JPH0943422A - Production of color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent deterioration in the display quality or adhesion defects in a color liquid crystal display device by removing development residue produced when a pixel pattern is formed by exposure and development of a color photosensitive resin film, by treatment with a specified acid cleaner. SOLUTION: A color filter is produced by successively forming a light- shielding layer and color pixels on a transparent substrate. In this method, development residue produced when a pixel pattern is formed by exposure and development of a color photosensitive resin film is removed by treatment with an acid cleaner essentially comprising an acid having a micell structure and a surfactant in a process after the developing process. As for the acid cleaner treatment using a cleaner essentially comprising an acid having a micell structure and a surfactant is carried out by dipping or spraying. For example, after dewatering and drying in the developing process, the substrate is dipped in a 30wt.% acid cleaner soln. essentially comprising sulfuric acid, then cleaned under flowing water, and heated and cured at 150 deg.C to form a color pattern of one color.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs).
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders, mainly in equipment, and the market is expected to expand rapidly in the future.

As shown in FIG. 1, a color filter for displaying an LCD in color is R (red) G (green) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a lattice pattern is formed. ) B (blue) color pixels 3 (about 100 × 100 × 2 μm) are sequentially formed, and a transparent overcoat layer (OC) 4 is formed thereon. 5 is a polarizing plate and 6 is an ITO electrode.

[0004] In the color LCD, the color filter 7 has an LC
D, the display screen can be colored by transmitting backlight light through a color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured using a dyeing method. However, in this method, a step of forming a pixel by applying a transparent photosensitive resin on a glass substrate, drying, exposing, and developing, dyeing with a dye, and then forming a color mixing prevention layer is required to be repeated three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a coloring agent, there is a disadvantage that reliability (weather resistance and heat resistance), which is an important issue of a color filter, is inferior.
Therefore, some color filters using a pigment as a coloring agent have been proposed, among which are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern. (1) The degree of freedom of the pattern is small.
(2) The cost is high, and the printing method has problems such as (1) it is difficult to align a large substrate and the resolution is low, so it is difficult to cope with miniaturization, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. For photolithography, liquid resists and films are contemplated. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

[0007]

In a method of manufacturing a color filter for a color liquid crystal display device using a film method, a colored photosensitive resin film is thermally laminated, exposed and developed to form RGB pixels. Pattern
The development residue is generated on the transparent substrate or the black matrix other than the remaining areas. This development residue causes color unevenness of pixels formed in a later process, and since ITO electrodes are formed on the glass surface around the pixel portion, these electrodes cause poor adhesion of the glass. The present invention provides a method for manufacturing a color filter in which the display quality of a color liquid crystal display device is not deteriorated and adhesion failure does not occur.

[0008]

The present invention relates to a method of manufacturing a color filter in which a light-shielding layer and colored pixels are sequentially formed on a transparent substrate, and when forming a pixel pattern for exposing and developing a colored photosensitive resin film. In the method for producing a color filter, the development residue generated is removed by performing an acid cleaner treatment using an acid having a micelle structure and a surfactant as main components in a step after development.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, dipping, spraying or the like is used as the acidic cleaner treatment mainly containing an acid having a micelle structure and a surfactant.

[0010]

EXAMPLES The present invention will be described below based on examples. Two
35 parts by weight of 2'-bis [4-methacryloxy, polyethoxyphenyl] propane, γ-chloro-β-hydroxypropyl-β'-methacryloyloxyethyl-o-
Phthalate 15 parts by weight, methacrylic acid / ethyl acrylate / ethyl acrylate (18/30/53 weight ratio)
Copolymer resin 50 parts by weight, 1,7 bis (9-acridinyl) heptane 2 parts by weight, hexamethoxymethylmelamine, methyl ethyl ketone, anthraquinone (red), halogenated copper phthalocyanine (green), copper phthalocyanine (blue) The components were made uniform to obtain a photosensitive resin layer coating solution. The solution is coated on a polyethylene terephthalate film having a thickness of 6 μm by a gravure coater (manufactured by Hirano Seiki Co., Ltd.) and a 30 μm polyethylene film is laminated as a protective film to obtain a photosensitive film. The colored photosensitive resin layer had a thickness of 1.5 μm. Next, a chrome film (film thickness 0.
1 μm) attached glass substrate (1.1 mm × 200 mm × 3)
Roll laminator HLM15 on a glass substrate on which a black matrix is formed with (00 mm, made by Geomatec).
00 (manufactured by Hitachi Chemical Techno Plant Co., Ltd.), substrate temperature 90 ° C., roll temperature 110 ° C., roll pressure 6 kg / c
A photosensitive film is laminated so that the colored photosensitive resin faces the substrate at m2 and a speed of 0.5 m / min, and a parallel light exposure machine MAP1200L is passed through a predetermined negative mask.
(Manufactured by Dainippon Screen Co., Ltd.) using 100 mJ / cm2
After exposure, the polyethylene terephthalate film was removed, and 0.2 wt% Na2B2 was added at 25 ° C. using a spray type developing device DVW911 (manufactured by Dainippon Screen).
The unexposed portion is removed by spray development with an O5 aqueous solution for 20 seconds. After draining and drying in the developing step, it is immersed for 5 minutes in a 30% by weight aqueous solution of an acidic cleaner (manufactured by Atotech Co.) containing sulfuric acid as a main component, and washed with running water. After that, clean oven C
SO-402 (manufactured by Kusumoto Kasei) is heated to 150 ° C. and cured to form a colored pattern of one color. This coloring formation process is repeated in the order of R, G, and B using films of each color to form an RGB pixel pattern. As a result, a color filter having no development residue was obtained.

[0011]

The color filter obtained according to the present invention does not deteriorate the display quality of a color liquid crystal display device or cause defective adhesion.

[Brief description of drawings]

FIG. 1 is a sectional view of a liquid crystal display.

[Explanation of symbols]

 1. 1. BM (black matrix) Glass substrate 3. Color pixels 4. 4. Overcoat layer (OC) Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

Claims (1)

[Claims] 1. A method of manufacturing a color filter in which a light-shielding layer and colored pixels are sequentially formed on a transparent substrate, and a development residue generated during pixel pattern formation in which a colored photosensitive resin film is exposed and developed is developed. A method for producing a color filter, which comprises removing an acid having a micelle structure and an acid cleaner containing a surfactant as a main component in the step.