JPH0530355Y2 - - Google Patents

Info

Publication number
JPH0530355Y2
JPH0530355Y2 JP7640086U JP7640086U JPH0530355Y2 JP H0530355 Y2 JPH0530355 Y2 JP H0530355Y2 JP 7640086 U JP7640086 U JP 7640086U JP 7640086 U JP7640086 U JP 7640086U JP H0530355 Y2 JPH0530355 Y2 JP H0530355Y2
Authority
JP
Japan
Prior art keywords
reaction tube
quartz reaction
door flange
rings
door
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP7640086U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62188135U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7640086U priority Critical patent/JPH0530355Y2/ja
Publication of JPS62188135U publication Critical patent/JPS62188135U/ja
Application granted granted Critical
Publication of JPH0530355Y2 publication Critical patent/JPH0530355Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP7640086U 1986-05-21 1986-05-21 Expired - Lifetime JPH0530355Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7640086U JPH0530355Y2 (enExample) 1986-05-21 1986-05-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7640086U JPH0530355Y2 (enExample) 1986-05-21 1986-05-21

Publications (2)

Publication Number Publication Date
JPS62188135U JPS62188135U (enExample) 1987-11-30
JPH0530355Y2 true JPH0530355Y2 (enExample) 1993-08-03

Family

ID=30923441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7640086U Expired - Lifetime JPH0530355Y2 (enExample) 1986-05-21 1986-05-21

Country Status (1)

Country Link
JP (1) JPH0530355Y2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023127054A1 (ja) * 2021-12-27 2023-07-06 株式会社Kokusai Electric 漏洩検知装置、半導体装置の製造方法、基板処理方法およびプログラム

Also Published As

Publication number Publication date
JPS62188135U (enExample) 1987-11-30

Similar Documents

Publication Publication Date Title
JP3106172B2 (ja) 熱処理装置の封止構造
KR0171600B1 (ko) 밀봉장치
KR100280689B1 (ko) 열처리 장치
JP2825172B2 (ja) 減圧処理装置および減圧処理方法
US20180364084A1 (en) Processing chamber gas detection system and operation method thereof
TWI697037B (zh) 處理裝置
TWM590308U (zh) 用於減少電漿蝕刻腔室中的污染的設備
KR102471048B1 (ko) 저입자 보호 플래퍼 밸브
US6082414A (en) Apparatus and method for replacing an attachment on a vacuum chamber
JP3480280B2 (ja) 縦型処理装置
JP3463785B2 (ja) 封止装置および処理装置
CN219861573U (zh) 一种微波等离子体化学气相沉积设备反应腔结构
JPH11145072A (ja) 熱処理装置
CN223705817U (zh) 一种外延炉体
JPH11204502A (ja) 真空処理装置
JPH057239Y2 (enExample)
TW202335086A (zh) 洩漏檢測裝置,半導體裝置的製造方法,基板處理方法及程式
JPH10231932A (ja) 封止装置
JPH04230022A (ja) 超高真空化学蒸着反応装置
TW202614302A (zh) 半導體製程腔室及半導體熱處理設備
KR20010062892A (ko) 반도체 제조 장비의 부산물 누적 방지장치
JPH01258427A (ja) 半導体ウェハーの製造装置
JP2880726B2 (ja) 半導体装置の製造装置
CN116659772A (zh) 一种用于薄膜设备的检漏装置以及检漏方法
JPH07161643A (ja) 真空処理装置