JPH0544817B2 - - Google Patents

Info

Publication number
JPH0544817B2
JPH0544817B2 JP59188301A JP18830184A JPH0544817B2 JP H0544817 B2 JPH0544817 B2 JP H0544817B2 JP 59188301 A JP59188301 A JP 59188301A JP 18830184 A JP18830184 A JP 18830184A JP H0544817 B2 JPH0544817 B2 JP H0544817B2
Authority
JP
Japan
Prior art keywords
grating
light
reticle
substrate
lens system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59188301A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6165251A (ja
Inventor
Noboru Nomura
Makoto Kato
Ryukichi Matsumura
Midori Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59188301A priority Critical patent/JPS6165251A/ja
Publication of JPS6165251A publication Critical patent/JPS6165251A/ja
Publication of JPH0544817B2 publication Critical patent/JPH0544817B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59188301A 1984-09-07 1984-09-07 露光装置 Granted JPS6165251A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59188301A JPS6165251A (ja) 1984-09-07 1984-09-07 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59188301A JPS6165251A (ja) 1984-09-07 1984-09-07 露光装置

Publications (2)

Publication Number Publication Date
JPS6165251A JPS6165251A (ja) 1986-04-03
JPH0544817B2 true JPH0544817B2 (en, 2012) 1993-07-07

Family

ID=16221215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59188301A Granted JPS6165251A (ja) 1984-09-07 1984-09-07 露光装置

Country Status (1)

Country Link
JP (1) JPS6165251A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638390B2 (ja) * 1986-04-09 1994-05-18 株式会社日立製作所 投影式露光装置
JP3216240B2 (ja) * 1992-06-04 2001-10-09 キヤノン株式会社 位置合わせ方法及びそれを用いた投影露光装置
JPH0665952U (ja) * 1993-02-19 1994-09-16 セフテイ工業株式会社 識別情報検出装置
CN102565904B (zh) * 2012-01-18 2013-09-18 中国科学院上海光学精密机械研究所 利用光栅成像扫描光刻制备大尺寸光栅的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1125000B (it) * 1978-12-08 1986-05-14 Rca Corp Sistema automatico per l'allineamento di fotomaschere in processi di stampa a proiezione
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
FR2472209A1 (fr) * 1979-12-18 1981-06-26 Thomson Csf Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium
JPS56122128A (en) * 1980-02-29 1981-09-25 Telmec Co Ltd Positioning system for printing device of semiconductor or the like
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings

Also Published As

Publication number Publication date
JPS6165251A (ja) 1986-04-03

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