JPH0541982B2 - - Google Patents
Info
- Publication number
- JPH0541982B2 JPH0541982B2 JP61211178A JP21117886A JPH0541982B2 JP H0541982 B2 JPH0541982 B2 JP H0541982B2 JP 61211178 A JP61211178 A JP 61211178A JP 21117886 A JP21117886 A JP 21117886A JP H0541982 B2 JPH0541982 B2 JP H0541982B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- alignment
- exposure
- section
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61211178A JPS6365443A (ja) | 1986-09-08 | 1986-09-08 | アライメント付両面自動露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61211178A JPS6365443A (ja) | 1986-09-08 | 1986-09-08 | アライメント付両面自動露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6365443A JPS6365443A (ja) | 1988-03-24 |
JPH0541982B2 true JPH0541982B2 (enrdf_load_stackoverflow) | 1993-06-25 |
Family
ID=16601702
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61211178A Granted JPS6365443A (ja) | 1986-09-08 | 1986-09-08 | アライメント付両面自動露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6365443A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9170483B2 (en) | 2012-09-13 | 2015-10-27 | Nippon Mektron, Ltd. | Photomask, photomask set, exposure apparatus and exposure method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0487390A (ja) * | 1990-07-31 | 1992-03-19 | Toppan Printing Co Ltd | 基板の露光装置及び露光方法 |
JPH04271355A (ja) * | 1991-02-27 | 1992-09-28 | Ii & S:Kk | フィーチャアライナ |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5080122A (enrdf_load_stackoverflow) * | 1973-11-14 | 1975-06-30 |
-
1986
- 1986-09-08 JP JP61211178A patent/JPS6365443A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9170483B2 (en) | 2012-09-13 | 2015-10-27 | Nippon Mektron, Ltd. | Photomask, photomask set, exposure apparatus and exposure method |
US9274415B2 (en) | 2012-09-13 | 2016-03-01 | Nippon Mektron, Ltd. | Photomask, photomask set, exposure apparatus and exposure method |
Also Published As
Publication number | Publication date |
---|---|
JPS6365443A (ja) | 1988-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |