JPH05318310A - Wafer placing method and placing device - Google Patents

Wafer placing method and placing device

Info

Publication number
JPH05318310A
JPH05318310A JP4154350A JP15435092A JPH05318310A JP H05318310 A JPH05318310 A JP H05318310A JP 4154350 A JP4154350 A JP 4154350A JP 15435092 A JP15435092 A JP 15435092A JP H05318310 A JPH05318310 A JP H05318310A
Authority
JP
Japan
Prior art keywords
wafer
template
placing
polishing plate
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4154350A
Other languages
Japanese (ja)
Other versions
JP3340151B2 (en
Inventor
Yasuo Inada
安雄 稲田
Masanori Fukushima
政法 福島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikoshi Machinery Corp
Original Assignee
Fujikoshi Machinery Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikoshi Machinery Corp filed Critical Fujikoshi Machinery Corp
Priority to JP15435092A priority Critical patent/JP3340151B2/en
Publication of JPH05318310A publication Critical patent/JPH05318310A/en
Application granted granted Critical
Publication of JP3340151B2 publication Critical patent/JP3340151B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To offer a method and device for placing a wafer inside a template of a polishing plate automatically and very accurately without requiring human labor. CONSTITUTION:When a semiconductor wafer 7 is placed for polishing inside a template 3 provided on a polishing plate 1, respective positions are numerically analyzed for fine adjustment in order to correctly place the semiconductor wafer 7 at the center of the template 3. In a wafer placing device for placing the semiconductor wafer 7 inside the template 3 provided on the polishing plate 1, an index table 2 for holding the polishing plate 1 and rotating, a wafer carrying arm 5 for attracting the wafer 7, moving in the horizontal and vertical directions and placing the wafer 7 inside the template 3, and an image processing device provided above the template 3 for placing the wafer 7 are provided.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウエハー(以下
ウエハーという)を研磨加工するため、平坦なプレート
上に設けられたテンプレート内にウエハーを載置、保持
するウエハー載置方法と載置装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer placing method and a placing apparatus for placing and holding a wafer in a template provided on a flat plate for polishing a semiconductor wafer (hereinafter referred to as "wafer"). Regarding

【0002】[0002]

【従来の技術】ウエハーを研磨するポリッシング装置で
は、複数のウエハーを平坦な研磨プレートに保持し、研
磨プレートのウエハー保持面を下にして、研磨布を貼っ
た研磨定盤に接触させ、プレートの上から負荷をかけ
て、ウエハーを研磨布に押圧し、スラリーを供給しなが
ら前記定盤とウエハーを保持する研磨プレートとを相対
的に回転させながら研磨している。
2. Description of the Related Art In a polishing apparatus for polishing wafers, a plurality of wafers are held on a flat polishing plate, and the wafer holding surface of the polishing plate faces down to make contact with a polishing platen having a polishing cloth attached thereto. A load is applied from above to press the wafer against the polishing cloth, and while the slurry is being supplied, the surface plate and the polishing plate holding the wafer are relatively rotated to perform polishing.

【0003】ウエハーを研磨プレートに保持する手段と
して、従来はワックスを介して接着する方法が一般的で
あったが、この方法では、中間にワックスを介している
ため、加工精度を向上させることが困難であり、また、
ウエハー接着装置、剥離装置が必要で、付帯設備が大規
模化し、工程も複雑化する等の欠点があるので、ワック
スを用いずに研磨プレートにウエハーを保持する方法が
多くなっている。この方法では、例えば研磨プレートの
ウエハー保持面に、テンプレートと呼ばれるウエハーの
外径よりも大きく、ウエハーの厚さよりも浅い複数の凹
所を形成し、この中にウエハーを投入し圧着、保持させ
ている。
Conventionally, as a means for holding a wafer on a polishing plate, a method of adhering via a wax has been generally used. However, in this method, since a wax is interposed in the middle, the processing accuracy can be improved. Difficult and also
Since there are drawbacks such as a wafer adhering device and a peeling device, a large scale of ancillary equipment, and a complicated process, there are many methods of holding a wafer on a polishing plate without using wax. In this method, for example, on the wafer holding surface of the polishing plate, a plurality of recesses called templates, which are larger than the outer diameter of the wafer and are shallower than the thickness of the wafer, are formed, and the wafer is put into this, pressure-bonded and held. There is.

【0004】[0004]

【発明が解決しようとする課題】一般に、前記テンプレ
ートの内径は、保持するウエハーの外径と極力近いほう
が望ましいことが知られており、実際には、ウエハーの
外周縁のうち円弧部とテンプレートの内周縁との間隔は
1mm以下を要求されている。このためテンプレート内
に、ウエハーを載置するまでの工程を機械化することは
非常に困難で、従来はほとんど手作業で載置している
が、ウエハーを汚染したり、破損する危険が大きかっ
た。
It is generally known that it is desirable that the inner diameter of the template is as close as possible to the outer diameter of the wafer to be held. In practice, the arc portion of the outer peripheral edge of the wafer and the template are The distance from the inner peripheral edge is required to be 1 mm or less. For this reason, it is very difficult to mechanize the process until the wafer is placed in the template. Conventionally, the wafer is mostly placed by hand, but there is a great risk of contaminating or damaging the wafer.

【0005】[0005]

【課題を解決するための手段】本発明は、上記の問題点
に鑑み、研磨プレートのテンプレート内中央に、正確に
ウエハーを載置する、すなわちウエハーの外周縁のうち
円弧部とテンプレートの内周縁との間隔を1mm以下の
等しい値に保つことが可能なウエハー載置方法と、その
装置を提供することを目的とするもので、第1の発明は
研磨プレート上に設けられたテンプレート内に半導体ウ
エハーを載置して研磨するにあたり、半導体ウエハーを
テンプレートの中央に正しく載置するため、それぞれの
位置を数値解析して微調整することを特徴とするウエハ
ー載置方法を、第2の発明は半導体ウエハーを、研磨プ
レート上に設けたテンプレート内に載置するウエハー載
置装置において、研磨プレートを保持して回転するイン
デックステーブル、ウエハーを吸着して水平、垂直方向
に移動し、テンプレート内にウエハーを載置するウエハ
ー搬送アームおよび前記ウエハーを載置するテンプレー
トの上方に設けた画像処理装置を具備することを特徴と
するウエハー載置装置を要旨とする。
In view of the above problems, the present invention accurately mounts a wafer at the center of the template of the polishing plate, that is, the arc portion of the outer peripheral edge of the wafer and the inner peripheral edge of the template. SUMMARY OF THE INVENTION An object of the present invention is to provide a wafer mounting method and an apparatus therefor capable of keeping an equal value of 1 mm or less with a semiconductor, and a first invention is to place a semiconductor in a template provided on a polishing plate. A second aspect of the present invention provides a wafer placing method characterized in that when a wafer is placed and polished, a semiconductor wafer is placed exactly in the center of a template, so that each position is numerically analyzed and finely adjusted. In a wafer placing device for placing a semiconductor wafer in a template provided on a polishing plate, an index table for holding and rotating the polishing plate A wafer mounting device that is equipped with a wafer transfer arm that attracts a wafer and moves in the horizontal and vertical directions to place the wafer in the template, and an image processing device provided above the template on which the wafer is placed. The equipment is the main point.

【0006】[0006]

【作用】以下本発明におけるウエハー載置装置の作用
を、図1(a),(b)によって順に説明する。 1. 円形の研磨プレート1をインデックステーブル2
上の所定位置に保持する。研磨プレート1上には6個の
円形のテンプレート3が同一円周上に等間隔に設けられ
ている。 2. テンプレート検出カメラ4により、研磨プレート
1上のテンプレート3の位置を解析し、これらが所定の
位置にくるようにインデックステーブル2を回転する。 3. ウエハー搬送アーム5の下面に、オリフラ部6を
一定方向に向けてウエハー7を吸着保持し、前記所定位
置に置かれたテンプレート3上の所定位置まで搬送す
る。ウエハー搬送アーム5は伸縮してY方向、レール8
上を走行してX方向支柱9の伸縮によってZ方向の移動
が可能である。 4. 3個のウエハー検出カメラ10、11、12によ
り、ウエハー7の位置を検出し、ウエハー搬送アーム5
を水平方向(X,Y方向)に移動させて、ウエハー7が
所定の原点位置にくるように微調整する。 5. ウエハー検出カメラ10、11、12でウエハー
7とテンプレート3の位置関係を割り出し、ウエハー7
の位置をウエハー搬送アーム5により微調整し、ウエハ
ー7の外周縁の円弧部13とテンプレート3の内周縁と
が等間隔を保つようにする。 6. ウエハー搬送アーム5の吸着を解放してウエハー
7をテンプレート3内に投入、載置する。 7. インデックステーブル2を回転して隣接のテンプ
レート3に新しいウエハー7を上記の方法によって載置
する。 同一円周上にないテンプレートがあるとき、例えば研磨
プレートの回転中心にもテンプレートがあるときは、イ
ンデックステーブルを水平方向(X,Y方向)に移動さ
せて、前記のウエハーの投入、載置を行う。
The operation of the wafer mounting device according to the present invention will be described below with reference to FIGS. 1 (a) and 1 (b). 1. Round polishing plate 1 to index table 2
Hold in place above. On the polishing plate 1, six circular templates 3 are provided on the same circumference at equal intervals. 2. The position of the template 3 on the polishing plate 1 is analyzed by the template detection camera 4, and the index table 2 is rotated so that these are at predetermined positions. 3. The wafer 7 is sucked and held on the lower surface of the wafer transfer arm 5 with the orientation flat portion 6 directed in a fixed direction, and transferred to a predetermined position on the template 3 placed at the predetermined position. The wafer transfer arm 5 expands and contracts to extend in the Y direction and rail 8.
It is possible to move in the Z direction by traveling upward and expanding and contracting the X-direction support 9. 4. The position of the wafer 7 is detected by the three wafer detection cameras 10, 11 and 12, and the wafer transfer arm 5
Is moved in the horizontal direction (X and Y directions), and the wafer 7 is finely adjusted so as to come to a predetermined origin position. 5. The positional relationship between the wafer 7 and the template 3 is determined by the wafer detection cameras 10, 11 and 12, and the wafer 7 is detected.
The position of 1 is finely adjusted by the wafer transfer arm 5 so that the arcuate portion 13 of the outer peripheral edge of the wafer 7 and the inner peripheral edge of the template 3 are kept at equal intervals. 6. The suction of the wafer transfer arm 5 is released, and the wafer 7 is loaded and placed in the template 3. 7. The index table 2 is rotated and a new wafer 7 is placed on the adjacent template 3 by the above method. When there is a template that is not on the same circumference, for example, when the template is also at the center of rotation of the polishing plate, the index table is moved in the horizontal direction (X, Y directions) to load and place the wafer. To do.

【0007】[0007]

【発明の効果】ウエハーとテンプレートの相対的な位置
関係を解析してからテンプレート内にウエハーを載置す
るため、ウエハーはテンプレート内の所定の位置に正確
に収納され、テンプレートのエッヂに乗り上げるような
ことはない。なおカメラでテンプレートとウエハーとの
位置関係を解析する関係上、テンプレート検出カメラ及
びウエハー検出カメラは、ウエハー搬送アームその他と
干渉しない範囲で被検出物に近い位置に配置するほうが
望ましい。
Since the relative positional relationship between the wafer and the template is analyzed and then the wafer is placed in the template, the wafer is accurately stored at a predetermined position in the template and is mounted on the edge of the template. There is no such thing. From the viewpoint of analyzing the positional relationship between the template and the wafer by the camera, it is desirable that the template detection camera and the wafer detection camera are arranged at positions close to the object to be detected within a range that does not interfere with the wafer transfer arm and the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明の装置の説明用平面図、(b)
は側面図である。
FIG. 1A is a plan view for explaining an apparatus of the present invention, and FIG.
Is a side view.

【符号の説明】[Explanation of symbols]

1 研磨プレート 9 支柱 2 インデックステーブル 10 ウエハー検
出カメラ 3 テンプレート 11 ウエハー検
出カメラ 4 テンプレート検出カメラ 12 ウエハー検
出カメラ 5 ウエハー搬送アーム 13 円弧部 6 オリフラ部 7 ウエハー 8 レール
1 Polishing Plate 9 Support 2 Index Table 10 Wafer Detection Camera 3 Template 11 Wafer Detection Camera 4 Template Detection Camera 12 Wafer Detection Camera 5 Wafer Transfer Arm 13 Arc Part 6 Orient Flat Part 7 Wafer 8 Rail

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 研磨プレート上に設けられたテンプレー
ト内に半導体ウエハーを載置して研磨するにあたり、半
導体ウエハーをテンプレートの中央に正しく載置するた
め、それぞれの位置を数値解析して微調整することを特
徴とするウエハー載置方法。
1. When placing and polishing a semiconductor wafer in a template provided on a polishing plate, the position of each semiconductor wafer is numerically analyzed and finely adjusted in order to properly place the semiconductor wafer at the center of the template. A wafer mounting method characterized by the above.
【請求項2】 前記数値解析は画像処理装置による請求
項1に記載の方法。
2. The method according to claim 1, wherein the numerical analysis is performed by an image processing device.
【請求項3】 半導体ウエハーを、研磨プレート上に設
けたテンプレート内に載置するウエハー載置装置におい
て、研磨プレートを保持して回転するインデックステー
ブル、ウエハーを吸着して水平、垂直方向に移動し、テ
ンプレート内にウエハーを載置するウエハー搬送アーム
および前記ウエハーを載置するテンプレートの上方に設
けた画像処理装置を具備することを特徴とするウエハー
載置装置。
3. A wafer mounting device for mounting a semiconductor wafer in a template provided on a polishing plate, an index table which holds and rotates the polishing plate, and sucks the wafer to move the wafer horizontally and vertically. A wafer placing apparatus comprising: a wafer transfer arm for placing a wafer in the template; and an image processing apparatus provided above the template for placing the wafer.
【請求項4】 前記画像処理装置は、ウエハーを載置す
るテンプレート上方に設けたテンプレート検出カメラ
と、テンプレートの内周縁とウエハーの外周縁を検出可
能に設けられた3つまたはそれ以上のウエハー検出カメ
ラを具備する請求項3に記載の装置。
4. The image processing apparatus comprises a template detection camera provided above a template on which a wafer is mounted, and three or more wafer detection units provided so as to detect an inner peripheral edge of the template and an outer peripheral edge of the wafer. The apparatus of claim 3, comprising a camera.
【請求項5】 前記インデックステーブルは、水平方向
に移動可能である請求項3に記載の装置。
5. The apparatus according to claim 3, wherein the index table is horizontally movable.
JP15435092A 1992-05-21 1992-05-21 Wafer mounting device Expired - Fee Related JP3340151B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15435092A JP3340151B2 (en) 1992-05-21 1992-05-21 Wafer mounting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15435092A JP3340151B2 (en) 1992-05-21 1992-05-21 Wafer mounting device

Publications (2)

Publication Number Publication Date
JPH05318310A true JPH05318310A (en) 1993-12-03
JP3340151B2 JP3340151B2 (en) 2002-11-05

Family

ID=15582247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15435092A Expired - Fee Related JP3340151B2 (en) 1992-05-21 1992-05-21 Wafer mounting device

Country Status (1)

Country Link
JP (1) JP3340151B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0803328A1 (en) * 1996-04-23 1997-10-29 Fujikoshi Kikai Kogyo Kabushiki Kaisha Polishing system for polishing wafer
CN103295931A (en) * 2012-02-29 2013-09-11 Lgcns株式会社 Providing device and method of LED wafers
CN103317414A (en) * 2013-06-28 2013-09-25 林全忠 Grinding device and grinding method for oil scraping rings
TWI476854B (en) * 2012-03-08 2015-03-11 Lg Cns Co Ltd Apparatus and method for supplying lightemitting diode (led) wafer
US9045827B2 (en) 2012-03-09 2015-06-02 Lg Cns Co., Ltd. Apparatus and method for supplying light-emitting diode (LED) wafer
JP2019130661A (en) * 2018-01-29 2019-08-08 ミーレ カンパニー インコーポレイテッド Polishing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128188A (en) * 2004-10-26 2006-05-18 Nikon Corp Substrate carrying apparatus, substrate carrying method and exposure apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0803328A1 (en) * 1996-04-23 1997-10-29 Fujikoshi Kikai Kogyo Kabushiki Kaisha Polishing system for polishing wafer
US5908347A (en) * 1996-04-23 1999-06-01 Fujikoshi Kikai Kogyo Kabushiki Kaisha Polishing system for polishing wafer
CN103295931A (en) * 2012-02-29 2013-09-11 Lgcns株式会社 Providing device and method of LED wafers
TWI476854B (en) * 2012-03-08 2015-03-11 Lg Cns Co Ltd Apparatus and method for supplying lightemitting diode (led) wafer
US9045827B2 (en) 2012-03-09 2015-06-02 Lg Cns Co., Ltd. Apparatus and method for supplying light-emitting diode (LED) wafer
CN103317414A (en) * 2013-06-28 2013-09-25 林全忠 Grinding device and grinding method for oil scraping rings
JP2019130661A (en) * 2018-01-29 2019-08-08 ミーレ カンパニー インコーポレイテッド Polishing device
CN110103132A (en) * 2018-01-29 2019-08-09 韩商未来股份有限公司 Grinding device

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JP3340151B2 (en) 2002-11-05

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