KR970063415A - Wafer development method - Google Patents
Wafer development method Download PDFInfo
- Publication number
- KR970063415A KR970063415A KR1019960004453A KR19960004453A KR970063415A KR 970063415 A KR970063415 A KR 970063415A KR 1019960004453 A KR1019960004453 A KR 1019960004453A KR 19960004453 A KR19960004453 A KR 19960004453A KR 970063415 A KR970063415 A KR 970063415A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- spraying
- nozzle
- edge
- center
- Prior art date
Links
Abstract
웨이퍼 상에 현상액 및 세척액을 분사하여 현상하는 방법에 대해 기재되어 있다.And a method of spraying a developer and a cleaning liquid onto a wafer to perform development.
이는, 분사노즐을 사용하여 회전하는 웨이퍼 상에 세척액 및 현상액을 분사하는 방법에 있어서, 분사노즐을 웨이퍼의 가장자리로부터 중심부로 이동시키면서 분사하는 것을 특징으로 한다.This is characterized in that, in a method of spraying a cleaning liquid and a developing liquid onto a rotating wafer using an injection nozzle, the spraying nozzle is injected while moving from the edge of the wafer to the center thereof.
따라서, 웨이퍼의 가장자리 및 중심부에서 현상이 균일하게 이루어지도록 하고, 현상된 포토레지스트 성분을 완전히 제거할 수 있다.Accordingly, the development can be uniformly performed at the edge and the center of the wafer, and the developed photoresist component can be completely removed.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제2a도는 본 발명에 의한 웨이퍼 현상방법을 설명하기 위하여 공정 진행에 따른 장치를 도시한 도면.FIG. 2a is a view showing an apparatus according to a process progress to explain a wafer developing method according to the present invention;
제2b도는 웨이퍼의 회전방향 및 노즐의 이동방향을 나타내는 도면.2b is a view showing the rotation direction of the wafer and the moving direction of the nozzle.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960004453A KR970063415A (en) | 1996-02-24 | 1996-02-24 | Wafer development method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960004453A KR970063415A (en) | 1996-02-24 | 1996-02-24 | Wafer development method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970063415A true KR970063415A (en) | 1997-09-12 |
Family
ID=66221540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960004453A KR970063415A (en) | 1996-02-24 | 1996-02-24 | Wafer development method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970063415A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010058399A (en) * | 1999-12-27 | 2001-07-05 | 박종섭 | Injection device for developing agents |
-
1996
- 1996-02-24 KR KR1019960004453A patent/KR970063415A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010058399A (en) * | 1999-12-27 | 2001-07-05 | 박종섭 | Injection device for developing agents |
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Legal Events
Date | Code | Title | Description |
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WITN | Withdrawal due to no request for examination |