JPH0528892B2 - - Google Patents
Info
- Publication number
- JPH0528892B2 JPH0528892B2 JP61077144A JP7714486A JPH0528892B2 JP H0528892 B2 JPH0528892 B2 JP H0528892B2 JP 61077144 A JP61077144 A JP 61077144A JP 7714486 A JP7714486 A JP 7714486A JP H0528892 B2 JPH0528892 B2 JP H0528892B2
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- optical device
- optical
- substrate
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61077144A JPS62232924A (ja) | 1986-04-03 | 1986-04-03 | 反射型投影露光機のアライメント光学装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61077144A JPS62232924A (ja) | 1986-04-03 | 1986-04-03 | 反射型投影露光機のアライメント光学装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62232924A JPS62232924A (ja) | 1987-10-13 |
JPH0528892B2 true JPH0528892B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-04-27 |
Family
ID=13625602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61077144A Granted JPS62232924A (ja) | 1986-04-03 | 1986-04-03 | 反射型投影露光機のアライメント光学装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62232924A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6927861B2 (en) * | 2001-06-29 | 2005-08-09 | Xanoptix, Inc. | Simple deterministic method for array based optical component packaging |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS602772B2 (ja) * | 1976-11-01 | 1985-01-23 | 株式会社日立製作所 | 露光装置 |
JPS58108745A (ja) * | 1981-12-23 | 1983-06-28 | Canon Inc | 転写装置 |
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1986
- 1986-04-03 JP JP61077144A patent/JPS62232924A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62232924A (ja) | 1987-10-13 |