JPH0544017B2 - - Google Patents

Info

Publication number
JPH0544017B2
JPH0544017B2 JP1089136A JP8913689A JPH0544017B2 JP H0544017 B2 JPH0544017 B2 JP H0544017B2 JP 1089136 A JP1089136 A JP 1089136A JP 8913689 A JP8913689 A JP 8913689A JP H0544017 B2 JPH0544017 B2 JP H0544017B2
Authority
JP
Japan
Prior art keywords
film
photomask
thin film
cellulose
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1089136A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0263A (ja
Inventor
Etsuo Ootake
Kaoru Yamaki
Takayuki Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP1089136A priority Critical patent/JPH0263A/ja
Publication of JPH0263A publication Critical patent/JPH0263A/ja
Publication of JPH0544017B2 publication Critical patent/JPH0544017B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1089136A 1989-04-07 1989-04-07 フォトマスクカバー Granted JPH0263A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1089136A JPH0263A (ja) 1989-04-07 1989-04-07 フォトマスクカバー

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1089136A JPH0263A (ja) 1989-04-07 1989-04-07 フォトマスクカバー

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57103488A Division JPS58219023A (ja) 1982-06-15 1982-06-15 樹脂薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPH0263A JPH0263A (ja) 1990-01-05
JPH0544017B2 true JPH0544017B2 (cs) 1993-07-05

Family

ID=13962464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1089136A Granted JPH0263A (ja) 1989-04-07 1989-04-07 フォトマスクカバー

Country Status (1)

Country Link
JP (1) JPH0263A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8866144B2 (en) 2002-05-17 2014-10-21 Semiconductor Energy Laboratory Co., Ltd. Thin film semiconductor device having silicon nitride film

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001201845A (ja) * 1999-11-09 2001-07-27 Asahi Kasei Electronics Co Ltd 大型ペリクル

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
JPS5544841A (en) * 1978-09-26 1980-03-29 Mitsubishi Gas Chem Co Inc Method of producing laminated plates
US4453828A (en) * 1981-12-02 1984-06-12 Advanced Semiconductor Products, Inc. Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8866144B2 (en) 2002-05-17 2014-10-21 Semiconductor Energy Laboratory Co., Ltd. Thin film semiconductor device having silicon nitride film

Also Published As

Publication number Publication date
JPH0263A (ja) 1990-01-05

Similar Documents

Publication Publication Date Title
JPS6325932B2 (cs)
US4861402A (en) Method of making a cellulose acetate butyrate pellicle
US5691088A (en) Pellicle for protection of photolithographic mask
US5378514A (en) Frame-supported pellicle for photolithography
US4748050A (en) Process for preparing thin film having high light transmittance
US5008156A (en) Photochemically stable mid and deep ultraviolet pellicles
JPH0544017B2 (cs)
JPH0578027B2 (cs)
JPH0514262B2 (cs)
JP2790946B2 (ja) ペリクル膜の製造方法
US4796973A (en) Pellicle structure for transmission of mid ultraviolet light
JPH0465764B2 (cs)
JP2001083691A (ja) 無発塵ペリクル
JP4371458B2 (ja) ペリクルの製造方法
EP0084221B1 (en) Method for the manufacture of a thin optical membrane
JPS6035733A (ja) フオトマスク用防塵カバ−の製造方法
GB2165545A (en) Pellicle structure for transmission of mid ultraviolet light
JPS60192951A (ja) 電子写真感光体の製造方法
JPH0619125A (ja) ペリクルの製造法
KR102172217B1 (ko) 펠리클 수납용기 및 이를 이용한 파티클 제거 방법
JPH0644148B2 (ja) 反射防止コ−テツドペリクルの製法
JPH1124237A (ja) ペリクル
JPH01166045A (ja) ペリクルの剥離法
JPH0768576A (ja) フッ素樹脂薄膜の製造方法
JPH0477739A (ja) ペリクルの製造方法