JPH05258702A - Sample holding mechanism - Google Patents

Sample holding mechanism

Info

Publication number
JPH05258702A
JPH05258702A JP5776592A JP5776592A JPH05258702A JP H05258702 A JPH05258702 A JP H05258702A JP 5776592 A JP5776592 A JP 5776592A JP 5776592 A JP5776592 A JP 5776592A JP H05258702 A JPH05258702 A JP H05258702A
Authority
JP
Japan
Prior art keywords
sample
lever
wafer
holding
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5776592A
Other languages
Japanese (ja)
Inventor
Mizuki Imaizumi
水城 今泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5776592A priority Critical patent/JPH05258702A/en
Publication of JPH05258702A publication Critical patent/JPH05258702A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To provide a sample holding mechanism which enables sample replacement irrespective of a surrounding pressure and to enhance through put. CONSTITUTION:In the case of conveying, observing or beam drawing of a sample 51, a holding body 35 fixed to a tip of lever is pressed to a sample end face by means of a coil spring to hold the sample 51. In the case of sample replacement, a bar 38 is displaced by a pad plate 22 in the direction to push a lever, and the holding body 35 is separated from the sample end face against the coil spring to release holding of the sample 51.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウエハ(以下ウ
エハと呼ぶ)等の試料保持機構に係わり、特に真空中に
おいてウエハ等の試料を保持するのに好適な試料保持機
構に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sample holding mechanism such as a semiconductor wafer (hereinafter referred to as a wafer), and more particularly to a sample holding mechanism suitable for holding a sample such as a wafer in a vacuum.

【0002】[0002]

【従来の技術】走査電子顕微鏡あるいは電子線描画装置
等でウエハ等の試料を観察もしくは試料の表面に電子線
描画する場合には、大気中にあるウエハ等の試料を試料
台に装着して、これを真空中に導入し、真空下でウエハ
等の試料を観察あるいは描画する方法が採られている。
2. Description of the Related Art When observing a sample such as a wafer with a scanning electron microscope or an electron beam drawing apparatus or drawing an electron beam on the surface of the sample, a sample such as a wafer in the atmosphere is mounted on a sample table. A method of introducing this into a vacuum and observing or drawing a sample such as a wafer under vacuum is adopted.

【0003】従来のこの種の試料保持装置としては、特
開昭60−167245号に示されるように、支持部材に載上さ
れた試料端面を前記保持部材と共に保持するための保持
体を先端に有し、周囲の圧力変化により変位する手段か
らなっている。変位手段としては、金属べローズが用い
られ、周囲の圧力が大気圧から真空圧に変化したときに
先端の保持体が試料端面に押圧する位置まで変位するも
のが知られている。
As a conventional sample holding device of this type, as shown in Japanese Patent Laid-Open No. 167245/1985, a holding body for holding the sample end face mounted on a supporting member together with the holding member is provided at the tip. It has means for displacing due to a change in ambient pressure. As a displacement means, a metal bellows is used, and it is known that when the ambient pressure changes from atmospheric pressure to vacuum pressure, it is displaced to a position where the holder at the tip presses the sample end face.

【0004】[0004]

【発明が解決しようとする課題】上記の従来技術では、
試料交換室内が真空であるとき金属ベローズが変位し、
保持体が試料端面を押圧しているため、試料交換室内を
大気圧にしてから試料交換を行わなければならないとい
う問題点があった。
SUMMARY OF THE INVENTION In the above prior art,
The metal bellows is displaced when the sample exchange chamber is in a vacuum,
Since the holder presses the sample end surface, there is a problem that the sample exchange must be performed after the pressure in the sample exchange chamber is set to the atmospheric pressure.

【0005】本発明の目的は、周囲圧力に関係なく試料
交換が可能な試料保持機構を提供することである。
An object of the present invention is to provide a sample holding mechanism capable of exchanging samples regardless of ambient pressure.

【0006】また、本発明の他の目的は、上記目的を達
成することによって、スループットを向上させることで
ある。
[0006] Another object of the present invention is to improve the throughput by achieving the above object.

【0007】[0007]

【課題を解決するための手段】本発明の特徴は、試料保
持体の押圧手段にコイルばねを有するレバーを用い、ま
た、試料交換室に保持体を変位させる当て板を固設した
点にある。
A feature of the present invention is that a lever having a coil spring is used as a pressing means for the sample holder, and a contact plate for displacing the holder is fixedly provided in the sample exchange chamber. ..

【0008】[0008]

【作用】試料を搬送あるいは観察,描画する際には、レ
バーの先端に固設された保持体はコイルばねにより試料
端面を押圧し、試料を保持する。また試料交換時には、
当て板によりバーがレバーを押す方向に変位し、コイル
ばねに抗して保持体は試料端面から離れ、試料の保持を
解除する。
When the sample is transported, observed or drawn, the holding body fixed to the tip of the lever presses the sample end surface by the coil spring to hold the sample. Also, when exchanging samples,
The bar causes the bar to be displaced in the direction of pushing the lever, the holder is separated from the sample end face against the coil spring, and the sample is released.

【0009】[0009]

【実施例】以下、本発明の実施例を図面を用いて説明す
る。図1は本発明に係わる試料保持機構を含む走査電子
顕微鏡等のウエハ観察用装置における試料交換装置の平
面図、図2は試料保持機構部分の一部断面平面図、図3
は縦断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view of a sample exchanging device in a wafer observing device such as a scanning electron microscope including a sample holding mechanism according to the present invention, and FIG. 2 is a partial sectional plan view of a sample holding mechanism portion.
Is a vertical sectional view.

【0010】図1において21は試料交換室であり、試
料室11との間は仕切り弁12により真空的に遮断また
は連通されている。
In FIG. 1, reference numeral 21 denotes a sample exchange chamber, which is closed or communicated with the sample chamber 11 in a vacuum by a partition valve 12.

【0011】また、31は試料台の基台であり、試料ウ
エハ51を載上する支持部材33及びウエハ51の端面
を保持する保持部材32が固設されている。さらに、基
台31には支持部材33に載上されたウエハ51の端面
を保持部材32とともに保持する保持体35を先端に有
するレバー34が軸37によって取り付けられている。
レバー34は引張ばね36により保持体35がウエハ5
1の端面を押圧する方向に変位する。
Further, 31 is a base of the sample table, and a supporting member 33 for mounting the sample wafer 51 and a holding member 32 for holding the end surface of the wafer 51 are fixedly provided. Further, a lever 34 having a holder 35 for holding the end surface of the wafer 51 mounted on the supporting member 33 together with the holding member 32 at the tip is attached to the base 31 by a shaft 37.
The lever 34 has a tension spring 36, and
The end face of No. 1 is displaced in the direction of pressing.

【0012】試料交換室21内は真空圧であり、基台3
1が図1に示す位置にあるとき、当て板22がバー38
に当たり、バー38はレバー34を押し、従って保持体
35はウエハ51の端面から離れ、ウエハ交換が可能な
状態となる。この状態において、試料交換室21内に設
けられたアーム28が回転して既観察ウエハを基台31
から基台41に移す。また同様に、アーム29が回転し
て次観察ウエハを基台41から基台31に移す。
The inside of the sample exchange chamber 21 is under vacuum pressure, and the base 3
1 is in the position shown in FIG.
At this time, the bar 38 pushes the lever 34, so that the holding body 35 is separated from the end surface of the wafer 51, and the wafer can be exchanged. In this state, the arm 28 provided in the sample exchange chamber 21 rotates and the already-observed wafer is transferred to the base 31.
To the base 41. Similarly, the arm 29 rotates to transfer the next observation wafer from the base 41 to the base 31.

【0013】基台31を試料室11に進退させる送り機
構は、送りねじ23,これに蝶合するナット25,直進
ガイド24から構成され、外部に位置するモータ26に
よって送りねじ23が回転し、ナット25が直進ガイド
24に沿って直進運動をするように構成されている。ナ
ット25は基台31をチャック/アンチャック可能であ
り、基台31の試料室11への搬入及び搬出を行う。基
台31を案内するガイド24は、たとえば四ふっ化エチ
レン樹脂等の材料で製作された滑り案内部材でも、ボー
ルベアリングを配列した転がりガイド部材で構成されて
もよい。
The feed mechanism for moving the base 31 into and out of the sample chamber 11 is composed of a feed screw 23, a nut 25 fitted on the feed screw 23, and a straight guide 24, and the motor 26 located outside rotates the feed screw 23. The nut 25 is configured to move linearly along the linear guide 24. The nut 25 can chuck / unchuck the base 31, and carries the base 31 into and out of the sample chamber 11. The guide 24 for guiding the base 31 may be, for example, a sliding guide member made of a material such as tetrafluoroethylene resin, or a rolling guide member having ball bearings arranged therein.

【0014】基台31が試料室11の方向に搬送される
と、バー38は当て板22より離れ、引張ばね36によ
って保持体35はウエハ51の端面を押圧し、ウエハを
保持する。
When the base 31 is conveyed in the direction of the sample chamber 11, the bar 38 is separated from the contact plate 22, and the tension spring 36 causes the holder 35 to press the end surface of the wafer 51 to hold the wafer.

【0015】仕切り弁12を通して試料交換室21から
試料室11にウエハを搬入後、仕切り弁12を閉じ、試
料交換室21を大気圧にして、基台41上の既観察ウエ
ハを外部の次観察ウエハと交換する。再び試料交換室2
1を真空にして、試料室11内のウエハの観察が終わっ
たら仕切り弁12を開き、基台31を図1に示す位置ま
でもどす。
After the wafer is loaded into the sample chamber 11 from the sample exchange chamber 21 through the partition valve 12, the partition valve 12 is closed, the sample exchange chamber 21 is set to the atmospheric pressure, and the observed wafer on the base 41 is next observed outside. Replace with wafer. Sample exchange room 2 again
When 1 is evacuated and the observation of the wafer in the sample chamber 11 is completed, the partition valve 12 is opened and the base 31 is returned to the position shown in FIG.

【0016】以上のような試料交換手順をとれば、大気
中でウエハを交換中には別のウエハは観察中であるの
で、試料交換室21及び試料室11には合わせて2枚の
ウエハが存在する。よって、従来のようにウエハを1枚
ずつ大気中から試料室を経て再び大気中に搬送するのに
比べて、スループットは約2倍向上する。
According to the above sample exchange procedure, since another wafer is being observed while the wafer is being exchanged in the atmosphere, two wafers in total are provided in the sample exchange chamber 21 and the sample chamber 11. Exists. Therefore, the throughput is improved about twice as compared with the conventional case where wafers are transferred one by one from the atmosphere to the atmosphere again through the sample chamber.

【0017】前記実施例において、図4ないし図5に示
すように、バー38の代わりにレバー37に軸62で接
続したバー61によっても、前記実施例と同様の効果を
得ることができる。この場合、前記実施例で懸念される
レバー34側面とバー38先端との接触における摩擦の
問題が解決される。
In the above embodiment, as shown in FIGS. 4 to 5, the same effect as in the above embodiment can be obtained by using the bar 61 connected to the lever 37 by the shaft 62 instead of the bar 38. In this case, the problem of friction in the contact between the side surface of the lever 34 and the tip of the bar 38, which is a concern in the above embodiment, is solved.

【0018】また、コイルばね36に従来用いた金属べ
ローズに比べて径の小さなものを採用することにより、
基台31の薄型化が図れる。これは、試料搬送機構の小
型化に対して有効である。
Further, by adopting a coil spring 36 having a diameter smaller than that of the metal bellows conventionally used,
The base 31 can be thinned. This is effective for downsizing the sample transport mechanism.

【0019】[0019]

【発明の効果】以上詳述したように本発明によれば、試
料交換室において周囲圧力に関係なく試料台の移動のみ
により試料の交換が可能となる。また、この機構を利用
することにより、スループットが向上する。
As described above in detail, according to the present invention, the sample can be exchanged in the sample exchange chamber by only moving the sample table regardless of the ambient pressure. Moreover, the throughput is improved by using this mechanism.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す試料保持機構を含む試
料交換装置の一部断面平面図である。
FIG. 1 is a partial cross-sectional plan view of a sample exchange device including a sample holding mechanism showing an embodiment of the present invention.

【図2】本発明の一実施例を示す試料保持機構部分の一
部断面平面図である。
FIG. 2 is a partial cross-sectional plan view of a sample holding mechanism portion showing an embodiment of the present invention.

【図3】本発明の一実施例を示す試料保持機構部分の縦
断面図である。
FIG. 3 is a vertical sectional view of a sample holding mechanism portion showing an embodiment of the present invention.

【図4】本発明の他の実施例を示す試料保持機構部分の
一部断面平面図である。
FIG. 4 is a partial cross-sectional plan view of a sample holding mechanism portion showing another embodiment of the present invention.

【図5】本発明の他の実施例を示す試料保持機構部分の
縦断面図である。
FIG. 5 is a vertical sectional view of a sample holding mechanism portion showing another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

11…試料室、12…仕切り弁、21…試料交換室、2
2…当て板、23…送りねじ、24…直進ガイド、25
…ナット、26…モータ、27…ガイド、28,29…
アーム、31,41…基台、32…保持部材、33…支
持部材、34…レバー、35…保持体、36…引張ば
ね、37,62…軸、38,61…バー、51,52…
ウエハ。
11 ... Sample chamber, 12 ... Gate valve, 21 ... Sample exchange chamber, 2
2 ... Patch plate, 23 ... Feed screw, 24 ... Straight guide, 25
... nuts, 26 ... motors, 27 ... guides, 28,29 ...
Arms, 31, 41 ... Base, 32 ... Holding member, 33 ... Support member, 34 ... Lever, 35 ... Holding body, 36 ... Tension spring, 37, 62 ... Shaft, 38, 61 ... Bar, 51, 52 ...
Wafer.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ウエハ等の試料を載上する試料台と、前記
試料の端面を保持する保持体と、前記保持体を先端に有
するレバーと、前記レバーに取り付けられた前記保持体
を試料端面に変位させるばねと、前記レバーを押し前記
ばねに抗して前記保持体を試料端面から離れる方向に変
位させるバーとから成ることを特徴とする試料保持機
構。
1. A sample table on which a sample such as a wafer is placed, a holder for holding an end face of the sample, a lever having the holder at its tip, and a holder attached to the lever. A sample holding mechanism comprising a spring for displacing the lever and a bar for pushing the lever and displacing the holder in a direction away from the end face of the sample against the spring.
【請求項2】真空状態を保持する試料室と、前記試料台
を試料室の方向に進退させる送り機構と、前記試料室と
仕切り弁を介して遮断及び連通される試料交換室におい
て、前記試料台に装着された前記レバーを押すことによ
り前記保持体を変位させる当て板を固設したことを特徴
とする請求項1記載の試料保持機構。
2. A sample chamber that holds a vacuum state, a feed mechanism that moves the sample stage forward and backward in the direction of the sample chamber, and a sample exchange chamber that is shut off and communicated with the sample chamber via a gate valve. 2. The sample holding mechanism according to claim 1, further comprising a backing plate fixedly arranged to displace the holding body by pressing the lever mounted on the table.
JP5776592A 1992-03-16 1992-03-16 Sample holding mechanism Pending JPH05258702A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5776592A JPH05258702A (en) 1992-03-16 1992-03-16 Sample holding mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5776592A JPH05258702A (en) 1992-03-16 1992-03-16 Sample holding mechanism

Publications (1)

Publication Number Publication Date
JPH05258702A true JPH05258702A (en) 1993-10-08

Family

ID=13064976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5776592A Pending JPH05258702A (en) 1992-03-16 1992-03-16 Sample holding mechanism

Country Status (1)

Country Link
JP (1) JPH05258702A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021093305A (en) * 2019-12-11 2021-06-17 株式会社日立ハイテク Charged particle beam device and stage
CN117949678A (en) * 2024-03-26 2024-04-30 北京中科科仪股份有限公司 Sample batch detection device and detection method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021093305A (en) * 2019-12-11 2021-06-17 株式会社日立ハイテク Charged particle beam device and stage
CN117949678A (en) * 2024-03-26 2024-04-30 北京中科科仪股份有限公司 Sample batch detection device and detection method

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