JPH0536314A - Formation of transparent conductive film - Google Patents
Formation of transparent conductive filmInfo
- Publication number
- JPH0536314A JPH0536314A JP3191910A JP19191091A JPH0536314A JP H0536314 A JPH0536314 A JP H0536314A JP 3191910 A JP3191910 A JP 3191910A JP 19191091 A JP19191091 A JP 19191091A JP H0536314 A JPH0536314 A JP H0536314A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- conductive film
- ito
- ink
- transparent conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroluminescent Light Sources (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、各種のディスプレイ装
置等において透明電極や帯電防止フィルムなどに用いら
れる特にインジウム錫酸化物（以下、ＩＴＯという）透
明導電膜を形成するための方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a transparent conductive film of indium tin oxide (hereinafter referred to as ITO) which is used as a transparent electrode or an antistatic film in various display devices.
【０００２】[0002]
【従来の技術】近年、情報表示機器において液晶ディス
プレイやエレクトロ・ルミネッセンスディスプレイ等の
フラット型ディスプレイ装置が広く用いられている。そ
してこの種のディスプレイでは、表示素子の電極又は回
路電極に透明導電膜が使用されるが、かかる透明導電膜
には、抵抗値が小さく且つ透明性が良好であることから
特にＩＴＯ透明導電膜が好適である。2. Description of the Related Art In recent years, flat display devices such as liquid crystal displays and electroluminescence displays have been widely used in information display equipment. In this type of display, a transparent conductive film is used for an electrode of a display element or a circuit electrode, and an ITO transparent conductive film is particularly preferable for such a transparent conductive film because of its low resistance and good transparency. It is suitable.
【０００３】ＩＴＯ透明導電膜を形成する場合、ＩＴＯ
粒子をターゲットとしてスパッタリングを行うことによ
り基板上に透明導電膜を蒸着する方法があるが、この方
法で使用する装置は高価であり、大きな蒸着面積の成膜
加工には適していない。又、成膜後更にエッチングによ
ってパターン成形加工を行う必要がある等の問題があっ
た。そこでＩＴＯ微粒子粉を用いたインクを塗布又は印
刷することによりＩＴＯ透明導電膜を形成する方法が開
発されてきている。そしてこの方法はＩＴＯ微粒子粉を
樹脂と溶剤とに混ぜ合わせて均一に分散せしめることに
よりペーストを形成し、該ペーストを基板に印刷してか
ら乾燥するという成膜方法である（以下、単に塗布法と
いう）。When forming an ITO transparent conductive film, ITO is used.
There is a method of vapor-depositing a transparent conductive film on a substrate by performing sputtering with particles as a target, but the apparatus used in this method is expensive and is not suitable for forming a large vapor deposition area. Further, there is a problem that it is necessary to perform pattern forming processing by etching after the film formation. Therefore, a method of forming an ITO transparent conductive film by applying or printing ink using ITO fine particle powder has been developed. This method is a film forming method in which ITO fine particle powder is mixed with a resin and a solvent and uniformly dispersed to form a paste, and the paste is printed on a substrate and then dried (hereinafter, simply referred to as a coating method. That).
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、上記塗
布法により形成される導電膜の導電原理はＩＴＯ微粒子
相互の接近作用によって行われるものであるため、前記
蒸着による方法に比べて導電膜の電気的抵抗値が大きく
なってしまうので問題になっていた。又、導電膜の膜厚
が厚くなる（１〜３μｍ）上、導電膜表面の凹凸や導電
膜内部のボイド（空隙）等の原因で光の散乱が発生して
導電膜の全光線透過率やヘーズ値（曇の程度を表す数
値）が悪化するという問題があった。このためかかる塗
布法により形成された導電膜は帯電防止用等の比較的グ
レードが低い用途以外では実用化されていない。However, since the conductive principle of the conductive film formed by the above-mentioned coating method is performed by the approaching action of ITO fine particles, the electrical conductivity of the conductive film is higher than that by the vapor deposition method. There was a problem because the resistance value increased. In addition, the conductive film becomes thick (1 to 3 μm), and light scattering occurs due to irregularities on the conductive film surface, voids (voids) inside the conductive film, and the total light transmittance of the conductive film. There was a problem that the haze value (numerical value indicating the degree of clouding) deteriorates. For this reason, the conductive film formed by such a coating method has not been put into practical use except for applications of relatively low grade such as for antistatic purposes.
【０００５】本発明はかかる実情に鑑み、この種透明導
電膜の光学的特性及び電気的特性を向上させることがで
きるようにした透明導電膜の成膜方法を提供することを
目的とする。In view of the above situation, it is an object of the present invention to provide a transparent conductive film forming method capable of improving the optical and electrical characteristics of this kind of transparent conductive film.
【０００６】[0006]
【課題を解決するための手段】本発明による透明導電膜
の成膜方法は、ＩＴＯ微粒子を含む電子線硬化型インク
を樹脂フィルム上に印刷後、乾燥によって脱溶剤化処理
を施し、更にスチールロールによる圧延処理後、電子線
硬化処理を施すことにより行われる。The method for forming a transparent conductive film according to the present invention comprises a method in which an electron beam-curable ink containing ITO fine particles is printed on a resin film, dried to remove the solvent, and further subjected to a steel roll. After the rolling process according to (1), the electron beam hardening process is performed.
【０００７】更に、本発明方法において、上記電子線硬
化型インクの固形成分中の上記ＩＴＯ微粒子の体積含有
率が５０〜８０％である。Further, in the method of the present invention, the volume content of the ITO fine particles in the solid component of the electron beam curable ink is 50 to 80%.
【０００８】[0008]
【作用】本発明によれば、先ず透明導電膜を形成すべき
ＩＴＯの超微粒子粉を用いてペースト状に形成したイン
クをロールによって圧延することにより、ＩＴＯ微粒子
を緻密化し、これにより形成された導電膜内のボイドの
発生を抑制することができる。又、かかるロールによる
圧延処理を行うことにより導電膜表面を平滑にし、この
結果、透明導電膜の光学的特性及び電気的特性の双方を
向上させることができる。電子線硬化型インクを使用す
ることにより、該インクを電子線によって硬化せしめる
前に行われる上記圧延処理においてはかかる電子線硬化
型インクが未だ硬化していない状態にあるため、圧延処
理時のロールの線圧力を比較的低く設定しても有効にＩ
ＴＯ微粒子の緻密化を図ることができる。According to the present invention, first, the ITO fine particles are densified by rolling the ink formed into a paste using the ultrafine particles of ITO for forming the transparent conductive film, thereby densifying the ITO fine particles. Generation of voids in the conductive film can be suppressed. Further, the rolling treatment with such a roll smoothes the surface of the conductive film, and as a result, it is possible to improve both the optical characteristics and the electrical characteristics of the transparent conductive film. By using the electron beam curable ink, the electron beam curable ink is not yet cured in the rolling process performed before the ink is cured by the electron beam. Is effective even if the line pressure of is set relatively low.
The TO fine particles can be densified.
【０００９】更に本発明によれば、基板に塗布される電
子線硬化型インクの固形成分中のＩＴＯ粒子の体積含有
率を特に５０〜８０％に設定したことにより、導電膜の
電気的特性及び光学的特性を有効且つ大幅に向上させる
ことができる。即ち上記圧延処理を行う際に緻密化され
るＩＴＯ粒子間の空隙を埋め尽くすだけの樹脂を必要と
するが、この場合、ＩＴＯ粒子の量が多過ぎると樹脂が
かかる空隙を完全に埋めることができず、従ってボイド
が発生して光線透過率及びヘーズ値が悪くなる上に、所
謂、ポーラスな導電膜になってしまいその強度が低下す
る。一方、ＩＴＯ粒子の量が少な過ぎるとかかるＩＴＯ
粒子よりも過剰に存在する樹脂によってＩＴＯ粒子同士
の相互接近が妨げられ、この場合には導電膜の光学的特
性は良好であっても電気的特性を向上させることはでき
ない。従って、インクの固形成分中の樹脂とＩＴＯ粒子
との含有割合を最適にする必要があるが、本発明方法に
おいては、ＩＴＯ粒子の体積含有率が上記のように５０
〜８０％に設定されている。Further, according to the present invention, the volumetric content of the ITO particles in the solid component of the electron beam curable ink applied to the substrate is set to 50% to 80%, whereby the electrical characteristics of the conductive film and The optical characteristics can be effectively and significantly improved. That is, a resin is needed to completely fill the voids between the ITO particles that are densified during the rolling treatment, but in this case, if the amount of the ITO particles is too large, the resin may completely fill the voids. Therefore, voids are generated and the light transmittance and the haze value are deteriorated, and moreover, a so-called porous conductive film is formed and its strength is lowered. On the other hand, if the amount of ITO particles is too small,
The resin existing in excess of the particles prevents the ITO particles from approaching each other, and in this case, the electrical characteristics cannot be improved even if the optical characteristics of the conductive film are good. Therefore, it is necessary to optimize the content ratio of the resin and the ITO particles in the solid component of the ink, but in the method of the present invention, the volume content of the ITO particles is 50 as described above.
It is set to ~ 80%.
【００１０】[0010]
【実施例】以下、本発明による透明導電膜の成膜方法の
一実施例を詳細に説明する。先ず基板である樹脂フィル
ム上に塗布すべき電子線硬化型インクの構成成分である
ＩＴＯの超微粒子粉は、その平均粒径０．０３μｍのも
のを用いる。そしてかかるＩＴＯ超微粒子粉を、オリゴ
マー及びモノマーから成る電子線硬化型樹脂と混ぜ合わ
せ、これら双方を合わせた重量に対して２０％の溶剤を
添加して分散処理を行うことにより、電子線硬化型イン
クが形成される。EXAMPLES An example of the method for forming a transparent conductive film according to the present invention will be described in detail below. First, as the ultrafine particle powder of ITO, which is a constituent component of the electron beam curable ink to be applied on the resin film which is the substrate, an average particle diameter of 0.03 μm is used. Then, the ITO ultrafine particle powder is mixed with an electron beam curable resin composed of an oligomer and a monomer, and 20% of a solvent is added to the combined weight of both of them to perform a dispersion treatment to obtain an electron beam curable resin. Ink is formed.
【００１１】上記オリゴマーとしての２官能基ウレタン
アクリレートもしくは２官能基エポキシアクリレートと
上記モノマーとしての３官能基アクリレート（例えばト
リメチロールプロパントリアクリレート）との重量比は
６０：４０程度に設定される。かかる電子線硬化型イン
クの固形成分（樹脂成分，ＩＴＯ粒子，添加剤等）中の
ＩＴＯ粒子の体積含有率５０〜８０％程度であることが
好ましいが、ここではウレタンアクリレート系インクに
ついては５０％，６０％及び７５％、また、エポキシア
クリレート系については６０％となるように合計４種類
のインクを形成した。The weight ratio of the bifunctional urethane acrylate or the bifunctional epoxy acrylate as the oligomer to the trifunctional acrylate (for example, trimethylolpropane triacrylate) as the monomer is set to about 60:40. The volume content of the ITO particles in the solid components (resin component, ITO particles, additives, etc.) of the electron beam curable ink is preferably about 50 to 80%, but here the urethane acrylate ink is 50%. , 60% and 75%, and 60% for the epoxy acrylate type, and a total of four types of ink were formed.
【００１２】次に、上記４種類の電子線硬化型インクの
それぞれをスクリーン印刷法により基板樹脂フィルムの
ＰＥＴフィルム（厚さ１００μｍで、密着性を良好にす
るためにプライマー処理が施されている）上に印刷し、
この後、赤外線加熱により８０°Ｃの温度で３０分間乾
燥せしめられる。そしてこの乾燥によって、電子線硬化
型インク中に含まれている上記溶剤は揮発せしめられる
が、この時点では電子線硬化型インクの他の成分である
オリゴマー及びモノマーが液状であるためＰＥＴフィル
ム上に膜は未だ硬化してはいない。尚、上記４種類の電
子線硬化型インクのいずれの場合も１２ｃｍ×１５ｃｍ
程度の広さの印刷領域を形成して行ったが、塗膜の厚さ
はウレタンアクリレート系インクではおよそ３μｍ、ま
たエポキシアクリレート系インクではおよそ５μｍであ
った。尚、これらの塗膜厚さの違いは、使用するインク
の粘度の相違に起因している。Next, each of the four types of electron beam curable inks described above was subjected to screen printing to form a PET film as a substrate resin film (having a thickness of 100 μm, which was subjected to a primer treatment for good adhesion). Print on,
Then, it is dried by infrared heating at a temperature of 80 ° C. for 30 minutes. Then, by this drying, the solvent contained in the electron beam curable ink is volatilized. At this point, however, the other components of the electron beam curable ink, namely, the oligomer and the monomer, are in liquid form, so that the PET film is not covered. The film is not yet cured. 12 cm × 15 cm in any of the above four types of electron beam curable inks
The print area was formed to have a large size, and the thickness of the coating film was about 3 μm for the urethane acrylate ink and about 5 μm for the epoxy acrylate ink. The difference in the coating film thickness is due to the difference in the viscosity of the ink used.
【００１３】更に、基板樹脂フィルム上に上記スクリー
ン印刷法によって塗布されたインクはスチールロールに
よって圧延処理されるが、この圧延処理においてはその
表面がハードクロムメッキされた直径１５０ｍｍの２本
のスチールロールを使用し、その処理スピードが略１０
ｃｍ／秒となるように該スチールロールの回転速度を設
定した。又、このスチールロールによる圧延処理を行う
場合、スチールロールの線圧力は２００ｋｇｆ／ｃｍ以
上であれば、必要且つ十分である。ここで、かかる線圧
力が高過ぎると基板樹脂フィルムに機械的歪みを生じて
しまうが、本発明ではかかる歪みが生じないように設定
されている。これは使用される基板樹脂フィルムの種
類，材質及び厚さ等により、本実施例では上記設定値が
好ましい。そして線圧力の上限は１０００ｋｇｆ／ｃｍ
以下が好ましい。Further, the ink applied on the resin film of the substrate by the screen printing method is rolled by a steel roll. In this rolling treatment, two steel rolls having a diameter of 150 mm, the surfaces of which are hard chrome plated. , And the processing speed is about 10
The rotation speed of the steel roll was set to be cm / sec. Further, when the rolling treatment with the steel roll is performed, it is necessary and sufficient if the linear pressure of the steel roll is 200 kgf / cm or more. Here, if the linear pressure is too high, mechanical strain will be generated in the substrate resin film, but in the present invention, the strain is set so as not to occur. This is preferably the above set value in this embodiment depending on the type, material and thickness of the substrate resin film used. And the upper limit of the linear pressure is 1000 kgf / cm
The following are preferred.
【００１４】上記スチールロールによる圧延処理後、本
実施例のインクに対してはアルゴン等の不活性ガス雰囲
気中で電子線硬化処理が行われる。即ち、基板樹脂フィ
ルム上に塗布されている電子線硬化型インクに対して、
電子線の加速電圧１７５ｋＶで照射線量１０〜４０Ｍｒ
ａｄの電子線が照射される。ここで上記のように不活性
ガスを用いるのは、例えば空気中で電子線処理を行った
場合には空気中の酸素が、生じたラジカルを消費してし
まう所謂、酸素禁止作用により重合反応が阻害されてし
まうのを防ぐためである。After the rolling treatment with the steel roll, the ink of this embodiment is subjected to an electron beam curing treatment in an atmosphere of an inert gas such as argon. That is, for the electron beam curable ink coated on the substrate resin film,
Electron beam acceleration voltage 175 kV and irradiation dose 10-40 Mr
The ad electron beam is irradiated. Here, the use of an inert gas as described above means that when the electron beam treatment is carried out in the air, oxygen in the air consumes the generated radicals, that is, the polymerization reaction is caused by the oxygen inhibition effect. This is to prevent it from being hindered.
【００１５】本発明による透明導電膜の成膜方法は上記
のように構成されているから、先ず上記スチールロール
による圧延処理を行うことにより、形成されたＩＴＯ透
明導電膜の光学的特性を著しく向上させることができ
る。即ち、この圧延処理を施す前の状態の塗膜の全光線
透過率は高々６０％程度に過ぎなかったが圧延処理後は
８０％程度にまで達し、又、導電膜のヘーズ値は２０％
程度であったものが１０％程度に向上した。この圧延処
理におけるスチールロールの線圧力は大きい程かかる効
果も大きくなる。Since the method for forming a transparent conductive film according to the present invention is configured as described above, the optical characteristic of the formed ITO transparent conductive film is remarkably improved by first performing the rolling treatment with the steel roll. Can be made. That is, the total light transmittance of the coating film before the rolling treatment was only about 60% at most, but after the rolling treatment, it reached about 80%, and the haze value of the conductive film was 20%.
What was around was improved to around 10%. The greater the linear pressure of the steel roll in this rolling treatment, the greater the effect.
【００１６】一方、圧延処理を施される電子線硬化型イ
ンクは通常、０〜２０％の溶剤を含んでいるが、基板樹
脂フィルム上に印刷・乾燥後に脱溶剤化処理が行われた
後でも液状のオリゴマー及びモノマーが存在しているた
めに硬化していない。従ってこのような状態で圧延処理
が行われるので、スチールロールの線圧力を比較的低く
設定しても塗膜は容易且つ有効に圧延せしめられＩＴＯ
粒子を容易に緻密化することができる。そしてこれによ
り導電膜表面が平滑化され、この点でも光学的特性を向
上させることができるが、一般の熱可塑性樹脂を用いて
インクを形成した場合には塗膜の圧延処理時に５００ｋ
ｇｆ／ｃｍ以上の高い線圧力が必要になるのに比べて線
圧力を低く設定することができるという利点がある。こ
のように線圧力を低くすることにより基板樹脂フィルム
の歪みの発生をなくすることができる。On the other hand, the electron beam-curable ink which is subjected to the rolling treatment usually contains 0 to 20% of solvent, but even after the solvent removal treatment is carried out after printing and drying on the substrate resin film. Not cured due to the presence of liquid oligomers and monomers. Therefore, since the rolling treatment is performed in such a state, the coating film can be rolled easily and effectively even if the linear pressure of the steel roll is set relatively low.
The particles can be easily densified. The surface of the conductive film is smoothed by this, and the optical characteristics can be improved also in this respect. However, when the ink is formed by using a general thermoplastic resin, it is 500 k during the rolling treatment of the coating film.
There is an advantage that the linear pressure can be set lower than the need for a high linear pressure of gf / cm or more. By lowering the linear pressure in this way, it is possible to eliminate the occurrence of distortion of the substrate resin film.
【００１７】又、かかるスチールロールによる圧延処理
によりＩＴＯ透明導電膜の電気的特性も向上させること
できる。即ち、この圧延処理を施さずに電子線硬化させ
ると塗膜の表面抵抗は１０〜２０ｋオーム／□にまで達
するが、圧延処理後に電子線硬化させると２００〜６０
０オーム／□に低下する。Further, the electrical characteristics of the ITO transparent conductive film can be improved by the rolling treatment with the steel roll. That is, the surface resistance of the coating film reaches 10 to 20 k ohms / square when electron beam curing is performed without this rolling treatment, but 200 to 60 when electron beam curing is performed after the rolling treatment.
It drops to 0 ohm / □.
【００１８】次に本発明により形成されたＩＴＯ透明導
電膜の光学的特性及び電気的特性についての測定結果を
図１乃至図５を参照して説明する。尚、これらの測定を
行うに際してＩＴＯ粒子の平均粒径は米国カウンターク
ローム社製のＱｕａｎｔａｓｏｒｂ ＱＳ−１０によ
り、又、透明導電膜の全光線透過率及びヘーズ値は基板
であるＰＥＴフィルムと一緒にスガ試験機株式会社製の
直読ヘーズコンピュータＨＧＭ−ＺＤＰにより、更に表
面抵抗は上記ＰＥＴフィルムを５０ｍｍ×５０ｍｍの寸
法に切り出した後三菱油化製のローレスタＭＣＰ−Ｔ４
００によりそれぞれ測定した。Next, measurement results of optical characteristics and electrical characteristics of the ITO transparent conductive film formed according to the present invention will be described with reference to FIGS. 1 to 5. In performing these measurements, the average particle size of the ITO particles was Quantasorb QS-10 manufactured by US Counterchrome Co., Ltd. Using a direct-reading haze computer HGM-ZDP manufactured by Tester Co., Ltd., the PET film was cut into a size of 50 mm × 50 mm, and then the surface resistance was cut out, and then Loresta MCP-T4 manufactured by Mitsubishi Petrochemical Co., Ltd.
00 for each measurement.
【００１９】図１は、ＩＴＯ粒子の体積含有率を６０％
にしたウレタンアクリレート系の電子線硬化型インクを
用いて、スチールロールによるロール線圧力を変化させ
て形成された電子線硬化処理後のＩＴＯ透明導電膜の表
面抵抗値及び光学的特性（全光線透過率，ヘーズ値）に
ついての測定結果を示している。この測定結果によれ
ば、ロール線圧力が２００ｋｇｆ／ｃｍ以上で５００オ
ーム／□以下の表面抵抗と良好な光学特性とが得られ
た。FIG. 1 shows that the volume content of ITO particles is 60%.
The surface resistance value and optical characteristics (total light transmission) of the ITO transparent conductive film after the electron beam curing treatment formed by changing the roll line pressure by the steel roll using the urethane acrylate-based electron beam curing type ink Rate, haze value). According to this measurement result, a surface resistance of 500 ohm / □ or less and a good optical characteristic were obtained when the roll line pressure was 200 kgf / cm or more.
【００２０】図２は圧延処理時の線圧力４００ｋｇｆ／
ｃｍにおいてＩＴＯ粒子の体積含有率５０％，６０％及
び７５％の３種類のウレタンアクリレート系の電子線硬
化型インクを用いて形成した電子線硬化処理後のＩＴＯ
透明導電膜の光学的特性及び電気的特性の測定結果を示
している。図から明らかなようにいずれの電子線硬化型
インクの場合にも良好な膜特性になっているが、この測
定結果よりＩＴＯ粒子の体積含有率は５０〜８０％程度
の範囲が光学的特性及び電気的特性を向上させる上で特
に好ましい。FIG. 2 shows a linear pressure of 400 kgf /
ITO after electron beam curing formed using three kinds of urethane acrylate-based electron beam curable inks having a volume content of ITO particles of 50%, 60% and 75% in cm.
The measurement result of the optical characteristic and electric characteristic of a transparent conductive film is shown. As is clear from the figure, all the electron beam curable inks have good film characteristics, but from the measurement results, the ITO particles have a volume content of about 50 to 80% in the optical characteristics and It is particularly preferable for improving the electrical characteristics.
【００２１】図３及び図４は、電子線の照射線量を変え
た場合のＩＴＯ透明導電膜の表面抵抗及び光学特性（全
光線透過率，ヘーズ値）についての測定結果を、ウレタ
ンアクリレート系インク及びエポキシアクリレート系イ
ンクのそれぞれについて示したものである。図３及び図
４から明らかなように、ＩＴＯ膜の膜物性は電子線の照
射量には大きく影響を受けず、１０Ｍｒａｄ以上あれば
充分である。そしてこの１０Ｍｒａｄ以上の電子線によ
って硬化せしめた膜は塗膜をメチルエチルケトンを含ま
せた布で２０回擦っても膜に剥離が生じなかった。ま
た、図３及び図４によれば、ウレタンアクリレート系イ
ンクは光学特性に優れており、一方、エポキシアクリレ
ート系インクは電気的特性に優れていることが分かる
が、このことからウレタンアクリレート系インク及びエ
ポキシアクリレート系インクの混合割合を適宜調整する
ことにより光学特性及び電気的特性について所望の特性
を有するように透明導電膜を成膜することができる。3 and 4 show the measurement results of the surface resistance and the optical characteristics (total light transmittance, haze value) of the ITO transparent conductive film when the irradiation dose of the electron beam was changed, and the urethane acrylate ink and It is shown for each of the epoxy acrylate-based ink. As is clear from FIGS. 3 and 4, the film physical properties of the ITO film are not significantly affected by the electron beam irradiation amount, and 10 Mrad or more is sufficient. The film cured by an electron beam of 10 Mrad or more did not peel off even if the film was rubbed 20 times with a cloth containing methyl ethyl ketone. Further, according to FIGS. 3 and 4, it can be seen that the urethane acrylate-based ink has excellent optical characteristics, while the epoxy acrylate-based ink has excellent electrical characteristics. By appropriately adjusting the mixing ratio of the epoxy acrylate-based ink, the transparent conductive film can be formed so as to have desired optical and electrical characteristics.
【００２２】更に図５は電子線硬化せしめられたウレタ
ンアクリレート系及びエポキシアクリレート系のＩＴＯ
透明導電膜の経時変化の例を示しており、この例では２
０Ｍｒａｄの電子線量での硬化により、ウレタンアクリ
レート系の場合は表面抵抗が４００オーム／□弱まで低
下するが、その後は次第に増加して十数日後にほぼ安定
し、また、エポキシアクリレート系の場合は硬化後、表
面抵抗の変化が殆どない。Further, FIG. 5 shows a urethane acrylate-based and epoxy acrylate-based ITO cured by electron beam.
An example of the change over time of the transparent conductive film is shown. In this example, 2
By curing with an electron dose of 0 Mrad, the surface resistance of urethane acrylate type decreases to less than 400 ohm / □, but after that, it gradually increases and stabilizes after a dozen days. In the case of epoxy acrylate type, After curing, there is almost no change in surface resistance.
【００２３】[0023]
【発明の効果】上述したように、本発明方法によれば電
子線硬化型樹脂の選択により、この種導電膜の電気的特
性及び光学的特性を適宜調整することができ、特に表面
抵抗５００オーム／□以下、或いは全光線透過率約８０
％及びヘーズ値１０％以下である耐溶剤性に優れたＩＴ
Ｏ透明導電膜を形成することができる。As described above, according to the method of the present invention, it is possible to appropriately adjust the electric characteristics and the optical characteristics of the conductive film of this kind by selecting the electron beam curable resin, and particularly the surface resistance of 500 ohms. / □ or less, or total light transmittance of about 80
% And haze value less than 10% IT with excellent solvent resistance
An O transparent conductive film can be formed.
【図１】本発明方法により形成したウレタンアクリレー
ト系ＩＴＯ透明導電膜の電気的特性及び光学特性とロー
ル線圧力との関係を示すグラフである。FIG. 1 is a graph showing the relationship between electrical characteristics and optical characteristics of a urethane acrylate-based ITO transparent conductive film formed by the method of the present invention and roll line pressure.
【図２】本発明方法により３種類のウレタンアクリレー
ト系電子線硬化型インクを用いて形成したＩＴＯ透明導
電膜の光学的特性と電気的特性の測定結果を示すグラフ
である。FIG. 2 is a graph showing measurement results of optical characteristics and electrical characteristics of an ITO transparent conductive film formed by using three kinds of urethane acrylate-based electron beam curable inks by the method of the present invention.
【図３】本発明方法により形成したウレタンアクリレー
ト系のＩＴＯ透明導電膜の光学的特性及び電気的特性と
電子線照射量との関係を示すグラフである。FIG. 3 is a graph showing a relationship between optical characteristics and electrical characteristics of a urethane acrylate-based ITO transparent conductive film formed by the method of the present invention and electron beam irradiation dose.
【図４】本発明方法により形成したエポキシアクリレー
ト系のＩＴＯ透明導電膜の光学的特性及び電気的特性と
電子線照射量との関係を示すグラフである。FIG. 4 is a graph showing a relationship between optical characteristics and electrical characteristics of an epoxy acrylate-based ITO transparent conductive film formed by the method of the present invention and electron beam irradiation dose.
【図５】本発明方法により形成したＩＴＯ透明導電膜の
表面抵抗の経時変化の例を示したグラフである。FIG. 5 is a graph showing an example of changes with time of surface resistance of an ITO transparent conductive film formed by the method of the present invention.
Claims (2)
硬化型インクを樹脂フィルム上に印刷後、乾燥によって
脱溶剤化処理を施し、更にスチールロールによる圧延処
理後、電子線硬化処理を施すことにより上記樹脂フィル
ム上に透明導電膜を形成する透明導電膜の成膜方法。1. An electron beam curable ink containing fine particles of indium tin oxide is printed on a resin film, subjected to solvent removal treatment by drying, further rolled by a steel roll, and then subjected to electron beam curing treatment. A method for forming a transparent conductive film, which comprises forming a transparent conductive film on the resin film.
上記インジウム錫酸化物微粒子の体積含有率が５０〜８
０パーセントであることを特徴とする請求項１に記載の
透明導電膜の成膜方法。2. The volume content of the indium tin oxide fine particles in the solid component of the electron beam curable ink is 50 to 8.
It is 0%, The film-forming method of the transparent conductive film of Claim 1 characterized by the above-mentioned.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19191091A JP3072862B2 (en) | 1991-07-31 | 1991-07-31 | Method for forming transparent conductive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19191091A JP3072862B2 (en) | 1991-07-31 | 1991-07-31 | Method for forming transparent conductive film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0536314A true JPH0536314A (en) | 1993-02-12 |
| JP3072862B2 JP3072862B2 (en) | 2000-08-07 |
Family
ID=16282485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19191091A Expired - Fee Related JP3072862B2 (en) | 1991-07-31 | 1991-07-31 | Method for forming transparent conductive film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3072862B2 (en) |
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| EP0947566A1 (en) * | 1998-04-03 | 1999-10-06 | Sumitomo Chemical Company Limited | Conductive coating composition and antistatic plate |
| WO2000068330A1 (en) * | 1999-05-10 | 2000-11-16 | Shunichi Haruyama | Inorganic-organic film and starting liquid composition therefor and method for preparation thereof, and applications and method for preparing them |
| JP2006202738A (en) * | 2004-12-21 | 2006-08-03 | Sumitomo Metal Mining Co Ltd | Dispersed electroluminescence element and manufacturing method of the same |
| JP2006202739A (en) * | 2004-12-21 | 2006-08-03 | Sumitomo Metal Mining Co Ltd | Dispersed electroluminescence element and manufacturing method of the same |
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| WO2007039969A1 (en) * | 2005-10-05 | 2007-04-12 | Sumitomo Metal Mining Co., Ltd. | Transparent conductive film, flexible dispersion-type electroluminescence element, process for producing the same, and electronic device making use thereof |
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| US20130187104A1 (en) * | 2010-10-26 | 2013-07-25 | Mitsubishi Materials Electronic Chemicals Co., Ltd. | Indium tin oxide powder, method for producing same, dispersion, paint, and functional thin film |
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