JPH07171761A - Abrasive solution feed mechanism for polishing device - Google Patents

Abstract

PURPOSE:To feed a sufficient quantity of abrasive solution to the polished surface of a workpiece stably over a long period of time. CONSTITUTION:This abrasive solution feed mechanism is rotatably supported on a housing 1, and the main constituent elements of this abrasive solution feed mechanism are a rotary shaft 3 provided with a polishing disc 2 integrally at the lower end, a blade cylinder 4 fixed to the outer periphery of the rotary shaft 3 by insertion, a fixed cylinder 6 provided around the outer periphery of the rotary shaft 3 by insertion with a space part 5 and fixed at its upper end to the housing 1, an abrasive solution feed pipe 7 connected to the fixed cylinder 6, and a feed hole 2a formed in the polishing disc 2.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus used for polishing the surface of a work such as a liquid crystal panel, an image sensor and a thin glass used for a cover glass of a semiconductor laser, which requires high accuracy. .

[0002]

2. Description of the Related Art For example, a thin glass plate used for a liquid crystal panel, an image sensor or a cover glass for a semiconductor laser is finished by polishing the surface with high precision after manufacturing. , A polishing pad mounted on a polishing disc (formed of foamed urethane material, etc.) is pressed against the surface of the work piece, and a relative movement is given while supplying a polishing liquid between the two, so that a slight amount of polishing is done from the surface of the work piece By removing the margin, the dimensional accuracy and surface smoothness are improved.

By the way, in this type of polishing, it is necessary to supply a sufficient amount of polishing liquid between the surface (polishing surface) of the work and the polishing pad in order to secure the finishing accuracy of the work. . Conventionally, as a means for supplying the polishing liquid to the polishing surface, a means for supplying the polishing liquid via a through hole provided in the center of the rotary shaft of the polishing disk and a means for directly supplying the polishing surface from the outside have been used. Since the rotary shaft rotates during processing, in the former case, a polishing liquid supply pipe is connected to the center of the upper part of the rotary shaft via a rotary joint so that the polishing liquid can be supplied during processing.

[0004]

In the means for supplying the polishing liquid via the through hole of the rotary shaft, the seal portion between the rotating portion and the non-rotating portion of the rotary joint is made by the polishing agent in the polishing liquid. There is a problem in that the above-mentioned seal portion is always worn, abrasion is caused, and the polishing liquid easily leaks from this seal portion. In addition, if the leaked polishing liquid enters the bearing portion or the sliding portion of the device, wear or rust will occur on the portion, which will hinder the operation of the device.

Further, in the means for directly supplying the polishing liquid to the polishing surface from the outside, it is difficult to evenly spread the polishing liquid especially to the central portion of the polishing surface, which causes a problem that uniform polishing cannot be performed.

Therefore, an object of the present invention is to provide a polishing liquid supply mechanism capable of stably supplying a sufficient amount of polishing liquid to the polishing surface of a work for a long period of time.

[0007]

A polishing liquid supply mechanism of a polishing apparatus according to the present invention includes a rotary shaft rotatably supported by a housing, a rotary disk having a polishing disk at a lower end thereof, and a space portion around the rotary shaft. The polishing liquid supply pipe includes a fixed cylinder that is externally inserted at a distance and has its upper end fixed to the housing, a polishing liquid supply pipe connected to the fixed cylinder, and a supply hole formed in the polishing disk. Is supplied to the polishing surface of the work through the space and the supply hole.

Further, in the polishing liquid supply mechanism of the polishing apparatus of the present invention, in the above structure, the polishing liquid in the space portion is pressure-fed to the supply hole side on the outer periphery of the rotation shaft as the rotation shaft rotates. Axial flow blades that exert force are provided.

[0009]

The polishing liquid supply pipe is connected to the fixed cylinder. The fixed cylinder is fixed to the housing and does not rotate. The polishing liquid is supplied from the polishing liquid supply pipe to the space formed between the fixed cylinder and the rotary shaft, and is supplied to the polishing surface of the workpiece through the space and the supply hole formed in the polishing disk. Supplied evenly.

The axial blades provided on the outer periphery of the rotary shaft rotate with the rotation of the rotary shaft, and exert a pumping force to the supply hole side to the polishing liquid supplied from the polishing liquid supply pipe to the space. This ensures the supply of the polishing liquid.

[0011]

Embodiments of the present invention will be described below with reference to the drawings.

As shown in FIG. 1, the polishing liquid supply mechanism of this embodiment is rotatably supported by a housing 1 and has a rotary shaft 3 integrally provided with a polishing disk 2 at its lower end, and an outer periphery of the rotary shaft 3. A blade cylinder 4 externally fixed to the rotary shaft 3, a fixed cylinder 6 externally inserted to the outer periphery of the rotary shaft 3 with a space 5 therebetween, and an upper end of which is fixed to the housing 1, and a polishing liquid connected to the fixed cylinder 6. The supply pipe 7 and the supply hole 2a formed in the polishing disk 2 are main elements. The rotary shaft 3 is rotationally driven by a rotary drive means (not shown) and rotates with respect to the housing 1 in the direction of the arrow shown in the figure. Further, the rotating shaft 3 is driven up and down by a lifting drive means (not shown),
It moves up and down together with the housing 1. When the work W such as thin glass is supplied to a predetermined position, the rotating shaft 3 and the polishing disc 2 at the lower end thereof rotate and descend, and the polishing pad 8 mounted on the lower end surface of the polishing disc 2 polishes the work W. The surface S is pressed and the polishing process is started.

The rotary shaft 3 is inserted into the housing 1 and is rotatably supported by bearings 10. A space between the lower end of the housing 1 and the rotary shaft 3 is sealed by a plurality of sealing members 11 to prevent the polishing liquid from entering the bearing 10.

The fixed barrel 6 is provided with a housing 1 via an annular flange 6a fixed to the upper end thereof by a suitable means such as welding.
It is fixed to the lower end of the with bolts 13. The inner diameter of the flange 6a is smaller than that of the fixed barrel 6, so that the space 5 formed between the fixed barrel 6 and the rotating shaft 3 is covered from above by the inner diameter portion of the flange 6a.

A screw-shaped axial flow blade 4a as shown in FIG. 2 is provided on the outer circumference of the blade cylinder 4. When the rotary shaft 3 rotates, the blade cylinder 4 rotates together with the rotary shaft 3, whereby the axial blade 4a rotates in the space 5. The axial blade 4a rotates in the direction shown by the arrow in the figure in accordance with the rotation of the rotary shaft 3 to serve to pump the polishing liquid in the space 5 downward. A washer 14 is interposed between the upper end of the blade 4 and the positioning member 12. The lower end surface of the washer 14 faces the upper end surface of the flange 6a of the fixed barrel 6 with a space.

The polishing liquid supply pipe 7 is connected to the side portion of the fixed cylinder 6 and supplies the polishing liquid L pumped from a supply source (not shown) to the space 5.

An annular recess 2b as shown in FIG. 3 is provided on the upper end surface of the polishing disc 2, and a plurality of supply holes 2a are formed at equal intervals in the bottom of the annular recess 2b. Each supply hole 2a penetrates the polishing disk 2 in the axial direction,
The central hole 8a of the polishing pad 8 shown in FIG. Further, the lower end of the rotary cylinder 15 is fitted to the outer peripheral edge of the annular recess 2b and is fixed by the bolt 16. The rotary cylinder 15 is externally fitted to the outer periphery of the fixed cylinder 6 with a space therebetween, and covers the lower end of the fixed cylinder 6 to a substantially central portion thereof.

The polishing liquid L supplied from the supply pipe 7 to the space portion 5 is moved inside the space portion 5 toward the lower supply hole 2b side by the axial flow blades 4a of the blade cylinder 4 which rotates integrally with the rotating shaft 3. It is pressure-fed toward the polishing disk 2, and once enters the annular recess 2b of the polishing disk 2, then flows into each supply hole 2a from the annular recess 2b and is further supplied to the polishing surface S through the center hole 8a of the polishing pad 8. Therefore, a sufficient amount of the polishing liquid L is stably supplied to the polishing surface S of the work W for a long period of time. In addition, the fixed cylinder 6
Since the labyrinth space is formed between the rotary cylinder 15 and the rotary cylinder 15 and between the flange 6a of the fixed cylinder 6 and the washer 14, the polishing liquid L is unlikely to leak.

In this embodiment, the blade cylinder 4 having the screw-shaped axial flow blades 4a is inserted and fixed to the outer periphery of the rotary shaft 3, but the axial flow blades may be propeller-shaped (fan-shaped). Alternatively, it may be formed directly on the outer circumference of the rotary shaft 3.

[0020]

As described above, according to the present invention,
The polishing liquid supply pipe is connected to the fixed cylinder fixed to the housing, and the polishing liquid is supplied through the space formed between the fixed cylinder and the rotating shaft and the supply hole formed in the polishing disk. Since it is configured to supply to the polishing surface of the workpiece, there is no adverse effect such as the leakage of polishing liquid from the seal part of the rotary joint unlike the conventional configuration, and a sufficient amount of polishing liquid can be applied over a wide area of the polishing surface. Can be supplied evenly.

Further, by providing an axial flow vane on the outer circumference of the rotary shaft, which exerts a pressure-feeding force to the supply hole side to the polishing liquid in the above space in accordance with the rotation of the rotation shaft, the polishing liquid is supplied more stably. You can make it more certain.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an embodiment of the present invention.

FIG. 2 is a perspective view of the blade shown in FIG.

FIG. 3 is a plan view of the polishing disk in FIG.

FIG. 4 is a plan view of the polishing pad in FIG.

[Explanation of symbols]

 1 Housing 2 Polishing Disc 2a Supply Hole 3 Rotating Shaft 4 Blade Tube 4a Axial Flow Blade 5 Space 6 Fixed Tube 7 Polishing Liquid Supply Pipe 8 Polishing Pad W Work S Polishing Surface

Claims (2)

[Claims] 1. A polishing liquid supply mechanism of a polishing apparatus, in which a polishing tool mounted on a polishing disk is pressed against a surface of a work, and a relative movement is given while a polishing liquid is supplied between them to perform a polishing process. A rotary shaft that is rotatably supported and has the polishing disk at its lower end; a fixed cylinder that is externally inserted on the outer periphery of the rotary shaft with a space between them; and its upper end is fixed to the housing; And a supply hole formed in the polishing disc, and the polishing liquid from the polishing liquid supply pipe is supplied to the polishing surface of the workpiece through the space and the supply hole. A polishing liquid supply mechanism for a polishing apparatus. 2. An axial flow vane is provided on the outer circumference of the rotary shaft, which exerts a pumping force to the polishing liquid in the space portion toward the supply hole side as the rotary shaft rotates. Polishing liquid supply mechanism of the polishing apparatus of 1.