JPS63155105A - Color filter - Google Patents

Abstract

PURPOSE:To stably obtain a color filter having superior spectral characteristics and high quality by forming each of patterned colored resin layers with a colored resin contg. a coloring material whose surface has been subjected to electrostatic charge. CONSTITUTION:Each of patterned colored resin layers 4-6 is formed on a substrate 1 with a colored resin contg. a coloring material whose surface has been subjected to electrostatic charge in arom. polyamide resin or polyimide resin. Since the surface of the coloring material has been subjected to electrostatic charge, particles of the coloring material having electric charges of the same polarity repel one another in a colored resin soln., so coagulation is hindered and a stable dispersed state can be obtd. When the polarity of the electric charges of the coloring material is made opposite to that of the resin as a dispersion medium, dispersion is well carried out and a stable colored resin soln. can be obtd. Thus, a superior color filter can be obtd.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a color filter.

In particular, the present invention relates to a color filter suitable for fine color separation in color imaging devices, color sensors, color displays, and the like.

[Conventional technology] Conventionally, color filters have been prepared using gelatin, gelatin, etc. on a substrate.
A mordant consisting of a hydrophilic polymer substance such as casein, gris, or polyvinyl alcohol.

A dyed color filter is known in which a layer is provided and the mordant layer is dyed with a dye to form a colored layer.

With this type of dyeing method, many dyes can be used, and it is relatively easy to meet the spectral characteristics required for the filter. Wet method 1, which is difficult to control due to immersion
It also has the disadvantage of poor yields because it involves a complicated process of providing an interlayer for resist dyeing for each color. Also, the heat resistance of dyeable pigments is 1
It is relatively low at around 50°C or less, making it difficult to use if the filter requires thermal treatment, and also has disadvantages such as poor reliability such as heat resistance and light resistance of the dyed film itself. ing.

On the other hand, color filters using a colored resin in which a certain type of coloring material is dispersed in a transparent resin are conventionally known.

For example, JP-A-58-46325, JP-A-60-
Publication No. 78401, Japanese Patent Application Laid-open No. 184202/1983,
JP-A-60-184203, JP-A-60-184
As shown in JP-A No. 204, JP-A-60-184205, etc., according to a color filter characterized by a colored resin film in which a coloring material is mixed with a polyamino resin, the polyamino resin itself is It has excellent properties such as heat resistance and light resistance, and it is possible to form a patterned color filter by printing or by etching the colored resin film after providing a resist mask on the colored resin film. be.

Also, JP-A-57-16407, JP-A-57-7
As shown in Japanese Patent Application Laid-open No. 4707 and Japanese Patent Application Laid-Open No. 60-129707, a color filter is characterized by a colored resin film in which a coloring material is mixed with a photosensitive resin. Fine patterns can be created with just 7 standard steps.

It is possible to simplify the process.

However, in color filters using colored resins in which these coloring materials are dispersed in transparent resin, it is difficult to disperse the colored materials in the resin, and once dispersed, aggregation occurs in the colored resin liquid. This was a major problem and was not fully satisfactory for obtaining color filters with uniform coating, high spectral transmittance, and few defects.

Particularly, when a colored resin liquid that has been dispersed is stored, the colored material tends to agglomerate significantly over time, creating many problems in obtaining color filters of stable quality. Like this,
In color filters using colored resins in which colored materials are dispersed in the resin, although it is clear that the manufacturing method is simple and the formed color filters have better properties, the dispersibility of the colored materials is poor. Due to these problems, it was not completely satisfactory to obtain a color filter of excellent quality.

[Dark problems to be solved by the invention] The purpose of the present invention is to eliminate the drawbacks of the above-mentioned conventional examples, and to process the coloring material into a form with good dispersibility, thereby achieving excellent spectral characteristics and quality. Our aim is to provide a stable supply of good color filters.

Another object of the present invention is to provide a color filter that can form a fine pattern through a simple manufacturing process and has excellent mechanical properties, heat resistance, light resistance, solvent resistance, and other properties.

[Means for Solving the Problems] That is, one aspect of the present invention is a color filter having a patterned colored resin layer of a plurality of colors formed of a colored resin in which a colored material is dispersed in the resin. This color filter is characterized in that it is formed of a colored resin using a colored material whose layers or surfaces have been subjected to a charging treatment in advance.

The present invention will be explained in detail below.

Examples of the resin forming the colored resin layer of the color filter of the present invention include polyvinyl alcohol, polyimide,
polyamideimide, polyesterimide, polyamide,
Polyester, polyvaraxylylene, polycarbonate, polyvinyl acetal, polyvinyl acetate, polystyrene, cellulose resin, melamine resin, urea resin, acrylic resin, epoxy resin, polyurethane resin, polysilicon resin, and resins obtained by imparting photosensitivity to these resins; Although it can be arbitrarily selected from general photoresist resins, the following resins are preferred, particularly from the viewpoint of the necessary properties of the color filter and pattern processability.

That is, aromatic polyamide resins and polyimide resins that have a photosensitive group in their molecules can be cured at temperatures of 200°C or lower, and can be cured in the visible light wavelength range (400 to 700 nm).
+s) and does not have specific light absorption characteristics (light transmittance of 90
% or more) Aromatic polyamide resin is preferable.The photosensitive group of the resin may be an aromatic chain having a photosensitive hydrocarbon unsaturated group as shown below. , (1) Benzoic acid esters (in the formula, R8 is cox-cy-coo-z-1X is -H or -CsHs, Y is -H or -C113, Z is - or an ethyl group or a glycidyl group) ( 2) Benzyl acrylates (3) Diphenyl ethers (in the formula, R2 is C) IX-CY-CONH-1CH2-C
Y-COO-((:H,) 2-OCO or CH*=C
Those containing 1 or more of Y-COO-C11g-, X, Y
represents the same system as above) (4) Chalcone and other compound chains υ (in the formula, R3 represents H-, an alkyl group, or an alkoxy group).

Specific examples of aromatic polyamide resins and polyimide resins having these groups in the molecule include Lithocoat PA-
1000 (manufactured by Ube Industries), Risocoat PI-400 (
(manufactured by Ube Industries, Ltd.).

The above-mentioned photosensitive polyamino resins (polyamide resins and polyimide resins) are resins with excellent durability in terms of chemical structure, and the color filters formed using them also have very good durability. becomes.

The coloring material forming the colored resin layer of the color filter of the present invention is not particularly limited, as long as it can obtain desired spectral characteristics among organic pigments, inorganic pigments, dyes, etc. , each material can be used alone or as a mixture of some of these materials.

However, when a dye is used, the performance of the color filter is controlled by the durability of the dye itself, but if the resin system of the present invention is used, the performance will be superior to that of ordinary dyed color filters. can be formed. Therefore, in view of the color characteristics and various performances of the color filter, organic pigments are most preferable as the coloring material.

Examples of a#i pigments include azo pigments such as soluble azo pigments, insoluble azo pigments, condensed azo pigments, phthalocyanine pigments, and indigo pigments, anthraquinone pigments, perylene pigments,
Perinone series, dioxazine series, quinacridone series, isointrinon series, phthalone series, methine/azomethine series,
Other condensed polycyclic pigments containing metal complex systems or mixtures of some of these may also be used.

The coloring material in the present invention is subjected to a charging process in advance. There are two main methods for charging the material.

That is, one method is (A) to actively charge the surface of a colored material that is an insulator, and the other method is (A) to actively charge the surface of a colored material that is an insulator.
B) A method in which the coloring material itself is provided with a group equivalent to being electrically charged.

Specifically, method (A) includes: ■ Charging by external discharge such as corona discharge, ■ Charging by bringing different types of insulators into contact, and ■ Friction while bringing insulators into contact. (2) A method of charging the surface of the colored material by treating it with a surfactant or the like can be used. As the method (B), method (2) using a coloring material having a polar group, etc. can be used.

The coloring material to be charged by the method described above is first made into a fine powder with a particle size of 0.1 to 0.8mm, and the amount of charge is determined by the agglomeration of the coloring material used. Although it varies depending on energy, surface area, interfacial potential, etc., in general, it is sufficient that the charge is greater than the cohesive energy of the coloring material for the purpose of stabilizing dispersion.

In addition, from the viewpoint of dispersibility of the coloring material, good results can be obtained in terms of dispersibility by using a coloring material having a polarity opposite to that of the resin to be dispersed.

In other words, from the above term -, the dispersion stability is highest when the charge amount of the coloring material is opposite to the polarity of the dispersion resin, exceeds the cohesive energy, and is larger than the sum of the charge amount and the charge amount of the resin and solvent shade. It will be in good condition.

In the present invention, the colored resin used to form the colored resin layer is a colored material obtained by subjecting any of the above-mentioned resin solutions to the above-mentioned main treatment to obtain desired spectral characteristics.
It is prepared by blending at a ratio of about 150% and thoroughly dispersing it by ultrasonication, triple roll mill, ball mill, Santo mill, etc., and then removing it with a filter with a large particle size, usually about Igm. .

The colored resin layer of the color filter of the present invention can be formed by a printing process such as screen or offset printing, or if a photosensitive resin is used, the colored resin can be formed by a spinner,
Coat it on the substrate with the WS device of Roll Coater-V, and
It is formed into a pattern by an otolithography process, and the layer thickness is determined depending on the desired spectral characteristics, but is usually 0.
It is desirably about 5 to 51, preferably about 1 to 21.

The colored resin layer of the color filter of the present invention is itself made of a good material with sufficient durability, but in particular, in order to protect the colored resin layer from various environmental conditions, , polyamide on the surface of the colored resin layer,
Organic resins such as polyimide, polyurethane, polycarbonate, silicone, etc., and 513114.5i02. Sin
, Ai'tOi, Tat03, etc. can be provided as a protective layer by a spin cord coating method, a roll coating method, or a vapor deposition method. Further, depending on the material, after forming the protective layer, an alignment treatment may be performed, thereby making it possible to apply the protective layer to devices using liquid crystal.

A color filter having a colored resin layer as described above can be formed on a suitable substrate.For example, a glass plate, a transparent resin plate, a resin film, a cathode ray tube display surface, a light receiving surface of an image pickup tube, a CCD, a BBD. , CI
Examples include wafers on which solid-state imaging devices such as BASIS are formed, liquid crystal display surfaces of contact type image sensors using thin film semiconductors, photoreceptors for color electrophotography, and the like.

If it is necessary to further increase the adhesion between the colored resin layer and the underlying substrate, either apply a thin layer of silane coupling agent or the like on the substrate before forming a colored resin pattern, or It is even more effective to form a color filter using a color filter to which a small amount of a silane coupling agent or the like is added.

Hereinafter, two typical methods of forming a color filter of the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram illustrating the method for forming a color filter of the present invention. First, as shown in FIG. 1(a), a polyamino resin solution (NMP solution) containing a predetermined amount of a pre-charged coloring material having desired spectral characteristics is used to form a first color colored resin film 2. is coated on a predetermined substrate l using a spinner to a predetermined film thickness, and prebaked under appropriate temperature conditions.Next, as shown in Figure 1(b), a photosensitive colored resin is applied. The colored resin film is exposed to light having a sensitivity of (for example, a high-pressure mercury lamp) through a photomask 3 having a predetermined pattern shape corresponding to the pattern to be formed, and the pattern portion is photocured.

Then, as shown in FIG. 1(C), the colored resin film 2 having the photocured portion 2a is dissolved in a solvent (for example, one containing N-methyl-2-pyrrolidone-based solvent as a main component) that dissolves only the unexposed portion. After ultrasonic development, rinsing treatment (for example, 1
,1,1. Then, a post-baking treatment is performed to obtain the patterned colored resin layer 4 of the present invention as shown in FIG. 1(d).

In addition, when forming the color filter of the present invention consisting of two or more colors, the color filter may be further adjusted as necessary, that is, depending on the number of colors of the filter used.

The steps from FIG. 1(a) to FIG. 1(d) are repeated using colored resin liquids in which charged colored materials corresponding to each color are dispersed.
) Patterned colored resin layers of different colors 4.5
A color filter consisting of the three colors of and 6 can be formed.

Further, the color filter of the present invention may have a protective layer 7 formed from the above-mentioned materials on the top of the filter, as shown in FIG. 1(f).

[Function] The color filter of the present invention has a patterned colored resin layer of a plurality of colors formed of a colored resin in which a colored material is dispersed in the resin, and the patterned colored resin layer charges the surface in advance. Since it is made of colored resin using treated colored material, by charging the surface of the colored material in advance, colored materials with the same charge repel each other in the colored resin liquid, inhibiting aggregation. A stable dispersion state can be obtained.

Furthermore, by setting a coloring material with an electric charge of the opposite sign to the electric charge degree of the resin to be dispersed, the dispersion itself becomes good, a stable coloring material can be obtained, and an excellent color filter can be obtained. be able to.

[Example] Examples of the present invention are shown below.

Example 1 First, the charging treatment of blue, green, and red coloring materials was performed as follows.

That is, blue colored material [Helion Blue (1+e
liogen Blue) L7080 (Product name,
Manufactured by BASF.

C, 1, No. 74160)] is crushed to a particle size of 0.
．． After aligning the length to 84 m or less, corona discharge was performed on this to obtain a positively charged blue colored material.

Similarly, a green coloring material [Lionol Green (L
ionol Green) 6Y (trade name, manufactured by Toyo Ink Co., Ltd., C,l No. 74265)] and a red coloring material [Irgazin R
ed) BPT (Product name.

Manufactured by Ciba-Geigy (C4ba-Geigy), C,1
,No.

71127) ], positively charged green and red colored materials were also obtained by corona discharge, respectively.

Next, a color filter was formed using each of the charged colored materials as follows.

That is, on a glass substrate, a blue colored resin material [PA-1000G (trade name, manufactured by Ube Industries, Ltd., made by Ube Industries, Ltd., which is negatively charged with a blue colored resin material that has been subjected to charging treatment) that can obtain the desired spectral characteristics is used. 10%, solvent=N-methyl-2-
A photosensitive colored resin material prepared by dispersing pyrrolidone in a pigment:bolimer=l:2 formulation] was applied to the colored resin layer with a thickness of 1.5 μm using a spinner coating method. After prebaking for a minute, exposure was performed using a high-pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After exposure, a special developer (N-methyl-2
- Developing using ultrasonic waves in a developer containing pyrrolidone as a main component, and then developing with a special rinse solution 11.1, 1. After treatment with a rinse solution containing trichloroethane as the main component, 150
Post-baking was performed at 30° C. for 30 minutes to form a blue colored resin film having a patterned shape.

Next, on the glass substrate on which the blue colored pattern was formed, a green colored resin material [PA-1000, which is a negatively charged green colored material that has been subjected to charging treatment] is applied as a second color.
Product name, manufactured by Ube Industries, polymer content 10%, solvent = N-
A green colored pattern was formed at a predetermined position on the substrate in the same manner as above, except that a photosensitive colored resin material prepared by dispersing methyl-2-pyrrolidone in a pigment:bolimer=1=2 composition was used. .

Further, on the substrate on which the blue and green patterns are formed in this way, a red colored resin material [PA-1 in which the charged red colored material is negatively charged] is applied as a third color.
000G (Product name, manufactured by Ube Industries, Ltd.)

A red colored pattern was produced in the same manner as above except for using a photosensitive colored resin material prepared by dispersing it in a polymer content of 10%, solvent = N-methyl-2-pyrrolidone, pigment: polymer = 1:2 composition). Formed at a predetermined position on the substrate, R
A colored pattern of three color stripes of (red), G (green), and B (blue) was obtained.

The spectral characteristics of the three color filters thus formed are shown in FIG.

The obtained color filter was found to have good spectral characteristics, film uniformity, etc. due to excellent dispersibility of the coloring material when observed using an optical microscope and an electron microscope (SEM). Furthermore, it has excellent heat resistance and can withstand temperatures of 250° C. or higher, making it possible to form ITO on a color filter by sputtering.

In addition, it has high hardness and excellent mechanical properties, and even if the color filter is configured in contact with a spacer within the liquid crystal cell, the color filter will not be damaged during pressure bonding.Furthermore, it has excellent solvent resistance, and after curing, it can be used with various solvents. It is durable, does not change during each production process, and has excellent light resistance.

Example 2 A color liquid crystal display element was manufactured in the following manner using an AS transistor as a substrate and forming the color filter of the present invention on the substrate.

First, as shown in Figure 3(a), a glass substrate (product name:
After forming the pixel electrode 11 with a layer thickness of 100 OA into a desired pattern by a photolithography process, a layer of 1000 Å of Aj) was formed on this surface.
The deposited layer was vacuum deposited to a thickness of A, and the deposited layer was patterned into a desired shape by a photolithography process to form a gate electrode 12 as shown in FIG. 3(b).

Next, photosensitive polyimide (product name: Semicofine,
(manufactured by Toshisha Co., Ltd.) is coated on the surface of the substrate on which the electrodes are provided to form an insulating layer 13, and through-holes 14 forming contact portions between the train electrodes 18 and the pixel electrodes 11 are formed by pattern exposure and development processing. It was formed as shown in FIG. 3(c).

Here, the substrate 1 was set at a predetermined position in the deposition tank, and SiH4 diluted with 2 was introduced into the deposition tank.

A photoconductive layer (intrinsic layer) t consisting of a-3i with a layer thickness of 2000A is applied to the entire surface of the substrate l on which the electrodes 11 and 12 and the insulating layer 13 are provided by a glow discharge method in vacuum.
After S was deposited, an n+ layer I6 having a thickness of 100 OA was laminated on the photoconductive layer 15 by the same operation as shown in FIG. 3(d). This substrate 1 was taken out from the deposition bath, and the 08 layer 16 and the photoconductive layer 15 were each patterned into a desired shape by dry etching in this order as shown in FIG. 3(e).

Next, AP is vacuum-deposited to a thickness of 100 OA on the substrate surface on which the photoconductive layers 15 and 13 layers 16 are provided in this way, and then this AP-deposited layer is patterned into a desired shape by a photolithography process. Thus, a source electrode 17 and a train electrode 18 as shown in FIG. 3(f) were formed.

Finally, correspond to each of the pixel electrodes 11.

After forming a colored pattern in three colors of red, blue and green as shown in FIG. 3(g) by the same method as in Example 1,
As shown in figure (h), this insulating IP has an alignment function applied to the entire surface of the substrate! A polyimide resin as i22 was applied to a layer thickness of 1200A, and the resin was cured by heat treatment for 250''C11 hours to produce a thin film transistor with an integrated color filter.

A color liquid crystal display element was further formed using the thus produced thin film transistor with a color filter.

That is, 1000A was applied to the negative side of a glass substrate (trade name: 7059, manufactured by Corning Inc.) in the same manner as described above.
1. A T,0 electrode layer was formed, and an insulating layer of 1200A thick made of polyimide resin with an alignment function was formed on the electrode layer, and between this substrate and the previously formed thin film transistor with color filter. Liquid crystal was sealed and the whole was fixed to obtain a color liquid crystal display element.

The color liquid crystal display element thus formed had good functionality.

Example 3 Instead of providing a three-color filter on the pixel electrode,
A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that it was provided on the counter electrode.

The color liquid crystal display element thus formed has good alfl.

Example 4 A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that a three-color color filter was first formed on a counter substrate and then a counter electrode was provided.

The color liquid crystal display element thus formed had good functionality.

Example 5 First, three color filters were formed on a substrate in the same manner as in Example 1.

Next, a transparent resin film [PA-1000c (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone)] was applied as a protective and flattening layer on the obtained color filter pattern. Approximately 1
．． The film was formed with a film thickness of 0 and 3.

Next, ITO was deposited to a thickness of 500 mm by sputtering, and patterned by etching to form a transparent electrode layer. A polyimide forming solution (manufactured by Hitachi Chemical Co., Ltd., PIQJ) was applied thereon with a spinner as an alignment film, and heated at 150° C. for 30 minutes to form a 2,000-layer polyimide film. Thereafter, the surface of this polyimide film was subjected to a rubbing treatment.

The color filter substrate thus formed and the opposing substrate, on which a transparent electrode pattern and alignment film have been formed and rubbed, are bonded together to form a cell, and ferroelectric liquid crystal is injected, and a blade is formed. A liquid crystal device was obtained.

The obtained color liquid crystal display element had good functionality. .

Example 6 A wafer on which a CCO (charge, coupled, device) was formed was used as a substrate, and three-color stripes were formed so that each colored pattern of a color filter was arranged corresponding to each light-receiving cell of a CCD. A color solid-state imaging device having a color filter of the present invention was formed in the same manner as in Example 1 except that the color filter was formed.

The color solid-state image sensor thus formed had good functionality.

Example 7 The color filter formed in Example 1 was placed on a wafer on which a COD (charge, coupled, device) was formed, and each colored pattern of the color filter was colored in correspondence to each light receiving cell of the CCD. They were aligned and attached to form a color solid-state image sensor.

The color solid-state image sensor thus formed had good functionality.

Example 8 A color photosensor array having the color filter of the present invention as shown in the partial plan schematic diagram of FIG. 4 was formed in the following manner according to the steps shown in FIG.

First, a photoconductive layer (intrinsic layer) 15 consisting of an a-5i (amorphous silicon) layer is formed on a glass substrate (trade name: 7059, manufactured by Corning Inc.) by a glow discharge method, as shown in FIG. 5(a). Set it up like this.

Ta.

That is, SiH diluted to IO volume % with H2 was heated at a gas pressure of 0.50 Torr and RF (Radio Fre
2 at power 10W, substrate temperature 250°C
A photoconductive layer 15 having a thickness of 0.7 layer was obtained by depositing it on a substrate for a time.

Subsequently, a fifth layer is formed on this photoconductive layer 15 by a glow discharge method.
A 00 layer 16 was provided as shown in Figure (b).

That is, Sin< diluted to 10% by volume with H2,
PH diluted to 100 ppm, and 1
: Using a 10% mixed gas as the raw material, the others are as follows:
Continuing from the photoconductive layer 15, a 00 layer 16 having a layer thickness of 0.14 m was provided under the same deposition conditions as the previous photoconductive layer.

Next, as shown in FIG. 5(C), A
conductive layer 19 was deposited on nI layer 16 to a layer thickness of 0.34 it. Subsequently, as shown in FIG. 5(d), a portion of the conductive layer 19 corresponding to the portion that will become the light conversion portion was removed.

That is, positive type Microposit 1300-27 (
After forming a photoresist pattern in the desired shape using photoresist (product name, 5hipley),
Exposed areas (portions without a resist pattern) are etched using an etching solution containing phosphoric acid (85% aqueous solution by volume), nitric acid (60% by volume aqueous solution), glacial acetic acid, and water in a ratio of 16+l:2:1. The conductive layer 19 was removed from the substrate, and a common electrode 21 and individual electrodes 20 were formed.

Next, the portion of the n+ layer 16 that will become the light conversion section is shown in FIG. 5(e).
It was removed as shown.

That is, after peeling off the Microposit 1300-27 photoresist from the substrate, it was etched by RF using a plasma etching method (also known as reactive ion etching method) using a parallel plate plasma etching system @DEW-451 (manufactured by Nikkei Anelva Co., Ltd.). Power 120W, gas pressure 0.1
Tri-etching using CF and gas at Torr was performed for 5 minutes to remove exposed portions of the nI layer 16 and the surface layer of the photoconductive layer 15 from the substrate.

In this example, in order to prevent implantation of the cathode material of the etching device, a polysilicon sputtering target (8 inches, purity 99.999%) was placed on the cathode, and the sample was placed on top of it. The exposed portion of the cathode material SUS was covered with a Teflon sheet cut out in the shape of a donut, and etching was performed with the SO5 surface hardly exposed to plasma. Thereafter, heat treatment was performed at 20° C. for 60 minutes in an oven in which nitrogen was flowed at a rate of 3 j7/sin.

Next, a protective layer was formed on the surface of the photosensor array thus created in the following manner.

That is, a silicon nitride layer as the protective layer 7 was formed on the photosensor array by a glow discharge method.

i.e. Sin< and 1 diluted to IO volume % with H2
Silicon nitride (a-5i
A protective layer 7 made of NH) was formed as shown in FIG. 5(f).

Furthermore, using this protective layer 7 as a substrate, blue 5, green 4, . A color filter consisting of a colored pattern of three colors of red 6 was formed, and as shown in FIG. 4, a color photosensor array was formed in which a colored filter was arranged on each photosensor.

The color photosensor array formed in this example also had good functionality.

Example 9 A color photosensor array was formed by pasting the color filter formed in Example 1 onto the photosensor array formed in Example 8 using an adhesive.

The color photosensor formed in this example also had good functionality, similar to that formed in Example 8.

[Effects of the Invention] As explained above, according to the present invention, since the surface of the colored material is charged in advance, ■ aggregation of the colored material is prevented in the colored resin liquid and a stable dispersion state is maintained. This turned into a turning point. Furthermore, by charging the resin with a polarity opposite to that of the resin to be dispersed, it has become possible to (1) disperse the coloring material itself into the resin well.

Therefore, a colored resin with good dispersion stability can be obtained by a simple method, and a color filter of good quality with excellent spectral transmittance can be manufactured using the colored resin.

Furthermore, after the color filter is formed, the charge has been cleared in some way, so various devices are not affected by this charging process.

Furthermore, if the photosensitive aromatic polyamide resin and aromatic polyimide resin used in the present invention are used, they have excellent mechanical strength, heat resistance, light resistance,
Using a color filter with a fine pattern that has excellent properties such as solvent resistance, or a colored resin material that can be easily produced,
It has become possible to manufacture it using a simple manufacturing process. Therefore, it has become possible to apply the present invention to a wide variety of devices that require color filters with good performance, and it has become possible to produce color devices with excellent properties.

[Brief explanation of the drawing]

FIGS. 1(a) to (f) are process diagrams for explaining the method for forming the color filter of the present invention, and FIG. 2 is a diagram showing the colored resin layer of the color filter of the present invention obtained in Example 1. 3(a) to (h) are manufacturing process diagrams of a color liquid crystal display element having a color filter of the present invention, and FIG. 4 is a graph showing a color photophotograph having a color filter of the present invention. FIGS. 5(a) to 5(g), which are schematic partial plan views of the sensor array, are process diagrams for forming the color photosensor array shown in FIG. 4. 2 substrates 2: Colored resin film 2a: Photocured portion 3: Photomask 4.5, 6:
Patterned colored resin layer 7: Protective layer 8: Spectral characteristics of red colored resin layer 9: Spectral characteristics of green colored resin layer

Claims (7)

[Claims] (1) In a color filter having a patterned colored resin layer of multiple colors formed of a colored resin made by dispersing a colored material in the resin, the patterned colored resin layer uses a colored material whose surface has been subjected to a charging process in advance. A color filter characterized by being formed from colored resin. (2) The color filter according to claim 1, wherein the resin is an aromatic polyamide resin or polyimide resin. (3) The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer provided on a substrate. (4) The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer formed on a substrate using the colored resin by a photolithography process or a printing process. (5) The color filter according to claim 3 or 4, wherein the substrate is a display section of a display device. (6) The color filter according to claim 3 or 4, wherein the substrate is a solid-state image sensor. (7) The color filter according to claim 3 or 4, wherein the substrate is a light receiving surface of an image sensor.