JPH0525228Y2 - - Google Patents
Info
- Publication number
- JPH0525228Y2 JPH0525228Y2 JP1986098625U JP9862586U JPH0525228Y2 JP H0525228 Y2 JPH0525228 Y2 JP H0525228Y2 JP 1986098625 U JP1986098625 U JP 1986098625U JP 9862586 U JP9862586 U JP 9862586U JP H0525228 Y2 JPH0525228 Y2 JP H0525228Y2
- Authority
- JP
- Japan
- Prior art keywords
- heat insulating
- heat
- wafer
- free
- support columns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 claims description 17
- 239000000919 ceramic Substances 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000011810 insulating material Substances 0.000 claims description 6
- 238000009413 insulation Methods 0.000 description 14
- 230000000694 effects Effects 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 239000012212 insulator Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000006091 Macor Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986098625U JPH0525228Y2 (de) | 1986-06-27 | 1986-06-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986098625U JPH0525228Y2 (de) | 1986-06-27 | 1986-06-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS635624U JPS635624U (de) | 1988-01-14 |
| JPH0525228Y2 true JPH0525228Y2 (de) | 1993-06-25 |
Family
ID=30966735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986098625U Expired - Lifetime JPH0525228Y2 (de) | 1986-06-27 | 1986-06-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0525228Y2 (de) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49107676A (de) * | 1973-02-16 | 1974-10-12 |
-
1986
- 1986-06-27 JP JP1986098625U patent/JPH0525228Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49107676A (de) * | 1973-02-16 | 1974-10-12 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS635624U (de) | 1988-01-14 |
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