JPH0532902B2 - - Google Patents

Info

Publication number
JPH0532902B2
JPH0532902B2 JP63157701A JP15770188A JPH0532902B2 JP H0532902 B2 JPH0532902 B2 JP H0532902B2 JP 63157701 A JP63157701 A JP 63157701A JP 15770188 A JP15770188 A JP 15770188A JP H0532902 B2 JPH0532902 B2 JP H0532902B2
Authority
JP
Japan
Prior art keywords
wafer
heating section
heating
vapor phase
phase growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63157701A
Other languages
English (en)
Japanese (ja)
Other versions
JPH027419A (ja
Inventor
Kichizo Komyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP15770188A priority Critical patent/JPH027419A/ja
Publication of JPH027419A publication Critical patent/JPH027419A/ja
Publication of JPH0532902B2 publication Critical patent/JPH0532902B2/ja
Granted legal-status Critical Current

Links

JP15770188A 1988-06-24 1988-06-24 気相成長装置 Granted JPH027419A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15770188A JPH027419A (ja) 1988-06-24 1988-06-24 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15770188A JPH027419A (ja) 1988-06-24 1988-06-24 気相成長装置

Publications (2)

Publication Number Publication Date
JPH027419A JPH027419A (ja) 1990-01-11
JPH0532902B2 true JPH0532902B2 (ko) 1993-05-18

Family

ID=15655489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15770188A Granted JPH027419A (ja) 1988-06-24 1988-06-24 気相成長装置

Country Status (1)

Country Link
JP (1) JPH027419A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3474602B2 (ja) * 1993-05-07 2003-12-08 住友電気工業株式会社 超電導導体
JP3501828B2 (ja) * 1993-10-21 2004-03-02 住友電気工業株式会社 酸化物超電導導体の製造方法
JPH1027759A (ja) * 1996-07-11 1998-01-27 Seiko Epson Corp 熱処理装置、減圧cvd装置、および薄膜装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130477A (ja) * 1974-09-09 1976-03-15 Kokusai Electric Co Ltd Kisoseichosochi
JPS5319181A (en) * 1976-08-06 1978-02-22 Hitachi Ltd Low pressure reaction apparatus
JPS5842225A (ja) * 1981-09-04 1983-03-11 Kokusai Electric Co Ltd 外熱形の横型半導体気相成長装置
JPS5950093A (ja) * 1982-09-10 1984-03-22 Toshiba Mach Co Ltd 拡散炉型減圧気相成長装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130477A (ja) * 1974-09-09 1976-03-15 Kokusai Electric Co Ltd Kisoseichosochi
JPS5319181A (en) * 1976-08-06 1978-02-22 Hitachi Ltd Low pressure reaction apparatus
JPS5842225A (ja) * 1981-09-04 1983-03-11 Kokusai Electric Co Ltd 外熱形の横型半導体気相成長装置
JPS5950093A (ja) * 1982-09-10 1984-03-22 Toshiba Mach Co Ltd 拡散炉型減圧気相成長装置

Also Published As

Publication number Publication date
JPH027419A (ja) 1990-01-11

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