JPH06148421A - Production of color filter - Google Patents

Abstract

PURPOSE:To produce the color filter which has high color purity and spectral transmittance without peeling from a substrate and the color filter which makes high-grade spin coating possible on the substrate and has the excellent uniformity of a film thickness and surface condition of films. CONSTITUTION:(1) The residues consisting of the photosensitive resins and coloring materials generated on the substrate and colored resins are removed at the time of rinsing after developing in the case of formation of the color filter by photolithography using the photosensitive colored resins formed by dispersing the coloring materials into the photosensitive resins. (2) The color filter is produced by maintaining the atmosphere in a spin stage at <=0.008kg/kg absolute humidity in the process for production of the color filter consisting in applying a color filter material mainly composed of polyamide by a spinner on the substrate, prebaking the substrate, exposing desired patterns on the color filter material, removing the unexposed parts by developing and finally subjecting the color filter material to post baking.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The first invention of the present invention relates to a method for manufacturing a color filter, and more particularly to a method for manufacturing a color filter for a liquid crystal display.

The second invention of the present invention relates to a method for manufacturing a large screen color filter, and more particularly to a method for manufacturing a color filter for a liquid crystal display.

[0003]

2. Description of the Related Art Conventional technology of the first invention of the present invention: Conventionally, as a color filter, gelatin on a substrate,
There is known a dyed color filter in which a mordant layer made of a hydrophilic polymer such as casein, glue or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer. In such a dyeing method, there are many dyes that can be used, and it is relatively easy to deal with the spectral characteristics required for a color filter.
The wet process, which is difficult to control, is used to immerse the mordant layer in the dye bath in which the dye is dissolved, and the complex process of providing an intermediate layer for dye protection for each color results in poor yield. have.

Further, the heat resistance of the dyeable dye is 150 ° C.
It is relatively low as follows, and when the filter requires a thermal treatment, it is difficult to use and the dyeing film itself has inferior reliability such as heat resistance and light resistance.

On the other hand, conventionally, there is known a color filter using a coloring resin in which a certain coloring material is dispersed in a transparent resin. For example, a color filter can be formed by a method using a photolithography process using a photosensitive colored resin film in which a coloring material is mixed with a photosensitive resin. This color filter can be said to be a useful color filter because it can use a highly reliable material as compared with the dyed color filter and can be formed by a relatively simple method.

Conventional Technology of the Second Invention of the Present Invention Conventionally, a color filter for a liquid crystal display has a desired pattern formed by applying a color filter material onto a substrate by spin coating and then performing a photolithography process and an etching process. Or a method of obtaining a desired color filter pattern through a photolithography step and an etching step after printing the color filter material on the substrate by flexographic printing, and further when printing the color filter material on the substrate in advance. There is a method in which the printing plate is processed in the same manner as the color filter pattern and the color filter pattern is formed only by printing.

As described above, the method of applying the color filter material on the substrate can be roughly classified into a spin coating method and a printing method. However, while the flexographic printing method is advantageous in terms of production cost, it lacks uniformity in film thickness, and it is extremely difficult to control this. Further, the method of forming a color filter pattern only by printing has not been able to cope with the recent tendency of pattern miniaturization.

On the other hand, the spin coating method is not preferable from the viewpoint of material cost, but the uniformity and optical properties of the film obtained by coating are excellent, and it can be said that the spin coating method is a preferable method as a coating method of the color filter material. .

[0009]

DISCLOSURE OF THE INVENTION Problems to be Solved by the First Invention of the Invention However, in a color filter formed by using a photosensitive coloring resin composed of such a coloring material and a photosensitive resin, The white and other colored resin residues generated in the color filter forming step adhere to the substrate and the colored resin. Although some improvement can be seen by optimizing the development conditions for patterning the colored resin layer, it is impossible to completely eliminate the residue of the colored resin. Therefore, the residue of the colored resin causes a decrease in the spectral transmittance of the color filter and a broadening of the spectral characteristics, leaving a problem in terms of optical characteristics.
Also, in the case of color display, it is necessary to provide the transparent electrode on the color filter through passivation, but the adhesion of the passivation film is reduced due to the residue of the colored resin and peeling occurs, causing the transparent electrode to have an abnormal shape. As a result, electrode shorts and the like occur, which significantly reduces the yield of products.

The present invention has been made to solve the above-mentioned drawbacks of the prior art, and forms a color filter using a photosensitive coloring resin in which a coloring material is dispersed in a photosensitive resin on a substrate. In the method, the residue of the colored resin consisting of the photosensitive resin and the colored material generated on the substrate and the colored resin is removed, thereby obtaining a high-quality color filter with improved color purity and spectral transmittance, and a color filter and It is an object of the present invention to provide a method for producing a color filter in which the adhesion of a film provided on a substrate is also improved, peeling does not occur, and when a color panel is produced, the occurrence of short circuit between the upper and lower electrodes is extremely small.

However, in the above-mentioned conventional technique, when the color filter material mainly containing polyamide is applied on the substrate by the spin coating method, the environment at the time of spin coating is increased. Greatly affects the coating quality. In particular, the influence of temperature and humidity on the coating is remarkable. Absolute humidity is an index that is not affected by temperature changes. The coating quality gradually deteriorates as the absolute humidity gradually increases. This quality appears as unevenness that extends radially from the center of the color filter film coated on the substrate. This uneven coating causes a situation that cannot be ignored because the area occupied on the substrate increases as the absolute humidity increases.

The present invention has been made in view of the above-mentioned drawbacks of the prior art, and enables spin coating of a color filter film on a substrate at a high quality level, and can achieve uniform film thickness within the substrate surface and It is an object of the present invention to provide a method for producing a color filter having an excellent film surface condition.

[0013]

Means for Solving the Problem of the First Invention of the Present Invention That is, the first invention of the present invention is a photosensitive coloring in which a coloring material is dispersed in a photosensitive resin. A method for forming a color filter by patterning a resin by a photolithography process, which comprises a residue removing process at the time of rinsing after development in the photolithography process.

The present invention will be described in detail below. The present invention, in the step of forming a color filter by patterning a photosensitive colored resin using a photolithography process, after applying the photosensitive colored resin to the substrate, prebaking, exposure,
It is characterized in that the residue of the coloring material is removed by wiping off the pattern surface and the substrate surface around the pattern in the rinsing step performed after the development treatment.

A photosensitive resin is used as the base material of the color filter used in the present invention, and the photosensitive resin is not particularly limited, but a photosensitive polyamide resin excellent in heat resistance and transparency is preferably used. To be

Then, a coloring material such as an organic pigment is dispersed in the photosensitive resin to be used as the photosensitive coloring resin.
Examples of the organic pigment used include condensed azo pigments such as soluble azo pigments, insoluble azo pigments, condensed azo pigments, phthalocyanine pigments, indigo pigments, anthraquinone pigments, perylene pigments, dioxazine pigments, and other metal complex pigments. A system pigment is used.

Next, a specific process for forming a pattern using the above-described photosensitive colored resin material will be described. 1A to 1F are explanatory views showing an example of a method for manufacturing a color filter of the present invention. First, FIG. 1 (a)
As shown in, the first-color photosensitive colored resin film 2 is formed on the substrate 1. Examples of the film forming method include a spin coating method and a printing method. Next, after prebaking and drying, the photomask 3 is used to expose with ultraviolet light (see FIG. 1).
(See (b)). By this exposure, the exposed portion becomes the photo-cured portion 2a insoluble in the developing solution (see FIG. 1 (c)). After that, the unexposed portion is dissolved and removed by a developing solution, and then rinsed and post-baked to form a pattern of the first color (see FIG. 1D).

Here, in order to remove the residues of the photosensitive resin and the coloring material which cannot be removed by development during the rinsing treatment,
Wipe under a rinse solution. Examples of the wiping method include a hand wiping method, a polishing method and a rubbing roller method. The material of the means used for wiping is not particularly limited as long as it does not damage the color filter, and any material may be used, and examples thereof include nylon, rayon, acetate, cotton, polyester and PVA. The end point of the wiping is based on the fact that the wiping material does not become colored. The method of removing the residue at the time of such a rinse is the same for the second color and the third color.
The same process is performed in the color forming step (see FIG. 1).
(See (e)). After that, a protective film (passivation) 7
By providing the color filter, a color filter having no color mixture can be obtained (see FIG. 1 (f)).

Means for Solving the Problem of the Second Invention of the Present Invention That is, the second invention of the present invention is a spinning step of applying a color filter material mainly containing polyamide onto a substrate by a spinner, In a method for producing a color filter, which comprises a pre-baking step of the substrate, an exposing step of exposing a desired pattern to the color filter material, a developing step of removing an unexposed portion and a post-baking step,
The atmosphere of the spin process is 0.008 kg / k in absolute humidity.
The method for producing a color filter is characterized in that it is not more than g.

The present invention will be described in detail below. According to the present invention, in the step of applying a color filter material mainly composed of polyamide on a substrate by a spin coating method, the absolute humidity in the booth surrounding the spinner or the entire clean room is 0.008 kg / kg or less. Is a method of coating a color filter film having excellent quality.

Next, the principle of operation of the present invention will be described. Figure 4
FIG. 1 is a schematic diagram showing an example of an absolute humidity management system used in the method for manufacturing a color filter of the present invention. As shown in FIG. 4, a spinner 120 and a hot plate 104 for performing pre-baking are arranged in a room 121 communicating with the dehumidifier 105. This room 121 is a dehumidifier 1
Dehumidified by 05, absolute humidity is always 0.008kg / k
It is kept below g. The relationship between the temperature, the relative humidity and the absolute humidity is as shown in the graph of FIG. Under such a managed condition, the spin head 1 shown in FIG.
The colored resin mainly containing polyamide is dropped from the dispenser 103 onto the glass substrate 102 placed on 01, and then the resin is rotated at a rotational speed so as to obtain a desired film thickness and coated. By rapidly prebaking the colored resin film thus applied on the hot plate 104, a color filter film having a uniform film thickness and excellent surface condition of the film can be formed.

[0022]

EXAMPLES The present invention will be specifically described below with reference to examples.

Example of the First Invention of the Present Invention Example 1 A color filter was manufactured by the method shown in FIGS. First, as shown in FIG. 1A, a glass substrate (thickness: 1.1 mm) 1 was coated with a photosensitive red colored resin (PA-1012R, manufactured by Ube Industries, Ltd.) by a spinner to a thickness of 1.6 μm. The colored resin film 2 was formed. Then, prebaking was performed on a hot plate at a temperature of 90 ° C. for 5 minutes. After that, using a photomask 3 and a mask aligner (manufactured by Tamarack), 400 mJ /
It was exposed with energy of cm ² (see FIG. 1 (b)). By this exposure, the photosensitive colored resin was photocured and became insoluble in the developing solution. Then, after immersing in a dedicated developer (PA-AD, Ube Industries, Ltd.) for 120 seconds, ultrasonic waves were applied to the developer for 30 seconds to dissolve and remove the unexposed portion.

Next, after immersing for 30 seconds in a dedicated rinse liquid (RPA-2, manufactured by Ube Industries, Ltd.), PVA in the rinse liquid is performed.
The sheet was wiped off by hand for about 30 seconds. By this wiping, the residue of the colored resin on the substrate and the patterned colored resin layer was removed. afterwards,
It was immersed in IPA (isopropyl alcohol) for 30 seconds to replace the rinse liquid. Then, after hot water pull-up and drying, a red pattern colored resin layer 4 was obtained by post-baking in a clean oven at 200 ° C. for 30 minutes (see FIG. 1D). Thereafter, in the same manner, the green pattern colored resin layer 5 (PA-1012G, manufactured by Ube Industries, Ltd.),
A blue patterned colored resin layer 6 (PA-1012B, manufactured by Ube Industries, Ltd.) was sequentially formed (see FIG. 1 (e)).

After forming the above three colors, a protective layer 7 (PA-1000C, manufactured by Ube Industries, Ltd.) having a film thickness of 1.5 μm is formed by printing, and prebaked (90) by a hot plate.
Then, the whole surface was exposed to an energy of 800 mJ / cm ² by ultraviolet light. And finally, post-baking in a clean oven at 250 ° C for 30 minutes, red,
A color filter of three primary colors of green and blue was obtained (see FIG. 1 (f)).

FIG. 3 shows the transmittance characteristics 8, 9 and 10 of the color filter formed as described above and the transmittance characteristics 8'of the color filter formed without wiping.
9'and 10 'are shown. As is clear from the figure, it can be seen that the spectral characteristics of the wiped color filter have high transmittance and excellent color purity.

Example 2 A color filter was manufactured by the method shown in FIGS. First, as shown in FIG. 2A, a glass substrate (thickness: 1.1 mm) 1 was coated with a photosensitive red colored resin (PA-1012R, manufactured by Ube Industries, Ltd.) by a spinner to a thickness of 1.6 μm. The colored resin film 2 was formed. Then, prebaking was performed on a hot plate at a temperature of 90 ° C. for 5 minutes and time. After that, Photomass 3
Exposure (see FIG. 2B). By this exposure, the photosensitive colored resin was photocured and became insoluble in the developing solution. After that, 120 with a dedicated developer (PA-AD, Ube Industries)
After immersion for 2 seconds, ultrasonic waves were applied for 30 seconds in a developing solution to dissolve and remove the unexposed portion.

Next, after immersing in a dedicated rinse solution (RPA-2, Ube Industries, Ltd.) for 30 seconds, PVA in the rinse solution is performed.
Was wiped for about 30 seconds by a rubbing roller method. By this wiping, the residue of the colored resin on the substrate and the patterned colored resin layer was removed. Then I
It was immersed in PA for 30 seconds to replace the rinse liquid. Then, after pulling warm water and drying, 20 in a clean oven
Post-baking was performed at 0 ° C. for 30 minutes to obtain a red colored colored resin layer 4 (see FIG. 2D). Thereafter, similarly, the green patterned resin layer 5 (PA-1012) is formed.
G, manufactured by Ube Industries, Ltd., blue pattern colored resin layer 6 (P
A-1012B, Ube Industries, Ltd.) and a white patterned colored resin layer 11 (PA-1000C, Ube Industries Ltd.) were sequentially formed (see FIG. 2 (e)).

After forming the above four colors, a protective layer 7 (PA-1000C, manufactured by Ube Industries, Ltd.) having a thickness of 1.5 μm is formed by printing, and prebaked (90) by a hot plate.
Then, the whole surface was exposed to an energy of 800 mJ / cm ² by ultraviolet light. And finally, post-baking in a clean oven at 250 ° C for 30 minutes, red,
Four primary color filters of green, blue and white were obtained (Fig. 2
(See (f)). The color filter obtained is from Example 1.
Similar to the above, the spectral transmittance and the color purity were excellent.

As is apparent from the above examples, the residue of the colored resin and the colored material on the colored resin layer and the substrate is removed by wiping in the rinsing step after the development, whereby the color purity and the spectrum are improved. The transmittance was improved and a higher quality color filter was obtained.

Example of the Second Invention of the Present Invention Example 3 A color filter material was spin-coated at a low humidity shown in FIG. 4 using a spin-coating system. Hereinafter, it will be described with reference to FIG. 6 based on an actual color filter forming process.

As shown in FIG. 6A, the thickness is 1.1 mm.
Chrome film is formed on the glass substrate 102 of
The light shielding layer 109 and the alignment mark are formed by etching. The film thickness of chromium is about 1000Å. Then, spin coating was performed using the spinner 120 shown in FIG. The first color is a photosensitive polyamide resin in which a red pigment is dispersed (for example, PA-1012).
R, a product of Ube Industries, Ltd.) was used. The environment during spin coating is 21 ° C, relative humidity 45%, absolute humidity 0.007 kg /
kg (see FIG. 5). The red filter layer 111 was provided under the above conditions (see FIG. 6B).

Then, using the hot plate 104, 8
Prebaking was performed at 0 ° C. for 10 minutes to obtain a film thickness of 1.6 μm. The environment during this pre-baking is kept the same as during spin coating. Then, it was exposed to energy of 300 mJ / cm ² through a photomask 116 by a mask aligner to photo-cur a desired position to make it insoluble in a developing solution (see FIG. 6C). After that, an uncured portion was dissolved and removed using a dedicated developer (for example, PA-AD, a product of Ube Industries, Ltd.), and then rinsed with IPA.
In addition, post bake 200 in a clean oven.
It was carried out at ℃ for 1 hour. As a result, the red color filter layer 111 of the first color was formed (see FIG. 6D).

Similarly, a green filter layer 112, a blue filter layer 113, and a transparent layer (white) filter layer 11
4 were sequentially formed (see FIG. 6E). As a material,
PA-1012G, PA-1012B, PA-1000
C (product of Ube Industries, Ltd.) was used. The coating film thickness, exposure energy and baking temperature are the same as those of the red layer.

Finally, the protective layer 115 is formed by forming the transparent layer 11
1. The same material as in No. 4 was used and 1.
It was formed to a film thickness of 6 μm. After that, prebaking was performed at 80 ° C. for 10 minutes, and the entire surface was exposed to ultraviolet rays at an energy of 1000 mJ / cm ² . Then, it was heated in a clean oven at 250 ° C. for 1 hour to obtain a 4-color color filter (see FIG. 6 (f)).

The color filter thus obtained was excellent in the uniformity of the film thickness and the surface condition of the film, and a panel having a uniform screen after cell formation was obtained. FIG. 7A is an electron micrograph (magnified) showing the structure of the surface state of this color filter.

Example 4 The color filter material was spin-coated and pre-baked in the low-humidity spin coating system shown in FIG. 4 without controlling only the hot plate environment. Hereinafter, it will be described with reference to FIG. 6 based on an actual color filter forming process.

As shown in FIG. 6A, the thickness is 1.1 mm.
Chrome film is formed on the glass substrate 102 of
The light shielding layer 109 and the alignment mark 110 were formed by etching. The film thickness of chromium is about 1000Å. Then, spin coating was performed using the spinner 120 shown in FIG. The first color is a photosensitive polyamide resin in which a red pigment is dispersed (for example, PA-
1012R, Ube Industries, Ltd.) was used. The environment during spin coating was 25 ° C., relative humidity 40%, and absolute humidity 0.0078 kg / kg (see FIG. 5). The red filter layer 111 was provided under the above conditions (see FIG. 6B). Then, using the hot plate 104, 80 ° C., 1
Prebaking was performed for 0 minutes to obtain a film thickness of 1.6 μm. The environment during this pre-baking is kept the same as during spin coating.

After that, a mask aligner was used to expose through a photomask with energy of 300 mJ / cm ² to photocure desired positions to make them insoluble in a developing solution (see FIG. 3 (c)). After that, a dedicated developer (eg PA
-AD, Ube Industries, Ltd.) was used to dissolve and remove the uncured portion, and then rinse treatment was performed with IPA. Then, post-baking was performed in a clean oven at 200 ° C. for 1 hour. As a result, the red color filter layer 111 of the first color was formed (see FIG. 6D). Similarly, green filter layer 112, blue filter layer 113, transparent (white)
The filter layers 114 were sequentially formed (see FIG. 6E). As a material, PA-1012G, PA-101
2B, PA-1000C (product of Ube Industries, Ltd.) was used.
The coating film thickness, exposure energy and bake temperature are the same as those of the red filter layer 111.

Finally, the protective layer 115 was formed using the same material as the transparent filter layer 114 under the same spin conditions to a film thickness of 1.6 μm. After that, pre-baking is performed at 80 ° C. for 10 minutes, and 1000 mJ / cm 2 by ultraviolet rays.
^The entire surface was exposed with the energy of ² . After that, 250 ℃, 1
A 4-color color filter was obtained by heating in a clean oven under the conditions of time (see FIG. 6 (f)). The color filter thus obtained was excellent in uniformity of film thickness and surface condition of the film, similar to the case of Example 1.

Comparative Example 1 The color filter material was spin-coated and pre-baked by the low-humidity spin coating system shown in FIG. 4 without controlling only the hot plate environment. Hereinafter, it will be described with reference to FIG. 6 based on an actual color filter forming process.

As shown in FIG. 6A, the thickness is 1.1 mm.
Chrome film is formed on the glass substrate 102 of
The light shielding layer 109 and the alignment mark 110 were formed by etching. The film thickness of chromium is about 1000Å. Then, spin coating was performed using the spinner 120 shown in FIG. The first color is a photosensitive polyamide resin in which a red pigment is dispersed (for example, PA-
1012R, Ube Industries, Ltd.) was used.

The environment during spin coating is room temperature of 25 ° C., relative humidity of 45%, and absolute humidity of 0.0088 kg / kg (see FIG. 5).
See). The red filter layer 111 was provided under the above conditions (see FIG. 6B). And hot plate 10
Prebaked at 80 ℃ for 10 minutes using 4
A film thickness of m was obtained. The environment during this pre-baking is kept the same as during spin coating.

Then, a mask aligner was used to expose through a photomask with energy of 300 mJ / cm ² to photocure a desired position to make it insoluble in a developing solution (see FIG. 6C). After that, a dedicated developer (eg PA
-AD, Ube Industries, Ltd.) was used to dissolve and remove the uncured portion, and then rinse treatment was performed with IPA. The post-baking was performed in a clean oven at 200 ° C. for 1 hour. As a result, the red color filter layer 111 of the first color was formed (see FIG. 6D). Similarly, green filter layer 112, blue filter layer 113, transparent (white)
The filter layers 114 were sequentially formed (see FIG. 6E). As a material, PA-1012G, PA-101
2B, PA-1000C (product of Ube Industries, Ltd.) was used.
The coating film thickness, exposure energy and bake temperature are the same as those of the red filter layer 111.

Finally, the protective layer 115 is formed by forming the transparent layer 111.
1.6 μm with the same spin condition using the same material as
Was formed to a film thickness of. After that, prebaking was performed at 80 ° C. for 10 minutes, and the entire surface was exposed to ultraviolet rays at an energy of 1000 mJ / cm ² . Then, it was heated in a clean oven at 250 ° C. for 1 hour to obtain a 4-color color filter (see FIG. 6 (f)).

The color filter thus obtained appears as coating unevenness defects radially extending from the central portion of the substrate, and even in the case where it is subsequently made into a cell, it is no longer negligible. FIG. 7B is a copy of an electron micrograph showing the structure of the surface state of this color filter.

[0047]

As described above, according to the first invention of the present invention, the photosensitive colored resin in which the coloring material is dispersed in the photosensitive resin on the substrate is provided. In the method of forming a color filter using, by providing a step of washing the surface of the color filter at the time of rinsing after development in the photolithography step,
It is possible to obtain a high-quality color filter with improved color purity and spectral transmittance by removing the residue of the photosensitive colored resin composed of the photosensitive resin and the colored material generated on the substrate and the colored resin layer. Adhesion between the filter and the film provided on the substrate is also improved, peeling does not occur, and in the case of producing a color panel, the effect of causing very little occurrence of upper and lower electrode short circuits can be obtained.

Effect of the Second Invention of the Present Invention As described above, according to the second invention of the present invention, the absolute humidity during spin coating and preferably the absolute humidity during prebaking is 0.008 kg / kg. By controlling as follows, a color filter material mainly composed of polyamide can be spin-coated at a high quality level, and a color filter excellent in the uniformity of the film thickness within the substrate surface and the surface condition of the film can be obtained. Therefore, the cell gap accuracy and the alignment of the liquid crystal are improved, and a liquid crystal color panel having excellent display quality can be obtained.

[Brief description of drawings]

FIG. 1 is an explanatory view showing an example of a method for manufacturing a color filter of the first invention of the present invention.

FIG. 2 is an explanatory diagram showing a method of manufacturing a color filter of Example 2.

FIG. 3 is a graph showing spectral characteristics of color filters of Example 1 of the present invention and a conventional example.

FIG. 4 is a schematic view showing an example of an absolute humidity management system used in the method for manufacturing a color filter of the second invention of the present invention.

FIG. 5 is a graph showing the relationship between relative humidity, temperature and absolute humidity.

FIG. 6 is a process drawing showing cross sections of a substrate and a film in the process of forming a color filter of the second invention of the present invention in the order of processes.

FIG. 7 is a copy of an electron micrograph showing the structure of the surface condition of the color filter of the second invention of the present invention.
(A) is a copy drawing of a panel using a color filter formed by a spin process according to the present invention, and (b) of FIG. 7 shows a color filter obtained by spin coating without humidity control. It is a copy drawing of a panel.

[Explanation of symbols]

1 Liquid Crystal Display Panel 1 Substrate 2 Colored Resin Film 2a Photocured Part 3 Photomask 4 Red Patterned Colored Resin Layer 5 Green Patterned Colored Resin Layer 6 Blue Patterned Colored Resin Layer 7 Protective Layer 8, 9, 10 Red of the Invention Spectral characteristics of green, blue and blue color filters 8 ', 9', 10 'Spectral characteristics of conventional red, green and blue color filters 11 Transparent layer (white patterned colored resin layer) 101 Spinner head 102 Glass substrate 103 Dispenser 104 Hot plate 105 Dehumidifier 106 Hepa filter 109 Light-shielding layer 110 Alignment mark 111 Red filter layer 112 Green filter layer 113 Blue filter layer 114 Transparent (white) filter layer 115 Protective layer 116 Photomask 120 Spinner

Claims (5)

[Claims] 1. A method of forming a color filter by patterning in a photolithography process using a photosensitive coloring resin in which a coloring material is dispersed in a photosensitive resin, comprising a step of removing a residue during rinsing after development in the photolithography process. A method for manufacturing a color filter, which comprises: 2. The method of manufacturing a color filter according to claim 1, wherein in the color filter forming step, a residue removing step is performed for each color formation. 3. The method for producing a color filter according to claim 1, wherein in the residue removing step, the residue is removed by wiping the surface of the color filter. 4. A spin step of applying a color filter material mainly composed of polyamide onto a substrate by a spinner, a pre-baking step of the substrate, an exposure step of exposing a desired pattern to the color filter material, and an unexposed portion. A method of producing a color filter comprising a developing step and a post-baking step for removing the above, wherein the atmosphere of the spin step is set to an absolute humidity of 0.008 kg / kg or less. 5. The method for producing a color filter according to claim 4, wherein the atmosphere of the pre-baking step is set to an absolute humidity of 0.008 kg / kg or less.