JPH05335146A - Magnetic material film and magnetic head using the same - Google Patents
Magnetic material film and magnetic head using the sameInfo
- Publication number
- JPH05335146A JPH05335146A JP4195060A JP19506092A JPH05335146A JP H05335146 A JPH05335146 A JP H05335146A JP 4195060 A JP4195060 A JP 4195060A JP 19506092 A JP19506092 A JP 19506092A JP H05335146 A JPH05335146 A JP H05335146A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- main
- magnetic film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は磁性体膜に係り、特に磁
気ヘッド用のコア材料として、高密度磁気記録に好適な
性能を発揮する磁性体膜およびそれを用いた磁気ヘッド
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic film, and more particularly, to a magnetic film that exhibits suitable performance for high density magnetic recording as a core material for a magnetic head and a magnetic head using the same.
【０００２】[0002]
【従来の技術】磁気記録の高密度化の進歩はめざまし
く、メタルテープの出現によって従来の酸化物テープの
保磁力Ｈcが６００〜７００ Ｏe（エルステッド）に対
して１２００〜１６００ Ｏeのものが容易に得られるよ
うになった。このような高保磁力記録媒体に十分に記録
するためには、高飽和磁束密度を有する磁気ヘッド用の
磁性材料が要求される。高飽和磁束密度を有する磁性材
料はＦe、Ｃo、Ｎiを主成分とした合金で、１００００
ガウス以上のものを容易に得ることができる。従来、磁
気ヘッド等に金属磁性材料を用いる場合は高周波領域に
おける渦電流損を抑えるために磁性体膜を電気的に絶縁
して積層した構造がとられている。その製造方法はスパ
ッタリング、蒸着、イオンプレーティングやメッキ等
の、いわゆる薄膜形成技術によって行われる。図１は、
従来の積層磁性体膜の構造を示す図である。すなわち、
非磁性基板１３上に磁性体層１０と非磁性絶縁層１１
を交互に順次形成し、積層体を得るものが公知である
（例えば、特開昭４９−１２７１９５号公報）。ここ
で、各磁性体層１０の厚さは数ミクロン、非磁性体層１
１はその１／１０程度の厚さを有している。しかし、結
晶質の金属磁性体膜１２（例えば、Ｆeを主成分とし、
Ｓi、Ａｌ、Ｔi等との合金膜、あるいはＮi−Ｆe合金
膜）は、図１に示すような柱状構造を示すため、柱状構
造の境界で磁化を動き難くし、保磁力を大きくしている
ことがある。そのため、保磁力の大きい磁性体膜で磁気
ヘッドを作製した場合、外部から大きな磁界が与えられ
たときに磁気ヘッドコアが帯磁してしまうという問題が
あった。この問題を解決するために、サブミクロン厚さ
の磁性体層と１００Å程度の厚さの非磁性体層とを交互
に積層することによって保磁力を低減させる方法がある
（例えば、特開昭５２−１１２７９７号公報）。例え
ば、スパッタリングによって得られた約１μｍ厚さのＦ
e−６.５％Ｓi合金の単層膜では数エルステッドの保磁
力を有するが、上記の方法によれば保磁力を１ Ｏe程度
にまで低減させることができる。しかし、最も低い保磁
力を示すものでも０.８ Ｏe程度が限度であった。その
ため、磁気ヘッド材料としては満足できるものではなか
った。2. Description of the Related Art The progress of high density magnetic recording has been remarkable, and with the advent of metal tapes, coercive force Hc of conventional oxide tapes of 1200 to 1600 Oe can be easily obtained compared with 600 to 700 Oe (Oersted). I got it. In order to sufficiently record on such a high coercive force recording medium, a magnetic material for a magnetic head having a high saturation magnetic flux density is required. The magnetic material having a high saturation magnetic flux density is an alloy containing Fe, Co, and Ni as main components, and is 10,000.
You can easily get more than Gauss. Conventionally, when a metal magnetic material is used for a magnetic head or the like, a structure in which magnetic films are electrically insulated and laminated is used to suppress eddy current loss in a high frequency region. The manufacturing method is performed by a so-called thin film forming technique such as sputtering, vapor deposition, ion plating or plating. Figure 1
It is a figure which shows the structure of the conventional laminated magnetic film. That is,
The magnetic layer 10 and the nonmagnetic insulating layer 11 are formed on the nonmagnetic substrate 13.
It is publicly known that a laminate is obtained by alternately and sequentially forming (for example, JP-A-49-127195). Here, the thickness of each magnetic layer 10 is several microns, and the nonmagnetic layer 1
1 has a thickness of about 1/10 thereof. However, the crystalline metal magnetic film 12 (for example, Fe as a main component,
Since an alloy film with Si, Al, Ti, etc., or a Ni—Fe alloy film) has a columnar structure as shown in FIG. 1, the magnetization is hard to move at the boundary of the columnar structure and the coercive force is increased. Sometimes. Therefore, when a magnetic head is made of a magnetic film having a large coercive force, there is a problem that the magnetic head core is magnetized when a large magnetic field is applied from the outside. In order to solve this problem, there is a method of reducing the coercive force by alternately stacking a submicron-thick magnetic layer and a non-magnetic layer having a thickness of about 100Å (for example, JP-A-52). -1112797). For example, about 1 μm thick F obtained by sputtering
A single layer film of e-6.5% Si alloy has a coercive force of several oersteds, but the above method can reduce the coercive force to about 1 Oe. However, even the one showing the lowest coercive force was limited to about 0.8 Oe. Therefore, it was not satisfactory as a magnetic head material.
【０００３】[0003]
【発明が解決しようとする課題】本発明の目的は、上述
した従来技術における問題点を解消し、高保磁力記録媒
体に対して優れた記録再生特性を示す磁気ヘッド用の磁
性体膜を提供することにあり、特に主磁性体膜が高飽和
磁束密度を有する強磁性体膜からなり、低い保磁力で、
高透磁率を有する積層磁性体膜と、それを用いた磁気ヘ
ッドを提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems in the prior art and provide a magnetic film for a magnetic head exhibiting excellent recording / reproducing characteristics for a high coercive force recording medium. Especially, the main magnetic film is made of a ferromagnetic film having a high saturation magnetic flux density, and has a low coercive force.
It is to provide a laminated magnetic film having a high magnetic permeability and a magnetic head using the same.
【０００４】[0004]
【課題を解決するための手段】本発明は、従来の方法で
形成された磁性体層と非磁性体層とを交互に積層した積
層磁性体膜では得られない低保磁力の磁性体膜を、１０
０００ガウス以上の高飽和磁束密度を有する結晶質のＦ
ｅ、ＣｏまたはＮｉを主成分とする金属磁性体を用いて
容易に得られるようにしたものである。本発明者らは、
上記の積層磁性体膜は、従来の積層磁性体膜において磁
性体層間に設ける中間膜としての非磁性体層の代りに、
前記磁性体層と異なる磁性体層を中間膜として用いるこ
とによって達成できることを見出した。具体的に言え
ば、本発明の磁性体膜は、厚さ０.５μｍ以下の主磁性
体膜と、厚さ１００Å以下の中間磁性体膜を積層して形
成されるものである。The present invention provides a magnetic substance film having a low coercive force which cannot be obtained by a laminated magnetic substance film formed by alternately laminating magnetic substance layers and non-magnetic substance layers formed by a conventional method. 10,
Crystalline F with high saturation magnetic flux density of 000 Gauss or more
The metal magnetic material containing e, Co or Ni as a main component is used to easily obtain the magnetic material. We have
The above-mentioned laminated magnetic film is a conventional laminated magnetic film, instead of the non-magnetic layer as an intermediate film provided between the magnetic layers,
It has been found that this can be achieved by using a magnetic layer different from the magnetic layer as the intermediate film. Specifically, the magnetic film of the present invention is formed by laminating a main magnetic film having a thickness of 0.5 μm or less and an intermediate magnetic film having a thickness of 100 Å or less.
【０００５】図２は、本発明の磁性体膜の構造の一例を
示す断面図である。 図において、２０は高飽和磁束密
度を有する、例えば鉄を主成分とする磁性合金からなる
主磁性体膜、２１は鉄以外のＣo、Ｎi等を主成分とする
磁性合金からなる中間磁性体膜、２３は非磁性基板であ
る。この中間磁性体膜２１は、厚さ１００Å以下のごく
薄い層からなり、主磁性体膜２０は柱状晶構造が磁気的
に大きな悪影響を与えない程度の膜厚となるように形成
し、中間磁性体層２１によって主磁性体膜２０の柱状晶
構造２２が細分化されている。このような構造にすれ
ば、柱状組織に沿って膜面に垂直に向っていた磁化や、
柱状組織の境界で動き難くなっていた磁化が、膜面内に
向き、膜面内を小さな磁界で動くようになるので、保磁
力が小さくなる。また、中間磁性体膜２１が各主磁性体
膜２０の磁気的連結を補い、磁化の動きを助けているも
のと思われる。FIG. 2 is a sectional view showing an example of the structure of the magnetic film of the present invention. In the figure, 20 is a main magnetic film having a high saturation magnetic flux density, for example, a magnetic alloy mainly composed of iron, and 21 is an intermediate magnetic film made of a magnetic alloy mainly composed of Co, Ni, etc. other than iron. , 23 are non-magnetic substrates. The intermediate magnetic film 21 is made of a very thin layer having a thickness of 100 Å or less, and the main magnetic film 20 is formed so that the columnar crystal structure does not have a great magnetic effect. The columnar crystal structure 22 of the main magnetic film 20 is subdivided by the body layer 21. With such a structure, the magnetization that was perpendicular to the film surface along the columnar structure,
The magnetization, which was difficult to move at the boundary of the columnar structure, is directed to the film surface and moves in the film surface with a small magnetic field, so that the coercive force becomes small. Further, it seems that the intermediate magnetic film 21 supplements the magnetic coupling of the main magnetic films 20 and assists the movement of magnetization.
【０００６】本発明は、Ｆeを主成分とする高飽和磁束
密度（１００００ガウス以上）を有する複数の主磁性体
膜と該主磁性体膜間に介在するＦe以外の金属元素を主
成分とする中間磁性体膜からなる積層構造を有する磁性
体膜である。本発明の主磁性体膜は、例えばＦeを主成
分とし、Ｓi、Ａｌ、Ｔiの中から選ばれる少なくとも１
種、または２種以上を含み、磁歪が小さく、透磁率の高
い、高飽和磁束密度を有する強磁性合金膜からなるもの
である。なお、主磁性体膜の組成は、耐食性、耐摩耗
性、磁歪制御等の目的で、Ｃr、Ｐt等の他の添加物を１
０％以下の量で添加してもよい。ただし、１２００ Ｏe
以上の高保磁力の磁気記録媒体に適用する磁気ヘッド材
料として用いる場合には、主磁性体膜の飽和磁束密度を
１００００ガウス以上に確保することが望ましい。一
方、中間磁性体膜は、ＣoあるいはＮi、もしくは、これ
らの元素を主体とした合金からなっていることが望まし
い。また、Ｆeは単体で用いると、その柱状組織が主磁
性体膜の柱状組織とつながってしまうため、あまり良い
結果は得られないが、ＮiまたはＣoを主体にした合金、
例えば、Ｃo80Ｆe20合金を用いれば本発明の効果が得ら
れる。本発明は、主磁性体膜が単層膜において、柱状
（または針状）構造を示すような結晶質の強磁性体膜に
おいて有効である。特に、単層膜において数エルステッ
ドの保磁力を有する磁性体膜に本発明を適用すれば、保
磁力を約１桁低減することが可能である。本発明におけ
る主磁性体膜の各層の厚みは０.５μｍ以下、好適には
０.０５〜０.３μｍであることが望ましい。０.０５μ
ｍ以下では中間磁性体膜の磁性が勝り、０.５μｍ以上
では柱状組織の影響が強く、保磁力が大きくなってしま
う。また、中間磁性体膜の各層の厚みは１００Å以下が
好ましく、より好ましい範囲は１０〜８０Å、最も好適
には１５〜７０Åとすることが望ましい。１０Å以下で
は、主磁性体膜の柱状組織を完全に遮断することが困難
となり、８０Å以上では中間磁性体膜の磁性が強調され
保磁力が大きくなってしまう。上記のような主磁性体膜
と、中間磁性体膜とを積層した本発明の積層磁性体膜
は、従来の主磁性体膜と非磁性絶縁物よりなる中間膜で
構成した積層磁性体膜に比べ、保磁力の低い磁性体膜を
得ることができる。さらに、前記の主磁性体膜と中間磁
性体膜とからなる適当な厚さの単位積層磁性体膜を、Ｓ
iＯ2、Ａｌ2Ｏ3膜のような電気絶縁性のある非磁性体膜
を介して所定枚数積層することによって、高周波特性の
優れた本発明の膜厚の大きい積層磁性体膜を得ることが
できる。本発明の積層磁性体膜は、スパッタリング、蒸
着、イオンプレーティングやメッキ等のいわゆる薄膜形
成技術によって形成することができる。In the present invention, a plurality of main magnetic films having a high saturation magnetic flux density (10,000 Gauss or more) containing Fe as a main component and a metal element other than Fe interposed between the main magnetic films are main components. The magnetic film has a laminated structure made of an intermediate magnetic film. The main magnetic film of the present invention contains, for example, Fe as a main component and at least one selected from Si, Al, and Ti.
It is composed of a ferromagnetic alloy film containing two or more kinds, a small magnetostriction, a high magnetic permeability, and a high saturation magnetic flux density. The composition of the main magnetic film contains 1% of other additives such as Cr and Pt for the purpose of corrosion resistance, wear resistance, magnetostriction control, and the like.
It may be added in an amount of 0% or less. However, 1200 Oe
When used as a magnetic head material applied to the above high coercive force magnetic recording medium, it is desirable to secure the saturation magnetic flux density of the main magnetic film at 10,000 Gauss or more. On the other hand, the intermediate magnetic film is preferably made of Co or Ni, or an alloy mainly containing these elements. Further, when Fe is used alone, the columnar structure is connected to the columnar structure of the main magnetic film, so that a good result cannot be obtained, but an alloy mainly composed of Ni or Co,
For example, the effect of the present invention can be obtained by using a Co 80 Fe 20 alloy. INDUSTRIAL APPLICABILITY The present invention is effective for a crystalline ferromagnetic material film having a columnar (or acicular) structure in which the main magnetic film is a single-layer film. In particular, if the present invention is applied to a magnetic film having a coercive force of several oersteds in a single layer film, the coercive force can be reduced by about one digit. The thickness of each layer of the main magnetic film of the present invention is 0.5 μm or less, preferably 0.05 to 0.3 μm. 0.05μ
When it is less than m, the magnetism of the intermediate magnetic film is superior, and when it is more than 0.5 μm, the influence of the columnar structure is strong and the coercive force becomes large. The thickness of each layer of the intermediate magnetic film is preferably 100 Å or less, more preferably 10 to 80 Å, most preferably 15 to 70 Å. If it is 10 Å or less, it is difficult to completely block the columnar structure of the main magnetic film, and if it is 80 Å or more, the magnetism of the intermediate magnetic film is emphasized and the coercive force becomes large. The laminated magnetic material film of the present invention in which the main magnetic material film and the intermediate magnetic material film as described above are laminated is a laminated magnetic material film composed of a conventional main magnetic material film and an intermediate film made of a non-magnetic insulator. In comparison, a magnetic film having a low coercive force can be obtained. Furthermore, a unit laminated magnetic film having an appropriate thickness composed of the main magnetic film and the intermediate magnetic film is
By laminating a predetermined number of layers through a non-magnetic material film having an electrical insulation property such as an iO 2 film or an Al 2 O 3 film, it is possible to obtain the laminated magnetic material film of the present invention having excellent high frequency characteristics. it can. The laminated magnetic film of the present invention can be formed by a so-called thin film forming technique such as sputtering, vapor deposition, ion plating or plating.
【０００７】[0007]
【実施例】以下、本発明の実施例を挙げ、図面を用いて
さらに詳細に説明する。磁性体膜の形成は、図３に示す
ようなＲＦスパッタリング装置を用いた。真空容器３０
内には３つの独立した対向電極を有し、電極３１、３
２、３３はターゲット電極（陰極）で、電極３１にはＦ
eを主成分とした主磁性体膜を形成するための合金ター
ゲットが配置され、電極３２には中間磁性体膜を形成す
るためのＦe以外のＣo、Ｎi等の磁性金属を主体とする
磁性ターゲットが配置され、電極３３には中間非磁性体
層を形成するためのＳiＯ2、Ａｌ2Ｏ3、Ａｌ、Ｍo等の
絶縁体あるいは非磁性金属からなるターゲットが配置さ
れる。一方、電極３４、３５、３６は、それぞれ前記タ
ーゲット電極３１、３２、３３の直下に設けた試料電極
（陽極）で、試料３７は目的に応じてそれぞれの試料電
極上に移動できるようになっている。また、スパッタリ
ング時には電磁石３８、３８′によって、 試料３７の
面内に磁界が印加されるようになっている。なお、放電
はアルゴンガス中で行われ、ガス導入管３９から真空容
器３０内に入る。４０は、容器３０の排気孔、４１は、
電極切り換え器である。Embodiments of the present invention will be described below in more detail with reference to the drawings. The magnetic film was formed using an RF sputtering device as shown in FIG. Vacuum container 30
It has three independent counter electrodes inside, and electrodes 31, 3
Reference numerals 2 and 33 are target electrodes (cathodes), and electrode 31 has F
An alloy target for forming a main magnetic film mainly containing e is arranged, and a magnetic target mainly for a magnetic metal such as Co or Ni other than Fe for forming an intermediate magnetic film is arranged on the electrode 32. A target made of an insulator such as SiO 2 , Al 2 O 3 , Al, Mo or a nonmagnetic metal for forming an intermediate nonmagnetic layer is disposed on the electrode 33. On the other hand, the electrodes 34, 35 and 36 are sample electrodes (anodes) provided directly below the target electrodes 31, 32 and 33, respectively, and the sample 37 can be moved onto the respective sample electrodes according to the purpose. There is. A magnetic field is applied to the surface of the sample 37 by the electromagnets 38 and 38 'during sputtering. The discharge is performed in argon gas and enters the vacuum container 30 through the gas introduction pipe 39. 40 is the exhaust hole of the container 30, 41 is
It is an electrode switching device.
【０００８】＜実施例１＞まず、主磁性体膜としての高
飽和磁束密度を有するＦe−６.５％Ｓi（重量％）膜の
形成について述べる。比較的好条件でスパッタリングす
るために選ばれた諸条件は以下のようである。 ターゲット組成…Ｆe−６.５％Ｓi 高周波電力密度…２.８Ｗ／ｃｍ2 アルゴン圧力……２×１０~2Ｔorr 基板温度 ………３５０℃ 電極間距離 ……２５ｍｍ 膜厚 ……………１.５μｍ 得られた単層膜の磁気特性は、保磁力Ｈc；２.５ Ｏe、
５ＭＨｚにおける透磁率μ；４００、飽和磁束密度Ｂ
s；１８５００ガウスであった。なお、スパッタリング
中には磁性体膜の面内に一方向の磁界（約１０ Ｏe）が
印加されている。試料の磁気特性は磁性体膜の磁化困難
軸方向で測定した結果を示す。また、基板としてはガラ
ス基板を用いた。スパッタリングに際しての諸条件は、
ターゲット組成をＦe−６.５％ＳiとするとＦe側に組成
がずれる傾向にあり、堆積された膜の組成は５〜６％Ｓ
iとなる。高周波電力密度は２Ｗ／ｃｍ2以上にした方
が、保磁力Ｈcが低減する傾向にある。基板温度は膜の
歪応力を緩和するために３００℃以上にするのが好まし
い。電極間距離は短い方が保磁力が低くなる傾向にあ
り、スパッタリング中の放電の安定性を加速すると、２
０〜３０ｍｍ程度が好ましい。また、アルゴンガス導入
前の真空容器の真空度は酸素や不純物の残存が磁性体膜
の磁気特性に影響するので、１０~7Ｔorr以上の高真空
にすることが好ましい。一方、中間膜の形成は、一般に
ＲＦスパッタリングで行われている以下の条件で行っ
た。Example 1 First, the formation of a Fe-6.5% Si (weight%) film having a high saturation magnetic flux density as a main magnetic film will be described. The conditions selected for sputtering under relatively favorable conditions are as follows. Target composition ... Fe-6.5% Si RF power density ... 2.8W / cm 2 argon pressure ...... 2 × 10 ~ 2 Torr substrate temperature ......... 350 ℃ electrode distance ...... 25mm thickness ............... The magnetic properties of the obtained single layer film are as follows: coercive force Hc; 2.5 Oe;
Permeability at 5 MHz μ; 400, saturation magnetic flux density B
s; 18500 gauss. A unidirectional magnetic field (about 10 Oe) is applied to the surface of the magnetic film during sputtering. The magnetic characteristics of the sample are the results measured in the hard axis direction of the magnetic film. A glass substrate was used as the substrate. The various conditions for sputtering are
When the target composition is Fe-6.5% Si, the composition tends to shift to the Fe side, and the composition of the deposited film is 5-6% S.
i. The coercive force Hc tends to decrease when the high frequency power density is set to 2 W / cm 2 or more. The substrate temperature is preferably 300 ° C. or higher in order to relax the strain stress of the film. The shorter the distance between the electrodes, the lower the coercive force tends to be. Therefore, if the stability of discharge during sputtering is accelerated,
About 0 to 30 mm is preferable. The degree of vacuum of the vacuum container before the introduction of the argon gas is preferably set to a high vacuum of 10 to 7 Torr or more because the residual oxygen and impurities affect the magnetic properties of the magnetic film. On the other hand, the formation of the intermediate film was performed under the following conditions generally performed by RF sputtering.
【０００９】ターゲット材料…Ｃo、Ｎi、Ｃo80Ｆe20お
よびＳiＯ2、Ａｌ2Ｏ3、Ａｌ、Ｍo、Ｆe 高周波電力密度…０.５Ｗ／ｃｍ2 アルゴン圧力……５×１０~3Ｔorr 基板温度 ………２５０℃ 電極間距離 ……５０ｍｍ 膜厚 ……………３０Å 中間膜にＣo、Ｎiからなる磁性体膜との比較のために、
Ｆe膜および従来用いられているＳiＯ2、Ａｌ2Ｏ3から
なる絶縁体膜ならびにＡｌ、Ｍo等の非磁性金属膜を用
いたものについても実験した。積層磁性体膜において、
主磁性体膜の一層の膜厚を０.１μｍとし、中間膜の膜
厚を３０Åとし、主磁性体膜を１５層積層して全膜厚を
約１.５μｍとした。図４は上記のようにして得たＦe−
６.５％Ｓi膜を主磁性体膜とし、種々の中間膜を用いた
積層磁性体膜の磁気特性を示す図表である。同図表中の
磁気特性は、それぞれスパッタリングしたままの膜の平
均値を示す。また、図表中、（イ）はＦe−６.５％Ｓi
合金の単層膜の特性、（ロ）〜（ホ）は従来の非磁性材
を中間膜とした積層磁性体膜の特性、（ヘ）はＦeを中
間膜とした本発明と類似する積層磁性体膜の特性、
（ト）〜（リ）はＦe以外の磁性金属を主体とした磁性
金属を中間膜とした本発明の磁性体膜の特性である。同
図表の結果によれば、Ｃo、ＮiおよびＣo80Ｆe20を中間
膜とした本発明の磁性体膜は、Ｆeおよび従来の非磁性
体膜を中間膜とした磁性体膜に比べて保磁力が非常に小
さいことが分かる。すなわち、保磁力が０.５ Ｏe以下
となり、実用的な透磁率を得ることができた。Target material: Co, Ni, Co 80 Fe 20 and SiO 2 , Al 2 O 3 , Al, Mo, Fe High frequency power density: 0.5 W / cm 2 Argon pressure: 5 × 10 to 3 Torr substrate temperature ...... 250 ° C Distance between electrodes ...... 50 mm Film thickness ………… 30 Å For comparison with the magnetic film made of Co and Ni as the intermediate film,
Experiments were also conducted on the Fe film, the conventionally used insulator film made of SiO 2 , Al 2 O 3 and the non-magnetic metal film such as Al and Mo. In the laminated magnetic film,
The thickness of one layer of the main magnetic film was 0.1 μm, the thickness of the intermediate film was 30 Å, and 15 layers of the main magnetic film were laminated so that the total thickness was about 1.5 μm. FIG. 4 shows the Fe− obtained as described above.
6 is a chart showing magnetic characteristics of a laminated magnetic film using various intermediate films with a 6.5% Si film as a main magnetic film. The magnetic characteristics in the figure show the average values of the as-sputtered films. In the chart, (a) is Fe-6.5% Si.
Characteristics of a single layer film of alloy, (b) to (e) are characteristics of a laminated magnetic film using a conventional non-magnetic material as an intermediate film, and (f) is a laminated magnetic film similar to the present invention using Fe as an intermediate film. Characteristics of the body membrane,
(G) to (d) are characteristics of the magnetic film of the present invention in which a magnetic metal mainly composed of a magnetic metal other than Fe is used as an intermediate film. According to the results shown in the figure, the magnetic film of the present invention having Co, Ni and Co 80 Fe 20 as an intermediate film has a coercive force higher than that of a magnetic film having Fe and a conventional non-magnetic film as an intermediate film. It turns out that is very small. That is, the coercive force was 0.5 Oe or less, and a practical magnetic permeability could be obtained.
【００１０】本発明において、主磁性体膜の一層の膜厚
は０.０５〜０.５μｍの範囲で、積層磁性体膜の磁気特
性に悪影響を与えない程度に柱状組織を微細化すること
ができる。図５はＦe−６.５％Ｓi膜を主磁性体膜と
し、Ｃoを中間膜とした時の中間膜の膜厚と保磁力Ｈcお
よび５ＭＨzでの透磁率μの関係を示したものである。
この積層磁性体膜は、１５層の主磁性体膜と、それらの
間に中間膜を設けたものである。この図によると中間膜
の膜厚は１０〜８０Åの範囲で保磁力が約０.８ Ｏe、
１５〜７０Åの範囲で保磁力が０.５ Ｏe以下となり、
４０Å付近で最小となる。一方、透磁率はこの付近で最
大となる。中間膜の膜厚の影響は、材質によって若干異
なるものの、ほぼ同等の範囲で好適な磁気特性が得られ
る。なお、１０Å以下の膜厚では、主磁性体膜の組織を
遮断することが困難となり、柱状組織が成長してしまう
ため本発明の効果は低減する。一方、８０Å以上にする
と、中間膜の磁気的性質が強調され、保磁力が大きくな
ってしまう。中間膜の膜厚は直接測定することが困難で
あるため、数ミクロンの膜厚に被着したときのスパッタ
リング速度から算出して時間で管理した。本実施例で
は、スパッタリング中に磁性体膜の面内に一方向の磁界
が印加されており、磁界印加方向に磁化容易軸が形成さ
れる。図６に示すように周波数を変えて磁界印加方向
（磁化容易軸方向）で測定した透磁率（曲線５１）よ
り、印加磁界と垂直方向（磁化困難軸方向）で測定した
透磁率（曲線５２）の方が高くなっている。したがっ
て、本発明の積層磁性体膜を磁気ヘッドの作製に用いる
場合に、磁化困難軸方向を磁気ヘッドの磁気回路に対し
て有利な方向に配置することができる。In the present invention, the thickness of one layer of the main magnetic film is in the range of 0.05 to 0.5 μm, and the columnar structure can be made fine to such an extent that the magnetic characteristics of the laminated magnetic film are not adversely affected. it can. FIG. 5 shows the relationship between the film thickness of the intermediate film and the coercive force Hc and the magnetic permeability μ at 5 MHz when the Fe-6.5% Si film is the main magnetic film and Co is the intermediate film. ..
This laminated magnetic film is formed by providing 15 layers of main magnetic films and an intermediate film between them. According to this figure, the coercive force is about 0.8 Oe when the thickness of the intermediate film is in the range of 10 to 80Å,
Coercive force is less than 0.5 Oe in the range of 15 to 70Å,
The minimum is around 40Å. On the other hand, the magnetic permeability becomes maximum around this. Although the influence of the film thickness of the intermediate film is slightly different depending on the material, suitable magnetic properties can be obtained in a substantially equivalent range. If the film thickness is 10 Å or less, it becomes difficult to block the structure of the main magnetic film and the columnar structure grows, so that the effect of the present invention is reduced. On the other hand, when it is set to 80 Å or more, the magnetic property of the intermediate film is emphasized and the coercive force becomes large. Since it is difficult to directly measure the film thickness of the intermediate film, the film thickness was calculated from the sputtering rate when the film was deposited to a film thickness of several microns and was controlled by time. In this embodiment, a magnetic field in one direction is applied to the surface of the magnetic film during sputtering, and an easy axis of magnetization is formed in the magnetic field application direction. As shown in FIG. 6, magnetic permeability (curve 51) measured in the direction perpendicular to the applied magnetic field (hard axis of magnetization) from the magnetic permeability (curve 51) measured in the direction of magnetic field application (direction of easy magnetization axis) as shown in FIG. Is higher. Therefore, when the laminated magnetic film of the present invention is used for manufacturing a magnetic head, the hard axis direction can be arranged in an advantageous direction with respect to the magnetic circuit of the magnetic head.
【００１１】＜実施例２＞本実施例は、本発明の積層磁
性体膜により得られる保磁力について、従来の積層構造
の磁性体膜と比較して示すものである。例えば、Ｆe−
９.５％Ｓi−６％Ａｌ合金をターゲットとし、以下の条
件でスパッタリングして得られた積層磁性体膜は、０.
２ Ｏeの保磁力が恒常的に得られる。なお、従来型の積
層構造（例えば、中間膜にＳiＯ2膜を用いた場合）で得
られた保磁力は０.５ Ｏeであった。 ターゲット組成…Ｆe−１０％Ｓi−６.５％Ａｌ 高周波電力密度…２.５Ｗ／ｃｍ2 アルゴン圧力……１×１０~3Ｔorr 基板温度 ………３５０℃ 電極間距離 ……３０ｍｍ Ｆe−Ｓi−Ａｌ合金の膜厚…０.２μｍ 中間膜 …………Ｃo Ｃoの膜厚 ……３０Å 合金膜の層数……８ 中間膜の層数……７ 保磁力Ｈc ……０.２ Ｏe 飽和磁束密度……９０００ガウス 本発明に用いる主磁性体膜はＦeを主成分とする磁性体
膜であってもよいが、高飽和磁束密度を有し、ほぼ磁歪
が零付近であるＦｅ以外のＣｏまたはＮｉを主成分とす
る合金磁性体であれば十分な効果が生じる。特に、薄膜
形成技術によって形成された、膜体が膜面に垂直あるい
は傾斜した柱状構造を示す磁性体膜において保磁力が低
減され、磁気ヘッド材料として好適な積層磁性体膜を得
ることができる。<Embodiment 2> In this embodiment, the coercive force obtained by the laminated magnetic film of the present invention is shown in comparison with a conventional laminated magnetic film. For example, Fe-
A laminated magnetic film obtained by sputtering a 9.5% Si-6% Al alloy as a target under the following conditions was 0.1.
A coercive force of 2 Oe is constantly obtained. The coercive force obtained by the conventional laminated structure (for example, when the SiO 2 film is used as the intermediate film) was 0.5 Oe. Target composition: Fe-10% Si-6.5% Al High frequency power density: 2.5 W / cm 2 Argon pressure: 1 × 10 ~ 3 Torr Substrate temperature: 350 ° C Distance between electrodes: 30 mm Fe-Si -Al alloy film thickness: 0.2 μm Intermediate film: Co Co film thickness: 30Å Number of alloy film layers: 8 Number of intermediate film layers: 7 Coercive force Hc: 0.2 Oe Saturation Magnetic flux density: 9000 gauss The main magnetic film used in the present invention may be a magnetic film containing Fe as a main component, but Co other than Fe, which has a high saturation magnetic flux density and has a magnetostriction near zero, is used. Alternatively, a sufficient effect can be obtained with an alloy magnetic body containing Ni as a main component. In particular, the coercive force is reduced in the magnetic film formed by the thin film forming technique and having a columnar structure in which the film body is perpendicular or inclined to the film surface, and a laminated magnetic film suitable as a magnetic head material can be obtained.
【００１２】＜実施例３＞図７は、膜構造に関する本発
明の実施例を示すものであって、厚膜積層磁性体膜の構
造を示すものである。非磁性基板２３の上に、主磁性体
膜２０と中間磁性体膜２１を交互に積層した厚さ数ミク
ロンの単位積層膜ごとに、非磁性絶縁物よりなる中間膜
２４を形成してなる積層磁性体膜である。このように構
成した積層磁性体膜は、高周波領域での透磁率の劣化が
なく優れた磁気ヘッドコア材となる。このような積層磁
性体膜はトラック幅が１０μｍ以上のビデオヘッド材料
として用いられる。<Embodiment 3> FIG. 7 shows an embodiment of the present invention relating to a film structure, and shows the structure of a thick film laminated magnetic film. A laminate in which an intermediate film 24 made of a nonmagnetic insulator is formed on a non-magnetic substrate 23 for each unit laminated film having a thickness of several microns in which a main magnetic film 20 and an intermediate magnetic film 21 are alternately laminated. It is a magnetic film. The laminated magnetic film having such a structure is an excellent magnetic head core material without deterioration of magnetic permeability in a high frequency region. Such a laminated magnetic film is used as a video head material having a track width of 10 μm or more.
【００１３】＜実施例４＞以下に、本発明の磁気ヘッド
の実施例について説明する。本発明の磁気ヘッドは、磁
気ギャップを形成するコア部材と、コア部材に磁気的に
結合されるコイルを有する磁気ヘッドで、コア部材を２
種以上の磁性体膜を積層して形成したものである。この
ようにコアを形成することで、磁性体膜同士の磁気的な
つながりを保ったまま、磁性体膜の結晶構造を制御する
ことができる。この結果、単層では保磁力が大きい磁性
体膜であっても、磁気ヘッドコアとした時の保磁力は小
さく、透磁率は大きくなり、優れた特性の磁気ヘッドを
構成できる。図８には、上述の積層磁性体膜を非磁性基
板上に形成してから、所定の形状に加工し、ギャップ形
成面が互いに対向するように突き合せて作った磁気ヘッ
ドの一例を示す。図において、６１は、磁性体膜が形成
された非磁性基板、６２は積層磁性体膜、６３は、積層
磁性体膜６２を保護するためのもう一方の非磁性基板で
あって、他方の基板または磁性体膜にガラス等で接着さ
れている。６４はギャップ、６５はコイル巻線窓であ
る。この例では、積層磁性体膜６２の厚さがトラック幅
となる。図９は、上述した本発明の積層磁性体層を用い
た薄膜磁気ヘッドの構造の一例を示すものである。図９
（イ）は磁気ヘッドコア断面図、図９（ロ）は上面図で
ある。図において、７１は非磁性基板、７２は下部磁性
体膜、７３は上部磁性体膜、７４は導体コイル、７５は
作動ギャップである。この例では、磁性体膜は数ミクロ
ン以下の膜厚でよいので、図７に示すような非磁性絶縁
物よりなる中間膜２４を省くことができる。図１０は、
図９に示す磁気ヘッドの作動ギャップ近傍の磁性体膜の
主要部拡大図である。図１０（イ）は下部磁性体膜７
２、上部磁性体膜７３を、柱状構造の大きい単層膜で形
成した場合の一例を示す。この場合、曲り部７６、７７
のよううな、曲りをもつ部分で柱状組織が乱れ、その部
分でひび割れが生じたり、また腐食が起る原因となる。
また、曲りの部分での応力集中によってクラックを生じ
る。図１０（ロ）に示す本発明による積層磁性体膜によ
れば、曲り部７６、７７で結晶組織が細かく、均一にし
て連続的で応力集中も少ないためクラックを生じること
もなく、耐食性の良い磁気回路を形成することができ
る。<Embodiment 4> An embodiment of the magnetic head of the present invention will be described below. The magnetic head of the present invention is a magnetic head having a core member forming a magnetic gap and a coil magnetically coupled to the core member.
It is formed by laminating magnetic films of at least one kind. By forming the core in this way, the crystal structure of the magnetic film can be controlled while maintaining the magnetic connection between the magnetic films. As a result, even a magnetic film having a large coercive force in a single layer has a small coercive force when used as a magnetic head core and a large magnetic permeability, and a magnetic head having excellent characteristics can be constructed. FIG. 8 shows an example of a magnetic head formed by forming the above-mentioned laminated magnetic film on a non-magnetic substrate, processing it into a predetermined shape, and butting them so that the gap forming surfaces face each other. In the figure, 61 is a non-magnetic substrate on which a magnetic film is formed, 62 is a laminated magnetic film, 63 is another non-magnetic substrate for protecting the laminated magnetic film 62, and the other substrate. Alternatively, it is adhered to the magnetic film with glass or the like. 64 is a gap and 65 is a coil winding window. In this example, the thickness of the laminated magnetic film 62 is the track width. FIG. 9 shows an example of the structure of a thin film magnetic head using the above-mentioned laminated magnetic layer of the present invention. Figure 9
9A is a cross-sectional view of the magnetic head core, and FIG. 9B is a top view. In the figure, 71 is a non-magnetic substrate, 72 is a lower magnetic film, 73 is an upper magnetic film, 74 is a conductor coil, and 75 is an operating gap. In this example, since the magnetic film may have a film thickness of several microns or less, the intermediate film 24 made of a nonmagnetic insulator as shown in FIG. 7 can be omitted. Figure 10
FIG. 10 is an enlarged view of a main part of a magnetic film near the working gap of the magnetic head shown in FIG. 9. FIG. 10A shows the lower magnetic film 7.
2. An example of the case where the upper magnetic film 73 is formed of a single layer film having a large columnar structure is shown. In this case, the bent portions 76 and 77
The columnar structure is disturbed in a curved portion such as the above, which causes cracking or corrosion in that portion.
In addition, cracks are generated due to stress concentration in the bent portion. According to the laminated magnetic film of the present invention shown in FIG. 10B, since the bent portions 76 and 77 have fine crystal structures and are uniform and continuous, and stress concentration is small, cracks do not occur and good corrosion resistance is obtained. A magnetic circuit can be formed.
【００１４】[0014]
【発明の効果】以上詳細に説明したごとく、本発明の厚
さ０.５μｍ以下のＦeを主成分とする結晶質の磁性合金
からなる主磁性体膜と、厚さ１００Å以下の中間磁性体
膜とを積層した磁性体膜、あるいは主磁性体膜と中間磁
性体膜を所定数積層した単位積層磁性体膜と、非磁性絶
縁物よりなる中間膜を積層して構成した磁性体膜は、低
い保磁力で、高透磁率が得られる。また、単位積層磁性
体膜を電気絶縁性の非磁性絶縁物よりなる中間膜を介し
て複数積層することにより高周波特性に優れた膜厚の大
きい積層磁性体膜が得られる。したがって、本発明の磁
性体膜を磁気ヘッドのコア材として用いることにより、
特に高保磁力記録媒体に対して優れた記録再生特性を示
す高密度磁気記録再生用ヘッドを実現することができ
る。As described above in detail, the main magnetic film of the present invention is made of a crystalline magnetic alloy containing Fe as a main component and having a thickness of 0.5 μm or less, and an intermediate magnetic film having a thickness of 100 Å or less. The magnetic film formed by laminating a magnetic substance film formed by laminating a main magnetic substance film and a predetermined number of intermediate magnetic substance films, and a magnetic substance film formed by laminating an intermediate film made of a non-magnetic insulator are low. High coercivity can be obtained with coercive force. Further, by laminating a plurality of unit laminated magnetic films with an intermediate film made of an electrically insulating non-magnetic insulator interposed therebetween, it is possible to obtain a laminated magnetic film having a large thickness and excellent in high frequency characteristics. Therefore, by using the magnetic film of the present invention as a core material of a magnetic head,
In particular, it is possible to realize a high-density magnetic recording / reproducing head that exhibits excellent recording / reproducing characteristics for a high coercive force recording medium.
【図１】従来の積層磁性体膜の断面構成を示す模式図。FIG. 1 is a schematic diagram showing a cross-sectional structure of a conventional laminated magnetic film.
【図２】本発明の積層磁性体膜の断面構成の一例を示す
模式図。FIG. 2 is a schematic diagram showing an example of a cross-sectional structure of a laminated magnetic film of the present invention.
【図３】本発明の実施例において磁性体膜の形成に用い
たスパッタリング装置の構成を示す模式図。FIG. 3 is a schematic diagram showing a configuration of a sputtering apparatus used for forming a magnetic film in an example of the present invention.
【図４】本発明の実施例１で例示したＦe−６.５％Ｓi
合金膜を主磁性体膜とし、種々の中間膜を用いた積層磁
性体膜の磁気特性を示す図表。FIG. 4 is Fe-6.5% Si exemplified in Example 1 of the present invention.
The chart which shows the magnetic characteristic of the laminated magnetic film which used the alloy film as the main magnetic film and various intermediate films.
【図５】本発明の実施例１で例示したＦe−６.５％Ｓi
合金膜を主磁性体膜とし、Ｃoを中間膜とした本発明の
積層磁性体膜の磁気特性を示すグラフ。FIG. 5: Fe-6.5% Si exemplified in Example 1 of the present invention.
6 is a graph showing the magnetic characteristics of the laminated magnetic film of the present invention in which the alloy film is the main magnetic film and Co is the intermediate film.
【図６】本発明の実施例１で例示したＦe−６.５％Ｓi
合金膜を主磁性体膜とし、Ｃoを中間膜とした本発明の
積層磁性体膜の磁気特性を示すグラフ。FIG. 6 is Fe-6.5% Si exemplified in Example 1 of the present invention.
6 is a graph showing the magnetic characteristics of the laminated magnetic film of the present invention in which the alloy film is the main magnetic film and Co is the intermediate film.
【図７】本発明の実施例３で例示した本発明の他の積層
磁性体膜の断面構成を示す模式図。FIG. 7 is a schematic view showing a cross-sectional structure of another laminated magnetic film of the present invention exemplified in Example 3 of the present invention.
【図８】本発明の実施例４で例示した積層磁性体膜を用
いて作製した磁気ヘッドの構成を示す模式図。FIG. 8 is a schematic diagram showing the configuration of a magnetic head manufactured using the laminated magnetic film illustrated in Example 4 of the present invention.
【図９】本発明の実施例４で例示した薄膜磁気ヘッドの
構造を示す模式図。FIG. 9 is a schematic diagram showing the structure of the thin film magnetic head exemplified in Embodiment 4 of the present invention.
【図１０】本発明の実施例４で例示した磁気ヘッドの作
動ギャップ近傍の磁性体膜の構成を示す拡大図。FIG. 10 is an enlarged view showing the configuration of a magnetic film in the vicinity of the working gap of the magnetic head exemplified in Embodiment 4 of the present invention.
１０…磁性体層 １１…非磁性絶縁層 １２…金属磁性体膜 １３…非磁性基板 ２０…主磁性体膜 ２１…中間磁性体膜 ２２…柱状晶構造 ２３…非磁性基板 ２４…非磁性絶縁物よりなる中間膜 ３０…真空容器 ３１、３２、３３…電極（ターゲット…陰極） ３４、３５、３６…電極（試料電極…陽極） ３７…試料 ３８、３８′…電磁石 ３９…ガス導入管 ４０…排気口 ４１…電極切り換え器 ５１…磁化容易軸方向の透磁率 ５２…磁化困難軸方向の透磁率 ６１…非磁性基板 ６２…積層磁性体膜 ６３…非磁性基板 ６４…ギャップ ６５…コイル巻線窓 ７１…非磁性基板 ７２…下部磁性体膜 ７３…上部磁性体膜 ７４…導体コイル ７５…作動ギャップ ７６、７７…曲り部 10 ... Magnetic layer 11 ... Nonmagnetic insulating layer 12 ... Metal magnetic film 13 ... Nonmagnetic substrate 20 ... Main magnetic film 21 ... Intermediate magnetic film 22 ... Columnar crystal structure 23 ... Nonmagnetic substrate 24 ... Nonmagnetic insulator Intermediate film 30 ... Vacuum container 31, 32, 33 ... Electrode (target ... Cathode) 34, 35, 36 ... Electrode (sample electrode ... Anode) 37 ... Sample 38, 38 '... Electromagnet 39 ... Gas introduction tube 40 ... Exhaust Port 41 ... Electrode switch 51 ... Magnetic permeability in easy magnetization axis direction 52 ... Magnetic permeability in hard magnetization axis direction 61 ... Non-magnetic substrate 62 ... Laminated magnetic film 63 ... Non-magnetic substrate 64 ... Gap 65 ... Coil winding window 71 ... Non-magnetic substrate 72 ... Lower magnetic film 73 ... Upper magnetic film 74 ... Conductor coil 75 ... Operating gap 76, 77 ... Bent portion
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大友 茂一 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 山下 武夫 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 工藤 實弘 東京都国分寺市東恋ケ窪１丁目280番地 株式会社日立製作所中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shigekazu Otomo 1-280 Higashi Koikeku, Kokubunji, Tokyo Inside Hitachi Central Research Laboratory (72) Inventor Takeo Yamashita 1-280 Higashi Koikeku, Kokubunji, Tokyo Hitachi Ltd. Central Research Laboratory (72) Inventor, Masahiro Kudo 1-280, Higashi Koigokubo, Kokubunji, Tokyo Metropolitan Research Center, Hitachi, Ltd.
Claims (32)
５μｍ以下のＦeを主成分とする結晶質の磁性合金から
なる主磁性体膜と、該主磁性体膜とは組成の異なる磁性
合金からなる厚さ１００Å以下の中間磁性体膜とを少な
くとも積層してなることを特徴とする磁性体膜。1. A main part constituting a magnetic film has a thickness of 0.1.
At least a main magnetic film made of a crystalline magnetic alloy having Fe as a main component of 5 μm or less and an intermediate magnetic film having a thickness of 100 Å or less made of a magnetic alloy having a composition different from that of the main magnetic film are laminated. A magnetic film characterized by being formed.
して構成した単位積層磁性体膜と、非磁性絶縁物よりな
る中間膜とを積層して構成したことを特徴とする請求項
１記載の磁性体膜。2. A unit laminated magnetic film formed by laminating the main magnetic film and an intermediate magnetic film, and an intermediate film made of a non-magnetic insulator are laminated. 1. The magnetic film according to 1.
状または針状の結晶構造を有することを特徴とする請求
項１または請求項２記載の磁性体膜。3. The magnetic film according to claim 1, wherein the main magnetic film has a columnar or acicular crystal structure when formed into a single-layer film.
Ｏeの保磁力を有することを特徴とする請求項１ないし
請求項３のいずれか１項記載の磁性体膜。4. The magnetic film according to claim 1, wherein the main magnetic film has a coercive force of several Oe when formed into a single-layer film.
００００ガウス以上の飽和磁束密度を有することを特徴
とする請求項１ないし請求項５のいずれか１項記載の磁
性体膜。5. The main magnetic film is 1 when it is a single layer film.
The magnetic film according to any one of claims 1 to 5, which has a saturation magnetic flux density of 0000 Gauss or more.
i、Ａｌ、Ｔiのうちから選ばれる少なくとも１種の元素
を含む磁性合金からなることを特徴とする請求項１ない
し請求項５のいずれか１項記載の磁性体膜。6. The main magnetic film contains Fe as a main component and S
The magnetic film according to claim 1, which is made of a magnetic alloy containing at least one element selected from i, Al, and Ti.
重量％以下の範囲で含有する磁性合金であることを特徴
とする請求項１ないし請求項６のいずれか１項記載の磁
性体膜。7. The main magnetic film contains 10 elements other than Fe.
The magnetic film according to any one of claims 1 to 6, which is a magnetic alloy contained in a range of not more than wt%.
る磁性合金であることを特徴とする請求項１ないし請求
項７のいずれか１項記載の磁性体膜。8. The magnetic film according to claim 1, wherein the main magnetic film is a magnetic alloy containing Cr or Pt.
分とする磁性合金からなることを特徴とする請求項１な
いし請求項８のいずれか１項記載の磁性体膜。9. The magnetic film according to claim 1, wherein the intermediate magnetic film is made of a magnetic alloy containing Co or Ni as a main component.
〜０.３μｍの範囲であることを特徴とする請求項１な
いし請求項９のいずれか１項記載の磁性体膜。10. The thickness of a single layer of the main magnetic film is 0.05.
The magnetic film according to any one of claims 1 to 9, wherein the thickness is in the range of from 0.3 to 0.3 µm.
８０Åの範囲であることを特徴とする請求項１ないし請
求項１０のいずれか１項記載の磁性体膜。11. A single layer of the intermediate magnetic film has a thickness of 10 to 10.
The magnetic film according to any one of claims 1 to 10, wherein the thickness is in the range of 80Å.
７０Åの範囲であることを特徴とする請求項１ないし請
求項１０のいずれか１項記載の磁性体膜。12. A single layer of the intermediate magnetic film has a thickness of 15 to 10.
The magnetic film according to any one of claims 1 to 10, which has a range of 70Å.
iＯ2、Ａｌ2Ｏ3、Ａｌ、Ｍoのうちから選ばれる少なく
とも１種の非磁性絶縁物からなることを特徴とする請求
項１ないし請求項１２のいずれか１項記載の磁性体膜。13. The intermediate film made of the non-magnetic insulator is S
The magnetic film according to any one of claims 1 to 12, which is made of at least one kind of non-magnetic insulator selected from iO 2 , Al 2 O 3 , Al and Mo.
方向の磁界を印加して形成したものであることを特徴と
する請求項１ないし請求項１３のいずれか１項記載の磁
性体膜。14. The magnetic film according to claim 1, wherein the magnetic film is formed by applying a magnetic field in a predetermined direction to the film surface. Body membrane.
てなることを特徴とする請求項１ないし請求項１４のい
ずれか１項記載の磁性体膜。15. The magnetic film according to claim 1, wherein the magnetic film is formed on a non-magnetic substrate.
と、該コア部材に磁気的に結合されるコイル手段を有す
る磁気ヘッドにおいて、上記コア部材は、厚さ０.５μ
ｍ以下のＦeを主成分とする結晶質の磁性合金からなる
主磁性体膜と、該主磁性体膜とは組成の異なる磁性合金
からなる厚さ１００Å以下の中間磁性体膜を積層して構
成した磁性体膜、もしくは前記主磁性体膜と中間磁性体
膜とを積層して構成される単位積層磁性体膜と、非磁性
絶縁物よりなる中間膜とを積層して構成した磁性体膜に
より構成したことを特徴とする磁気ヘッド。16. A magnetic head having a magnetic core member forming a magnetic gap and coil means magnetically coupled to the core member, wherein the core member has a thickness of 0.5 μm.
A structure in which a main magnetic film made of a crystalline magnetic alloy containing Fe as the main component and having a thickness of 100 m or less and an intermediate magnetic film having a thickness of 100 Å or less made of a magnetic alloy having a composition different from that of the main magnetic film are laminated. Or a unit laminated magnetic film formed by laminating the main magnetic film and the intermediate magnetic film, and a magnetic film formed by laminating an intermediate film made of a non-magnetic insulator. A magnetic head characterized by being configured.
下の主磁性体膜と、厚さ１０〜８０Åの中間磁性体膜と
を積層して構成したことを特徴とする請求項１６記載の
磁気ヘッド。17. The magnetic core member is formed by laminating a main magnetic film having a thickness of 0.5 μm or less and an intermediate magnetic film having a thickness of 10 to 80 Å. Magnetic head.
中間磁性体膜を積層して構成した単位積層磁性体膜と、
非磁性絶縁物よりなる中間膜とを積層して構成した磁性
体膜からなることを特徴とする請求項１６または請求項
１７記載の磁気ヘッド。18. A unit laminated magnetic film formed by laminating a main magnetic film and an intermediate magnetic film, said magnetic core member comprising:
18. The magnetic head according to claim 16 or 17, wherein the magnetic head is formed by laminating an intermediate film made of a non-magnetic insulator.
は、単層膜としたときに柱状または針状の結晶構造を有
することを特徴とする請求項１６ないし請求項１８のい
ずれか１項記載の磁気ヘッド。19. The main magnetic film forming the magnetic core member has a columnar or acicular crystal structure when formed into a single-layer film. A magnetic head according to the item.
は、単層膜としたときに数Ｏeの保磁力を有することを
特徴とする請求項１６ないし請求項１９のいずれか１項
記載の磁気ヘッド。20. The main magnetic film forming the magnetic core member has a coercive force of several Oe when formed into a single-layer film, according to any one of claims 16 to 19. Magnetic head.
は、単層膜としたときに１００００ガウス以上の飽和磁
束密度を有することを特徴とする請求項１６ないし請求
項２０のいずれか１項記載の磁気ヘッド。21. The main magnetic film forming the magnetic core member has a saturation magnetic flux density of 10,000 Gauss or more when formed as a single-layer film, according to any one of claims 16 to 20. A magnetic head according to the item.
は、Ｆeを主成分とする高飽和磁束密度を有する磁性合
金からなることを特徴とする請求項１６ないし請求項２
１のいずれか１項記載の磁気ヘッド。22. The main magnetic film forming the magnetic core member is made of a magnetic alloy containing Fe as a main component and having a high saturation magnetic flux density.
2. The magnetic head according to any one of 1.
密度を有するＦeを主成分とする磁性合金からなる主磁
性体膜は、Ｓi、Ａｌ、Ｔiのうちから選ばれる少なくと
も１種の元素を含む磁性合金であることを特徴とする請
求項１６ないし請求項２２のいずれか１項記載の磁気ヘ
ッド。23. The main magnetic film made of a magnetic alloy containing Fe as a main component and having a high saturation magnetic flux density, which constitutes the magnetic core member, contains at least one element selected from Si, Al and Ti. 23. The magnetic head according to claim 16, wherein the magnetic head contains a magnetic alloy.
分とする磁性合金からなる主磁性体膜は、Ｆe以外の元
素を１０重量％以下の範囲で含有する磁性合金であるこ
とを特徴とする請求項１６ないし請求項２３のいずれか
１項記載の磁気ヘッド。24. The main magnetic film made of a magnetic alloy containing Fe as a main component constituting the magnetic core member is a magnetic alloy containing an element other than Fe in an amount of 10% by weight or less. The magnetic head according to any one of claims 16 to 23.
は、ＣrまたはＰtを含有する磁性合金であることを特徴
とする請求項１６ないし請求項２４のいずれか１項記載
の磁気ヘッド。25. The magnetic head according to claim 16, wherein the main magnetic film forming the magnetic core member is a magnetic alloy containing Cr or Pt.
膜は、ＣoまたはＮiを主成分とする磁性合金からなるこ
とを特徴とする請求項１６ないし請求項２５のいずれか
１項記載の磁気ヘッド。26. The magnetic material according to claim 16, wherein the intermediate magnetic film forming the magnetic core member is made of a magnetic alloy containing Co or Ni as a main component. head.
の単層の厚さが０.０５〜０.３μｍの範囲であることを
特徴とする請求項１６ないし請求項２６のいずれか１項
記載の磁気ヘッド。27. The single layer of the main magnetic film forming the magnetic core member has a thickness in the range of 0.05 to 0.3 .mu.m. A magnetic head according to the item.
膜の単層の厚さが１０〜８０Åの範囲であることを特徴
とする請求項１６ないし請求項２７のいずれか１項記載
の磁気ヘッド。28. The magnetic according to claim 16, wherein the thickness of the single layer of the intermediate magnetic film forming the magnetic core member is in the range of 10 to 80Å. head.
膜の単層の厚さが１５〜７０Åの範囲であることを特徴
とする請求項１６ないし請求項２７のいずれか１項記載
の磁気ヘッド。29. The magnetic material according to claim 16, wherein a single layer of the intermediate magnetic film forming the magnetic core member has a thickness in the range of 15 to 70Å. head.
物よりなる中間膜は、ＳiＯ2、Ａｌ2Ｏ3、Ａｌ、Ｍoの
うちから選ばれる少なくとも１種の非磁性絶縁物からな
ることを特徴とする請求項１６ないし請求項２９のいず
れか１項記載の磁気ヘッド。30. The intermediate film made of a non-magnetic insulator forming the magnetic core member is made of at least one non-magnetic insulator selected from SiO 2 , Al 2 O 3 , Al and Mo. 30. The magnetic head according to claim 16, wherein the magnetic head is a magnetic head.
は、その膜面に対して所定方向の磁界を印加して形成し
たものであることを特徴とする請求項１６ないし請求項
３０のいずれか１項記載の磁気ヘッド。31. The magnetic material film forming the magnetic core member is formed by applying a magnetic field in a predetermined direction to the film surface. The magnetic head according to item 1.
は、非磁性基板上に形成したものであることを特徴とす
る請求項１６ないし請求項３１のいずれか１項記載の磁
気ヘッド。32. The magnetic head according to claim 16, wherein the magnetic film forming the magnetic core member is formed on a non-magnetic substrate.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57118509A JPS599905A (en) | 1982-07-09 | 1982-07-09 | Magnetic substance film |
| JP4195060A JPH05335146A (en) | 1982-07-09 | 1992-07-22 | Magnetic material film and magnetic head using the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57118509A JPS599905A (en) | 1982-07-09 | 1982-07-09 | Magnetic substance film |
| JP4195060A JPH05335146A (en) | 1982-07-09 | 1992-07-22 | Magnetic material film and magnetic head using the same |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57118509A Division JPS599905A (en) | 1982-07-09 | 1982-07-09 | Magnetic substance film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05335146A true JPH05335146A (en) | 1993-12-17 |
Family
ID=26456434
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57118509A Granted JPS599905A (en) | 1982-07-09 | 1982-07-09 | Magnetic substance film |
| JP4195060A Pending JPH05335146A (en) | 1982-07-09 | 1992-07-22 | Magnetic material film and magnetic head using the same |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57118509A Granted JPS599905A (en) | 1982-07-09 | 1982-07-09 | Magnetic substance film |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JPS599905A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001209910A (en) * | 2000-01-24 | 2001-08-03 | Matsushita Electric Ind Co Ltd | Thin film magnetic head and its manufacturing method |
| US7288333B2 (en) | 2002-09-12 | 2007-10-30 | Alps Electric Co., Ltd. | Magnetic film and thin film magnetic head using this magnetic film |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS599905A (en) * | 1982-07-09 | 1984-01-19 | Hitachi Ltd | Magnetic substance film |
| JPH061729B2 (en) * | 1983-01-17 | 1994-01-05 | 株式会社日立製作所 | Magnetic film and magnetic head using the same |
| JPS6159616A (en) * | 1984-08-29 | 1986-03-27 | Sharp Corp | Production of magnetic head core |
| JP2502965B2 (en) * | 1984-10-19 | 1996-05-29 | 株式会社日立製作所 | Thin film magnetic head |
| JP2533860B2 (en) * | 1986-09-24 | 1996-09-11 | 株式会社日立製作所 | Magnetic superlattice film and magnetic head using the same |
| JPH07114164B2 (en) * | 1987-08-04 | 1995-12-06 | 日本電信電話株式会社 | Magnetic artificial lattice film |
| JPH01239821A (en) * | 1988-03-18 | 1989-09-25 | Nippon Telegr & Teleph Corp <Ntt> | Magnetic multilayered film and manufacture thereof |
| KR100210579B1 (en) * | 1990-01-08 | 1999-07-15 | 가나이 쓰도무 | Ferromagnetic film and manufacturing method magnetic head in use therewith |
| JPH03263306A (en) * | 1990-02-02 | 1991-11-22 | Nec Corp | Magnetic film and magnetic head |
| US5132859A (en) * | 1990-08-23 | 1992-07-21 | International Business Machines Corporation | Thin film structures for magnetic recording heads |
| US5589221A (en) * | 1994-05-16 | 1996-12-31 | Matsushita Electric Industrial Co., Ltd. | Magnetic thin film, and method of manufacturing the same, and magnetic head |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118509A (en) * | 1981-01-14 | 1982-07-23 | Toyo Jozo Co Ltd | Novel preparation of high absorbability |
| JPS599905A (en) * | 1982-07-09 | 1984-01-19 | Hitachi Ltd | Magnetic substance film |
| JPH0519804A (en) * | 1991-07-09 | 1993-01-29 | Toshiba Corp | Automatic controller |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5669809A (en) * | 1979-11-09 | 1981-06-11 | Tdk Corp | Magnetic material and its manufacture |
-
1982
- 1982-07-09 JP JP57118509A patent/JPS599905A/en active Granted
-
1992
- 1992-07-22 JP JP4195060A patent/JPH05335146A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118509A (en) * | 1981-01-14 | 1982-07-23 | Toyo Jozo Co Ltd | Novel preparation of high absorbability |
| JPS599905A (en) * | 1982-07-09 | 1984-01-19 | Hitachi Ltd | Magnetic substance film |
| JPH0519804A (en) * | 1991-07-09 | 1993-01-29 | Toshiba Corp | Automatic controller |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001209910A (en) * | 2000-01-24 | 2001-08-03 | Matsushita Electric Ind Co Ltd | Thin film magnetic head and its manufacturing method |
| US7288333B2 (en) | 2002-09-12 | 2007-10-30 | Alps Electric Co., Ltd. | Magnetic film and thin film magnetic head using this magnetic film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS599905A (en) | 1984-01-19 |
| JPH0519804B2 (en) | 1993-03-17 |
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