JPH0532848Y2 - - Google Patents

Description

[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a spray processing apparatus, and more specifically to an improvement of a nozzle used for spray development and the like.

[Conventional technology]

For example, a spray processing apparatus used for developing a mask is shown in a cross-sectional view in FIG.
22 is a rotary chuck, 23 is a motor for rotating the chuck 22, 24 is a nozzle, 25 is a developer tank, 26 is an operator valve, and 27 is a waste liquid discharge pipe. A mask 28 to be developed is placed on the chuck 22 and rotates as the chuck rotates, and a developer 29 is sprayed onto it to develop the resist applied to the mask.

The nozzle 24 has the configuration shown in the side view of FIG. 3, with a tubular portion having a diameter D tapering to a tip having a diameter d on one side and a thread on the other side. Typically, D is 15 mm and d is 7 mm.

The tip of the nozzle 24 is shown in the front view of FIG.
An opening 30 having a width w and a length t is opened. opening 3
0 is open horizontally as shown in the figure, and generally w
is 3.0 mm, and t is 0.02 mm.

When spraying the developer, as shown in the perspective view of FIG. 5, the mask 28 is rotated in the direction of arrow I, and the developer 29 is sprayed in a strip parallel to the horizontal direction.

[Problem that the invention attempts to solve]

Recently, masks have a large diameter (6 inches (15.2 cm), 7
inch (17.8cm)). When such a large-diameter mask is spray-developed as shown in FIG. 5, a problem arises in that the developing solution surrounding the mask is too dispersed and uneven development tends to occur around the mask.

[Means for solving problems]

The above problem is that the chemical spray nozzle has a long opening formed in a direction substantially perpendicular to the surface direction of the substrate to be processed, and the chemical spray nozzle does not substantially spread the chemical onto the surface of the substrate to be processed. The solution is to provide a spray treatment device configured for linear distribution.

[Effect]

When a chemical solution is sprayed using the above-mentioned nozzle, the chemical solution surrounding the area is concentrated without being too dispersed, making it difficult for uneven processing to occur.

〔Example〕

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

As shown in the perspective view of FIG. 1, the nozzle 11 according to the present invention has an opening 12 formed perpendicular to the horizontal direction. Its dimensions are set the same as shown in FIG.

With such a nozzle, the developer is sprayed onto the mask 14 in a band 13 perpendicular to the horizontal direction. The mask 14 is conventionally placed on a rotary chuck and rotates in the direction of arrow I.

When spraying as shown in FIG. 1, it was visually observed that the developer surrounding the area was concentrated, and it was confirmed that uneven development was less likely to occur. This is confirmed by the fact that the amount of developer used was saved by 9/13 compared to the conventional example when developing a mask with a diameter of 15.2 cm (6 inches).

[Effect of idea]

As explained above, according to the present invention, by spraying a strip of developer using a nozzle having an opening perpendicular to the waterside direction, there is a remarkable effect of preventing uneven development in the periphery. Moreover, the present invention is not limited to the case of the above-mentioned development,
It is also applicable to other treatments such as etching, and extends to such cases as well.

[Brief explanation of drawings]

Fig. 1 is a perspective view of an embodiment of the present invention, Fig. 2 is a sectional view of the spray developing device, Fig. 3 is a side view of the nozzle of the spray developing device, Fig. 4 is a front view of the nozzle of Fig. 3, FIG. 5 is a perspective view of a spray using the nozzle of FIG. 4. In the figure, 11 is a nozzle, 12 is an opening, 13 is a developer, and 14 is a mask.

Claims (1)

[Claims for Utility Model Registration] A chemical liquid spray nozzle having a long opening formed in a direction substantially perpendicular to the surface direction of the substrate to be processed, the chemical liquid being sprayed onto the surface of the substrate to be processed by the chemical liquid spray nozzle. A spray treatment device configured to provide a substantially linear distribution.