JPS63155106A - Color filter - Google Patents

Abstract

PURPOSE:To obtain a color filter having superior optical characteristics, quality and reliability by forming each of patterned colored resin layers with a colored resin contg. a coloring material subjected to surface treatment with the same resin as a dispersed resin. CONSTITUTION:A polyamino resin soln. blended with a coloring material having desired spectral characteristics and subjected to surface treatment with polyamino resin is applied to a prescribed substrate 1 and prebaked to form a colored resin film 2 having a first color. The resin film 2 is exposed through a photomask 3 with light having the sensitivity of the photosensitive colored resin to patternwise photoset the film 2. The film 2 having photoset parts 2a is developed under ultrasonic waves with a solvent dissolving only the unexposed parts and the developed film 2 is rinsed and post-baked to obtain a patterned colored resin layer 4. Since impurities in the coloring material are enclosed, a color device having superior reliability can be formed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] Unreleased III relates to color filters, and particularly relates to color filters suitable for fine color separation in color image pickup devices, color sensors, color displays, and the like.

[Conventional technology] Conventionally, color filters have been made by coating ceratin,
Dyeing color filters are known in which a mordant layer made of a hydrophilic polymer material such as casein, cryu, or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer.

In such dyeing methods, it is relatively easy to meet the spectral characteristics required for many filters using available dyes, or the mordant layer is placed in a dyeing bath in which the dye is dissolved in the dyeing process of the mordant layer. Wet method 1, which is difficult to control due to immersion
Moreover, it has the drawback of poor yields because it involves a complicated process of providing an interlayer for resist dyeing for each color. Also, the heat resistance of dyeable pigments1
It is relatively low at around 50°C or less, and if the filter requires thermal treatment, it is difficult to use, and there are also disadvantages such as poor reliability such as heat resistance and light resistance of the dyed film itself. are doing.

On the other hand, color filters using a certain kind of coloring material or a colored resin dispersed in a transparent resin are known.

For example, JP-A-58-46325, JP-A-60-
Publication No. 78401, Japanese Patent Application Laid-open No. 184202/1983,
JP-A-50-184203, JP-A-60-184
As disclosed in JP-A No. 204, JP-A No. 11/60-184205, etc., according to a color filter characterized by a colored resin film in which a colorant is mixed with a polyamino resin, the polyamino resin itself It has excellent properties such as heat resistance and light resistance, and can be used to form a patterned color filter by printing or by providing a resist mask on a colored resin film and then etching the colored resin film. It is possible.

Also, JP-A-57-16407, JP-A-57-7
As shown in Japanese Patent Application Laid-open No. 4707 and Japanese Patent Application Laid-Open No. 60-129707, a color filter is characterized by a colored resin film in which a coloring material is mixed with a photosensitive resin. A fine pattern can be formed using only the general (general) otolithography process, and the process can be simplified.

However, in color filters using colored resins in which these coloring materials are dispersed in transparent resins, impurities contained in the coloring materials to be dispersed may dissolve into the color filters, causing problems such as problems with liquid-mounted display elements, etc. However, with respect to the currently mainstream color filter in which the impurities enter the cell, the impurities affect the liquid crystal over time and deteriorate the display characteristics, which is not completely satisfactory in terms of reliability.

In addition, in solid-state imaging devices, etc., forming color filters directly on the device is currently becoming mainstream, but impurities, especially mobile ions, etc. can affect semiconductor devices or wiring over time. This was not completely satisfactory in terms of reliability as it deteriorated the imaging characteristics. In general, to solve these problems, methods such as selecting a specific coloring material and refining the coloring material can be considered. Furthermore, even if these methods were used, it was difficult to obtain a product that was completely satisfactory in terms of reliability.

On the other hand, in a color filter using a colored resin dispersed in a colored material or a transparent resin, in order to form a filter that has excellent optical performance such as spectral characteristics, is uniform, and has few defects, it is necessary to This has a great effect on the dispersibility of the particles, and from this point of view, conventional methods have not been fully satisfactory.

[Problems to be Solved by the Invention] The purpose of the present invention is to eliminate the drawbacks of the above-mentioned conventional examples, and to eliminate damage to devices (elements) caused by impurities contained in the coloring material regardless of the type of coloring material. The objective is to provide a color filter with excellent optical properties, quality, and reliability by eliminating the coloring matter and processing it into a colored material with good dispersibility.

Another object of the present invention is to provide a color filter that can form a fine pattern through a simple manufacturing process and has excellent mechanical properties, heat resistance, light resistance, solvent resistance, and other properties.

[Means for Solving the Problems] That is, the present invention provides a color filter having a patterned colored resin layer of a plurality of colors formed of a colored resin in which a colored material is dispersed in the resin. This is a color filter characterized in that the layer or surface is formed of a colored resin using a colored material whose surface is treated with the same resin as the resin in which the layer is previously dispersed.

The present invention will be explained in detail below.

Examples of the resin forming the colored resin layer of the color filter of the present invention include polyvinyl alcohol, polyimide,
polyamideimide, polyesterimide, polyamide,
Polyester, polyvaraxylylene, polycarbonate, polyvinyl acetal, polyvinyl acetate, polystyrene, cellulose resin, melamine resin, area resin, acrylic resin, epoxy resin, polyurethane resin, polysilicon resin, and resins obtained by imparting photosensitivity to these resins; Although it can be arbitrarily selected from common photoresist resins, the following resins are preferred, particularly from the viewpoint of the necessary properties of the color filter and pattern processability.

That is, aromatic polyamide resins and polyimide resins that have photosensitive groups in their molecules can be cured at temperatures below 200°C, and can be cured in the visible light wavelength range (400 to 700°C).
nm) and does not have specific light absorption characteristics (light transmittance of 90 nm).
% or more) Aromatic polyamide resin is preferred.The photosensitive group of the resin may be any aromatic silver having a photosensitive hydrocarbon unsaturated group as shown below, such as (1) Benzoic acid esters (in the formula RI CIIX-CY-COO-Z-1X is
or -C, I+, Y is -11 or -C113,2 is -
or ethyl group or glycidyl group) (2) Benzyl acrylates (in the formula, Y represents 1 or C113) (3) diphenyl ethers (in the formula, R2 is C11X-CY-CON) l-1CH*-
CY-(:0O-(CHi) 2-OCO or Ct(2
mono containing one or more -CY-COO-CHt-, x, y
(4) Chalcone and other compound chains (in the formula, R3 represents +1-, an alkyl group, or an alkoxy group).

Specific examples of aromatic polyamide resins and polyimide resins having these groups in the molecule include V-coat PA
-1000 (Ube Industries H5i2), Lithocoat PI-4
00 (manufactured by Ube Industries, Ltd.), etc.

The above-mentioned photosensitive polyamino resins (polyamide resins and polyimide resins) are resins with excellent durability in terms of chemical structure, and the color filters formed using them also have very good durability. becomes.

The coloring material forming the colored resin layer of the color filter of the present invention is not particularly limited, as long as it can obtain desired spectral characteristics among organic pigments, inorganic pigments, dyes, etc. In this case, each material can be used alone or as a mixture of some of these materials.

However, if a dye is used, the durability of the dye itself will control the performance of the color filter, or if the resin system of the present invention is used, the performance will be superior to that of ordinary dyed color filters. can be formed. Therefore, in view of the color characteristics and various performances of color filters, organic pigments are most preferable as coloring materials.

Organic pigments include azo pigments such as soluble azo, insoluble azo, condensed azo, phthalocyanine pigments,
and condensed polycyclic pigments including indigo, anthraquinone, perylene, perinone, dioxazine, quinacridone, isointrinon, phthalone, methine/azomethine, and other metal complex systems, or any of these. Several mixtures are used.

The coloring material in the present invention is subjected to surface treatment in advance using the same resin as the resin to be dispersed. Conventionally known methods can be used to treat the surface of a colored material with a resin. For example, (1) a method of melt-kneading the pigment and the resin and then crushing the pigment to an appropriate particle size; (2) a method of treating the pigment with the resin; The above resin is dispersed in a solution or emulsion, and then dispersed in a suitable manner, such as a spray drying method,
A method in which both are precipitated simultaneously by coprecipitation and /Fi drying.

(3) A method in which the pigment is dispersed in a monomer, a monomer solution, or a 7-mer dispersion, and the monomer is polymerized and coated on the pigment surface; (4) A resin solution or emulsion is sprayed on the pigment surface in a fluidized bed or the like; Any method such as coating with resin can be used. In some cases, there is also a method in which a pigment is dispersed in a photoreactive polymer and polymerized on the surface of the pigment by photoreaction.

The size of the colored material particles treated with resin in this way affects the transmittance of the formed color filter layer, so
It is preferable that the particles be as fine as possible, but usually the particle size is 0.
Preferably, the amount of resin is in the range of 1 to 0.8 cm.The amount of resin used for surface treatment may be sufficient as long as it can surround the impurities contained in the coloring material and prevent their movement. Does it change depending on porosity, particle size, surface area, etc.
Generally, for 100 parts by weight of coloring material, 20 parts by weight of resin
Approximately 0 to 5 parts by weight is suitable.

In the present invention, the colored resin used to form one colored resin layer includes 10 to 10% of the above-mentioned surface-treated colored material having desired spectral characteristics added to any of the above-mentioned resin solutions.
After blending at a ratio of about 50% and thoroughly dispersing it using ultrasonic waves, three-roll mills, ball mills, sand mills, etc., large particles are removed using a filter, usually a filter with a filter size of about one per minute. Prepare.

The colored resin layer of the color filter of the present invention can be formed by a printing process such as screen or offset printing, or if a photosensitive resin is used, the colored resin can be formed by a spinner,
It is coated onto a substrate using a coating device such as a roll coater, and is formed into a pattern by a photolithography process, and the layer thickness is determined depending on the desired spectral characteristics, or is usually 0.5 mm thick.
It is desirable that it is about 5 to 5 TL, preferably about 1 to 2 TL11.

It should be noted that the colored resin layer of the color filter of the present invention is itself made of a good material with sufficient durability.In particular, in order to protect the colored resin layer from various environmental conditions, On the surface of the colored resin layer, polyamide,
Organic resins such as polyimide, polyurethane, polycarbonate, silicone, and 5iJ4. Sin,, Sin,
81z03. Spin code an inorganic film such as TatO=,
The protective layer can be provided by a roll coating method or a vapor deposition method. Further, depending on the material, after forming the protective layer, an alignment treatment may be performed, thereby making it possible to apply the protective layer to devices using liquid crystal.

A color filter having a colored resin layer as described above can be formed on a suitable substrate. For example, glass plate, transparent resin plate, resin film, cathode ray tube display surface, image pickup tube light receiving surface, CCI), BB[l, C
A wafer formed with a solid-state 1M image element such as ID or BASIS, fl[Ig! Examples include a contact type image sensor using a semiconductor, a liquid crystal display surface, and a color electrophotographic photoreceptor.

If it is necessary to further increase the adhesion between the colored resin layer and the underlying substrate, a colored resin pattern may be formed after a thin coat of silane coupling agent or the like is applied on the substrate, or a colored resin pattern may be formed in advance. It is even more effective to form a color filter using a material to which a small amount of a silane coupling agent or the like is added.

Hereinafter, a typical method for forming a color filter of the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram illustrating the method for forming a color filter of the present invention. First, as shown in Fig. 1(a), a colored material having desired spectral characteristics is prepared and surface-treated with a polyamino resin, and then a polyamino resin liquid (NMP solution) containing a predetermined amount of the colored material is mixed. A colored resin film 2 of the first color is coated onto a predetermined substrate l using a spinner to a predetermined film thickness, and prebaked under appropriate temperature conditions. As shown in b), the colored resin film is exposed to light having the sensitivity of the photosensitive colored resin (for example, a high-pressure mercury lamp, etc.) through a photomask 3 having a predetermined pattern shape corresponding to the pattern to be formed. , photocuring the pattern portion.

Then, as shown in FIG. 1(C), the colored resin film 2 having the photocured portion 2a is dissolved in a solvent (for example, one containing N-methyl-2-pyrrolidone-based solvent as a main component) that dissolves only the unexposed portion. After ultrasonic development, rinsing treatment (for example,
1,1,1,1-lichloroethane, etc.) Then, a boss baking process is performed to obtain the patterned colored resin layer 4 of the present invention as shown in FIG. 1(d).

In addition, when forming the color filter of the present invention consisting of two or more colors, if necessary, that is, depending on the number of colors of the filter to be used, from FIG.
The steps up to Figure 1(d) are repeated using colored resin liquids in which surface-treated colored materials corresponding to each color are dispersed. A color filter consisting of three colors of patterned colored resin layers 4, 5 and 6 can be formed.

Further, the color filter of the present invention may have a protective layer 7 formed from the above-mentioned materials on the top of the filter, as shown in FIG. 1(f).

[Function] The color filter of the present invention is a color filter having a patterned colored resin layer of multiple colors formed of a colored resin made by dispersing a colored material in the resin, in which the patterned colored resin layer is predispersed on the surface. Since it is made of colored resin using a colored material whose surface has been treated with the same resin as the resin used for coloring, by pre-treating the surface of the colored material with resin, the impurities contained in the colored material will be encapsulated, and the coloring will be enhanced. The patterned colored resin layer formed using the material can suppress the influence of impurities on the device (element), and can be used regardless of the type of the colored material.

Furthermore, when one coloring material is dispersed in the resin by surface treatment of the coloring material with the same resin as the resin to be dispersed, it becomes a form with very good dispersibility, which improves the uniformity of the film as well as the one-color characteristics. A good color filter with few defects can be obtained.

[Example] Examples of the present invention are shown below.

Example 1 First, the surface treatment of blue, green, and red colored materials was performed as follows.

That is, a blue colored material [Heliogen Blue
) L7080 (Product name, manufactured by BASF, C,
1.No.

74160)] Add 10 parts to 5 times the amount of NIP solution and disperse in a wave. In this state, aromatic polyamide resin [PA-100DC (product name, manufactured by Ube Industries, Ltd.)]
] 50 parts by weight of NMP solution containing 110 parts by weight were added little by little, and after being sufficiently dispersed, the entire surface of the solution was exposed to light, and then the solvent was evaporated and at the same time the resin was thermally cured.

The obtained blue block was crushed to have a particle size of 0.8 pm or less to obtain a surface-treated blue colored material.

Similarly, a green coloring material [Lionol Green (L
ionol Green) 6YK (trade name, manufactured by Toyo Ink Co., Ltd., C, 1, No. 74265)] and red coloring material [Irgazin Red (Irgazin Red)]
Red) BPT (Product name.

Manufactured by Ciba-Geigy, C,1
,No.

71127)], surface-treated green and red colored materials were also obtained.

Next, color filters were formed using these surface-treated colored materials as follows.

That is, a blue colored resin material that can obtain the desired spectral characteristics [surface-treated blue colored material PA-1000G (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N 1.5 liters of photosensitive colored resin material prepared by dispersing methyl-2-pyrrolidone, pigment: polymer; 1:2 blend) by spinner coating method
After prebaking the colored resin layer coated to a thickness of 0 at 70° C. for 30 minutes, it was exposed to light using a high-pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After the exposure, the colored resin film is developed using ultrasonic waves in a special developer (a developer whose main component is N-methyl-2-pyrrolidone) that dissolves only the unexposed areas, and a special rinse solution ( After treatment with a rinsing liquid containing 1,1,1, trichloroethane as a main component, a boss bake was performed at 150° C. for 30 minutes to form a blue colored resin film having a patterned shape.

Next, a green colored resin material [surface-treated green colored material PA-1000G (trade name)] was applied as a second color onto the glass substrate on which the blue colored pattern was formed.

Manufactured by Ube Industries, polymer content 10%, solvent = N-methyl-
A green colored pattern was formed at a predetermined position on the substrate in the same manner as described above, except that a photosensitive colored resin material prepared by dispersing 2-pyrrolidone in a pigment:bolimer=1=2 composition was used.

Furthermore, as a third color, a red colored resin material [surface-treated red colored material PA-1000G (trade name, manufactured by Ube Industries, Ltd., Polymer content 10%, solvent = N-methyl-2-pyrrolidone, pigment: polymer = 1 = 2 combination)
A red colored pattern was formed at a predetermined position on the substrate in the same manner as above except that a photosensitive colored resin material prepared by dispersing in ) no 3
A colored pattern of colored stripes was obtained.

The spectral characteristics of the three-color filter thus formed are shown in FIG.

The obtained color filter was found to have excellent dispersibility by optical microscopy and electron microscopy (SEM) R observation, as well as excellent spectral characteristics and film uniformity, with few defects. Furthermore, it has excellent heat resistance and can withstand temperatures of 250° C. or higher, making it possible to form ITO on color filters by sputtering.

In addition, it has high hardness and excellent mechanical properties, and even if the color filter is configured in the liquid crystal cell in contact with the spacer, the color filter will not be damaged during pressure bonding.
It has excellent solvent resistance, is resistant to various solvents after curing, does not change during each production process, and has excellent light resistance.

Furthermore, there was no damage to the device due to impurity migration from the color filter, and the device was highly reliable.

Example 2 A color liquid crystal display element was manufactured in the following manner using a thin film transistor as a substrate and forming the color filter of the present invention on the substrate.

First, as shown in Figure 3(a), a glass substrate (product name:
7059, manufactured by Corning Inc.) with a layer thickness of 100 OA. After forming the T,0 pixel electrode 11 into a desired pattern by a photolithography process, 1000% of Aβ is further applied to this surface.
A gate electrode 12 as shown in FIG. 3(b) was formed by vacuum vapor deposition to a layer thickness of A, and pattern masking this vapor deposited layer into a desired shape by a photolithography process.

Photosensitive polyimide (product name: Semicofine,
Toshisha Co., Ltd.) is coated on the surface of the substrate on which the electrodes are provided to form an insulating layer 13, and through pattern exposure and development are performed to form through holes that form the contact portions between the train electrodes 18 and the pixel electrodes 11. 14 was formed as shown in FIG. 3(C).

Here, the substrate l is set at a predetermined position in the deposition tank, 5il14 diluted with ]1□ is introduced into the deposition tank, and the electrodes 11, 12 and the insulating layer 13 are A layer thickness of 200 OA is applied to the entire surface of the substrate provided with
-3i photoconductive layer (intrinsic layer) 15
After depositing the photoconductive layer 15, an N6 layer 16 having a thickness of 100 OA is deposited on the photoconductive layer 15 in the same manner as shown in FIG. 3C.
Lamination was performed as shown in d). This substrate 1 was taken out from the deposition bath, and the 00 layer 16 and the photoconductive layer 15 were each patterned in this order into a desired shape by dry etching as shown in FIG. 3(e).

Next, on the substrate surface on which the photoconductive layer 15 and the n+ layer 16 are provided, Ai) is vacuum-deposited to a layer thickness of 100 OA, and then two evaporated layers are formed into a desired shape by a photolithography process. By patterning, a source electrode 17 and a train electrode 18 as shown in FIG. 3(f) were formed.

Finally, three colored patterns of red, blue and green are formed in the same manner as in Example 1 to correspond to each of the pixel electrodes 11 as shown in FIG. 3(g). (h
), the insulating Wi layer has an orientation source applied to the entire surface of the substrate.
Polyimide resin No. 22 was applied to a layer thickness of 120 OA, and the resin was cured by heat treatment at 250° C. for 1 hour to produce a No. 11 film transistor with an integrated color filter.

A color liquid crystal display element was further formed using the thus produced thin film transistor with a color filter.

That is, the same method as above was applied to the negative side of a glass substrate (trade name: 7059, manufactured by Corning Inc.).

A 1.7.0 electrode layer of 1000A is formed, and a layer thickness 1 made of polyimide resin with an orientation function added on the electrode layer.
A 200A insulating layer was formed, and a liquid crystal was sealed between this substrate and the previously formed F1 film transistor with a color filter, and the whole was fixed to obtain a color liquid crystal display element.

The color liquid crystal display element formed in this manner had a good a-pot.

Example 3 Instead of providing a three-color filter on the pixel electrode,
A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that it was provided on the counter electrode.

The color liquid crystal display element thus formed has good functionality.

Example 4 A color liquid crystal display element having a color filter of the present invention was obtained in the same manner as in Example 2 except that a three-color color filter was first formed on a counter substrate and then a counter electrode was provided.

The color liquid crystal display element thus formed had good functionality.

Example 5 First, three color filters were formed on a substrate in the same manner as in Example 1.

Next, a transparent resin film [PA-1000C (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone)] was applied as a protective and flattening layer on the obtained color filter pattern. Approximately 1 by spinner coating method
．． The film was formed with a film thickness of 0.04 m.

Next, ITO was deposited to a thickness of 500 mm by sputtering, and patterned by etching to form a transparent electrode layer. A polyimide forming solution (manufactured by Hitachi Chemical Co., Ltd., 'PI(b)) was applied onto this as an alignment film using a spinner, and heated at 150°C for 30 minutes to form a 2,000-layer polyimide film. After that, the surface of this polyimide film was was subjected to rubbing treatment.

The color filter substrate thus formed and the opposing substrate on which a transparent electrode pattern and alignment film have been formed and subjected to lining processing are pasted together to form a cell, injected with ferroelectric liquid crystal, and sealed. A liquid crystal device was obtained.

The obtained color liquid crystal display element had good functionality.

Example 6 A wafer on which a CCD (charge, coupled, device) was formed was used as a substrate, and three-color stripes were formed so that each colored pattern of a color filter was arranged corresponding to each light-receiving cell of the CCD. A color solid-state imaging device having a color filter of the present invention was formed in the same manner as in Example 1 except that the color filter was formed.

The color solid-state image sensor thus formed had good functionality.

Example 7 The color filter formed in Example 1 was placed on a wafer on which a CCD (charge, coupled, device) was formed, and each colored pattern of the color filter was applied in correspondence to each light receiving cell of the CCD. They were aligned and attached to form a color solid-state image sensor.

The color solid-state MS device thus formed had good functionality.

Example 8 A color photosensor array having the color filter of the present invention as shown in the partial plan schematic diagram of FIG. 4 was formed in the following manner according to the steps shown in FIG.

First, a photoconductive layer (intrinsic layer) 15 consisting of an a-5i (amorphous silicon) layer is formed on a glass substrate (trade name: 7059, manufactured by Corning Inc.) by a glow discharge method. It was set up as shown.

That is, SiH diluted to IO volume % with
2 at power 10W, substrate temperature 250°C
A photoconductive layer 15 having a thickness of 0.7 thick was obtained by depositing the photoconductive layer on a substrate for a time.

Subsequently, a fifth layer is deposited on this photoconductive layer IS by a glow discharge method.
As shown in Figure (b), n''M516 was provided.

i.e., with SiH4 diluted to IO volume % in 11□.

112 and 100 pp diluted PH3 in the intestine and 1=1
A 00 layer 16 having a layer thickness of 0.1 .mu.m was formed continuously on the photoconductive layer 15 using the gas mixed with 0.0 and 0.01 as a raw material, and under the same conditions as the previous photoconductive layer deposition conditions.

Next, as shown in Figure 5(C), the electron beam evaporation method is used to
A conductive layer 19 was deposited on the 00 layer 16 by depositing 0.2 to a layer thickness of 0.3 layers. Subsequently, as shown in FIG. 5(d), a portion of the conductive layer 19 corresponding to the portion that will become the light conversion portion was removed.

That is, positive microposit I: 100-27
(Product name, manufactured by 5hipley) After forming a photoresist pattern in the desired shape using photoresist,
Exposed areas (where there is no resist pattern The conductive layer 19 (part) was removed from the substrate to form a common electrode 21 and individual electrodes 20.

Next, the 00 layer 16 of the part that will become the light conversion part is shown in FIG. 5(e).
It was removed as shown.

That is, after the Microposit 130 Row 27 photoresist is etched from the substrate, it is RF etched using a plasma etching method (also known as reactive ion etching method) using a parallel plate plasma etching apparatus OEM-451 (manufactured by Nikkei Anelva Co., Ltd.). Power 120W, gas pressure 0. IT
Tri-etching using CF and gas was performed at ORR for 5 minutes to remove exposed portions of the 00 layer 16 and a portion of the surface layer of the photoconductive layer 15 from the substrate.

In this example, in order to prevent implantation of the cathode material of the etching device, a polysilicon sputtering target (8 inches, purity 99.999%) was placed on the cathode, and the sample was placed on top of it. The exposed portion of the SUS cathode material was etched using a Teflon sheet cut out in the shape of a tornut, with the cover L/SO3 surface hardly exposed to plasma. Then nitrogen at 3 f! Heat treatment was performed at 20° C. for 160 minutes in an oven with a flow rate of /sin.

A protective layer was first formed on the surface of the photosensor array thus prepared in the following manner.

That is, a silicon nitride layer as the protective layer 7 was formed on the photosensor array by a glow discharge method.

That is, 5i11. Using a mixed gas of 100% N 11 :l and 100% N 11 :l at a flow rate ratio of 1=4, a siliconite layer with a layer thickness of 0.5% m was formed in the same manner as in the other steps for forming B-Si ffj. A protective layer 7 made of a Ride (a-3iN)l) layer was formed as shown in FIG. 5(f).

Furthermore, using this protective layer 7 as a substrate, blue 5, green 4, . A color filter consisting of a colored pattern of three colors of red 6 was formed, and as shown in FIG. 4, a color photosensor array was formed in which a colored filter was placed on each photosensor.

The color photosensor array formed in this example also had good afl.

Example 9 A color photosensor array was formed by pasting the color filter formed in Example 1 onto the photosensor array formed in Example 8 using an adhesive.

The color photosensor formed in this example also had good functionality, similar to that formed in Example 8.

[Effects of the Invention] As explained above, according to the present invention, since the surface of the colored material is treated with resin in advance, ■ impurities contained in the colored material are surrounded, and various devices (elements) are removed from the color filter layer. ), it is now possible to create a highly reliable color device without causing damage to the device. Therefore, (1) it is advantageous in terms of one-color design regardless of the type of coloring material to be dispersed.

Furthermore, since the resin for surface treatment is the same resin as the resin for dispersion, (1) easy dispersion is possible, and it is also possible to obtain a color filter with good 0-spectral transmittance and film uniformity. Note that these surface treatments can be carried out in a very simple manner.

Furthermore, if the photosensitive aromatic polyamide resin and aromatic polyimide resin used in the present invention are used, they have excellent mechanical strength, heat resistance, light resistance,
Using a color filter with a fine pattern that has excellent properties such as solvent resistance, or a colored resin material that can be easily produced,
It has become possible to produce it using a simple manufacturing process.

Therefore, it has become possible to apply the present invention to a wide variety of devices that require color filters with good performance, and it has become possible to produce color devices with excellent properties.

[Brief explanation of the drawing]

FIGS. 1(a) to (f) are process diagrams for explaining the method for forming the color filter of the present invention, and FIG. 2 is a diagram showing the colored resin layer of the color filter of the present invention obtained in Example 1. A graph showing the spectral transmittance of. 3(a) to (h) are manufacturing process diagrams of a color liquid crystal display element having a color filter of the present invention, and FIG. 4 is a schematic partial plan view of a color photosensor array having a color filter of the present invention. , Figures 5(a) to (g) are
5 is a process diagram for forming the color photosensor array shown in FIG. 4. FIG. 1: Substrate 2: Colored resin film 2a: Photocured portion 3: Photomask 4.5, 6:
Patterned colored resin layer 7: Protective layer 8: Spectral characteristics of red colored resin layer 9: Spectral characteristics of green colored resin layer

Claims (7)

[Claims] (1) In a color filter having a patterned colored resin layer of multiple colors formed of a colored resin made by dispersing a colored material in the resin, the patterned colored resin layer has a surface made of the same resin as the resin in which the colored material is dispersed in advance. A color filter characterized in that it is formed of a colored resin using a surface-treated colored material. (2) The color filter according to claim 1, wherein the resin is an aromatic polyamide resin or polyimide resin. (3) The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer provided on a substrate. (4) The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer formed on a substrate by a photolithography process or a printing process using the colored resin. (5) The color filter according to claim 3 or 4, wherein the substrate is a display section of a display device. (6) The color filter according to claim 3 or 4, wherein the substrate is a solid-state image sensor. (7) The color filter according to claim 3 or 4, wherein the substrate is a light receiving surface of an image sensor.