JPH05315728A - Transfer sheet and manufacture of circuit element using it - Google Patents

Transfer sheet and manufacture of circuit element using it

Info

Publication number
JPH05315728A
JPH05315728A JP11860392A JP11860392A JPH05315728A JP H05315728 A JPH05315728 A JP H05315728A JP 11860392 A JP11860392 A JP 11860392A JP 11860392 A JP11860392 A JP 11860392A JP H05315728 A JPH05315728 A JP H05315728A
Authority
JP
Japan
Prior art keywords
transfer sheet
circuit element
electrode pattern
circuit
insulating substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11860392A
Other languages
Japanese (ja)
Inventor
Ryo Kimura
涼 木村
Kazuyuki Okano
和之 岡野
Minehiro Itagaki
峰広 板垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11860392A priority Critical patent/JPH05315728A/en
Publication of JPH05315728A publication Critical patent/JPH05315728A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide a transfer sheet having strong adhesive force between the circuit part of a transfer sheet and an insulated substrate of a circuit element at the time of manufacturaing the circuit element while having little variation in the size of the circuit part at the time of manufacturing the circuit element. CONSTITUTION:An electrode pattern 2 is provided on a base material part 1 consisting of a flexible film and an insulator layer 3 is provided on the electrode pattern 2 while providing adhesive layer 6 on the upper end part of the insulator layer 3 in order to increase adhesive force at the time of lamination.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、高密度実装回路を実現
するための転写シートおよびそれを用いた回路素子の製
造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer sheet for realizing a high-density mounting circuit and a method for manufacturing a circuit element using the transfer sheet.

【0002】[0002]

【従来の技術】近年の電子機器の高機能化、高密度実装
化に対応する電子回路形成技術として多層基板を用いる
技術がある。この技術は大型コンピュータ分野において
導入されてきたが、最近、小型化が要求される携帯型の
電子機器分野、例えばビデオムービー、携帯電話機、パ
ソコンなどに盛んに用いられるようになってきた。
2. Description of the Related Art There is a technique of using a multi-layer substrate as an electronic circuit forming technique corresponding to the recent high function and high density mounting of electronic equipment. Although this technology has been introduced in the field of large-sized computers, it has recently been actively used in the field of portable electronic devices that require miniaturization, such as video movies, mobile phones, and personal computers.

【0003】そして、多層基板による回路素子を実現す
るための従来の転写シートは図3(a)の上面図、図3
(b)の断面図に示すように、可とう性フィルムからな
る基材部1の上に電極パターン2を設け、その電極パタ
ーン2の上に絶縁体層3を設けた構成であり、電極パタ
ーン2と絶縁体層3とで回路部4を構成していた。そし
て、上記の転写シートを用いた回路素子の製造方法は図
4に示すように、絶縁基板5の上に図3の転写シートを
用いて電極パターン2と絶縁体層3からなる回路部4を
絶縁基板5の上に1層以上転写して積層体を構成し、そ
の積層体に加熱圧着加工、脱バインダ、本焼成を順次施
していた。
A conventional transfer sheet for realizing a circuit element using a multi-layer substrate is shown in the top view of FIG.
As shown in the sectional view of (b), an electrode pattern 2 is provided on a base material portion 1 made of a flexible film, and an insulating layer 3 is provided on the electrode pattern 2, 2 and the insulator layer 3 constitute the circuit portion 4. Then, as shown in FIG. 4, the method of manufacturing a circuit element using the transfer sheet described above uses the transfer sheet of FIG. 3 on the insulating substrate 5 to form the circuit portion 4 including the electrode pattern 2 and the insulating layer 3. One or more layers were transferred onto the insulating substrate 5 to form a laminate, and the laminate was subjected to thermocompression bonding, binder removal, and main firing in this order.

【0004】[0004]

【発明が解決しようとする課題】しかしながら従来の転
写シートを用いると、転写する時に回路部4と絶縁基板
5との界面ではく離し易いという問題があった。その理
由は絶縁体層3が樹脂と無機粉末の混合物で絶縁基板と
の接着力が弱いためである。その接着力を強くするため
に樹脂の含有量を多くすると接着力は強くなるが回路素
子の製造時に収縮が大きくなるという問題があった。
However, when the conventional transfer sheet is used, there is a problem that the transfer sheet is easily peeled off at the interface between the circuit portion 4 and the insulating substrate 5. The reason is that the insulating layer 3 is a mixture of resin and inorganic powder and has a weak adhesive force with the insulating substrate. If the content of the resin is increased in order to increase the adhesive strength, the adhesive strength is increased, but there is a problem that the shrinkage becomes large at the time of manufacturing the circuit element.

【0005】本発明は、上記の従来の問題を解決するも
ので、回路素子の製造時に転写シートの回路部と回路素
子の絶縁基板との接着力が強くかつ回路素子製造時に回
路部の寸法変化の少ない転写シートとそれを用いた回路
素子の製造方法の提供を目的とする。
The present invention solves the above-mentioned problems of the prior art. The circuit sheet of the transfer sheet and the insulating substrate of the circuit element have a strong adhesive force at the time of manufacturing the circuit element, and the dimension of the circuit section changes at the time of manufacturing the circuit element. An object of the present invention is to provide a transfer sheet having a small amount and a method for manufacturing a circuit element using the transfer sheet.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに本発明の転写シートは、可とう性フィルムからなる
基材部の上に電極パターンを設け、その電極パターンの
上に絶縁体層を設け、その絶縁体層の上の端部に接着層
を設けたものである。
In order to achieve the above-mentioned object, a transfer sheet of the present invention is provided with an electrode pattern on a base material part made of a flexible film, and an insulating layer on the electrode pattern. Is provided, and an adhesive layer is provided at the upper end of the insulating layer.

【0007】[0007]

【作用】上記構成によれば、回路素子製造時に回路部の
寸法変化を大きくしないで絶縁基板との接着力を高くで
きる。
According to the above construction, the adhesive force with the insulating substrate can be increased without increasing the dimensional change of the circuit portion during the production of the circuit element.

【0008】[0008]

【実施例】(実施例1)以下本発明の第1の実施例につ
いて図1を参照しながら説明する。
(Embodiment 1) A first embodiment of the present invention will be described below with reference to FIG.

【0009】図1(a)は本実施例の転写シートの上面
図、(b)はA−B線に沿った断面図である。これらの
図において、1は離型処理されたポリエステル等の可と
う性フィルムからなる基材部である。2は銅電極ペース
トを用いて印刷法で形成した電極パターンである。3は
電極パターン2の上に印刷法で設けた絶縁体層であり、
乾燥後の厚さは100μmとなるようにした。その絶縁
体層3は樹脂と可塑剤の合計が12重量%、ガラスとア
ルミナからなる無機粉末の合計が88重量%からなるも
のである。6は絶縁体層3の上の端部に印刷法により設
けた接着層である。その接着層6は絶縁体層3と同じ樹
脂と可塑剤からなり無機粉末を含有しないものである。
本実施例で用いた樹脂はポリビニルブチラールとアルキ
ルフェノールの2成分、可塑剤はジオクチルフタレー
ト、ジブチルフタレートとブチルベンジルフタレートの
3成分からなり、有機溶剤としてはα−テレピノールを
用いた。
FIG. 1A is a top view of the transfer sheet of this embodiment, and FIG. 1B is a sectional view taken along the line AB. In these figures, reference numeral 1 is a base material portion made of a flexible film such as polyester subjected to a mold release treatment. Reference numeral 2 is an electrode pattern formed by a printing method using a copper electrode paste. 3 is an insulator layer provided on the electrode pattern 2 by a printing method,
The thickness after drying was set to 100 μm. The insulator layer 3 is composed of 12% by weight of resin and plasticizer, and 88% by weight of inorganic powder of glass and alumina. Reference numeral 6 is an adhesive layer provided on the upper end of the insulating layer 3 by a printing method. The adhesive layer 6 is made of the same resin and plasticizer as the insulator layer 3 and contains no inorganic powder.
The resin used in this example was composed of two components of polyvinyl butyral and alkylphenol, the plasticizer was composed of three components of dioctyl phthalate, dibutyl phthalate and butylbenzyl phthalate, and α-terepinol was used as the organic solvent.

【0010】本実施例の転写シートを接着層6を介して
フォルステライトからなる絶縁基板5に加熱圧着してポ
リエステルのフィルム1をはく離しても回路部4と絶縁
基板5の間にはく離は認められなかった。
Even if the polyester film 1 is peeled by heat-pressing the transfer sheet of this embodiment to the insulating substrate 5 made of forsterite via the adhesive layer 6, peeling is recognized between the circuit portion 4 and the insulating substrate 5. I couldn't do it.

【0011】(実施例2)次に実施例1の転写シートを
用いた回路素子の製造方法について図2を参照しながら
説明する。
Example 2 Next, a method of manufacturing a circuit element using the transfer sheet of Example 1 will be described with reference to FIG.

【0012】同図はフォルステライトからなる絶縁基板
5の上に実施例1の転写シートを用いて3回転写を行な
って積層体を構成し、その積層体に加熱圧着加工を施し
た後の断面図である。この断面が従来例と相違する点
は、回路部4の端部には接着層6が埋設された構成とな
っている点である。本実施例の電極パターン2は銅電極
ペーストを用いているために脱バインダは酸素濃度50
ppm以下の雰囲気中において最高温度500℃で24
時間加熱して行ない、これにより溶剤、樹脂、可塑剤の
有機物を除去した。その後窒素雰囲気中において900
℃で10分加熱して本焼成を施した。このようにして製
造した回路素子には回路部4と絶縁基板5の間にはく離
などの欠陥が発生しなかった。
In the figure, a cross section is formed by performing transfer three times using the transfer sheet of Example 1 on an insulating substrate 5 made of forsterite to form a laminate, and subjecting the laminate to thermocompression bonding. It is a figure. This cross section is different from the conventional example in that the adhesive layer 6 is embedded in the end portion of the circuit portion 4. Since the electrode pattern 2 of this embodiment uses a copper electrode paste, the binder is removed with an oxygen concentration of 50.
24 at a maximum temperature of 500 ° C in an atmosphere of ppm or less
It was heated for a period of time to remove the solvent, the resin, and the organic material of the plasticizer. Then 900 in a nitrogen atmosphere
Main firing was performed by heating at 0 ° C. for 10 minutes. No defect such as peeling occurred between the circuit portion 4 and the insulating substrate 5 in the circuit element manufactured in this manner.

【0013】(実施例3)本実施例の転写シートが実施
例1の転写シートと相違する点は電極パターンにAg/
Pd電極ペーストを用い、絶縁体層の無機粉末として9
00℃で焼結するガラスとアルミナからなるものを用
い、樹脂としてブチラール、可塑剤としてブチルベンジ
ルフタレートを用い、有機溶剤としてはブチルカルビト
ールを用いた点である。接着層は上記絶縁体層と同じ樹
脂と可塑剤からなり無機粉末を含有しないものとした。
(Embodiment 3) The transfer sheet of this embodiment is different from the transfer sheet of Embodiment 1 in that the electrode pattern is Ag /
Using Pd electrode paste as an inorganic powder for the insulator layer
The point is that glass that is sintered at 00 ° C. and alumina are used, butyral is used as the resin, butylbenzyl phthalate is used as the plasticizer, and butyl carbitol is used as the organic solvent. The adhesive layer was made of the same resin and plasticizer as those of the above-mentioned insulator layer and contained no inorganic powder.

【0014】本実施例の転写シートを接着層を介してア
ルミナからなる絶縁基板に加熱圧着してポリエステルの
フィルムをはく離しても回路部4と絶縁基板5の間には
く離は認められなかった。
No peeling was observed between the circuit section 4 and the insulating substrate 5 even if the polyester film was peeled off by thermocompression bonding the transfer sheet of this Example to an insulating substrate made of alumina via an adhesive layer.

【0015】(実施例4)次に実施例3の転写シートを
用いた回路素子の製造方法について説明する。
Example 4 Next, a method of manufacturing a circuit element using the transfer sheet of Example 3 will be described.

【0016】アルミナ基板の上に実施例3の転写シート
を用いて3回転写を行なって積層体を構成し、加熱圧着
加工を施した。本実施例の電極パターンはAg/Pd電
極ペーストを用いているために脱バインダは空気中で最
高温度500℃で24時間加熱して行ない、これにより
溶剤、樹脂、可塑剤の有機物を除去した。その後空気中
で900℃で10分加熱して本焼成を施した。このよう
にして製造した回路素子には回路部4と絶縁基板5の間
にはく離などの欠陥が発生しなかった。
The transfer sheet of Example 3 was used to transfer onto the alumina substrate three times to form a laminate, which was subjected to thermocompression bonding. Since the electrode pattern of this example uses Ag / Pd electrode paste, the binder was heated in air at a maximum temperature of 500 ° C. for 24 hours to remove the solvent, the resin, and the organic material of the plasticizer. Then, it was heated in air at 900 ° C. for 10 minutes to be subjected to main firing. No defect such as peeling occurred between the circuit portion 4 and the insulating substrate 5 in the circuit element manufactured in this manner.

【0017】(実施例5)本実施例の転写シートが実施
例1の転写シートと相違する点は、電極パターンに酸化
銅電極ペーストを用い、絶縁体層の無機粉末として結晶
化温度が850℃のホウケイ酸カルシウムを平均粒径
1.5μmに調整したガラス粉末を用い、溶剤はブチル
セロソルブとブチルカルビトールアセテートの混合溶剤
を用いた点であり、樹脂と可塑剤は同じものを用いた。
(Example 5) A transfer sheet of this example is different from the transfer sheet of Example 1 in that a copper oxide electrode paste is used for an electrode pattern and a crystallization temperature of 850 ° C. is used as an inorganic powder for an insulating layer. The glass powder in which the average particle size of calcium borosilicate was adjusted to 1.5 μm was used, the solvent was a mixed solvent of butyl cellosolve and butyl carbitol acetate, and the same resin and plasticizer were used.

【0018】本実施例の転写シートを接着層を介してス
テアタイトからなる絶縁基板に加熱圧着してポリエステ
ルのフィルムをはく離しても回路部4と絶縁基板5の間
にはく離は認められなかった。
No peeling was observed between the circuit portion 4 and the insulating substrate 5 even if the polyester film was peeled off by thermocompression bonding the transfer sheet of this example to the insulating substrate made of steatite via the adhesive layer. ..

【0019】(実施例6)次に実施例5の転写シートを
用いた回路素子の製造方法について説明する。
(Sixth Embodiment) Next, a method of manufacturing a circuit element using the transfer sheet of the fifth embodiment will be described.

【0020】ステアタイト基板の上に実施例5の転写シ
ートを用いて3回転写を行なって積層体を構成し、加熱
圧着加工を施した。次に脱バインダは空気中において最
高温度500℃で24時間加熱して行なった。本実施例
の電極パターンは酸化銅電極ペーストを用いているので
水素雰囲気中において250℃で1時間加熱して酸化銅
を銅に還元した。その後窒素雰囲気中において900℃
で10分の本焼成を施した。このようにして製造した回
路素子には回路部4と絶縁基板5の間にはく離などの欠
陥が発生しなかった。
The transfer sheet of Example 5 was used to transfer onto the steatite substrate three times to form a laminate, which was subjected to thermocompression bonding. Next, the binder was removed by heating in air at a maximum temperature of 500 ° C. for 24 hours. Since the electrode pattern of this example uses a copper oxide electrode paste, it was heated in a hydrogen atmosphere at 250 ° C. for 1 hour to reduce the copper oxide to copper. Then 900 ° C in a nitrogen atmosphere
The main firing was performed for 10 minutes. No defect such as peeling occurred between the circuit portion 4 and the insulating substrate 5 in the circuit element manufactured in this manner.

【0021】なお、実施例では転写シートの電極パター
ン、絶縁体層、接着層の形成には印刷法を用いたが、こ
れに代えてドクターブレード法、キャスティング法、凹
板印刷法、平板印刷法を用いてもよい。
In the examples, the printing method was used to form the electrode pattern, the insulating layer and the adhesive layer of the transfer sheet, but instead of this, a doctor blade method, a casting method, a concave plate printing method, a flat plate printing method. May be used.

【0022】[0022]

【発明の効果】以上の説明から明らかなように本発明に
よれば、次の効果が得られる。
As is apparent from the above description, according to the present invention, the following effects can be obtained.

【0023】(1)回路部と絶縁基板の接着力が強くか
つ加熱圧着前後における寸法変化の少ない転写シートが
得られる。
(1) A transfer sheet having a strong adhesive force between the circuit portion and the insulating substrate and having little dimensional change before and after thermocompression bonding can be obtained.

【0024】(2)回路部と絶縁基板の間にはく離など
の欠陥のない高密度の回路素子が製造できる。
(2) It is possible to manufacture a high-density circuit element having no defects such as peeling between the circuit portion and the insulating substrate.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明の実施例における転写シートの
上面図 (b)は図1(a)のA−B線に沿った断面図
1A is a top view of a transfer sheet according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along the line AB of FIG. 1A.

【図2】本発明の回路素子の製造方法における積層体の
断面図
FIG. 2 is a cross-sectional view of a laminate in the method for manufacturing a circuit element of the present invention.

【図3】(a)は従来の転写シートの上面図 (b)は図3(a)のC−D線に沿った断面図3A is a top view of a conventional transfer sheet, and FIG. 3B is a cross-sectional view taken along the line C-D of FIG. 3A.

【図4】従来の回路素子の製造方法における積層体の断
面図
FIG. 4 is a cross-sectional view of a laminated body in a conventional circuit element manufacturing method.

【符号の説明】[Explanation of symbols]

1 基材部 2 電極パターン 3 絶縁体層 4 回路部 5 絶縁基板 6 接着層 1 Base Material Section 2 Electrode Pattern 3 Insulator Layer 4 Circuit Section 5 Insulating Substrate 6 Adhesive Layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】可とう性フィルムからなる基材部の上に電
極パターンを設け、その電極パターンの上に絶縁体層を
設け、その絶縁体層の上の端部に接着層を設けた転写シ
ート。
1. A transfer in which an electrode pattern is provided on a base material portion made of a flexible film, an insulating layer is provided on the electrode pattern, and an adhesive layer is provided at an end portion on the insulating layer. Sheet.
【請求項2】絶縁基板上に請求項1記載の転写シートに
おける電極パターン、絶縁体層および接着層からなる回
路部を1層以上転写して積層体を構成し、その積層体に
加熱圧着加工、脱バインダ、本焼成を順次施す回路素子
の製造方法。
2. A laminated body is formed by transferring one or more layers of a circuit portion consisting of an electrode pattern, an insulating layer and an adhesive layer in the transfer sheet according to claim 1 onto an insulating substrate to form a laminated body, and thermocompression bonding is applied to the laminated body. , A method for manufacturing a circuit element in which binder removal and main firing are sequentially performed.
JP11860392A 1992-05-12 1992-05-12 Transfer sheet and manufacture of circuit element using it Pending JPH05315728A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11860392A JPH05315728A (en) 1992-05-12 1992-05-12 Transfer sheet and manufacture of circuit element using it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11860392A JPH05315728A (en) 1992-05-12 1992-05-12 Transfer sheet and manufacture of circuit element using it

Publications (1)

Publication Number Publication Date
JPH05315728A true JPH05315728A (en) 1993-11-26

Family

ID=14740660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11860392A Pending JPH05315728A (en) 1992-05-12 1992-05-12 Transfer sheet and manufacture of circuit element using it

Country Status (1)

Country Link
JP (1) JPH05315728A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005172496A (en) * 2003-12-09 2005-06-30 Matsushita Electric Ind Co Ltd Load sensor and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005172496A (en) * 2003-12-09 2005-06-30 Matsushita Electric Ind Co Ltd Load sensor and its manufacturing method

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