JPH05340996A - Burn-in method for bare chip ic - Google Patents

Burn-in method for bare chip ic

Info

Publication number
JPH05340996A
JPH05340996A JP4144123A JP14412392A JPH05340996A JP H05340996 A JPH05340996 A JP H05340996A JP 4144123 A JP4144123 A JP 4144123A JP 14412392 A JP14412392 A JP 14412392A JP H05340996 A JPH05340996 A JP H05340996A
Authority
JP
Japan
Prior art keywords
bare chip
burn
electrode pad
electrode pads
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4144123A
Other languages
Japanese (ja)
Inventor
Hideo Aoki
秀夫 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP4144123A priority Critical patent/JPH05340996A/en
Publication of JPH05340996A publication Critical patent/JPH05340996A/en
Withdrawn legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To achieve a method for carrying out required burn-in conveniently on a bare chip IC. CONSTITUTION:Electrode pads 1a of a bare chip IC 1 to be tested and corresponding electrode pads 2a on a testing substrate 2 are arranged through an anisotropic rubber layer 6, while being connected electrically, on the testing substrate 2 provided with the electrode pads 2a corresponding with the electrode pads 1a on the bare chip IC 1 to be tested, and then required burn-in is carried out. In other words, pressure is applied selectively between the electrode pads 1a on the bare chip IC 1 to be tested and the corresponding electrode pads 2a on the testing substrate 2 in order to provide a conductive region 6a at a corresponding position on the interposed anisotropic rubber layer 6, and then burn-in is carried out while connecting the electrode pads 1a, 2a electrically.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はベアチップICのバ―ン
イン方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a burn-in method for bare chip ICs.

【0002】[0002]

【従来の技術】周知のようにIC素子は、たとえばSi
ウェハ―に多数個形成され、これを切断・分離して、い
わゆるベアチップ化されている。しかして、この種のI
C素子については、前記ウェハ―状態で一応の電気的な
評価(初期評価)を行い、選択された合格品のベアチッ
プICをパッケ―ジングもしくはアッセンブリした後、
バ―ンインテストが行われている。つまり、初期評価で
良品と不良品とに分け良品と判定されたIC素子は、ベ
アチップ化後そのまま良品として実用に供されている。
2. Description of the Related Art As is well known, an IC element is, for example, Si.
A large number of wafers are formed on a wafer, which are cut and separated to form a so-called bare chip. And this kind of I
For the C element, a tentative electrical evaluation (initial evaluation) is performed in the wafer state, and after packaging or assembling a selected acceptable bare chip IC,
Burn-in test is being conducted. That is, an IC element which is determined as a non-defective product by being classified into a non-defective product and a defective product in the initial evaluation is put into practical use as a non-defective product as it is after being formed into a bare chip.

【0003】[0003]

【発明が解決しようとする課題】しかし、上記のごとく
ベアチップICをパッケ―ジングもしくはアッセンブリ
した後、バ―ンインテストを行う方式には、次のような
不都合がある。すなわち、前記パッケ―ジングもしくは
アッセンブリした後、予測寿命試験としての加速試験
(通常、一定の高温下で規格電圧の 1.2倍程度の電圧を
印加)で不良品と判定されると、パッケ―ジングもしく
はアッセンブリした製品を不良品として破棄処分するこ
とになる。つまり、結果的には寿命試験で不良品となる
ベアチップICをパッケ―ジングもしくはアッセンブリ
したことになり、製造コスト面でも多くの損失を招来す
る。しかも、前記パッケ―ジングもしくはアッセンブリ
後の加速試験には、比較的大きいスペ―スや比較的大型
のバ―ンイン炉を要するので設備面でも問題がある。
However, the method of performing the burn-in test after packaging or assembling the bare chip IC as described above has the following disadvantages. That is, if the product is judged to be defective in the accelerated test (usually, a voltage 1.2 times higher than the standard voltage is applied at a constant high temperature) as a predictive life test after packaging or assembling, the packaging or The assembled product will be discarded as a defective product. That is, as a result, a bare chip IC, which becomes a defective product in the life test, is packaged or assembled, which causes a large loss in terms of manufacturing cost. Moreover, the accelerated test after packaging or assembly requires a comparatively large space and a comparatively large burn-in furnace, which causes a problem in terms of equipment.

【0004】さらに、ベアチップICを直接実装するC
OB(チップ・オン・ボ―ド)法やフリップチップ方式
においては、ベアチップICの微細な入出力端子(電極
パッド)を、試験用基板上の対応する電極パッドと電気
的に接続・配置する有効な方式がないため、バ―ンイン
テストを省略して実装される場合もあり、実装製品の信
頼性に問題があった。つまり、試験用基板上の対応する
電極パッドに、ベアチップICの微細な電極パッドを接
続するため、たとえば印刷方式などにより、微小な導電
球を両電極パッド面間に、選択的に供給・配置すること
も試みられているが、前記微小導電球の選択的な供給・
配置が煩雑ないし困難で、実用的といえないので、バ―
ンインテストを省略している場合がしばしばあり、実装
製品の信頼性低下および結果的にはコストアップを招来
することになる。
Further, C for directly mounting the bare chip IC
In the OB (chip on board) method and the flip chip method, it is effective to electrically connect and arrange the minute input / output terminals (electrode pads) of the bare chip IC with the corresponding electrode pads on the test substrate. Since there is no such method, the burn-in test may be omitted in some cases, and there was a problem in the reliability of the mounted product. That is, in order to connect the fine electrode pad of the bare chip IC to the corresponding electrode pad on the test substrate, a fine conductive ball is selectively supplied / placed between the electrode pad surfaces by a printing method or the like. It has also been attempted to selectively supply the minute conductive spheres.
Since the arrangement is complicated or difficult and not practical,
Often, the in-line test is omitted, resulting in reduced reliability of the mounted product and eventually cost increase.

【0005】本発明は上記事情に対処してなされたもの
で、ベアチップICの形で簡易に所要のバ―ンインを行
い得る方法の提供を目的とする。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a method capable of easily performing a required burn-in in the form of a bare chip IC.

【0006】[0006]

【課題を解決するための手段】本発明に係るベアチップ
ICのバ―ンイン方法は、被試験用ベアチップICの電
極パッドに対応する電極パッド群を備えた試験用基板上
に、前記被試験用ベアチップICの電極パッドと試験用
基板上の対応する電極パッドとを異方導電性ゴム層を介
して電気的に接続・配置し、所要のバ―ンインを行うこ
とを特徴とする。
A bare chip IC burn-in method according to the present invention is a bare chip IC to be tested on a test substrate having an electrode pad group corresponding to the electrode pads of the bare chip IC to be tested. It is characterized in that the electrode pad of the IC and the corresponding electrode pad on the test substrate are electrically connected and arranged through the anisotropic conductive rubber layer to perform the required burn-in.

【0007】[0007]

【作用】上記本発明によれば、被試験用ベアチップIC
の電極パッドと試験基板面の対応する電極パッドとの間
に、異方導電性ゴム層を介在させて、たとえば被試験用
ベアチップICを加圧することにより、被試験用ベアチ
ップICの電極パッド面に対接する異方導電性ゴム層領
域を、選択的に導電性化させて電気的な接続を行い得
る。すなわち、試験基板面上に、異方導電性ゴム層およ
び被試験用ベアチップICを順次位置合わせ・積層配置
し、被試験用ベアチップICを加圧すると電極パッド面
に対接する異方導電性ゴム層領域が選択的に導電性化し
て、両電極パッド間の電気的な接続が容易かつ確実に行
われ、高信頼性で所要のバ―ンインを達成し得る。
According to the present invention, the bare chip IC under test is tested.
An anisotropic conductive rubber layer is interposed between the corresponding electrode pad on the surface of the test substrate and the corresponding electrode pad on the surface of the test substrate. The anisotropically conductive rubber layer regions that are in contact with each other can be selectively made conductive to make electrical connection. That is, the anisotropic conductive rubber layer and the bare chip IC under test are sequentially aligned and stacked on the surface of the test substrate, and the anisotropic conductive rubber layer contacts the electrode pad surface when the bare chip IC under test is pressed. The region is selectively made conductive so that the electrical connection between both electrode pads is easily and surely achieved, and the required burn-in can be achieved with high reliability.

【0008】[0008]

【実施例】以下本発明の実施態様を模式的に示す図1を
参照して本発明の実施例を説明する。
EXAMPLES Examples of the present invention will be described below with reference to FIG. 1 which schematically shows the embodiments of the present invention.

【0009】図1は実施態様を断面的に示したもので、
先ず次のように構成された試験用基板2を用意する。す
なわち、被試験用ベアチップIC1の電極パッド1aに対
応する電極パッド2a、これらの電極パッド2aに接続する
配線2b、および外部接続端子2cを具備して成る試験用基
板2を用意する。そして、この試験用基板2を、ロック
機構3aおよびヒンジ機構3bを備えたベース基板3上に配
置する。なお、前記ヒンジ機構3bに一端が回動自在に支
持され、他端側がロック機構3aでロックされる構成を採
って、ベース基板3に所要のスペーサ4を介して押さえ
板5が対向・配置されている。ここで、スペーサ4の高
さは、被試験用ベアチップIC1の厚さ、電極パッド1
a,2aの高さ、異方導電性ゴム層6の厚さ(導電性化に
要する変形量)などによって選択・設定される。
FIG. 1 is a sectional view of an embodiment,
First, a test substrate 2 configured as follows is prepared. That is, a test substrate 2 including an electrode pad 2a corresponding to the electrode pad 1a of the bare chip IC1 to be tested, a wiring 2b connected to these electrode pads 2a, and an external connection terminal 2c is prepared. Then, the test substrate 2 is placed on the base substrate 3 including the lock mechanism 3a and the hinge mechanism 3b. It should be noted that one end is rotatably supported by the hinge mechanism 3b, and the other end side is locked by the lock mechanism 3a, and the pressing plate 5 is arranged to face the base substrate 3 via a required spacer 4. ing. Here, the height of the spacer 4 is the thickness of the bare chip IC 1 under test, the electrode pad 1
It is selected and set according to the heights of a and 2a, the thickness of the anisotropic conductive rubber layer 6 (the amount of deformation required for making it conductive), and the like.

【0010】前記ベース基板3に配置された試験用基板
2面上に、厚さ 0.1〜 0.3mm程度の異方導電性ゴム層
(たとえば異方導電性シリコーンゴム層)6を、マウン
タにより位置合わせ・配置した後、その異方導電性シリ
コーンゴム層6上に、予め用意しておいた被試験用ベア
チップIC1を、マウンタにより位置合わせ・配置す
る。ここで用いる異方導電性ゴム層は、いわゆる加圧に
よりその加圧箇所(領域)が、選択的に導電性化するも
のであれば、前記異方導電性シリコーンゴム以外のもの
でもよい。そして、前記導電性を付与する導電体として
は、被試験用ベアチップIC1の電極パッド1aや、試験
用基板2の電極パッド2aないし配線2bなどと同種の金属
粉末が好ましい。
An anisotropic conductive rubber layer (for example, anisotropic conductive silicone rubber layer) 6 having a thickness of about 0.1 to 0.3 mm is positioned on the surface of the test substrate 2 arranged on the base substrate 3 by a mounter. After the placement, the bare chip IC1 to be tested prepared in advance is positioned and placed on the anisotropic conductive silicone rubber layer 6 by the mounter. The anisotropically conductive rubber layer used here may be a material other than the anisotropically conductive silicone rubber as long as its pressed portion (area) is selectively made conductive by so-called pressing. As the conductor for imparting conductivity, the same kind of metal powder as the electrode pad 1a of the bare chip IC1 to be tested, the electrode pad 2a or the wiring 2b of the test substrate 2 and the like is preferable.

【0011】次いで、前記スペーサ4によって試験用基
板2と押さえ板5との間隔を制御しながら、ロック機構
3aおよびヒンジ機構3bの駆動によって、適切な加圧力で
被試験用ベアチップIC1を加圧する。この加圧によっ
て、被試験用ベアチップIC1の電極パッド1a面と試験
用基板2の電極パッド2a面との間に介在する異方導電性
シリコーンゴム層6の、両電極パッド1a,2a面に接触す
る領域面間が選択的に導電性領域6aを成し、両電極パッ
ド1a,2a間を容易かつ確実に電気的に接続する。この状
態で、所定の電流・信号を試験用基板2の外部接続端子
2cに接続させたコネクタ7を介して電極パッド2aに流し
ながら、または所要の電圧をコネクタ7を介して試験用
基板2の電極パッド 2a に印加しながら所定温度に保持
された高温炉内に放置し、前記被試験用ベアチップIC
1について所要の加速試験(バ―ンイン)を行う。この
バーンインにおいて、前記異方導電性シリコーンゴム層
6の所定領域6aが、選択的に導電性化化するため、被試
験用ベアチップIC1の電極パッド1aと試験用基板2上
の対応する電極パッド 2a との間は十分かつ、確実に所
要の電気的な接続が達成されて、所要のバーンインテス
トが行なわれる。
Next, while controlling the distance between the test substrate 2 and the pressing plate 5 by the spacer 4, a lock mechanism is used.
By driving the hinge mechanism 3b and the hinge mechanism 3a, the bare chip IC1 under test is pressed with an appropriate pressure. Due to this pressurization, the anisotropic conductive silicone rubber layer 6 interposed between the electrode pad 1a surface of the bare chip IC1 under test and the electrode pad 2a surface of the test substrate 2 comes into contact with both electrode pad 1a, 2a surfaces. A conductive area 6a is selectively formed between the area surfaces to be formed, and the electrode pads 1a and 2a are electrically connected easily and reliably. In this state, a predetermined current / signal is applied to the external connection terminal of the test board 2.
Left in a high-temperature furnace maintained at a predetermined temperature while flowing to the electrode pad 2a via the connector 7 connected to 2c or applying a required voltage to the electrode pad 2a of the test substrate 2 via the connector 7. And the bare chip IC under test
Perform the required accelerated test (burn-in) for 1. In this burn-in, the predetermined region 6a of the anisotropic conductive silicone rubber layer 6 is selectively made conductive, so that the electrode pad 1a of the bare chip IC1 to be tested and the corresponding electrode pad 2a on the test substrate 2 are made. , And the required electrical connection is achieved reliably and reliably, and the required burn-in test is performed.

【0012】[0012]

【発明の効果】上記のごとく本発明に係るバ―ンイン方
法によれば、ベアチップICについて所要の加速寿命試
験を容易に、かつ確実に行い得る。つまり、パッケ―ジ
ングに先立って、またはフリップチップ実装やチップ・
オン・ボ―ド実装などに先立って、裸のままのベアチッ
プICについて、煩雑な操作や特別な微細加工などを要
せずに、所要のバ―ンイン(加速寿命テスト)を行い、
寿命特性の良否を判定・識別できる。したがって、ベア
チップICをパッケ―ジングした後もしくは実装ないし
アッセンブリした後、交換補修を要する事態の発生など
全面的に回避することが可能となる。しかも、前記所要
のバ―ンイン(加速寿命テスト)において、被試験用ベ
アチップIC1の電極パッド1aと試験用基板2上の対応
する電極パッド 2a との電気的な接続に、異方導電性ゴ
ム層を用いているため、両電極パッド間などの直接接触
の回避により、損傷・不良発生も防止されるとともに、
両電極パッド間における金属拡散も低減ないし防止され
ることに伴い電極パッドの劣化もなくなる。かくして、
本発明に係るベアチップICのバ―ンイン方法は、この
種のベアチップICをパッケ―ジングなどして実用に供
する上で多くの利点をもたらすものといえる。
As described above, according to the burn-in method of the present invention, the required accelerated life test can be easily and surely performed on the bare chip IC. That is, prior to packaging, or flip-chip mounting or chip
Prior to on-board mounting, bare chip ICs that have been left bare are subjected to the required burn-in (accelerated life test) without the need for complicated operations or special microfabrication.
The quality of life characteristics can be judged and identified. Therefore, after packaging the bare chip IC or after mounting or assembling, occurrence of a situation requiring replacement and repair can be completely avoided. Moreover, in the required burn-in (accelerated life test), an anisotropic conductive rubber layer is used for electrical connection between the electrode pad 1a of the bare chip IC1 to be tested and the corresponding electrode pad 2a on the test substrate 2. Since it uses, the damage and defects can be prevented by avoiding direct contact between both electrode pads.
As the metal diffusion between both electrode pads is reduced or prevented, deterioration of the electrode pads also disappears. Thus,
It can be said that the burn-in method for a bare chip IC according to the present invention brings many advantages in putting this type of bare chip IC into practical use by packaging it.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るベアチップICのバ―ンイン方法
の実施態様例を模式的に示す断面図。
FIG. 1 is a sectional view schematically showing an embodiment of a burn-in method for a bare chip IC according to the present invention.

【符号の説明】[Explanation of symbols]

1…被試験用ベアチップIC 1a…被試験用ベアチッ
プICの電極パッド 2…試験用基板 2a…試験用基板の電極パッド 2b
…接続配線 2c…外部接続端子 3…ベース基板
3a…ロック機構 3b…ヒンジ機構 4…スペーサ
5…押さえ板 6…異方導電性ゴム層 6a…異
方導電性ゴム層の導電性化領域 7…コネクタ
1 ... Bare chip IC for test 1a ... Electrode pad of bare chip IC for test 2 ... Test substrate 2a ... Electrode pad 2b of test substrate
Connection wiring 2c External connection terminal 3 Base board
3a ... Lock mechanism 3b ... Hinge mechanism 4 ... Spacer 5 ... Press plate 6 ... Anisotropic conductive rubber layer 6a ... Conductive area of anisotropic conductive rubber layer 7 ... Connector

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 被試験用ベアチップICの電極パッドに
対応する電極パッド群を備えた試験用基板上に、前記被
試験用ベアチップICの電極パッドと試験用基板上の対
応する電極パッドとを異方導電性ゴム層を介して電気的
に接続・配置し、所要のバ―ンインを行うことを特徴と
するベアチップICのバ―ンイン方法。
1. An electrode pad of the bare chip IC to be tested and a corresponding electrode pad on the test substrate are different on a test substrate having an electrode pad group corresponding to the electrode pad of the bare chip IC to be tested. A burn-in method for a bare chip IC, characterized in that the burn-in is performed by electrically connecting and arranging via a conductive rubber layer and performing a required burn-in.
JP4144123A 1992-06-04 1992-06-04 Burn-in method for bare chip ic Withdrawn JPH05340996A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4144123A JPH05340996A (en) 1992-06-04 1992-06-04 Burn-in method for bare chip ic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4144123A JPH05340996A (en) 1992-06-04 1992-06-04 Burn-in method for bare chip ic

Publications (1)

Publication Number Publication Date
JPH05340996A true JPH05340996A (en) 1993-12-24

Family

ID=15354734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4144123A Withdrawn JPH05340996A (en) 1992-06-04 1992-06-04 Burn-in method for bare chip ic

Country Status (1)

Country Link
JP (1) JPH05340996A (en)

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Effective date: 19990831