JPH0496001A - Production of color filter - Google Patents

Abstract

PURPOSE:To obtain the high-grade color filter having improved color purity and spectral transmittance by providing a stage for washing the surface of color filters and removing the residues of photosensitive colored resins produced on a substrate and colored resin layer. CONSTITUTION:The photosensitive colored resin film 2 of the 1st color is formed on the substrate 1. After this film is prebacked and dried, the resin film is exposed by UV light using a photomask 3. The exposed parts formed by this exposing are photoset parts 2a insoluble in a developer. The unexposed parts are dissolved away by the developer and thereafter, the substrate is subjected to a rinsing treatment. The photosensitive resin is wiped away under, for example, tap water, to wash the substrate. The substrate formed with the color filters from which the residues are removed by the wiping away is pulled up in warm water and is dried by a drier, by which the patterns of the 1st color are obtd. The 2nd color and the 3rd color are thereafter formed in the same manner. The color filters which are free from color mixing are obtd. by providing a protective layer (passivation) 7.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a color filter, and particularly to a method for manufacturing a color filter suitable for fine color separation in color displays, color image sensors, color sensors, etc. It is something.

[Conventional technology] Conventionally, color filters have been prepared using gelatin, gelatin, etc. on a substrate.
A dyed color filter is known in which a mordant layer made of a hydrophilic polymer material such as casein, gris, or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer.

In this type of dyeing method, there are many dyes that can be used (it is relatively easy to meet the spectral characteristics required for color filters, but in the dyeing process of the mordant layer, a mordant layer is added to the dyeing layer in which the dye is dissolved). The method uses a wet method, which is difficult to control, in which dyeing is immersed in water, and also involves a complicated process of providing an intermediate layer for resist dyeing for each color, resulting in poor yields. The heat resistance of possible dyes is relatively low at around 150°C or less (if the filter requires thermal treatment, it is difficult to use, and the dye film itself has poor heat resistance, light resistance, etc.) It also has the disadvantage of poor performance.

On the other hand, color filters using a colored resin in which a certain type of colored material is dispersed in a transparent resin are conventionally known.

For example, JP-A-58-46325, JP-A-60-
Publication No. 78401, Japanese Patent Application Laid-open No. 184202/1983,
JP-A-60-184203, JP-A-60-184
As shown in Japanese Patent Publication No. 204, Japanese Patent Laid-Open No. 60-184205, etc., using a colored resin material in which a colored material is mixed with a polyamide resin, a printing method or a mask using a resist on a colored resin film is used. A color filter can be formed by etching the colored resin film after forming the colored resin film.

Also, JP-A-57-16407, JP-A-5774
As shown in JP-A No. 707, JP-A-60-129707, etc., a color filter is formed by a photolithography process using a photosensitive colored resin film in which a coloring material is mixed with a photosensitive resin. I can do it.

These color filters can be said to be useful color filters because they can use materials with higher reliability than the dyed color filters and can be formed by a relatively simple method.

[Problems to be Solved by the Invention] However, in a color filter formed using a photosensitive colored resin composed of such a colored material and a photosensitive resin, it is difficult to form a color filter on a substrate and a colored resin layer. Residues of white and other colored resins generated during the process adhere. Furthermore, when a colored resin layer is provided by printing, it has been recognized that there is a lot of residue, especially at the outermost periphery of the colored resin layer. Although this can be slightly improved by optimizing the development conditions during patterning of the colored resin layer, it is impossible to completely eliminate the colored resin residue.

Therefore, the spectral transmittance of the color filter decreases and the spectral characteristics become broader, and problems regarding optical characteristics remain. In addition, in the case of a color display, it is necessary to provide a transparent electrode on the color filter through passivation, but when a colored resin layer is provided by the above printing method, the outermost part of the colored resin layer As a result, the adhesion of the passivation film was reduced and peeling occurred, resulting in an abnormal shape of the transparent electrode. This caused electrode shorts and other problems, significantly reducing product yield. .

The present invention has been made in order to improve the drawbacks of the prior art, and is directed to a method of forming a color filter on a substrate using a photosensitive colored resin in which a colored material is dispersed in the photosensitive resin. , the residues of the colored resin made of the photosensitive resin and the colored material generated on the substrate and the colored resin layer are removed, thereby obtaining a high-quality color filter with improved color purity and spectral transmittance. It is an object of the present invention to provide a method for producing a color filter in which the adhesion of the film provided on the color filter is improved and peeling does not occur, and the occurrence of short-circuits between the upper and lower electrodes is extremely small when a color panel is produced.

[Means for Solving the Problems] That is, the present invention provides a method of forming a color filter by patterning in a photolithography process using a photosensitive colored resin in which a colored material is dispersed in the photosensitive resin.
This is a method for manufacturing a color filter, comprising a step of cleaning the surface of the color filter.

The present invention will be explained in detail below.

In the process of forming a color filter by patterning a colored resin using a photo-solid process, the present invention includes cleaning the pattern surface and the entire surface of the substrate by wiping it under running water after forming the pattern of the color filter.
It is characterized by removing residues of photosensitive resin and coloring materials.

A photosensitive resin is used as the base material of the color filter used in the present invention, and there is no particular restriction on the photosensitive resin, but preferably a photosensitive polyamide resin having excellent heat resistance and transparency is used.

A coloring material, such as an organic pigment, is dispersed in this photosensitive resin and used as a photosensitive colored resin. The organic pigment used is a soluble azo type.

Azo pigments such as insoluble azo pigments and condensed azo pigments, phthalocyanine pigments, indigo pigments, anthraquinone pigments, perylene pigments, perinone pigments, dioxazine pigments, quinacridone pigments, and other condensed polycyclic pigments including metal complex pigments are used.

Next, a specific process for forming a pattern using the photosensitive colored resin material described above will be described.

FIGS. 1(a) to 1(f) are explanatory diagrams showing an example of the method for manufacturing a color filter of the present invention. First, Figure 1(a)
As shown in FIG. 1, a photosensitive colored resin film 2 of a first color is formed on a substrate 1. Examples of the film forming method include a spin coating method and a printing method. Next, after pre-baking and drying, it is exposed to UV light using a photomask 3 (first
Figure (see bl). Through this exposure, the exposed area becomes a photocured area 2a that is insoluble in the developer (see FIG. 1(c)). Thereafter, after dissolving and removing the unexposed areas with a phenomenon liquid, a rinsing treatment is performed and a post-baking is performed to form a first color pattern (FIG. 1(d) l').

Then, cleaning is performed to remove residues of the photosensitive resin and coloring material that cannot be completely removed by development. Examples of cleaning methods include wiping under running water. Methods include manual wiping method, polishing method, rubbing roller method, etc. The material of the wiping means used for wiping may be any material as long as it does not damage the color filter, such as nylon, rayon, acetate, etc. , cotton, polyester, PVA, etc.The end point of wiping should be when the wiping material is no longer colored.Furthermore, if there is a large amount of residue, it may be necessary to wipe the wiping material before boiling. is effective.Then, the substrate on which the color filter has been formed, from which the residue has been removed by wiping, is dried using a hot water pulling dryer to obtain the first color pattern.Thereafter, the second color and third color patterns are obtained in the same manner. forming a color (see FIG. 1(e)).

After that, by providing a protective layer (passivation) 7, a color filter without color mixture can be obtained (
(See Figure 1(f)).

[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.

Example 1 A color filter was manufactured by the method shown in FIGS. 1(a) to (f). In this example, a wiping step was performed before forming the passivation.

First, as shown in FIG. 1(a), a photosensitive red colored resin (P
A-1012R (product of Ube Industries, Ltd.) was printed to a thickness of 1.6 gm to form a colored resin film 2. Then, on a hot plate at 65°C-99sec, at 90°C-99sec,
Prebaking was performed sequentially at a temperature and time of 40° C. for 99 seconds. Thereafter, using a photomask 3 and an aligner (manufactured by Tamarack), it was exposed to UV light with an energy of 400 mJ/cm (see Figure 1 (b)). Due to this exposure, the photosensitive colored resin was photocured. , becomes insoluble in the developer (see Figure 1(c)).After that, a special developer (PA-
After being immersed in a product manufactured by AD Ube Industries for 120 seconds, the unexposed portions were dissolved and removed by applying US (ultrasonic) waves for 30 seconds in a developer.

Next, after immersing it in a special rinsing liquid (RPA2, a product of Ube Industries, Ltd.) for 30 seconds to remove the remaining solution, the IP
A (isopropyl alcohol) bath was immersed for 30 seconds to replace the rinsing liquid. After drying with warm water, a red pattern was obtained by boiling in a clean oven at 200°C for 30 minutes (first
Figure (d). Thereafter, in the same manner, green colored resin (P
A-1012G Ube Industries product), blue colored resin (
PA-1012B (manufactured by Ube Industries, Ltd.)) were sequentially formed (see FIG. 1(e)). Development conditions are green: Dip
240sec, US 20sec, Blue: Dip
180sec US 30sec.

After forming the above three colors, wiping was performed for about 60 seconds using a hand wiping method using a PVA sheet in a pure water shower bath. This wiping removed the colored resin residue on the substrate and the patterned colored resin layer. After drying with warm water, passivation (PA-1
000G (product of Ube Industries, Ltd.) was applied to a film thickness of 1.5 ILm, and prebaked (90°C, 18°C) using a hot plate.
The entire surface was exposed to UV light at an energy of 800 mJ/cm2. Finally, post-bake in a clean oven at 250℃ for 30 minutes, R, G, H
A three-primary color filter was obtained (see Figure 1(f)).
.

FIG. 3 shows the transmittance characteristics 8, 9, and 10 of the color filters formed as described above, and the transmittance characteristics 8', 9', and 10' of the color filters formed without wiping. As is clear from the figure, it is recognized that the spectral characteristics of the wiped color filter have high transmittance and excellent brown color purity.

Example 2 A color filter was manufactured by the method shown in FIGS. 2(a) to 2(f). In this example, a wiping step was performed after each color was formed (before hot water was drawn and dried).

First, as shown in Figure 2(a), a glass substrate (thickness
1.1 mm) 1. Using an Onguest Roma printing machine (product of Nissha Printing Co., Ltd.), photosensitive red colored resin (PA-
1012R (product of Ube Industries, Ltd.)) was printed to a final thickness of 1.6 m to form a colored resin film 2. Then, on a hot plate at 65°C-99sec, at 90°C-99sec,
Blitter was sequentially performed at a temperature and time of 40° C. for 99 seconds. Then, using a photomask 3 and an aligner (manufactured by Kumarak), UV light was applied at 400 mJ/cm.
2 (see FIG. 2(b)). Due to this exposure, the photosensitive colored resin is photocured, and the photocured portion 2
a became insoluble in the developer (see FIG. 2(C)). After that, use a special developer (PA-AD Ube Industries product) with 120
After immersion for 2 seconds, the unexposed portions were dissolved and removed by applying US at 30 seconds in a developer. Then, use the special rinsing liquid (R
PA2 (product of Ube Industries, Ltd.) for 30 seconds to remove dissolved residue, and then immersed in an IPA bath for 30 seconds to replace the rinsing liquid. Next, PV in a pure water shower bath
Using sheet A, wiping was performed for about 60 seconds using a rubbing roller method. With this wiping,
The colored resin residue on the substrate and the colored resin layer was removed. After drying with warm water, a red pattern was obtained by post-baking at 200° C. for 30 minutes in a clean oven (see FIG. 2(d)). Thereafter, in the same manner, green (PA-1012G Ube Industries product), blue (PA-1012B Ube Industries product), and white (PA-1012B Ube Industries product)
-1000C (manufactured by Ube Industries, Ltd.)) was formed by sequentially performing a wiping process (see FIG. 2(e)).

After forming the four colors R, G, B, and W, passivation (PA-1000C Ube Industries product) is applied once.
．． Apply to a film thickness of 5gm and pre-bake on a hot plate (90℃, 180sec) L/, 8g with UV light.
The entire surface was exposed with an energy of 00 mJ/cm2. Finally, a post bake was performed at 250° C. for 30 minutes in a clean oven to obtain four color filters of R, G, B, and W (see FIG. 2(f)).

The obtained color filter had excellent spectral transmittance and color purity as in Example 1.

As is clear from the above examples, by wiping before and after the post-bake, the residues of the colored resin and the colored material on the colored resin layer and the substrate are removed, thereby improving color purity and spectral transmittance. The color filter has been improved and a higher quality color filter has been obtained.

[Effects of the Invention] As explained above, according to the present invention, in the method of forming a color filter on a substrate using a photosensitive colored resin in which a coloring material is dispersed in a photosensitive resin, the surface of the color filter is By providing a cleaning process, the residue of the photosensitive colored resin made of the photosensitive resin and coloring material that occurs on the substrate and the colored resin layer is removed, thereby producing high-quality colors with improved color purity and spectral transmittance. In addition to being able to obtain a filter, the adhesion between the color filter and the film provided on the substrate is improved, and peeling does not occur, and when a color panel is created, the effect of extremely reducing the occurrence of short-circuits between the upper and lower electrodes can be obtained.

[Brief explanation of drawings]

FIGS. 1(a) to (f) are explanatory diagrams showing an example of the method of manufacturing a color filter of the present invention, and FIGS. 2(a) to (f) are explanatory diagrams showing a method of manufacturing a color filter of Example 2. and 3 are graphs showing the spectral characteristics of color filters of Example 1 of the present invention and conventional color filters. 1... Substrate 2... Colored resin film 2a.
...Photocured portion 3...Photomask 4...Red colored resin layer 5...Green colored resin layer 6...Blue colored resin layer 7...Protective layer 8.9.10...Book Spectral characteristic fields of the color filter of the invention, green, blue 8', 9', 10'...Conventional color filter 11...Transparent layer

Claims (4)

[Claims] (1) A method of forming a color filter by patterning a photosensitive colored resin in a photolithographic process using a photosensitive colored resin in which a coloring material is dispersed, which is characterized by having a step of cleaning the surface of the color filter. A method for manufacturing color filters. (2) The method for manufacturing a color filter according to claim 1, wherein the surface of the color filter is cleaned before forming passivation. (3) The method for manufacturing a color filter according to claim 1, wherein the surface of the color filter is cleaned after each color is formed. (4) The method for manufacturing a color filter according to claim 1, 2 or 3, wherein the surface of the color filter is cleaned by wiping.