JPH05303207A - リソグラフィ用現像液及びリソグラフィ工程 - Google Patents

リソグラフィ用現像液及びリソグラフィ工程

Info

Publication number
JPH05303207A
JPH05303207A JP4233080A JP23308092A JPH05303207A JP H05303207 A JPH05303207 A JP H05303207A JP 4233080 A JP4233080 A JP 4233080A JP 23308092 A JP23308092 A JP 23308092A JP H05303207 A JPH05303207 A JP H05303207A
Authority
JP
Japan
Prior art keywords
resist
surfactant
developer
lithographic
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4233080A
Other languages
English (en)
Japanese (ja)
Inventor
Tadahiro Omi
忠弘 大見
Hisayuki Shimada
久幸 島田
Shigeki Shimomura
茂樹 下村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to TW082100661A priority Critical patent/TW259850B/zh
Priority to DE69325043T priority patent/DE69325043T2/de
Priority to MYPI93000187A priority patent/MY121957A/en
Priority to AT93300883T priority patent/ATE180583T1/de
Priority to EP93300883A priority patent/EP0555098B1/en
Priority to KR1019930001611A priority patent/KR960015482B1/ko
Publication of JPH05303207A publication Critical patent/JPH05303207A/ja
Priority to US08/395,182 priority patent/US6007970A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP4233080A 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程 Pending JPH05303207A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
TW082100661A TW259850B (enExample) 1992-02-07 1993-02-02
DE69325043T DE69325043T2 (de) 1992-02-07 1993-02-05 Lithographischer Entwickler und lithographisches Verfahren
MYPI93000187A MY121957A (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process.
AT93300883T ATE180583T1 (de) 1992-02-07 1993-02-05 Lithographischer entwickler und lithographisches verfahren
EP93300883A EP0555098B1 (en) 1992-02-07 1993-02-05 Lithographic developer and lithographic process
KR1019930001611A KR960015482B1 (ko) 1992-02-07 1993-02-06 리토그라피용 현상액 및 리토그라피 공정
US08/395,182 US6007970A (en) 1992-02-07 1995-02-27 Lithographic developer containing surfactant

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5708192 1992-02-07
JP4-57081 1992-02-07

Publications (1)

Publication Number Publication Date
JPH05303207A true JPH05303207A (ja) 1993-11-16

Family

ID=13045534

Family Applications (2)

Application Number Title Priority Date Filing Date
JP4233080A Pending JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233082A Pending JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP4233082A Pending JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Country Status (4)

Country Link
JP (2) JPH05303207A (enExample)
KR (1) KR960015482B1 (enExample)
MY (1) MY121957A (enExample)
TW (1) TW259850B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5848321A (en) * 1995-12-20 1998-12-08 Samsung Electronics Co., Ltd. Method for automatically controlling transfer voltage in printer using electrophotography system
US6742944B2 (en) 2001-05-14 2004-06-01 Kabushiki Kaisha Toshiba Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
JP2011215244A (ja) * 2010-03-31 2011-10-27 Hoya Corp レジスト層の現像剤、レジストパターンの形成方法及びモールドの製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7357535B2 (ja) * 2019-12-17 2023-10-06 三井化学株式会社 アルキレンオキシド重合体の製造方法
JP7422530B2 (ja) * 2019-12-17 2024-01-26 三井化学株式会社 アルキレンオキシド重合体の曇点測定用溶媒

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5848321A (en) * 1995-12-20 1998-12-08 Samsung Electronics Co., Ltd. Method for automatically controlling transfer voltage in printer using electrophotography system
US6742944B2 (en) 2001-05-14 2004-06-01 Kabushiki Kaisha Toshiba Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
US7097960B2 (en) 2001-05-14 2006-08-29 Kabushiki Kaisha Toshiba Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
US7399578B2 (en) 2001-05-14 2008-07-15 Kabushiki Kaisha Toshiba Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
JP2011215244A (ja) * 2010-03-31 2011-10-27 Hoya Corp レジスト層の現像剤、レジストパターンの形成方法及びモールドの製造方法

Also Published As

Publication number Publication date
KR930018651A (ko) 1993-09-22
KR960015482B1 (ko) 1996-11-14
MY121957A (en) 2006-03-31
JPH05303208A (ja) 1993-11-16
TW259850B (enExample) 1995-10-11

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