JPH0540928Y2 - - Google Patents

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Publication number
JPH0540928Y2
JPH0540928Y2 JP1988061936U JP6193688U JPH0540928Y2 JP H0540928 Y2 JPH0540928 Y2 JP H0540928Y2 JP 1988061936 U JP1988061936 U JP 1988061936U JP 6193688 U JP6193688 U JP 6193688U JP H0540928 Y2 JPH0540928 Y2 JP H0540928Y2
Authority
JP
Japan
Prior art keywords
surface plate
polishing surface
polishing
runner
waste liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988061936U
Other languages
Japanese (ja)
Other versions
JPH01164060U (en
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Filing date
Publication date
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Priority to JP1988061936U priority Critical patent/JPH0540928Y2/ja
Publication of JPH01164060U publication Critical patent/JPH01164060U/ja
Application granted granted Critical
Publication of JPH0540928Y2 publication Critical patent/JPH0540928Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は研磨装置の研磨定盤とランナとの接触
面に砥粒、加工液および廃液が浸入するのを防止
する構造を持つた研磨装置に関する。
[Detailed description of the invention] (Field of industrial application) The present invention is a polishing device that has a structure that prevents abrasive grains, machining fluid, and waste fluid from entering the contact surface between the polishing surface plate and the runner of the polishing device. Regarding.

(従来の技術) 第3図は、油動圧軸受を適用した従来の研磨装
置の例である。1は研磨定盤で、回転するランナ
2の上面に設置され、ランナ2の中心の下側に主
軸3が締結されている。回転部の軸受は軸受部を
油で浸漬している、所謂、油動圧軸受を採用した
構造である。4,5はランナ2と中央ベース6と
の間に配設されたスラスト油動圧軸受、ラジアル
油動圧軸受である。スラスト油動圧軸受4は、動
圧発生形状面としての極微小傾斜面と精密平面と
を有し、精密平面がロータとして機能するランナ
2の面2′と対向し、研磨定盤1の軸方向(垂直
方向)の動圧を受け、押えるようになつている。
また、ラジアル油動圧軸受5は、動圧発生形状面
としての極微小傾斜面が一部に形成された精密円
筒面を有し、円筒面がロータとして機能するラン
ナ2の内面2″と対向し、研磨定盤1の軸方向と
交差する方向(水平方向)の動圧を受け、押える
ようになつている。両油動圧軸受4,5とも油7
に浸漬され、その摺動面に動圧が発生するように
なつている。
(Prior Art) FIG. 3 is an example of a conventional polishing device to which a hydraulic pressure bearing is applied. A polishing surface plate 1 is installed on the upper surface of a rotating runner 2, and a main shaft 3 is fastened to the lower side of the center of the runner 2. The bearing of the rotating part has a structure that employs a so-called oil dynamic bearing in which the bearing part is immersed in oil. Reference numerals 4 and 5 denote thrust oil dynamic pressure bearings and radial oil dynamic pressure bearings arranged between the runner 2 and the central base 6. The thrust oil dynamic pressure bearing 4 has an extremely small inclined surface as a dynamic pressure generating surface and a precision plane, and the precision plane faces the surface 2' of the runner 2 functioning as a rotor, and It is designed to hold down by receiving dynamic pressure in the vertical direction.
Furthermore, the radial oil dynamic pressure bearing 5 has a precision cylindrical surface in which an extremely small inclined surface is formed as a dynamic pressure generating surface, and the cylindrical surface faces the inner surface 2'' of the runner 2 that functions as a rotor. The bearings 4 and 5 are designed to receive and press dynamic pressure in a direction (horizontal direction) that intersects the axial direction of the polishing surface plate 1.
Dynamic pressure is generated on the sliding surface.

従つて、駆動源としてのモータ8からの回転を
プーリ9、ベルト10を経て、主軸3に懸垂・固
定されたプーリ11に回転が与えられ、即ちラン
ナ2、研磨定盤1を回転することになり、ローラ
12,13で保持された研磨試料が研磨される。
Therefore, the rotation from the motor 8 as a driving source is applied to the pulley 11 suspended and fixed to the main shaft 3 through the pulley 9 and the belt 10, which rotates the runner 2 and the polishing surface plate 1. The polishing sample held by the rollers 12 and 13 is polished.

ところが、特に油動圧軸受4,5を有する研磨
装置では、研磨剤などの廃液が油7の中に混入す
ると、動圧軸受としての精度が劣るばかりでな
く、軸受としての機能を果たすことができなくな
る。そのため、従来の研磨装置では、廃液などが
油7の中に混入しないようにカバー14を研磨定
盤1あるいはランナ2に取付けていた。
However, especially in a polishing device having oil hydrodynamic bearings 4 and 5, if waste liquid such as abrasive is mixed into the oil 7, not only will the accuracy of the hydrodynamic bearing deteriorate, but the bearing will no longer function as a bearing. become unable. Therefore, in the conventional polishing apparatus, a cover 14 is attached to the polishing platen 1 or the runner 2 to prevent waste fluid from getting mixed into the oil 7.

第4図は従来の廃液浸入防止構造の分解斜視図
である。ランナ2と研磨定盤1の接面には対応す
る位置に一対の穴1b,2aが配設されており駆
動ピン15を用いて互いに連結され回転伝達をお
こなう。また、ガイド部1aに主軸のガイド3a
が嵌入される。さらに、ランナ2、もしくは研磨
定盤1には、油タンク16内の油7に研磨剤や廃
液が浸入しないようにカバー14が接着剤、もし
くは溶接などで固定されており、廃液受け17の
内側枠18をカバー14の内側に介して装着す
る。なお、17a,17bは廃液の流入口、流出
口である。
FIG. 4 is an exploded perspective view of a conventional waste liquid infiltration prevention structure. A pair of holes 1b and 2a are provided at corresponding positions on the contact surfaces of the runner 2 and the polishing surface plate 1, and are connected to each other using a drive pin 15 to transmit rotation. In addition, a guide 3a of the main shaft is attached to the guide portion 1a.
is inserted. Further, a cover 14 is fixed to the runner 2 or the polishing surface plate 1 with adhesive or welding to prevent abrasives or waste liquid from entering the oil 7 in the oil tank 16, and the cover 14 is fixed to the inside of the waste liquid receiver 17. The frame 18 is attached to the inside of the cover 14. Note that 17a and 17b are an inlet and an outlet for waste liquid.

(考案が解決しようとする課題) 以上、研磨装置の構成、及び廃液受けの構造に
ついて説明した。次に構造的な欠陥について述べ
る。
(Problems to be Solved by the Invention) The configuration of the polishing device and the structure of the waste liquid receiver have been described above. Next, we will discuss structural defects.

この種の研磨装置では、通常、研磨試料、研磨
剤、あるいは仕上げの程度などにより研磨定盤1
を複数枚用意し、作業の進捗状況に合わせて交換
して使用する。さらに試料の高精度化という点か
ら研磨定盤1は、上・下面の平行度と平面度が非
常に重視される。実際の作業においても使用前に
は「平面出し」といわれる研磨定盤1の上面の再
加工がおこなわれている。また、ポリシングにお
いてはポリシヤの張り替えを適時おこなう必要が
ある。このため、カバー14を接着剤などによつ
て研磨定盤1に固定するのは極めて作業性が劣
り、精度の悪化を招くことになる。よつて、従来
例の廃液浸入防止構造においては、カバー14を
ランナ2に接着固定するが、製作に手間がかか
る。また廃液受け17は、内側枠18をカバー1
4の内側に介して装着してあるので、着脱の際は
プーリ11から回転軸を取外すなどの手間がかか
る、などの欠陥があつた。
In this type of polishing equipment, the polishing surface plate is usually
Prepare multiple sheets and use them by replacing them according to the progress of the work. Furthermore, from the viewpoint of high precision of the sample, the parallelism and flatness of the upper and lower surfaces of the polishing surface plate 1 are very important. In actual work, the upper surface of the polishing surface plate 1 is reprocessed, which is called "flattening", before use. Furthermore, in polishing, it is necessary to replace the polisher at a timely manner. For this reason, fixing the cover 14 to the polishing surface plate 1 with adhesive or the like is extremely inefficient and leads to deterioration of accuracy. Therefore, in the conventional waste liquid infiltration prevention structure, the cover 14 is fixed to the runner 2 with adhesive, but it takes time and effort to manufacture. In addition, the waste liquid receiver 17 is connected to the inner frame 18 by the cover 1.
Since the rotary shaft is attached to the inside of the pulley 11, it takes time and effort to remove the rotary shaft from the pulley 11 when attaching and detaching.

さらに、研磨定盤1とランナ2との接面に研磨
剤や廃液が流れ込む可能性があり、そのことによ
つて、接面を傷付け、研磨定盤1の平行度、平面
度を悪化させるという問題もある。
Furthermore, there is a possibility that abrasives and waste liquid may flow into the contact surface between the polishing surface plate 1 and the runner 2, thereby damaging the contact surface and worsening the parallelism and flatness of the polishing surface plate 1. There are also problems.

本考案は上記問題点に鑑み、高精度研磨装置に
おれる作業性の煩雑さを解消するとともに高精度
研磨装置としての信頼性を確保して廃液浸入を防
止した研磨装置を提供することを目的とする。
In view of the above-mentioned problems, the purpose of this invention is to provide a polishing device that eliminates the complexity of workability in a high-precision polishing device, ensures reliability as a high-precision polishing device, and prevents infiltration of waste liquid. shall be.

(課題を解決するための手段) 本考案は上記課題を解決するために、駆動源に
より駆動される回転主軸がランナの中心に締結さ
れ、前記ランナの上部に取外し可能な状態で設置
された研磨定盤の外周側面に研磨定盤の外径より
小さい内径で弾性を有するリング状ベルトを、前
記研磨定盤の研磨面表面側に突き出ないように
し、かつ前記研磨定盤の下側の裏面よりも突出し
て装着し、さらに、前記研磨定盤の前記ランナと
接する側の面の所定の位置に回転中心とほぼ同心
円状の溝を設け、廃液受けの内側枠を前記溝に当
たらないようにはめ込んだ構造としたことを特徴
とする廃液浸入を防止した研磨装置を要旨とす
る。
(Means for Solving the Problems) In order to solve the above problems, the present invention provides a polishing system in which a rotating main shaft driven by a drive source is fastened to the center of a runner, and is removably installed on the upper part of the runner. An elastic ring-shaped belt with an inner diameter smaller than the outer diameter of the polishing surface plate is placed on the outer peripheral side of the polishing surface plate so as not to protrude toward the surface of the polishing surface of the polishing surface plate, and from the lower back surface of the polishing surface plate. Further, a groove approximately concentric with the center of rotation is provided at a predetermined position on the surface of the polishing surface plate that contacts the runner, and the inner frame of the waste liquid receiver is fitted into the groove so as not to hit the groove. The main feature of the present invention is a polishing device that prevents waste liquid from entering, which is characterized by its structure.

従つて本考案は、簡単に取外し可能なリング状
ベルトを研磨定盤外周側面に装着するとともに、
研磨定盤の外周に近い部分に、廃液受けの枠に対
応する溝を設けて廃液等が油の中に混入しないよ
うにすることを主要な特徴とする。
Therefore, the present invention attaches an easily removable ring-shaped belt to the outer peripheral side of the polishing surface plate, and
The main feature is that a groove corresponding to the waste liquid receiving frame is provided near the outer periphery of the polishing surface plate to prevent waste liquid from getting mixed into the oil.

(実施例) 以下、図面に沿つて本考案の実施例について説
明する。なお、実施例は一つの例示であつて、本
考案の精神を逸脱しない範囲で種々の変更あるい
は改良を行いうることは言うまでもない。
(Example) Hereinafter, an example of the present invention will be described with reference to the drawings. Note that the embodiments are merely illustrative, and it goes without saying that various changes and improvements can be made without departing from the spirit of the present invention.

第1図は本考案の実施例を示す一部断面図であ
る。図は研磨装置の駆動源、動力伝達機構等につ
いては適宜第3図に示すような従来装置を適用で
きるので図示を省略した。
FIG. 1 is a partially sectional view showing an embodiment of the present invention. The drive source, power transmission mechanism, etc. of the polishing device are not shown in the figure because the conventional device shown in FIG. 3 can be applied as appropriate.

研磨装置は、中央ベース19の中央部に従来と
同様の軸受部20を設け、この軸受部20上に設
置した円盤状のランナ2には、主軸3が装着して
あり、軸受部20により回転自在に支持される。
また、主軸3には図示しない駆動源に連結され
る、回転部を構成するランナ2上に研磨定盤1を
取外し可能に装着する。この研磨定盤1とランナ
2とは主軸3に設けた研磨定盤1のガイド部1a
に主軸のガイド3aを嵌入し、また、所要の位置
に配設された穴1b,2aの中に駆動ピン15を
嵌入することで、ほぼ同芯に、かつ回転方向にス
ベリが生じないように固定される。なお、7は油
タンク16内に充填した油である。
The polishing device has a bearing part 20 similar to the conventional one in the center of a central base 19, and a main shaft 3 is attached to a disc-shaped runner 2 installed on this bearing part 20, and the main shaft 3 is rotated by the bearing part 20. freely supported.
Further, a polishing surface plate 1 is removably mounted on a runner 2 constituting a rotating portion of the main shaft 3, which is connected to a drive source (not shown). The polishing surface plate 1 and the runner 2 are a guide portion 1a of the polishing surface plate 1 provided on the main shaft 3.
By inserting the guide 3a of the main shaft into the holes 1b and 2a arranged at the required positions, and by inserting the drive pin 15 into the holes 1b and 2a arranged at the required positions, the pins can be made almost concentrically and without slipping in the direction of rotation. Fixed. Note that 7 is oil filled in the oil tank 16.

次に、第2図を用いて廃液浸入防止構造の詳細
について述べる。
Next, details of the waste liquid infiltration prevention structure will be described using FIG.

第2図は、研磨作業中に廃液が軸受部に浸入し
ない構造を説明する分解斜視図であつて、21は
弾性を有するリング状ベルト、1は研磨定盤、2
はランナ、3は主軸、17は廃液受けである。研
磨定盤1には、ランナ2に接する面側の外周付近
に同心円状の溝22が設けてあり、溝22は廃液
受け17の内側枠18に対応し、かつ内側枠18
に接触しないようになつている。リング状ベルト
21は、研磨定盤1の外周に装着するものである
が、研磨定盤1の表側に突き出ないように、かつ
裏側には充分突き出る形状を有する。また、リン
グ状ベルト21は、簡単に取外しができ、廃液が
リング状ベルト21の内側に浸み込まないような
弾性を有するものならば適宜選択が可能で、例え
ば、自然の引張らない状態で研磨定盤1の外径よ
り内径の小さいリング状のゴムベルトが安価で推
奨される。このリング状ベルト21は言うまでも
なく継ぎ目のないものがよい。
FIG. 2 is an exploded perspective view illustrating a structure that prevents waste liquid from entering the bearing part during polishing work, in which 21 is an elastic ring-shaped belt, 1 is a polishing surface plate, and 2
3 is a runner, 3 is a main shaft, and 17 is a waste liquid receiver. The polishing surface plate 1 is provided with a concentric groove 22 near the outer periphery of the surface in contact with the runner 2. The groove 22 corresponds to the inner frame 18 of the waste liquid receiver 17, and the groove 22 corresponds to the inner frame 18 of the waste liquid receiver 17.
It is designed not to come in contact with. The ring-shaped belt 21 is attached to the outer periphery of the polishing surface plate 1, and has a shape that does not protrude to the front side of the polishing surface plate 1, but protrudes sufficiently from the back side. Further, the ring-shaped belt 21 can be appropriately selected as long as it can be easily removed and has elasticity that prevents waste liquid from seeping into the inside of the ring-shaped belt 21. A ring-shaped rubber belt with an inner diameter smaller than the outer diameter of the polishing surface plate 1 is recommended because it is inexpensive. It goes without saying that this ring-shaped belt 21 should be seamless.

(考案の効果) 以上説明したように、本考案によれば駆動源に
より駆動される回転主軸がランナの中心に締結さ
れ、前記ランナの上部に取外し可能な状態で設置
された研磨定盤の外周側面に研磨定盤の外径より
小さい内径で弾性を有するリング状ベルトを、前
記研磨定盤の研磨面表面側に突き出ないように
し、かつ前記研磨定盤の下側の裏面よりも突出し
て装着し、さらに、前記研磨定盤の前記ランナと
接する側の面の所定の位置に回転中心とほぼ同心
円状の溝を設け、廃液受けの内側枠を前記溝に当
たらないようにはめ込んだ構造としたことによ
り、研磨定盤の外周側面に研磨定盤の外径(もし
くは外周)より若干小さい内径(もしくは内周)
で研磨定盤の厚みより幅のある取り外し可能な弾
性を有するリング状ベルトを、その弾性による密
着を利用して装着し、さらに、研磨定盤のランナ
と接する面の所要な位置に回転中心とほぼ同心円
状の溝を設け、廃液受けの内側枠に対応させて、
研磨定盤をランナ上に配置し、研磨定盤を回転さ
せて研磨作業ができるので、研磨定盤とランナと
の接面に研磨剤や廃液が流れ込むのを防止でき、
接面を傷付け、研磨定盤の平行度、平面度を悪化
させることがない。また、研磨定盤を取り外した
だけで廃液受けの脱着ができるのでメンテナンス
が行ないやすい。
(Effect of the invention) As explained above, according to the invention, a rotating main shaft driven by a drive source is fastened to the center of a runner, and the outer periphery of a polishing surface plate is removably installed above the runner. A ring-shaped belt having elasticity and an inner diameter smaller than the outer diameter of the polishing surface plate is installed on the side surface so as not to protrude toward the surface of the polishing surface of the polishing surface plate and to protrude beyond the lower back surface of the polishing surface plate. Furthermore, a groove substantially concentric with the center of rotation is provided at a predetermined position on the surface of the polishing surface plate that contacts the runner, and the inner frame of the waste liquid receiver is fitted into the groove so as not to hit the groove. By doing so, there is an inner diameter (or inner periphery) slightly smaller than the outer diameter (or outer periphery) of the polishing surface plate on the outer peripheral side of the polishing surface plate.
Attach a removable elastic ring-shaped belt that is wider than the thickness of the polishing surface plate by utilizing its elasticity, and then set the rotation center at a desired position on the surface of the polishing surface plate that contacts the runner. Almost concentric grooves are provided to correspond to the inner frame of the waste liquid receiver.
The polishing surface plate is placed on the runner and polishing work can be performed by rotating the polishing surface plate, which prevents abrasives and waste liquid from flowing into the contact surface between the polishing surface plate and the runner.
It does not damage the contact surface and deteriorate the parallelism and flatness of the polishing surface plate. In addition, maintenance is easy because the waste liquid receiver can be attached and detached simply by removing the polishing surface plate.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例の研磨装置の一部断面
図、第2図は本考案の廃液受けの取付構造の分解
斜視図、第3図は従来例の研磨装置の略線断面
図、第4図は従来例の廃液受けの取付構造の分解
斜視図である。 1……研磨定盤、2……ランナ、3……主軸、
4……スラスト油動圧軸受、5……ラジアル油動
圧軸受、6,19……中央ベース、7……油、8
……モータ、9……プーリ、10……ベルト、1
1……プーリ、14……カバー、15……駆動ピ
ン、16……油タンク、17……廃液受け、18
……内側枠、20……軸受部、21……リング状
ベルト、22……溝、1a……研磨定盤のガイド
部、1b,2a……穴、3a……主軸ガイド、1
7a,17b……廃液の流入口、流出口。
FIG. 1 is a partial sectional view of a polishing device according to an embodiment of the present invention, FIG. 2 is an exploded perspective view of a mounting structure for a waste liquid receiver of the present invention, and FIG. 3 is a schematic cross-sectional view of a conventional polishing device. FIG. 4 is an exploded perspective view of a conventional mounting structure for a waste liquid receiver. 1... Polishing surface plate, 2... Runner, 3... Main shaft,
4...Thrust oil dynamic pressure bearing, 5...Radial oil dynamic pressure bearing, 6, 19...Central base, 7...Oil, 8
...Motor, 9...Pulley, 10...Belt, 1
1... Pulley, 14... Cover, 15... Drive pin, 16... Oil tank, 17... Waste liquid receiver, 18
... Inner frame, 20 ... Bearing part, 21 ... Ring-shaped belt, 22 ... Groove, 1a ... Guide part of polishing surface plate, 1b, 2a ... Hole, 3a ... Main shaft guide, 1
7a, 17b... Inflow port and outflow port for waste liquid.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 駆動源により駆動される回転主軸がランナの中
心に締結され、前記ランナの上部に取外し可能な
状態で設置された研磨定盤の外周側面に研磨定盤
の外径より小さい内径で弾性を有するリング状ベ
ルトを、前記研磨定盤の研磨面表面側に突き出な
いようにし、かつ前記研磨定盤の下側の裏面より
も突出して装着し、さらに、前記研磨定盤の前記
ランナと接する側の面の所定の位置に回転中心と
ほぼ同心円状の溝を設け、廃液受けの内側枠を前
記溝に当たらないようにはめ込んだ構造としたこ
とを特徴とする廃液浸入を防止した研磨装置。
A rotating main shaft driven by a drive source is fastened to the center of the runner, and an elastic ring with an inner diameter smaller than the outer diameter of the polishing surface plate is attached to the outer peripheral side of the polishing surface plate, which is removably installed above the runner. The shaped belt is mounted so as not to protrude to the surface of the polishing surface of the polishing surface plate and protrudes beyond the lower back surface of the polishing surface plate, and further, the belt is attached to the surface of the polishing surface plate that contacts the runner. 1. A polishing device that prevents waste liquid from entering, characterized in that a groove is provided at a predetermined position substantially concentric with the center of rotation, and the inner frame of the waste liquid receiver is fitted into the groove so as not to hit the groove.
JP1988061936U 1988-05-11 1988-05-11 Expired - Lifetime JPH0540928Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988061936U JPH0540928Y2 (en) 1988-05-11 1988-05-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988061936U JPH0540928Y2 (en) 1988-05-11 1988-05-11

Publications (2)

Publication Number Publication Date
JPH01164060U JPH01164060U (en) 1989-11-15
JPH0540928Y2 true JPH0540928Y2 (en) 1993-10-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988061936U Expired - Lifetime JPH0540928Y2 (en) 1988-05-11 1988-05-11

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999033612A1 (en) * 1997-12-26 1999-07-08 Ebara Corporation Polishing device
JP2019181689A (en) * 2018-04-02 2019-10-24 株式会社荏原製作所 Polishing device and substrate processing device

Also Published As

Publication number Publication date
JPH01164060U (en) 1989-11-15

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