JPH0541982B2 - - Google Patents

Info

Publication number
JPH0541982B2
JPH0541982B2 JP61211178A JP21117886A JPH0541982B2 JP H0541982 B2 JPH0541982 B2 JP H0541982B2 JP 61211178 A JP61211178 A JP 61211178A JP 21117886 A JP21117886 A JP 21117886A JP H0541982 B2 JPH0541982 B2 JP H0541982B2
Authority
JP
Japan
Prior art keywords
workpiece
alignment
exposure
section
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61211178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6365443A (ja
Inventor
Tadao Komata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OKU SEISAKUSHO CO Ltd
Original Assignee
OKU SEISAKUSHO CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OKU SEISAKUSHO CO Ltd filed Critical OKU SEISAKUSHO CO Ltd
Priority to JP61211178A priority Critical patent/JPS6365443A/ja
Publication of JPS6365443A publication Critical patent/JPS6365443A/ja
Publication of JPH0541982B2 publication Critical patent/JPH0541982B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61211178A 1986-09-08 1986-09-08 アライメント付両面自動露光装置 Granted JPS6365443A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61211178A JPS6365443A (ja) 1986-09-08 1986-09-08 アライメント付両面自動露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61211178A JPS6365443A (ja) 1986-09-08 1986-09-08 アライメント付両面自動露光装置

Publications (2)

Publication Number Publication Date
JPS6365443A JPS6365443A (ja) 1988-03-24
JPH0541982B2 true JPH0541982B2 (OSRAM) 1993-06-25

Family

ID=16601702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61211178A Granted JPS6365443A (ja) 1986-09-08 1986-09-08 アライメント付両面自動露光装置

Country Status (1)

Country Link
JP (1) JPS6365443A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9170483B2 (en) 2012-09-13 2015-10-27 Nippon Mektron, Ltd. Photomask, photomask set, exposure apparatus and exposure method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0487390A (ja) * 1990-07-31 1992-03-19 Toppan Printing Co Ltd 基板の露光装置及び露光方法
JPH04271355A (ja) * 1991-02-27 1992-09-28 Ii & S:Kk フィーチャアライナ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080122A (OSRAM) * 1973-11-14 1975-06-30

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9170483B2 (en) 2012-09-13 2015-10-27 Nippon Mektron, Ltd. Photomask, photomask set, exposure apparatus and exposure method
US9274415B2 (en) 2012-09-13 2016-03-01 Nippon Mektron, Ltd. Photomask, photomask set, exposure apparatus and exposure method

Also Published As

Publication number Publication date
JPS6365443A (ja) 1988-03-24

Similar Documents

Publication Publication Date Title
JP2614946B2 (ja) スクリーン印刷機
US5337151A (en) Double-sided circuit board exposure machine and method with optical registration and material variation compensation
JPH0541981B2 (OSRAM)
US20090310850A1 (en) Screen printing apparatus
US6211942B1 (en) Double-sided exposure system
KR100426151B1 (ko) 작업물과 마스크의 정렬장치 및 정렬방법
JP3316676B2 (ja) ワークとマスクの整合機構および整合方法
US5772768A (en) Printing apparatus and method
US6387579B1 (en) Method for direct image processing of printed circuit boards
JPH06182965A (ja) クリームはんだ印刷装置
JPH0541982B2 (OSRAM)
JP7002181B2 (ja) スクリーン印刷機
JP2001343753A (ja) 基板搬送機構および露光装置
JP2000250227A (ja) 露光装置
JPH01302259A (ja) 自動露光装置におけるワーク位置決め方法
JP2578035B2 (ja) 基板位置決め方法
US6249337B1 (en) Alignment mechanism and process for light exposure
JP3231246B2 (ja) 露光装置
CN216351772U (zh) 一种直写式光刻机的对准装置
JPH05326361A (ja) 近接露光装置のプリアライメント装置
JP2008307718A (ja) スクリーン取付構造
JP3308108B2 (ja) 画像処理印刷法及び装置
JPS62293799A (ja) プリント基板へのクリ−ム半田印刷方法
JP2866513B2 (ja) 露光装置
JP4868119B2 (ja) 露光装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees