JPH05224015A - Production of color filter - Google Patents
Production of color filterInfo
- Publication number
- JPH05224015A JPH05224015A JP4055990A JP5599092A JPH05224015A JP H05224015 A JPH05224015 A JP H05224015A JP 4055990 A JP4055990 A JP 4055990A JP 5599092 A JP5599092 A JP 5599092A JP H05224015 A JPH05224015 A JP H05224015A
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- substrate
- producing
- residue
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はカラーフィルターの製造
方法に関し、特に液晶表示素子等のカラーディスプレイ
用のカラーフィルターの製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter, and more particularly to a method for manufacturing a color filter for a color display such as a liquid crystal display device.
【０００２】[0002]
【従来の技術】カラーフィルターには、いくつかの種類
が挙げられるが、その中でも比較的耐熱性に優れ、製造
工程の簡単な、感光性樹脂に着色材料を混合した着色樹
脂膜を用いる方式がよく知られている。2. Description of the Related Art There are several types of color filters. Among them, a method using a colored resin film in which a coloring material is mixed with a photosensitive resin is relatively excellent in heat resistance and the manufacturing process is simple. well known.
【０００３】従来、上記カラーフィルターを基板上に形
成するには、一般に、フォトリソ工程によりパターニン
グするが、このパターニングは通常塗布工程としてスピ
ンナー法、印刷法、ロールコーター法等の手段を用いて
着色樹脂を基板上に塗布し、その後ホットプレート、オ
ーブン等を用いて仮硬化（プリベーク）させ、次いでフ
ォトマスクを通して露光し、現像液に浸漬させて現像し
た後、前記仮硬化よりも高い温度で再度加熱して本硬化
（ポストベーク）させ、カラーフィルターのパターンを
形成している。Conventionally, in order to form the above-mentioned color filter on a substrate, patterning is generally performed by a photolithography process, but this patterning is usually performed by using a spinner method, a printing method, a roll coater method or the like as a coating step. Is applied to the substrate, then temporarily cured (prebaked) using a hot plate, oven, etc., then exposed through a photomask, immersed in a developing solution for development, and then heated again at a temperature higher than the temporary curing. Then, main curing (post-baking) is performed to form a color filter pattern.
【０００４】液晶表示素子の基板を製造するには、前記
の方法で形成したカラーフィルター上に主として平坦化
を目的とする透明な絶縁膜を成膜した後、透明電極、さ
らには金属電極等を成膜し、パターニングしてストライ
プ状の電極群を有するカラーフィルター付基板を得る。In order to manufacture a substrate for a liquid crystal display device, a transparent insulating film, mainly for the purpose of flattening, is formed on the color filter formed by the above method, and then a transparent electrode, further a metal electrode, etc. are formed. A film is formed and patterned to obtain a substrate with a color filter having a striped electrode group.
【０００５】又、前記透明な絶縁膜としては、ＳｉＯ
2 ，ＴａＯx 等の無機膜の他、透明樹脂膜、さらには感
光性透明樹脂膜等が用いられ、またパターニングが行わ
れる場合もある。As the transparent insulating film, SiO is used.
In addition to an inorganic film such as 2 , TaO x , a transparent resin film, a photosensitive transparent resin film, or the like is used, and patterning may be performed.
【０００６】[0006]
【発明が解決しようとする課題】しかしながら、上記従
来例では、フォトリソ工程において、基板上に塗布した
着色樹脂を露光し、現像液にて現像する場合に、未露光
部の化学的な溶解速度が遅く、特に基板との界面近くで
は、光硬化部の着色樹脂と基板との密着性を向上させる
ために、着色樹脂中にカップリッグ剤が含有されている
こともあり、光硬化部の表面に粗れが生じるまで現像液
中での浸漬時間を長くしても、未露光部の着色樹脂を完
全に除去することができず、基板との界面に残渣として
残ってしまう欠点があった。However, in the above-mentioned conventional example, in the photolithography process, when the colored resin applied on the substrate is exposed and developed with a developing solution, the chemical dissolution rate of the unexposed portion is Slowly, especially near the interface with the substrate, a cup-rigging agent may be contained in the colored resin in order to improve the adhesion between the colored resin in the photocured part and the substrate. Even if the immersion time in the developing solution is extended until this occurs, the colored resin in the unexposed portion cannot be completely removed, and there is a drawback that it remains as a residue at the interface with the substrate.
【０００７】この残渣は、溶剤等を用いた洗浄である程
度除去できるが、完全に除去することは非常に困難であ
り、基板表面にごく薄く残ってしまう。そして、この残
渣は、その後の工程で別の色の形成あるいは、透明電極
や金属電極を成膜し、パターニングする際に、それらの
膜と基板との密着性を悪くし、膜ハガレ等の原因にな
る。特に、液晶表示素子の液晶パネルと駆動用ドライバ
ーとを接続する実装部においては、基板上の実装電極に
物理的に大きな力が加わり易く、実装電極の基板からの
剥離が発生し、致命的欠陥となっていた。Although this residue can be removed to some extent by washing with a solvent or the like, it is very difficult to completely remove it, and it remains very thin on the substrate surface. Then, this residue deteriorates the adhesion between the film and the substrate when another color is formed or a transparent electrode or a metal electrode is formed and patterned in the subsequent step, and causes the film peeling or the like. become. In particular, in the mounting portion that connects the liquid crystal panel of the liquid crystal display element and the driver for driving, a large physical force is easily applied to the mounting electrodes on the substrate, and the mounting electrodes peel off from the substrate, resulting in a fatal defect. It was.
【０００８】本発明は、この様な従来技術の欠点を改善
し、フォトリソ工程における基板表面に残った着色樹脂
の残渣を完全に除去し、生産効率を向上させたカラーフ
ィルターの製造方法を提供することを目的とするもので
ある。The present invention provides a method for manufacturing a color filter, in which the above-mentioned drawbacks of the prior art are improved, the residue of the colored resin remaining on the substrate surface in the photolithography process is completely removed, and the production efficiency is improved. The purpose is that.
【０００９】[0009]
【課題を解決するための手段】即ち、本発明は、透明な
感光性樹脂中に少なくとも着色材料を分散してなる着色
樹脂を基板上に塗布し、加熱して仮硬化した後、フォト
リソ工程における露光、現像を行い、次いで再度加熱し
本硬化してカラーフィルターを製造する方法において、
前記本硬化工程の後に、基板表面に大気中にて５〜２０
Ｊ／ｃｍ2 の紫外線を照射し、現像工程で基板表面に残
った残渣を除去することを特徴とするカラーフィルター
の製造方法である。That is, according to the present invention, in a photolithography process, a substrate is coated with a colored resin in which at least a colored material is dispersed in a transparent photosensitive resin, which is heated and temporarily cured. In the method of producing a color filter by exposing and developing, and then heating again to perform main curing,
After the main curing step, the substrate surface is exposed to the atmosphere for 5 to 20
It is a method for producing a color filter, which comprises irradiating ultraviolet rays of J / cm 2 to remove the residue left on the substrate surface in the developing step.
【００１０】以下、本発明を詳細に説明する。本発明
は、透明な感光性樹脂中に少なくとも着色材料を分散し
てなる着色樹脂を基板上に塗布し、加熱して仮硬化した
後、フォトリソ工程における露光、現像工程を行ない、
再度加熱して本硬化してカラーフィルターを形成する方
法において、本硬化工程の後に、例えば３色または４色
のカラーフィルターを形成した後に、基板表面に大気中
にて５〜２０Ｊ／ｃｍ2 の紫外線（以下、ＵＶ光と記
す）を照射することにより、オゾンを発生させ、前記現
像工程で基板表面に残った残渣とオゾンとの反応によ
り、基板面の残渣を完全に除去するものである。The present invention will be described in detail below. The present invention applies a colored resin obtained by dispersing at least a colored material in a transparent photosensitive resin onto a substrate, and after heating and temporary curing, exposure and development steps in a photolithography step are performed,
In the method of forming a color filter by heating again by heating, a color filter of, for example, 3 or 4 colors is formed after the main curing step, and then the substrate surface is exposed to 5 to 20 J / cm 2 in air. By irradiating with ultraviolet rays (hereinafter referred to as UV light), ozone is generated, and the residue remaining on the substrate surface in the developing step reacts with ozone to completely remove the residue on the substrate surface.
【００１１】本発明の方法により製造されたカラーフィ
ルターは、前記基板表面に残った残渣が完全に除去され
ているために、その後の工程で成膜、パターニングされ
た透明電極や金属電極等と基板との密着力が高くなり、
前記液晶パネルと駆動用ドライバーを接続する実装部等
においても、実装電極の基板からの剥離は発生せず、カ
ラーフィルター付基板を歩留まり良く製造することが可
能になる。In the color filter manufactured by the method of the present invention, since the residue remaining on the surface of the substrate is completely removed, the transparent electrode, the metal electrode, etc. formed and patterned in the subsequent step and the substrate The adhesion with
Even in the mounting portion that connects the liquid crystal panel and the driver for driving, the mounting electrodes are not peeled off from the substrate, and the substrate with a color filter can be manufactured with high yield.
【００１２】また、本発明にいては、基板表面に大気中
にて５〜２０Ｊ／ｃｍ2 の紫外線を照射するが、紫外線
の照射はオゾンの発生による基板表面の洗浄を目的と
し、そのためには、大気中にて５〜２０Ｊ／ｃｍ2 の照
射エネルギーを必要とする。In the present invention, the surface of the substrate is irradiated with ultraviolet rays of 5 to 20 J / cm 2 in the atmosphere. The purpose of the irradiation of ultraviolet rays is to clean the surface of the substrate by the generation of ozone. The irradiation energy of 5 to 20 J / cm 2 is required in the atmosphere.
【００１３】図１は本発明のカラーフィルターの製造方
法の一例を示す工程図である。同図１において、本発明
のカラーフィルターの製造方法は、先ずガラス基板１上
にカラーフィルター材料塗布膜２をスピンナー方法にて
塗布し、仮硬化する（図１（ａ）参照）。次に、露光機
にてフォトマスク３を用いてＵＶ光４を露光する（図１
（ｂ）参照）。露光した後、現像・リンス・乾燥工程を
行なう（図１（ｃ）参照）。この現像工程では、基板表
面に単分子層に近い残渣５が残っている。FIG. 1 is a process chart showing an example of a method for manufacturing a color filter of the present invention. Referring to FIG. 1, in the method of manufacturing a color filter of the present invention, first, a color filter material coating film 2 is applied on a glass substrate 1 by a spinner method and temporarily cured (see FIG. 1A). Next, UV light 4 is exposed using a photomask 3 with an exposure device (see FIG. 1).
(See (b)). After exposure, development, rinsing, and drying steps are performed (see FIG. 1 (c)). In this developing step, the residue 5 close to the monolayer remains on the surface of the substrate.
【００１４】次いで、ホットプレート８により再度加熱
し本硬化してカラーフィルターを製造する（図１（ｄ）
参照）。前記本硬化した後に、該残渣５を除去するため
に、空気中でＵＶランプ７から５〜２０Ｊ／ｃｍ2 のＵ
Ｖ光６を基板表面に照射し残渣を分解・除去する（図１
（ｅ）参照）。Ｒ（赤），Ｇ（緑），Ｂ（青）を形成す
る為には、図１（ａ）〜（ｅ）の工程を色分だけ繰り返
す必要がある。Then, it is heated again by the hot plate 8 and main-cured to manufacture a color filter (FIG. 1 (d)).
reference). After the main curing, in order to remove the residue 5, from the UV lamp 7 U of 5-20 J / cm 2 in air.
The surface of the substrate is irradiated with V light 6 to decompose and remove the residue (Fig. 1
(See (e)). In order to form R (red), G (green), and B (blue), it is necessary to repeat the steps of FIGS. 1A to 1E for each color.
【００１５】本発明において、カラーフィルターは赤，
緑，青の３色または赤，緑，青，白の４色からなり、３
色または４色のすべてを形成した後にＵＶ光を照射し
て、現像工程でガラス基板表面に残った残渣５を除去し
てもよい。In the present invention, the color filter is red,
3 colors of green and blue or 4 colors of red, green, blue and white
After forming all the colors or all four colors, UV light may be irradiated to remove the residue 5 remaining on the glass substrate surface in the developing step.
【００１６】また、着色樹脂は、感光性樹脂中に少なく
とも着色材料を分散してなるものが用いられるが、感光
性樹脂はポリアミドを主体とした成分からなるものが好
ましい。着色材料には、特に制限する必要はなく広範囲
のもが用いられるが、例えば等が挙がられる。基板上に
着色樹脂を塗布する方法としては、例えばスピンナー
法、印刷法、ロールコーター法等が用いられるが、特に
スピンナー方法により塗布するのが好ましい。Further, as the coloring resin, a resin in which at least a coloring material is dispersed in a photosensitive resin is used, but the photosensitive resin is preferably composed of a component mainly containing polyamide. There is no particular limitation on the coloring material, and a wide range of coloring materials can be used. As a method for applying the colored resin on the substrate, for example, a spinner method, a printing method, a roll coater method, etc. are used, and it is particularly preferable to apply the spinner method.
【００１７】残渣の分解・除去の効果の確認に関して
は、簡易的には表面をこすることにより効果の有無がわ
かる。しかし、もう少し細かく見る為には、ガラス基板
表面の接触角を測定し、表面エネルギー（アンカリング
エネルギー）の状態で確認する手段を用いる。接触角測
定の内、最も簡易的な手法に絞り、例えば、Ｈ2 Ｏに
て、その差を見ると、素ガラス上の接触角が４．２度
（洗浄直後のガラス基板表面）であるのに対し、従来の
方法では、カラーフィルター材料を用い、塗布・露光・
現像後のカラーフィルターの残っていないはずの部分
で、接触角が４６度もある。これは、カラーフィルター
材料もしくは現像液の成分が数１０〜数１００Åの単位
で残っていることを示す。Regarding the confirmation of the effect of decomposing / removing the residue, the presence or absence of the effect can be easily understood by rubbing the surface. However, in order to look a little more finely, a means for measuring the contact angle of the glass substrate surface and confirming it in the state of surface energy (anchoring energy) is used. Of the contact angle measurements, focusing on the simplest method, for example, using H 2 O, and looking at the difference, the contact angle on the raw glass is 4.2 degrees (the glass substrate surface immediately after cleaning). On the other hand, in the conventional method, a color filter material is used, and coating / exposure /
The contact angle is as large as 46 degrees in the part where the color filter after development should not remain. This indicates that the components of the color filter material or the developing solution remain in the unit of several tens to several hundreds of liters.
【００１８】本発明においては、該残渣の成分が特定で
きない為、仮にカラーフィルター材料の残渣成分と記述
する。なお、残渣成分は、図１（ｄ）に示す様に、ＵＶ
光に当てることより分解洗浄され、接触角がほぼ素ガラ
スと同等になることで確認した。In the present invention, since the component of the residue cannot be specified, it will be described as a residual component of the color filter material. The residual component is UV as shown in FIG. 1 (d).
It was confirmed that it was disassembled and washed by exposing it to light, and that the contact angle was almost the same as that of plain glass.
【００１９】[0019]
【実施例】以下に実施例を挙げて本発明を具体的に説明
する。EXAMPLES The present invention will be specifically described below with reference to examples.
【００２０】実施例１ 図１に示す方法により、カラーフィルターを製造した。
まず、１のガラス基板上に、金属Ｃｒをスパッタリング
方法により、約８００Åの膜厚に成膜した後、フォトリ
ソを通し必要なパターンを形成した。次に、ネガ型感光
性ポリアミドを主体とし、顔料を含有するカラーフィル
ター材料を用いて厚さ１．６μｍにスピンナー方法にて
塗布した（図１（ａ）参照）。Example 1 A color filter was manufactured by the method shown in FIG.
First, metal Cr was deposited on a glass substrate 1 to a thickness of about 800 Å by a sputtering method, and then a required pattern was formed through photolithography. Next, a negative type photosensitive polyamide was used as a main component, and a color filter material containing a pigment was used to apply a film having a thickness of 1.6 μm by a spinner method (see FIG. 1A).
【００２１】次に、ホットプレートにて８０℃、１０分
間仮硬化した後、フォトマスクを用いてＵＶ光を１００
〜６００ｍＪ照射した（図１（ｂ）参照）。該カラーフ
ィルター材料はＵＶ照射によって光硬化される。この
後、現像液にて、光硬化されていない部分を取り除き、
リンス、洗浄、乾燥、ポストベーク工程へと移動した。
この様にして形成したカラーフィルターパターンのない
周辺部分のＨ2 Ｏによる接触角は約５３度であった。Next, after temporarily curing at 80 ° C. for 10 minutes on a hot plate, UV light of 100 is applied using a photomask.
Irradiation was performed up to 600 mJ (see FIG. 1 (b)). The color filter material is photo-cured by UV irradiation. After that, with a developer, remove the part that is not photocured,
Moved to rinse, wash, dry, post bake process.
The contact angle by H 2 O of the peripheral portion having no color filter pattern thus formed was about 53 degrees.
【００２２】その後、ＵＶランプを用いて、該カラーフ
ィルターパターン付基板にＵＶ光を５Ｊ／ｃｍ2 照射し
たところ、該基板のカラーフィルターパターンのない周
辺部分のＨ2 Ｏによる接触角は２０度となった。上記工
程をＲ（赤），Ｇ（緑），Ｂ（青）の各色毎に実施し
（図１（ａ）〜（ｄ）参照）、ディスプレイ用のカラー
フィルター基板を形成した。After that, when a UV lamp was used to irradiate the substrate with the color filter pattern with UV light at 5 J / cm 2, the contact angle by H 2 O of the peripheral portion of the substrate without the color filter pattern was 20 degrees. became. The above process was performed for each color of R (red), G (green), and B (blue) (see FIGS. 1A to 1D) to form a color filter substrate for a display.
【００２３】この基板上に、ＩＴＯ膜、補助電極の金属
膜を各々スパッタで形成、フォトリソ工程によりパター
ニングした後、絶縁層を形成し、さらに配向膜を形成
し、この上をラビングし、対向基板と貼合せた。このパ
ネルに強誘電性液晶を注入し、封口後、実装部にＴＡＢ
ＩＣを接続したことろ、実装部密着性が良好な結果が
得られた。On this substrate, an ITO film and a metal film of an auxiliary electrode are formed by sputtering and patterned by a photolithography process, an insulating layer is formed, an alignment film is further formed, and an alignment film is rubbed on the counter substrate. Pasted together. Ferroelectric liquid crystal is injected into this panel, and after sealing, TAB is mounted on the mounting part.
Since the ICs were connected, good adhesion was obtained.
【００２４】実施例２ 図１に示す方法により、カラーフィルターを製造した。
まず、１のガラス基板上に、金属Ｃｒをスパッタリング
方法により、約８００Åの膜厚に成膜した後、フォトリ
ソを通し必要なパターンを形成した。次に、ネガ型感光
性ポリアミドを主体とし、顔料を含有するカラーフィル
ター材料を用いて厚さ１．６μｍにスピンナー方法にて
塗布した（図１（ａ）参照）。Example 2 A color filter was manufactured by the method shown in FIG.
First, metal Cr was deposited on a glass substrate 1 to a thickness of about 800 Å by a sputtering method, and then a required pattern was formed through photolithography. Next, a negative type photosensitive polyamide was used as a main component, and a color filter material containing a pigment was used to apply a film having a thickness of 1.6 μm by a spinner method (see FIG. 1A).
【００２５】次に、ホットプレートにて８０℃、１０分
間仮硬化した後、フォトマスクを用いてＵＶ光を１００
〜６００ｍＪ照射した（図１（ｂ）参照）。該カラーフ
ィルター材料はＵＶ照射によって光硬化される。この
後、現像液にて、光硬化されていない部分を取り除き、
リンス、洗浄、乾燥、ポストベーク工程へと移動した。
この様にして形成したカラーフィルターパターンのない
周辺部分のＨ2 Ｏによる接触角は約５３度であった。Next, after temporary curing at 80 ° C. for 10 minutes on a hot plate, UV light of 100 is applied using a photomask.
Irradiation was performed up to 600 mJ (see FIG. 1 (b)). The color filter material is photo-cured by UV irradiation. After that, with a developer, remove the part that is not photocured,
Moved to rinse, wash, dry, post bake process.
The contact angle by H 2 O of the peripheral portion having no color filter pattern thus formed was about 53 degrees.
【００２６】その後、ＵＶランプを用いて、該カラーフ
ィルターパターン付基板にＵＶ光を２０Ｊ／ｃｍ2 照射
したところ、該基板のカラーフィルターパターンのない
周辺部分のＨ2 Ｏによる接触角は８度となった。上記工
程をＲ（赤），Ｇ（緑），Ｂ（青）の形成後に実施し
（図１（ａ）〜（ｄ）参照）、さらに保護膜を形成し、
ディスプレイ用のカラーフィルター基板を形成した。After that, when a UV lamp was used to irradiate the substrate with the color filter pattern with UV light of 20 J / cm 2, the contact angle by H 2 O of the peripheral portion of the substrate without the color filter pattern was 8 degrees. became. The above process is performed after forming R (red), G (green), and B (blue) (see FIGS. 1A to 1D), and further forming a protective film,
A color filter substrate for a display was formed.
【００２７】この基板上に、ＩＴＯ膜、補助電極の金属
膜を各々スパッタで形成、フォトリソ工程によりパター
ニングした後、絶縁層を形成し、さらに配向膜を形成
し、この上をラビングし、対向基板と貼合せた。このパ
ネルに強誘電性液晶を注入し、封口後、実装部にＴＡＢ
ＩＣを接続したことろ、実装部密着性が非常に良好な
結果が得られた。On this substrate, an ITO film and a metal film of an auxiliary electrode are formed by sputtering and patterned by a photolithography process, an insulating layer is formed, an alignment film is further formed, and an alignment film is rubbed on the counter substrate. Pasted together. Ferroelectric liquid crystal is injected into this panel, and after sealing, TAB is mounted on the mounting part.
By connecting the ICs, the result was that the adhesion of the mounting portion was very good.
【００２８】[0028]
【発明の効果】以上説明した様に、本発明は、カラーフ
ィルターを形成する際に、現像パタ−ニング後、本硬化
後にＵＶ光を照射し、基板表面に残ったカラーフィルタ
ーの残渣成分を分解除去することにより、実装部の密着
性に優れたカラーフィルター付き基板を提供できる。特
に、ネガ型感光性カラーフィルター材料に対しては、本
発明の実施が必要であり、非常に優れた効果がある。As described above, according to the present invention, when a color filter is formed, UV rays are irradiated after the development patterning and after the main curing to decompose the residual components of the color filter remaining on the substrate surface. By removing it, it is possible to provide a substrate with a color filter having excellent adhesion of the mounting portion. In particular, it is necessary to carry out the present invention for a negative type photosensitive color filter material, and there is a very excellent effect.
【図１】本発明のカラーフィルターの製造方法の一例を
示す工程図である。FIG. 1 is a process drawing showing an example of a method for manufacturing a color filter of the present invention.
１ ガラス基板 ２ カラーフィルター材料塗布膜 ３ フォトマスク ４ ＵＶ光 ５ 残渣 ６ ＵＶ光 ７ ＵＶランプ ８ ホットプレート 1 Glass Substrate 2 Color Filter Material Coating Film 3 Photo Mask 4 UV Light 5 Residue 6 UV Light 7 UV Lamp 8 Hot Plate
Claims (4)
料を分散してなる着色樹脂を基板上に塗布し、加熱して
仮硬化した後、フォトリソ工程における露光、現像を行
い、次いで再度加熱し本硬化してカラーフィルターを製
造する方法において、前記本硬化工程の後に、基板表面
に大気中にて５〜２０Ｊ／ｃｍ2 の紫外線を照射し、現
像工程で基板表面に残った残渣を除去することを特徴と
するカラーフィルターの製造方法。1. A colored resin in which at least a colored material is dispersed in a transparent photosensitive resin is applied on a substrate, heated and temporarily cured, and then exposed and developed in a photolithography process, and then heated again. In the method for producing a color filter by main curing, after the main curing step, the substrate surface is irradiated with ultraviolet rays of 5 to 20 J / cm 2 in the atmosphere to remove the residue left on the substrate surface in the developing step. A method for producing a color filter, which is characterized in that
により塗布する請求項１記載のカラーフィルターの製造
方法。2. The method for producing a color filter according to claim 1, wherein the colored resin is applied onto the substrate by a spinner method.
た成分からなる請求項１記載のカラーフィルターの製造
方法。3. The method for producing a color filter according to claim 1, wherein the photosensitive resin is composed of a component mainly containing polyamide.
色または赤，緑，青，白の４色であり、３色または４色
を形成した後に紫外線の照射を行なう請求項１記載のカ
ラーフィルターの製造方法。4. The color filter comprises red, green, and blue.
2. The method for producing a color filter according to claim 1, wherein the color filter has four colors of red, green, blue, and white, and ultraviolet rays are irradiated after forming three colors or four colors.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4055990A JPH05224015A (en) | 1992-02-07 | 1992-02-07 | Production of color filter |
| US08/013,796 US5482803A (en) | 1992-02-07 | 1993-02-05 | Process for preparing filter |
| US08/962,820 US5830608A (en) | 1992-02-07 | 1997-11-03 | Process for preparing filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4055990A JPH05224015A (en) | 1992-02-07 | 1992-02-07 | Production of color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05224015A true JPH05224015A (en) | 1993-09-03 |
Family
ID=13014527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4055990A Pending JPH05224015A (en) | 1992-02-07 | 1992-02-07 | Production of color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05224015A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882790A (en) * | 1994-09-12 | 1996-03-26 | Japan Storage Battery Co Ltd | Removing device of residual film on color filter for liquid crystal display panel |
| JPH10239863A (en) * | 1996-12-27 | 1998-09-11 | Mitsubishi Chem Corp | Forming method of black resist pattern and production of color filter |
| JP2004265752A (en) * | 2003-03-03 | 2004-09-24 | Dainippon Printing Co Ltd | Manufacturing method of color conversion filter |
| KR100529558B1 (en) * | 1998-05-19 | 2006-03-03 | 삼성전자주식회사 | Manufacturing Method of Color Filter Board |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63155105A (en) * | 1986-12-19 | 1988-06-28 | Canon Inc | Color filter |
| JPS63298242A (en) * | 1987-05-29 | 1988-12-06 | Dainippon Printing Co Ltd | Formation of photosensitive resin layer |
-
1992
- 1992-02-07 JP JP4055990A patent/JPH05224015A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63155105A (en) * | 1986-12-19 | 1988-06-28 | Canon Inc | Color filter |
| JPS63298242A (en) * | 1987-05-29 | 1988-12-06 | Dainippon Printing Co Ltd | Formation of photosensitive resin layer |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882790A (en) * | 1994-09-12 | 1996-03-26 | Japan Storage Battery Co Ltd | Removing device of residual film on color filter for liquid crystal display panel |
| JPH10239863A (en) * | 1996-12-27 | 1998-09-11 | Mitsubishi Chem Corp | Forming method of black resist pattern and production of color filter |
| KR100529558B1 (en) * | 1998-05-19 | 2006-03-03 | 삼성전자주식회사 | Manufacturing Method of Color Filter Board |
| JP2004265752A (en) * | 2003-03-03 | 2004-09-24 | Dainippon Printing Co Ltd | Manufacturing method of color conversion filter |
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