JPH0473809A - Transparent conductiv film - Google Patents
Transparent conductiv filmInfo
- Publication number
- JPH0473809A JPH0473809A JP18676790A JP18676790A JPH0473809A JP H0473809 A JPH0473809 A JP H0473809A JP 18676790 A JP18676790 A JP 18676790A JP 18676790 A JP18676790 A JP 18676790A JP H0473809 A JPH0473809 A JP H0473809A
- Authority
- JP
- Japan
- Prior art keywords
- silazane
- tin
- conductive film
- containing indium
- indium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract description 23
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000001035 drying Methods 0.000 claims abstract description 5
- -1 polyethyleneoxy group Polymers 0.000 claims description 19
- 239000002245 particle Substances 0.000 claims description 17
- 239000011882 ultra-fine particle Substances 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 abstract 2
- 229920001451 polypropylene glycol Polymers 0.000 abstract 2
- 239000010408 film Substances 0.000 description 34
- 229910052718 tin Inorganic materials 0.000 description 19
- 239000003973 paint Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229920000128 polypyrrole Polymers 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- 229920001940 conductive polymer Polymers 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 229920001197 polyacetylene Polymers 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 239000012808 vapor phase Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
本発明は透明導電膜に関し、さらに詳しくは透明性が良
好て、導電性および耐久性に優れた透明導電膜に関する
。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a transparent conductive film, and more particularly to a transparent conductive film that has good transparency, conductivity, and durability.
一般に、プラスチックフィルム、ガラス、セラミ、りあ
るいは紙などの絶縁性基材への導電性の付与は、これら
の基材表面に導電膜を形成することによって行われてお
り、たとえば、スパッタ法、真空蒸着法などの気相法に
よって金属あるいは酸化物の導電性薄膜を形成したり、
カーボンや金属、もしくは錫含有酸化インジウム（ＩＴ
Ｏ）や酸化錫などの導電性フィラーを分散させた塗料を
塗布したり、さらにはポリアセチレン、ポリピロール、
ポリチオフェンなどのドーピングによって高活性ラジカ
ルを生成させた導電性高分子溶液を塗布したりして導電
膜を形成することが行われている。（特開昭５９−２１
３６２３号、特開昭６２−１１９２３７号）
〔発明が解決しようとする課題〕
ところが、絶縁性基材の形状が複雑になると、スパッタ
法、真空蒸着法などの気相法によって、絶縁性基材のす
べての表面に均一に導電性薄膜を形成することは極めて
困難となる。Generally, conductivity is imparted to insulating substrates such as plastic film, glass, ceramic, resin, or paper by forming a conductive film on the surface of these substrates. For example, sputtering, vacuum Forming a conductive thin film of metal or oxide by vapor phase method such as evaporation method,
Carbon, metal, or tin-containing indium oxide (IT
Paints containing conductive fillers such as O) and tin oxide are applied, and polyacetylene, polypyrrole,
A conductive film is formed by applying a conductive polymer solution in which highly active radicals are generated by doping with polythiophene or the like. (Unexamined Japanese Patent Publication No. 59-21
(No. 3623, JP-A No. 62-119237) [Problem to be solved by the invention] However, when the shape of the insulating base material becomes complicated, it is difficult to form the insulating base material by vapor phase methods such as sputtering and vacuum evaporation. It is extremely difficult to uniformly form a conductive thin film on all surfaces of the substrate.
また、カーボン、金属などのフィラーは、通常黒色、あ
るいは黒色に近い色をしているため、これを用いた塗布
型の導電膜は下地を隠蔽したり、内容が見えな（なるな
どの欠点があり、加えて、金属フィラーでは表面酸化に
伴う導電性の低下という問題がある。In addition, fillers such as carbon and metal are usually black or close to black, so coating-type conductive films using them have drawbacks such as hiding the underlying material and making the contents invisible. In addition, metal fillers have the problem of reduced conductivity due to surface oxidation.
さらに、錫含有酸化インジウム（ＩＴＯ）、酸化錫など
の導電性超微粒子を、ポリエステル、ポリウレタン、塩
化ビニルなどの高分子化合物中に分散させた塗布型の導
電膜は、透明性は保たれるものの、表面電気抵抗が１０
５Ω／口以上と高いため適用範囲が限られる。Furthermore, coating-type conductive films in which conductive ultrafine particles such as tin-containing indium oxide (ITO) and tin oxide are dispersed in polymeric compounds such as polyester, polyurethane, and vinyl chloride, although transparency is maintained. , the surface electrical resistance is 10
The range of application is limited due to its high resistance of 5Ω/mouth or more.
また、ポリアセチレン、ポリピロール、ポリチオフェン
などの導電性高分子膜は、ドーピングによって高活性ラ
ジカルを生成させているため安定性に欠けており、また
導電膜の耐久性や絶縁性基材への接着性にも劣るという
欠点を持っている。In addition, conductive polymer films such as polyacetylene, polypyrrole, and polythiophene lack stability because highly active radicals are generated by doping, and the durability of the conductive film and its adhesion to insulating substrates are affected. It also has the disadvantage of being inferior.
〔課題を解決するための手段］
本発明は、かかる現状に鑑み種々検討を行った結果なさ
れたもので、平均粒径が５０ｎｍ以下の錫含有酸化イン
ジウムＣＩＴＯ）超微粒子と、ポリエチレンオキシ基お
よびポリプロピレンオキシ基のいずれかまたは両者を有
するシラザンとを併用することによって、乾燥後の塗膜
の厚さが１μｍ以下で、表面電気抵抗が１０５Ω／口以
下の塗布型透明導電膜を形成し、導電膜の透明性を良好
にして、導電性および耐久性を一段と向上させたもので
ある。[Means for Solving the Problems] The present invention was made as a result of various studies in view of the current situation, and consists of tin-containing indium oxide (CITO) ultrafine particles with an average particle size of 50 nm or less, polyethyleneoxy groups, and polypropylene. By using a silazane having either or both of the oxy groups in combination, a coated transparent conductive film having a dry coating thickness of 1 μm or less and a surface electrical resistance of 105 Ω/mouth or less can be formed. It has good transparency and further improved conductivity and durability.
本発明で用いられる錫含有酸化インジウム（ＩＴｏ）超
微粒子は、粒径が５０ｎｓ＋以下のものが好適なもとし
て使用され、粒径が５０ｎｍ以下であれば、共沈法、ゾ
ル−ゲル法、あるいは粉砕法などどのような方法によっ
て合成されたものでも好適に使用される。The tin-containing indium oxide (ITo) ultrafine particles used in the present invention preferably have a particle size of 50 ns+ or less, and if the particle size is 50 nm or less, a coprecipitation method, sol-gel method, or Those synthesized by any method such as a pulverization method are preferably used.
このような粒径が５０ｎｉ以下の錫含有酸化インジウム
（ＩＴＯ）超微粒子は、これを含む導電膜の厚さを１μ
ｍ以下にすると、良好な透明性を保持することができる
。これに対し、粒径が５０ｎｉ以上になると、導電膜の
厚さがｌａｍで半透明になるため好ましくない。また、
この種の錫含有酸化インジウム（ＩＴＯ）超微粒子は、
その導電性が電子伝導に基づいているため、温湿度の変
化に対しても導電性は安定しており、酸化物であるため
、酸素、水分などによって変質することもない、しかし
て、この種の錫含有酸化インジウム（ＩＴｏ）超微粒子
によって安定した導電性が発揮され、安定した導電性を
有する透明導電膜が得られる。このような粒径が５０ｎ
ｍ以下の錫含有酸化インジウム（ｒＴｏ）超微粒子の透
明導電膜中における含有量は、透明導電膜の透明性を良
好にし、その安定した導電性を充分に発揮させるため、
透明導電膜の全固形分に対して６０重量％以上含有させ
るのが好ましい。Such ultrafine tin-containing indium oxide (ITO) particles with a particle size of 50 ni or less can be used to reduce the thickness of a conductive film containing them to 1 μm.
When it is less than m, good transparency can be maintained. On the other hand, if the particle size is 50 ni or more, the conductive film becomes translucent at lam thickness, which is not preferable. Also,
This type of tin-containing indium oxide (ITO) ultrafine particles are
Because its conductivity is based on electron conduction, its conductivity is stable even with changes in temperature and humidity, and since it is an oxide, it does not change in quality due to oxygen, moisture, etc. Stable conductivity is exhibited by the tin-containing indium oxide (ITo) ultrafine particles, and a transparent conductive film having stable conductivity can be obtained. Such particle size is 50n
The content of tin-containing indium oxide (rTo) ultrafine particles of m or less in the transparent conductive film is determined to improve the transparency of the transparent conductive film and fully exhibit its stable conductivity.
The content is preferably 60% by weight or more based on the total solid content of the transparent conductive film.
また、本発明で用いられるシラザンは、ポリエチレンオ
キシ基およびポリプロピレンオキシ基のいずれかを有す
るものであっても、また両者を有するものであってもよ
く、いずれの場合もその分子自体に導電性を有している
。また、この種のシラザンのポリエチレンオキシ基およ
びポリプロピレンオキシ基などの官能基は、固体表面へ
の吸着力が極めて強い。しかして、粒径が５０ｎｍ以下
の錫含有酸化インジウム（ＩＴＯ）超微粒子と併用する
と、錫含有酸化インジウム（ＩＴＯ）超微粒子の表面に
、この種のシラザンが常温で容易に化学吸着され、シラ
ザンを介して錫含有酸化インジウム（ＩＴＯ）超微粒子
同士が相互に接触する頻度が極めて高められる。従って
、この種のシラザンの併用によって、透明導電膜の導電
性はこのシラザンを含まない場合に比べて約−桁改善さ
れる。その結果、透明導電膜の厚さを１μｍ以下にして
、１０５Ω／□以下の表面電気抵抗を発現することがで
き、導電性を充分に向上させることができる。Furthermore, the silazane used in the present invention may have either a polyethyleneoxy group or a polypropyleneoxy group, or may have both, and in either case, the molecule itself has conductivity. have. Further, functional groups such as polyethyleneoxy groups and polypropyleneoxy groups of this type of silazane have extremely strong adsorption power to solid surfaces. However, when used together with ultrafine tin-containing indium oxide (ITO) particles with a particle size of 50 nm or less, this type of silazane is easily chemically adsorbed on the surface of the ultrafine tin-containing indium oxide (ITO) particles at room temperature, and the silazane is Through this, the frequency at which ultrafine tin-containing indium oxide (ITO) particles come into contact with each other is greatly increased. Therefore, by using this kind of silazane in combination, the conductivity of the transparent conductive film is improved by about an order of magnitude compared to the case where this silazane is not included. As a result, the transparent conductive film can have a thickness of 1 μm or less, exhibit a surface electrical resistance of 10 5 Ω/□ or less, and can sufficiently improve conductivity.
さらに、この種のシラザンを粒径が５０ｎｍ以下の錫含
有酸化インジウム（ＩＴｏ）超微粒子と併用した場合、
錫含有酸化インジウム（Ｉ Ｔ ’Ｏ）超微粒子がフィ
ラーとしても作用するため、透明導電膜の強度が強化さ
れ、透明導電膜の耐摩耗性が向上される。また、錫含有
酸化インジウム（ＩＴＯ）超微粒子の表面に、常温で容
易に化学吸着されたこの種のシラザンが高分子化合物で
あるため、絶縁性基材への接着性も改善され、ポリアセ
チレン、ポリピロール、ポリチオフェンなどの導電性高
分子導電膜に比べて、接着性が飛躍的に向上される。Furthermore, when this type of silazane is used in combination with tin-containing indium oxide (ITo) ultrafine particles with a particle size of 50 nm or less,
Since the tin-containing indium oxide (IT'O) ultrafine particles also act as a filler, the strength of the transparent conductive film is strengthened and the abrasion resistance of the transparent conductive film is improved. In addition, since this type of silazane is a polymeric compound that is easily chemically adsorbed on the surface of tin-containing indium oxide (ITO) ultrafine particles at room temperature, it has improved adhesion to insulating substrates, such as polyacetylene, polypyrrole, etc. , the adhesion is dramatically improved compared to conductive polymer conductive films such as polythiophene.
このようなポリエチレンオキシ基およびポリプロピレン
オキシ基のいずれかまたは両者を有するシラザンの使用
量は、粒径が５０ｎｍ以下の錫含有酸化インジウム（Ｉ
ＴＯ）超微粒子に対して１〜１０重量％の範囲内にする
のが好ましく、１重量％より少なくては所期の効果が得
られず、１０重量％より多くなると残存する未反応のシ
ラザンが耐久性に悪影響を及ぼす。The amount of silazane having either or both of polyethyleneoxy groups and polypropyleneoxy groups is determined by the amount of tin-containing indium oxide (I) having a particle size of 50 nm or less.
TO) The amount is preferably within the range of 1 to 10% by weight based on the ultrafine particles; if it is less than 1% by weight, the desired effect will not be obtained, and if it is more than 10% by weight, residual unreacted silazane will be Adversely affects durability.
本発明の透明導電膜の形成は常法に準じて行われ、たと
えば、粒径が５０ｎｍ以下の錫含有酸化インジウム（Ｉ
ＴＯ）超微粒子を、ポリエチレンオキシ基およびポリプ
ロピレンオキシ基のいずれかまたは両者を有するシラザ
ン、結合剤樹脂、有機溶削等とともに混合分散して導電
性塗料を調製し、これをポリエステルフィルムなどの絶
縁性基材上に、刷毛塗り、スプレー、浸漬などによって
塗布、乾燥して形成される。The transparent conductive film of the present invention is formed according to a conventional method, for example, tin-containing indium oxide (I) having a particle size of 50 nm or less.
TO) A conductive paint is prepared by mixing and dispersing ultrafine particles with silazane having either or both of polyethyleneoxy groups and polypropyleneoxy groups, a binder resin, organic cutting, etc., and this is applied to insulating materials such as polyester films. It is formed by applying it onto a base material by brushing, spraying, dipping, etc. and drying it.
このように、本発明の透明導電膜は、導電性塗料を絶縁
性基材表面に、刷毛塗り、スプレー、浸漬などによって
塗布、乾燥するだけで容易に形成することができ、従来
のスパンタ法や真空蒸着法などの気相法のように複雑な
装置、工程を必要としない。また、複雑な形状にも容易
に対応可能で、複雑な形状の絶縁性基材に対して高い導
電性を均一に付与することができる。As described above, the transparent conductive film of the present invention can be easily formed by simply applying a conductive paint to the surface of an insulating substrate by brushing, spraying, dipping, etc. and drying. It does not require complicated equipment or processes unlike vapor phase methods such as vacuum evaporation. Moreover, it can easily be applied to complex shapes, and high conductivity can be uniformly imparted to complex-shaped insulating base materials.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例１
錫含有酸化インジウム（ＩＴＯ）８０重量部超微粒子（
粒径４５ｎｍ ）
ポリエチレンオキシ基を有する ４ 〃シラザン
塩化ビニル−酢酸ビニル−ビニ ２０〃ルアルコ一ル
共重合体
メチルイソブチルケトン ５０〃トルエン
５０＃上記の組成物をボールミル中
で約５０時間混合分散して導電性塗料を作製した０次い
で、この導電性塗料を、厚さが１３μｍのポリエステル
フィルム上に、乾燥後の塗膜の厚さが０．９μｍとなる
ように塗布、乾燥して透明導電膜を作った。Example 1 80 parts by weight of tin-containing indium oxide (ITO) ultrafine particles (
Particle size: 45 nm) Polyethyleneoxy group-containing 4 Silazane Vinyl chloride-vinyl acetate-vinyl 20 Alcohol copolymer methyl isobutyl ketone 50 Toluene
50# A conductive paint was prepared by mixing and dispersing the above composition in a ball mill for about 50 hours.Next, this conductive paint was coated on a polyester film with a thickness of 13 μm to the thickness of the dried coating film. A transparent conductive film was prepared by coating and drying to a thickness of 0.9 μm.
実施例２
実施例１における導電性塗料の組成において、ポリエチ
レンオキシ基を有するシラザンに代えて、ポリプロピレ
ンオキシ基を有するシラザンを同量使用した以外は、実
施例１と同様にして透明導電膜を作った。Example 2 A transparent conductive film was produced in the same manner as in Example 1, except that in the composition of the conductive paint in Example 1, the same amount of silazane having a polypropyleneoxy group was used instead of the silazane having a polyethyleneoxy group. Ta.
実施例３
実施例１における導電性塗料の組成において、ポリエチ
レンオキシ基を有するシラザンに代えて、ポリエチレン
オキシ基とポリプロピレンオキシ基とを有するシラザン
を同量使用した以外は、実施例１と同様にして透明導電
膜を作った。Example 3 In the composition of the conductive paint in Example 1, the same amount of silazane having a polyethyleneoxy group and a polypropyleneoxy group was used instead of the silazane having a polyethyleneoxy group. A transparent conductive film was created.
比較例１
実施例１における導電性塗料の組成において、粒径が４
５ｒ＋ｎ＋の錫含有酸化インジウム（ｒＴｏ）超微粒子
に代えて、粒径が６０ｎｍの錫含有酸化インジウム（Ｔ
ＴＯ）超微粒子を同量使用した以外は、実施例１と同様
にして透明導電膜を作った。Comparative Example 1 In the composition of the conductive paint in Example 1, the particle size was 4
In place of the tin-containing indium oxide (rTo) ultrafine particles of 5r+n+, tin-containing indium oxide (T
TO) A transparent conductive film was produced in the same manner as in Example 1, except that the same amount of ultrafine particles was used.
比較例２
実施例１における導電性塗料の組成において、ポリエチ
レンオキシ基を有するシラザンを省いた以外は、実施例
１と同様にして透明導電膜を作った。Comparative Example 2 A transparent conductive film was produced in the same manner as in Example 1, except that the silazane having a polyethyleneoxy group was omitted from the composition of the conductive paint in Example 1.
比較例３
厚さが１３μｍのポリエステルフィルム上に、ドーパン
トとしてＢＦ、−イオンを含む厚さ３０μｍのポリピロ
ール導電膜を作った。Comparative Example 3 A 30 μm thick polypyrrole conductive film containing BF and − ions as dopants was formed on a 13 μm thick polyester film.
各実施例および比較例で得られた透明導電膜について、
表面電気抵抗および透過率を測定し、耐摩耗性を試験し
た。耐摩耗性試験は、得られた各透明導電膜にルビーの
小球を往復摺動させて、透明導電膜が破壊されるまでの
回数を測定し、評価した。Regarding the transparent conductive films obtained in each example and comparative example,
Surface electrical resistance and transmittance were measured and abrasion resistance was tested. The abrasion resistance test was evaluated by sliding a small ruby ball back and forth on each of the obtained transparent conductive films and measuring the number of times until the transparent conductive film was destroyed.
下記第１表はその結果である。Table 1 below shows the results.
第１表
比し、表面電気抵抗が小さくて耐摩耗性がよく、比較例
１で得られた透明導電膜に比べて透明性に優れており、
これらの結果から、本発明によって得られる透明導電膜
は、透明性が良好で、導電性および耐久性に優れている
ことがわかる。Compared to Table 1, the surface electrical resistance is small and the abrasion resistance is good, and the transparency is excellent compared to the transparent conductive film obtained in Comparative Example 1.
These results show that the transparent conductive film obtained by the present invention has good transparency and excellent conductivity and durability.
特許出願人 日立マクセル株式会社 〔発明の効果〕Patent applicant: Hitachi Maxell, Ltd. 〔Effect of the invention〕
Claims (1)
微粒子と、ポリエチレンオキシ基およびポリプロピレン
オキシ基のいずれかまたは両者を有するシラザンとを含
み、乾燥後の塗膜の厚さが１μｍ以下で、表面電気抵抗
が１０＾５Ω／□以下の透明導電膜1. Contains tin-containing indium oxide ultrafine particles with an average particle size of 50 nm or less and silazane having either or both of a polyethyleneoxy group and a polypropyleneoxy group, the thickness of the coating film after drying is 1 μm or less, and the surface electrical resistance is Transparent conductive film with less than 10^5Ω/□
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18676790A JPH0473809A (en) | 1990-07-13 | 1990-07-13 | Transparent conductiv film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18676790A JPH0473809A (en) | 1990-07-13 | 1990-07-13 | Transparent conductiv film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0473809A true JPH0473809A (en) | 1992-03-09 |
Family
ID=16194276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18676790A Pending JPH0473809A (en) | 1990-07-13 | 1990-07-13 | Transparent conductiv film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0473809A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003000808A1 (en) * | 2001-06-20 | 2003-01-03 | Röhm GmbH & Co. KG | Method for producing moulded bodies comprising an electroconductive coating and moulded bodies having one such coating |
| WO2006000326A1 (en) * | 2004-06-24 | 2006-01-05 | Mitsubishi Polyester Film Gmbh | Film containing transparent metal oxide, method for the production thereof, and use thereof |
| JP2007128280A (en) * | 2005-11-04 | 2007-05-24 | Shin Etsu Polymer Co Ltd | Conductive sheet for coordinate input device, manufacturing method thereof and coordinate input device |
| US7534487B2 (en) * | 2004-03-25 | 2009-05-19 | Mitsubishi Polyester Film Gmbh | Transparent, electrically conductive, coated polyester film, process for its production, and its use |
| CN101783199A (en) * | 2009-01-19 | 2010-07-21 | 日立麦克赛尔株式会社 | Transparent conductive film and method of producing the same |
| US7958834B2 (en) | 2007-11-19 | 2011-06-14 | Brother Kogyo Kabushiki Kaisha | Template for use in circular sewing |
-
1990
- 1990-07-13 JP JP18676790A patent/JPH0473809A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003000808A1 (en) * | 2001-06-20 | 2003-01-03 | Röhm GmbH & Co. KG | Method for producing moulded bodies comprising an electroconductive coating and moulded bodies having one such coating |
| US7534487B2 (en) * | 2004-03-25 | 2009-05-19 | Mitsubishi Polyester Film Gmbh | Transparent, electrically conductive, coated polyester film, process for its production, and its use |
| WO2006000326A1 (en) * | 2004-06-24 | 2006-01-05 | Mitsubishi Polyester Film Gmbh | Film containing transparent metal oxide, method for the production thereof, and use thereof |
| JP2007128280A (en) * | 2005-11-04 | 2007-05-24 | Shin Etsu Polymer Co Ltd | Conductive sheet for coordinate input device, manufacturing method thereof and coordinate input device |
| US7958834B2 (en) | 2007-11-19 | 2011-06-14 | Brother Kogyo Kabushiki Kaisha | Template for use in circular sewing |
| CN101783199A (en) * | 2009-01-19 | 2010-07-21 | 日立麦克赛尔株式会社 | Transparent conductive film and method of producing the same |
| JP2010165641A (en) * | 2009-01-19 | 2010-07-29 | Hitachi Maxell Ltd | Transparent conductive film and method of manufacturing the same |
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