JPH0541698B2 - - Google Patents
Info
- Publication number
- JPH0541698B2 JPH0541698B2 JP13750988A JP13750988A JPH0541698B2 JP H0541698 B2 JPH0541698 B2 JP H0541698B2 JP 13750988 A JP13750988 A JP 13750988A JP 13750988 A JP13750988 A JP 13750988A JP H0541698 B2 JPH0541698 B2 JP H0541698B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- crucible body
- evaporation source
- aluminum
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001704 evaporation Methods 0.000 claims description 47
- 230000008020 evaporation Effects 0.000 claims description 44
- 239000000463 material Substances 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 24
- 238000007740 vapor deposition Methods 0.000 claims description 21
- 239000011247 coating layer Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 13
- 230000009257 reactivity Effects 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 27
- 229910052782 aluminium Inorganic materials 0.000 description 27
- 239000010409 thin film Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 11
- 238000000151 deposition Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 230000005684 electric field Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13750988A JPH01306555A (ja) | 1988-06-06 | 1988-06-06 | 蒸発源用るつぼ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13750988A JPH01306555A (ja) | 1988-06-06 | 1988-06-06 | 蒸発源用るつぼ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01306555A JPH01306555A (ja) | 1989-12-11 |
| JPH0541698B2 true JPH0541698B2 (zh) | 1993-06-24 |
Family
ID=15200332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13750988A Granted JPH01306555A (ja) | 1988-06-06 | 1988-06-06 | 蒸発源用るつぼ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01306555A (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG10201608496UA (en) * | 2016-10-11 | 2018-05-30 | Au Optronics Corp | Crucible |
-
1988
- 1988-06-06 JP JP13750988A patent/JPH01306555A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01306555A (ja) | 1989-12-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5180477A (en) | Thin film deposition apparatus | |
| JP2710670B2 (ja) | 蒸気発生源用るつぼ | |
| JPH0541698B2 (zh) | ||
| JPH0236673B2 (zh) | ||
| JPS60262963A (ja) | 化合物薄膜蒸着装置 | |
| JPS60125368A (ja) | 薄膜蒸着装置 | |
| JPH0830265B2 (ja) | 薄膜形成装置 | |
| JPS6329925A (ja) | 化合物薄膜形成装置 | |
| JPH0215630B2 (zh) | ||
| JPS62287617A (ja) | 薄膜形成装置 | |
| JPS60158619A (ja) | 薄膜蒸着装置 | |
| JPS60124929A (ja) | 薄膜蒸着装置 | |
| JPH0735569B2 (ja) | 薄膜形成装置 | |
| JPS60124923A (ja) | 薄膜蒸着装置 | |
| JPH0510423B2 (zh) | ||
| JPS60124915A (ja) | 薄膜蒸着装置 | |
| JPH03158458A (ja) | クラスターイオンビーム装置 | |
| JPS634060A (ja) | 薄膜形成装置 | |
| JPS6320820A (ja) | 薄膜蒸着装置 | |
| JPH05311407A (ja) | 薄膜形成装置 | |
| JPH0351087B2 (zh) | ||
| JPH0443412B2 (zh) | ||
| JPH0447969B2 (zh) | ||
| JPS60125369A (ja) | 薄膜蒸着装置 | |
| JPH0215629B2 (zh) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |