JPH0528758Y2 - - Google Patents
Info
- Publication number
- JPH0528758Y2 JPH0528758Y2 JP1985028518U JP2851885U JPH0528758Y2 JP H0528758 Y2 JPH0528758 Y2 JP H0528758Y2 JP 1985028518 U JP1985028518 U JP 1985028518U JP 2851885 U JP2851885 U JP 2851885U JP H0528758 Y2 JPH0528758 Y2 JP H0528758Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- semiconductor wafer
- nozzle
- water
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000007921 spray Substances 0.000 claims description 3
- 238000004381 surface treatment Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 239000000126 substance Substances 0.000 description 9
- 238000011109 contamination Methods 0.000 description 8
- 229910001385 heavy metal Inorganic materials 0.000 description 6
- 239000002923 metal particle Substances 0.000 description 4
- 238000012958 reprocessing Methods 0.000 description 4
- 238000011084 recovery Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985028518U JPH0528758Y2 (fr) | 1985-02-28 | 1985-02-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985028518U JPH0528758Y2 (fr) | 1985-02-28 | 1985-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61144636U JPS61144636U (fr) | 1986-09-06 |
| JPH0528758Y2 true JPH0528758Y2 (fr) | 1993-07-23 |
Family
ID=30526465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985028518U Expired - Lifetime JPH0528758Y2 (fr) | 1985-02-28 | 1985-02-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528758Y2 (fr) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4999480A (fr) * | 1973-01-02 | 1974-09-19 | ||
| JPS5493972A (en) * | 1978-01-06 | 1979-07-25 | Mitsubishi Electric Corp | Etching unit of semiconductor element |
| JPS5580319A (en) * | 1978-12-12 | 1980-06-17 | Nec Corp | Manufacture of semiconductor device |
| JPS5844838B2 (ja) * | 1979-08-06 | 1983-10-05 | 鈴木シヤツタ−工業株式会社 | シャツタ−の随時閉鎖手動操作箱 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5844838U (ja) * | 1981-09-21 | 1983-03-25 | 三菱電機株式会社 | ウエ−ハ洗浄乾燥装置 |
-
1985
- 1985-02-28 JP JP1985028518U patent/JPH0528758Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4999480A (fr) * | 1973-01-02 | 1974-09-19 | ||
| JPS5493972A (en) * | 1978-01-06 | 1979-07-25 | Mitsubishi Electric Corp | Etching unit of semiconductor element |
| JPS5580319A (en) * | 1978-12-12 | 1980-06-17 | Nec Corp | Manufacture of semiconductor device |
| JPS5844838B2 (ja) * | 1979-08-06 | 1983-10-05 | 鈴木シヤツタ−工業株式会社 | シャツタ−の随時閉鎖手動操作箱 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61144636U (fr) | 1986-09-06 |
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