JPH0536504B2 - - Google Patents
Info
- Publication number
- JPH0536504B2 JPH0536504B2 JP5823084A JP5823084A JPH0536504B2 JP H0536504 B2 JPH0536504 B2 JP H0536504B2 JP 5823084 A JP5823084 A JP 5823084A JP 5823084 A JP5823084 A JP 5823084A JP H0536504 B2 JPH0536504 B2 JP H0536504B2
- Authority
- JP
- Japan
- Prior art keywords
- separator
- cluster
- deposited
- ionized
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001704 evaporation Methods 0.000 claims description 22
- 230000008020 evaporation Effects 0.000 claims description 21
- 238000007740 vapor deposition Methods 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000005192 partition Methods 0.000 claims description 4
- 239000012495 reaction gas Substances 0.000 claims description 4
- 239000002826 coolant Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 40
- 239000007789 gas Substances 0.000 description 10
- 238000000605 extraction Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5823084A JPS60204876A (ja) | 1984-03-28 | 1984-03-28 | クラスタビ−ム蒸着装置 |
| KR1019840006920A KR890002747B1 (ko) | 1983-11-07 | 1984-11-05 | 이온 빔에 의한 성막방법 및 그 장치 |
| DE8484113348T DE3485563D1 (de) | 1983-11-07 | 1984-11-06 | Vorrichtung zur herstellung eines filmes mittels ionenstrahl. |
| EP84113348A EP0141417B1 (en) | 1983-11-07 | 1984-11-06 | Apparatus for forming film by ion beam |
| US06/668,843 US4687939A (en) | 1983-11-07 | 1984-11-06 | Method and apparatus for forming film by ion beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5823084A JPS60204876A (ja) | 1984-03-28 | 1984-03-28 | クラスタビ−ム蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60204876A JPS60204876A (ja) | 1985-10-16 |
| JPH0536504B2 true JPH0536504B2 (enrdf_load_stackoverflow) | 1993-05-31 |
Family
ID=13078280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5823084A Granted JPS60204876A (ja) | 1983-11-07 | 1984-03-28 | クラスタビ−ム蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60204876A (enrdf_load_stackoverflow) |
-
1984
- 1984-03-28 JP JP5823084A patent/JPS60204876A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60204876A (ja) | 1985-10-16 |
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