JPH0529301B2 - - Google Patents
Info
- Publication number
- JPH0529301B2 JPH0529301B2 JP63322313A JP32231388A JPH0529301B2 JP H0529301 B2 JPH0529301 B2 JP H0529301B2 JP 63322313 A JP63322313 A JP 63322313A JP 32231388 A JP32231388 A JP 32231388A JP H0529301 B2 JPH0529301 B2 JP H0529301B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- amine compound
- positive resist
- resist containing
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63322313A JPH02166718A (ja) | 1988-12-21 | 1988-12-21 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63322313A JPH02166718A (ja) | 1988-12-21 | 1988-12-21 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02166718A JPH02166718A (ja) | 1990-06-27 |
| JPH0529301B2 true JPH0529301B2 (enExample) | 1993-04-30 |
Family
ID=18142234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63322313A Granted JPH02166718A (ja) | 1988-12-21 | 1988-12-21 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02166718A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7875419B2 (en) | 2002-10-29 | 2011-01-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for removing resist pattern and method for manufacturing semiconductor device |
| JPWO2024128279A1 (enExample) * | 2022-12-15 | 2024-06-20 |
-
1988
- 1988-12-21 JP JP63322313A patent/JPH02166718A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02166718A (ja) | 1990-06-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080430 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090430 Year of fee payment: 16 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090430 Year of fee payment: 16 |