconductor device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1493087A (en) * | 1975-04-28 | 1977-11-23 | Ibm | Ellipsometer |
US3985447A (en) * | 1975-08-29 | 1976-10-12 | Bell Telephone Laboratories, Incorporated | Measurement of thin films by polarized light |
JPS58103604A (ja) * | 1981-12-16 | 1983-06-20 | Teijin Ltd | フイルムの厚さ測定方法及び測定装置 |
JPS6052706A (ja) * | 1983-08-31 | 1985-03-26 | Nippon Kokan Kk <Nkk> | 膜厚測定装置 |
US4695162A (en) * | 1984-05-24 | 1987-09-22 | Victor Company Of Japan, Ltd. | Film thickness measuring apparatus |
US4850711A (en) * | 1986-06-13 | 1989-07-25 | Nippon Kokan Kabushiki Kaisha | Film thickness-measuring apparatus using linearly polarized light |
-
1987
- 1987-07-23 JP JP62184250A patent/JPS6428509A/ja active Granted
-
1988
- 1988-07-22 US US07/223,275 patent/US4872758A/en not_active Expired - Lifetime
- 1988-07-25 DE DE3889026A patent/DE3889026D1/de not_active Expired - Fee Related
- 1988-07-25 DE DE3889026T patent/DE3889026T4/de not_active Expired - Lifetime
- 1988-07-25 EP EP88111960A patent/EP0300508B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3889026D1 (de) | 1994-05-19 |
EP0300508A3 (en) | 1990-11-28 |
DE3889026T2 (de) | 1994-10-13 |
US4872758A (en) | 1989-10-10 |
DE3889026T4 (de) | 1995-01-12 |
EP0300508B1 (en) | 1994-04-13 |
EP0300508A2 (en) | 1989-01-25 |
JPS6428509A (en) | 1989-01-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH054606B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
US4647207A (en) | Ellipsometric method and apparatus | |
US4672196A (en) | Method and apparatus for measuring properties of thin materials using polarized light | |
US5311285A (en) | Measuring method for ellipsometric parameter and ellipsometer | |
US7889339B1 (en) | Complementary waveplate rotating compensator ellipsometer | |
US4850711A (en) | Film thickness-measuring apparatus using linearly polarized light | |
US5170049A (en) | Coating thickness gauge using linearly polarized light | |
US7286226B2 (en) | Method and apparatus for measuring birefringence | |
US20100045985A1 (en) | Focused-beam ellipsometer | |
WO1998055844A1 (en) | Full field photoelastic stress analysis | |
US6181421B1 (en) | Ellipsometer and polarimeter with zero-order plate compensator | |
JPH02503115A (ja) | デファレンシャルエリプソメーター | |
WO2005029050A1 (ja) | 偏光解析装置および偏光解析方法 | |
EP0737856B1 (en) | A method of investigating samples by changing polarisation | |
JP3311497B2 (ja) | フーリエ変換分光位相変調偏光解析法 | |
JPH0431522B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JP3520379B2 (ja) | 光学定数測定方法およびその装置 | |
JPH07111327B2 (ja) | 偏光解析装置 | |
JPS6231289B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JP2597099B2 (ja) | 多光源偏光解析法 | |
JPH11101739A (ja) | エリプソメトリ装置 | |
JPH06317518A (ja) | 二色性分散計 | |
US7342661B2 (en) | Method for noise improvement in ellipsometers | |
CN222166377U (zh) | 一种衬底残余应力的光学无损检测系统 | |
JP2529562B2 (ja) | エリプソメ−タ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |