JPH0525174B2 - - Google Patents
Info
- Publication number
- JPH0525174B2 JPH0525174B2 JP59091140A JP9114084A JPH0525174B2 JP H0525174 B2 JPH0525174 B2 JP H0525174B2 JP 59091140 A JP59091140 A JP 59091140A JP 9114084 A JP9114084 A JP 9114084A JP H0525174 B2 JPH0525174 B2 JP H0525174B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- transistor
- output
- source
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/15—Charge-coupled device [CCD] image sensors
- H10F39/156—CCD or CID colour image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D44/00—Charge transfer devices
- H10D44/40—Charge-coupled devices [CCD]
- H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes
- H10D44/454—Output structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/15—Charge-coupled device [CCD] image sensors
- H10F39/153—Two-dimensional or three-dimensional array CCD image sensors
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8301629 | 1983-05-09 | ||
| NL8301629A NL8301629A (nl) | 1983-05-09 | 1983-05-09 | Halfgeleiderinrichting. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59208775A JPS59208775A (ja) | 1984-11-27 |
| JPH0525174B2 true JPH0525174B2 (enExample) | 1993-04-12 |
Family
ID=19841824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59091140A Granted JPS59208775A (ja) | 1983-05-09 | 1984-05-09 | 半導体デバイス |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4622567A (enExample) |
| EP (1) | EP0127223B1 (enExample) |
| JP (1) | JPS59208775A (enExample) |
| CA (1) | CA1214573A (enExample) |
| DE (1) | DE3465553D1 (enExample) |
| NL (1) | NL8301629A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63278248A (ja) * | 1987-03-13 | 1988-11-15 | Fujitsu Ltd | ゲ−トアレイの基本セル |
| EP0396093B1 (en) * | 1989-05-02 | 1999-06-23 | Sony Corporation | Charge transfer device having multiple registers |
| US5206530A (en) * | 1989-05-02 | 1993-04-27 | Sony Corporation | Charge transfer device having multiple registers |
| US5194751A (en) * | 1989-07-17 | 1993-03-16 | Sony Corporation | Structure of solid-state image sensing devices |
| EP0409174B1 (en) * | 1989-07-17 | 2004-06-09 | Sony Corporation | Structure of solid-state image sensing devices |
| JP2509706B2 (ja) * | 1989-08-18 | 1996-06-26 | 株式会社東芝 | マスクromの製造方法 |
| JPH0828497B2 (ja) * | 1990-07-19 | 1996-03-21 | 株式会社東芝 | 固体撮像装置 |
| JP3097186B2 (ja) * | 1991-06-04 | 2000-10-10 | ソニー株式会社 | 固体撮像装置 |
| US5387536A (en) * | 1994-01-26 | 1995-02-07 | Eastman Kodak Company | Method of making a low capacitance floating diffusion structure for a solid state image sensor |
| US5591997A (en) * | 1995-01-17 | 1997-01-07 | Eastman Kodak Company | Low capacitance floating diffusion structure for a solid state image sensor |
| JP3280288B2 (ja) * | 1996-09-12 | 2002-04-30 | シャープ株式会社 | 固体撮像装置、その製造方法、およびその駆動方法 |
| US6878977B1 (en) * | 1999-02-25 | 2005-04-12 | Canon Kabushiki Kaisha | Photoelectric conversion device, and image sensor and image input system making use of the same |
| JP7242285B2 (ja) * | 2018-12-19 | 2023-03-20 | キオクシア株式会社 | 半導体装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2159592C3 (de) * | 1971-12-01 | 1981-12-17 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Integrierte Halbleiteranordnung |
| US4152717A (en) * | 1975-07-18 | 1979-05-01 | Tokyo Shibaura Electric Co., Ltd. | Complementary MOSFET device |
| JPS5422781A (en) * | 1977-07-22 | 1979-02-20 | Hitachi Ltd | Insulator gate protective semiconductor device |
-
1983
- 1983-05-09 NL NL8301629A patent/NL8301629A/nl not_active Application Discontinuation
-
1984
- 1984-05-02 CA CA000453390A patent/CA1214573A/en not_active Expired
- 1984-05-04 US US06/607,334 patent/US4622567A/en not_active Expired - Fee Related
- 1984-05-07 EP EP84200643A patent/EP0127223B1/en not_active Expired
- 1984-05-07 DE DE8484200643T patent/DE3465553D1/de not_active Expired
- 1984-05-09 JP JP59091140A patent/JPS59208775A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| CA1214573A (en) | 1986-11-25 |
| US4622567A (en) | 1986-11-11 |
| DE3465553D1 (en) | 1987-09-24 |
| NL8301629A (nl) | 1984-12-03 |
| EP0127223A1 (en) | 1984-12-05 |
| JPS59208775A (ja) | 1984-11-27 |
| EP0127223B1 (en) | 1987-08-19 |
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