JPH0525953B2 - - Google Patents
Info
- Publication number
- JPH0525953B2 JPH0525953B2 JP18027783A JP18027783A JPH0525953B2 JP H0525953 B2 JPH0525953 B2 JP H0525953B2 JP 18027783 A JP18027783 A JP 18027783A JP 18027783 A JP18027783 A JP 18027783A JP H0525953 B2 JPH0525953 B2 JP H0525953B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode plate
- heating
- processed
- etching
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 claims description 36
- 238000005530 etching Methods 0.000 claims description 23
- 238000000992 sputter etching Methods 0.000 claims description 17
- 230000007246 mechanism Effects 0.000 claims description 10
- 239000000758 substrate Substances 0.000 description 13
- 239000011521 glass Substances 0.000 description 11
- 238000004544 sputter deposition Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18027783A JPS6075588A (ja) | 1983-09-30 | 1983-09-30 | 加熱機構付のスパツタエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18027783A JPS6075588A (ja) | 1983-09-30 | 1983-09-30 | 加熱機構付のスパツタエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6075588A JPS6075588A (ja) | 1985-04-27 |
| JPH0525953B2 true JPH0525953B2 (enrdf_load_html_response) | 1993-04-14 |
Family
ID=16080405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18027783A Granted JPS6075588A (ja) | 1983-09-30 | 1983-09-30 | 加熱機構付のスパツタエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6075588A (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0425229U (enrdf_load_html_response) * | 1990-06-21 | 1992-02-28 | ||
| JP5764780B2 (ja) * | 2011-06-07 | 2015-08-19 | 株式会社ユーテック | ポーリング処理方法及び圧電体の製造方法 |
-
1983
- 1983-09-30 JP JP18027783A patent/JPS6075588A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6075588A (ja) | 1985-04-27 |
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