JPH053582B2 - - Google Patents

Info

Publication number
JPH053582B2
JPH053582B2 JP1645785A JP1645785A JPH053582B2 JP H053582 B2 JPH053582 B2 JP H053582B2 JP 1645785 A JP1645785 A JP 1645785A JP 1645785 A JP1645785 A JP 1645785A JP H053582 B2 JPH053582 B2 JP H053582B2
Authority
JP
Japan
Prior art keywords
methylstyrene
copolymer
present
polymer
resists
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1645785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61176922A (ja
Inventor
Tadashi Asanuma
Junko Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP1645785A priority Critical patent/JPS61176922A/ja
Publication of JPS61176922A publication Critical patent/JPS61176922A/ja
Publication of JPH053582B2 publication Critical patent/JPH053582B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP1645785A 1985-02-01 1985-02-01 レジスト用α−メチルスチレン共重合体 Granted JPS61176922A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1645785A JPS61176922A (ja) 1985-02-01 1985-02-01 レジスト用α−メチルスチレン共重合体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1645785A JPS61176922A (ja) 1985-02-01 1985-02-01 レジスト用α−メチルスチレン共重合体

Publications (2)

Publication Number Publication Date
JPS61176922A JPS61176922A (ja) 1986-08-08
JPH053582B2 true JPH053582B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-01-18

Family

ID=11916778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1645785A Granted JPS61176922A (ja) 1985-02-01 1985-02-01 レジスト用α−メチルスチレン共重合体

Country Status (1)

Country Link
JP (1) JPS61176922A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110505A (ja) * 2000-09-27 2002-04-12 Mitsubishi Electric Corp 露光方法、露光装置、ｘ線マスク、レジスト、半導体装置および微細構造体

Also Published As

Publication number Publication date
JPS61176922A (ja) 1986-08-08

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