JPH05224011A - Production of color filter - Google Patents

Abstract

PURPOSE:To provide a producing method for a color filter by completely removing the residue of a coloring resin left on the surface of a glass base plate in a photolithography process, thereby improving production efficiency. CONSTITUTION:In the producing method for the color filter by applying the coloring resin made by dispersing at least a coloring material in a transparent photosensitive resin on the base plate 1, executing exposure and development in the photolithography process after heating and temporarily hardening and by heating again and main hardening, 2-20J/cm<2> ultraviolet UV-beam 4 is radiated on the surface of the substrate in the atmosphere and the residue left on the surface of the substrate 1 in the developing process is removed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter, and more particularly to a method for manufacturing a color filter for a color display such as a liquid crystal display device.

[0002]

2. Description of the Related Art There are several types of color filters. Among them, a method using a colored resin film in which a coloring material is mixed with a photosensitive resin is relatively excellent in heat resistance and the manufacturing process is simple. well known.

Conventionally, in order to form the above-mentioned color filter on a substrate, patterning is generally performed by a photolithography process, but this patterning is usually performed by using a spinner method, a printing method, a roll coater method or the like as a coating step. Is applied to the substrate, then temporarily cured (prebaked) using a hot plate, oven, etc., then exposed through a photomask, immersed in a developing solution for development, and then heated again at a temperature higher than the temporary curing. Then, main curing (post-baking) is performed to form a color filter pattern.

In order to manufacture a substrate for a liquid crystal display device, a transparent insulating film, mainly for the purpose of flattening, is formed on the color filter formed by the above method, and then a transparent electrode, further a metal electrode, etc. are formed. A film is formed and patterned to obtain a substrate with a color filter having a striped electrode group.

As the transparent insulating film, SiO is used.
_In addition to an inorganic film such as ₂ , TaO _x , a transparent resin film, a photosensitive transparent resin film, or the like is used, and patterning may be performed.

[0006]

However, in the above-mentioned conventional example, in the photolithography process, when the colored resin applied on the substrate is exposed and developed with a developing solution, the chemical dissolution rate of the unexposed portion is Slowly, especially near the interface with the substrate, a cup-rigging agent may be contained in the colored resin in order to improve the adhesion between the colored resin in the photocured part and the substrate. Even if the immersion time in the developing solution is extended until this occurs, the colored resin in the unexposed portion cannot be completely removed, and there is a drawback that it remains as a residue at the interface with the substrate.

Although this residue can be removed to some extent by washing with a solvent or the like, it is very difficult to completely remove it, and it remains very thin on the substrate surface. Then, this residue deteriorates the adhesion between the film and the substrate when another color is formed or a transparent electrode or a metal electrode is formed and patterned in the subsequent step, and causes the film peeling or the like. become. In particular, in the mounting portion that connects the liquid crystal panel of the liquid crystal display element and the driver for driving, a large physical force is easily applied to the mounting electrodes on the substrate, and the mounting electrodes peel off from the substrate, resulting in a fatal defect. It was.

The present invention provides a method for manufacturing a color filter, in which the above-mentioned drawbacks of the prior art are improved, the residue of the colored resin remaining on the substrate surface in the photolithography process is completely removed, and the production efficiency is improved. The purpose is that.

[0009]

That is, according to the present invention, in a photolithography process, a substrate is coated with a colored resin in which at least a colored material is dispersed in a transparent photosensitive resin, which is heated and temporarily cured. In the method of producing a color filter by exposing and developing, and then heating again to perform main curing,
Between the developing step and the main curing step, the substrate surface is irradiated with ultraviolet rays of ^{2 to 20} J / cm ² in the atmosphere to remove the residue left on the substrate surface in the developing step. It is a manufacturing method.

The present invention will be described in detail below. The present invention applies a colored resin obtained by dispersing at least a colored material in a transparent photosensitive resin onto a substrate, and after heating and temporary curing, exposure and development steps in a photolithography step are performed,
In the method of forming a color filter by heating again by main curing, in the atmosphere between the developing step and the main curing step, the substrate surface is exposed to ultraviolet rays of ^{2 to 20} J / cm ² (hereinafter, U).
By irradiating V light), ozone is generated, and the residue remaining on the substrate surface in the developing step reacts with ozone to completely remove the residue on the substrate surface.

In the color filter manufactured by the method of the present invention, since the residue remaining on the surface of the substrate is completely removed, the transparent electrode, the metal electrode, etc. formed and patterned in the subsequent step and the substrate The adhesion with
Even in the mounting portion that connects the liquid crystal panel and the driver for driving, the mounting electrodes are not peeled off from the substrate, and the substrate with a color filter can be manufactured with high yield.

In the present invention, the surface of the substrate is irradiated with ultraviolet rays of ^{2 to 20} J / cm ² in the atmosphere. The purpose of the irradiation of ultraviolet rays is to clean the surface of the substrate by the generation of ozone. It requires irradiation energy of ^{2 to 20} J / cm ^{2 in} the atmosphere.

FIG. 1 is a process chart showing an example of a method for manufacturing a color filter of the present invention. Referring to FIG. 1, in the method of manufacturing a color filter of the present invention, first, a color filter material coating film 2 is applied on a glass substrate 1 by a spinner method and temporarily cured (see FIG. 1A). Next, UV light 4 is exposed using a photomask 3 with an exposure device (see FIG. 1).
(See (b)). After exposure, development, rinsing, and drying steps are performed (see FIG. 1 (c)). In this developing step, the residue 5 close to the monolayer remains on the surface of the substrate.

Next, in order to remove the residue 5, the surface of the substrate is irradiated with UV light 6 of ² to 20 J / cm ² from the UV lamp 7 in the air to decompose and remove the residue (FIG. 1 (d)). reference). Then, it is heated again by the hot plate 8 to be fully cured to form a color filter (see FIG. 1E). In order to form R (red), G (green), and B (blue), it is necessary to repeat the steps of FIGS. 1A to 1E for each color.

Further, as the coloring resin, a resin in which at least a coloring material is dispersed in a photosensitive resin is used, but the photosensitive resin is preferably composed of a component mainly composed of polyamide. There is no particular limitation on the coloring material, and a wide range of coloring materials can be used.

As a method for applying the colored resin on the substrate, for example, a spinner method, a printing method, a roll coater method, etc. are used, but the spinner method is particularly preferred.

Regarding the confirmation of the effect of decomposing / removing the residue, the presence or absence of the effect can be easily understood by rubbing the surface. However, in order to look a little more finely, a means for measuring the contact angle of the glass substrate surface and confirming it in the state of surface energy (anchoring energy) is used. Of the contact angle measurements, focusing on the simplest method, for example, using H ₂ O, and looking at the difference, the contact angle on the raw glass is 4.2 degrees (the glass substrate surface immediately after cleaning). On the other hand, in the conventional method, a color filter material is used, and coating / exposure /
The contact angle is as large as 46 degrees in the part where the color filter after development should not remain. This indicates that the components of the color filter material or the developing solution remain in the unit of several tens to several hundreds of liters.

In the present invention, since the component of the residue cannot be specified, it will be described as a residual component of the color filter material. The residual component is UV as shown in FIG. 1 (d).
It was confirmed that it was disassembled and washed by exposing it to light, and that the contact angle was almost the same as that of plain glass.

[0019]

EXAMPLES The present invention will be specifically described below with reference to examples.

Example 1 A color filter was manufactured by the method shown in FIG.
First, metal Cr was deposited on a glass substrate 1 to a thickness of about 800 Å by a sputtering method, and then a required pattern was formed through photolithography. Next, a negative type photosensitive polyamide was used as a main component, and a color filter material containing a pigment was used to apply a film having a thickness of 1.6 μm by a spinner method (see FIG. 1A).

Next, after temporarily curing at 80 ° C. for 10 minutes on a hot plate, UV light of 100 is applied using a photomask.
Irradiation was performed up to 600 mJ (see FIG. 1 (b)). The color filter material is photo-cured by UV irradiation. After that, with a developer, remove the part that is not photocured,
Moved to rinse, wash and dry process. The H _{2 of the} peripheral portion without the color filter pattern formed in this way
The contact angle with O was about 46 degrees.

After that, the substrate with color filter pattern was irradiated with 5 J / cm ² of UV light using a UV lamp, and the contact angle of H ₂ O of the peripheral portion of the substrate without the color filter pattern was 12 degrees. became. next,
The substrate was heated on a hot plate at 200 ° C. for 10 minutes and post-baked. The above process is R (red), G
(Green), B (blue) for each color (Figure 1 (a) ~
(See (d)), a color filter substrate for a display was formed.

On this substrate, an ITO film and a metal film of an auxiliary electrode are formed by sputtering and patterned by a photolithography process, an insulating layer is formed, an alignment film is further formed, and an alignment film is rubbed on the counter substrate. Pasted together. Ferroelectric liquid crystal is injected into this panel, and after sealing, TAB is mounted on the mounting part.
By connecting the ICs, the adhesion of the mounting portion was very good.

Example 2 A color filter was manufactured by the method shown in FIG.
First, metal Cr was deposited on a glass substrate 1 to a thickness of about 800 Å by a sputtering method, and then a required pattern was formed through photolithography. Next, a negative type photosensitive polyamide was used as a main component, and a color filter material containing a pigment was used to apply a film having a thickness of 1.6 μm by a spinner method (see FIG. 1A).

Next, after temporary curing at 80 ° C. for 10 minutes on a hot plate, UV light of 100 is applied using a photomask.
Irradiation was performed up to 600 mJ (see FIG. 1 (b)). The color filter material is photo-cured by UV irradiation. After that, with a developer, remove the part that is not photocured,
Moved to rinse, wash and dry process. The H _{2 of the} peripheral portion without the color filter pattern formed in this way
The contact angle with O was about 46 degrees.

Then, the substrate with color filter pattern was irradiated with UV light at 15 J / cm ² by using a UV lamp. The contact angle of H ₂ O of the peripheral portion of the substrate without the color filter pattern was 4.6. It became a degree.

Next, the substrate is placed in a clean oven at 25
Post baking was performed by heating at 0 ° C. for 60 minutes. The above process is performed for each color of R (red), G (green), and B (blue) (see FIGS. 1A to 1D) to further form a protective film,
A color filter substrate for a display was formed.

On this substrate, an ITO film and a metal film of an auxiliary electrode are formed by sputtering, respectively, and patterned by a photolithography process, then an insulating layer is formed, an alignment film is further formed thereon, and rubbing is performed on the alignment film. Pasted together. Ferroelectric liquid crystal is injected into this panel, and after sealing, TAB is mounted on the mounting part.
By connecting the ICs, the adhesion of the mounting portion was very good.

[0029]

As described above, according to the present invention, when a color filter is formed, UV light is irradiated after development patterning and before main curing to remove residual components of the color filter remaining on the substrate surface. By disassembling and removing it, a substrate with a color filter having excellent adhesiveness to the mounting portion can be provided. In particular, it is necessary to carry out the present invention for a negative type photosensitive color filter material, and there is a very excellent effect.

Further, by performing the irradiation of UV light after the development and before the main curing, less energy is required as compared with the case of irradiating the UV light after the main curing to decompose and remove the residual components, and moreover, the residue is evenly distributed over the entire area. There is also an effect that components can be decomposed and removed.

[Brief description of drawings]

FIG. 1 is a process drawing showing an example of a method for manufacturing a color filter of the present invention.

[Explanation of symbols]

 1 Glass Substrate 2 Color Filter Material Coating Film 3 Photo Mask 4 UV Light 5 Residue 6 UV Light 7 UV Lamp 8 Hot Plate

Claims (3)

[Claims] 1. A colored resin in which at least a colored material is dispersed in a transparent photosensitive resin is applied on a substrate, heated and temporarily cured, and then exposed and developed in a photolithography process, and then heated again. In the method for producing a color filter by main curing, the substrate surface is irradiated with ultraviolet rays of ^{2 to 20} J / cm ² in the atmosphere between the developing step and the main curing step, and remains on the substrate surface in the developing step. A method for producing a color filter, which comprises removing a residue. 2. The method for producing a color filter according to claim 1, wherein the colored resin is applied onto the substrate by a spinner method. 3. The method for producing a color filter according to claim 1, wherein the photosensitive resin is composed of a component mainly containing polyamide.