JPH08136721A - Production of color filter - Google Patents

Abstract

PURPOSE: To execute a production of black matrix without defect in the case of producing the black matrix by a lift-off method by executing resist peeling in a state in which a release soln. is not retained on a substrate. CONSTITUTION: The black matrix 1, a colored picture element 3 and an overcoat film 4 are formed on a transparent substrate 2. In this producing method, a photoresist is applied on whole area of a nonalkali glass plate, and the matrix pattern of the resist is obtained by performing exposure through a photomask having a prescribed matrix pattern and development. Then, a graphite coating material is applied on a whole area of this resist matrix, and the coating is dried at 150 deg.C. Then, the result is immersed in 2% sodium hydroxide aq. soln. for 1 min, and the resist and the graphite coating film thereon are simultaneously peeled off by spraying a pure water by using a spray type peeling machine. The substrate is inclined at 10 deg. to the horizontal plane at the time of peeling. In this way, the resist peeling is executed in the state in which the release soln. is not retained on the substrate.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device.

[0002]

2. Description of the Related Art Liquid crystal display (hereinafter abbreviated as LCD)
Taking advantage of its thinness, small size, and low power consumption, is currently used for display parts of watches, calculators, TVs, personal computers and the like. Furthermore, in recent years, color LCDs have been developed and OA / AV
It has begun to be used in many applications such as navigation systems and viewfinders mainly for devices, and the market is expected to expand rapidly in the future.

A color filter for displaying an LCD in color is R (red) on a substrate 2 such as a glass plate on which a BM (black matrix) 1 having a grid pattern is formed.
Color pixel 3 consisting of G (green) and B (blue) (approximately 100 x 1
(00 × 2 μm), and a transparent overcoat layer (OC) 4 is formed thereon. Reference numeral 5 is a polarizing plate, and 6 is an ITO electrode.

A color LCD has a color filter 7 as an LC.
The display screen can be colored by being installed inside D and transmitting the backlight light to the color filter. 8 is an alignment film, 9 is a liquid crystal, 10 is a seal material, 11 is a top coat layer, 12 is an ITO electrode, 13 is a substrate such as a glass plate, 14
Is a polarizing plate.

At present, color filters are mainly manufactured by the dyeing method. However, in this method, it is necessary to repeat the process of applying a transparent photosensitive resin on a glass substrate, forming pixels by drying, exposing and developing, dyeing with a dye, and then forming a color mixing prevention layer three times. Therefore, the number of steps is large and the cost is high. Further, since a dye is used as a colorant, there is a drawback that the reliability (weather resistance / heat resistance), which is an important subject of the color filter, is deteriorated.
Therefore, some color filters using a pigment as a colorant have been proposed, and among them, there are an electrodeposition method, a printing method, and a photolithography method (photolithography method).

However, the electrodeposition method requires the formation of an electrode pattern (1) the degree of freedom of the pattern is small,
(2) The cost is high, and the printing method has problems that (1) it is difficult to align a large-sized substrate and the resolution is low, so it is difficult to miniaturize, and (2) the flatness of the pattern is poor. The photolithography method is considered to be the mainstream. A liquid resist and a film are considered for the photolithography method. In the liquid resist, color pixels are formed by applying a varnish in which a pigment is dispersed in a photosensitive resin on a glass substrate with a spinner, drying, exposing, and developing. On the other hand, the film is a varnish formed into a film like the photosensitive film for printed boards, and after being laminated on a substrate, color pixels are formed by exposure and development.

[0007]

In the black matrix forming process using graphite or carbon paint, when the resist is removed by a lift-off method, the resist and the graphite coating on the resist are horizontally transferred during spray peeling. When a stripping solution is sprayed onto a horizontal substrate from above, such as when using a stripping machine, the stripping solution stays on the substrate and the line side portions of the black matrix are chipped. It is considered that this is because the accumulated liquid exerts a stress above the spray pressure on the coating film. The present invention provides a method for manufacturing a color filter that allows a black matrix to be produced without defects.

[0008]

The present invention is devised so that the stripping solution does not stay on the substrate when the resist and the graphite coating film on the resist are stripped by spraying, so that there is no chipping on the side of the line. It was made by discovering that a good black matrix can be created.

That is, the present invention is a method of manufacturing a color filter in which a black matrix, colored pixels and an overcoat film are formed on a transparent substrate, and when the black matrix is formed by a lift-off method, it is peeled off on the substrate. A method for producing a color filter, characterized in that the resist is stripped in a state where the liquid does not stay.

Specifically, as a method for preventing the stripping solution from staying on the substrate, 1) a method of tilting the substrate (up to 180 °) to improve the flow of the stripping solution, 2) forcibly staying with an air gun or the like There is a method of removing the stripping solution, but the combination of 1) and 2) may be used.

[0011]

[Example] A photoresist (PMER6005C) on a non-alkali glass substrate (# 7059, manufactured by Corning Incorporated).
3, manufactured by Tokyo Ohka Co., Ltd.) was applied over the entire surface, and exposed through a photomask having a predetermined matrix pattern and developed to obtain a resist matrix pattern. Next, graphite paint (manufactured by Hitachi Powdered Metals) on this resist matrix
Was applied over the entire surface and dried at 150 ° C. Thereafter, the resist and the graphite coating film thereon were simultaneously peeled off by immersing in a 2% sodium hydroxide aqueous solution for 1 minute and spraying pure water with a spray using a spray peeling machine. At the time of peeling, the substrate was tilted by 10 ° from the horizontal plane. Almost no peeling liquid remained on the substrate by tilting the substrate by 10 °. As a result, it was possible to create a black matrix with good breakage without chipping on the side of the line.

[0012]

Industrial Applicability According to the present invention, it is possible to manufacture a color filter having a black matrix with a good break without chipping of the line side portion.

[Brief description of drawings]

FIG. 1 is a sectional view of a liquid crystal display.

[Explanation of symbols]

 1. BM (black matrix) 2. Glass substrate 3. Color pixel 4. Overcoat layer (OC) 5. Polarizing plate 6. ITO electrode 7. Color filter 8. Alignment film 9. Liquid crystal 10. Seal material 11. Top coat layer 12. ITO electrode 13. Glass substrate 14. Polarizer

Claims (1)

[Claims] 1. A black matrix on a transparent substrate,
In a method of manufacturing a color filter for forming colored pixels and an overcoat film, when a black matrix is formed by a lift-off method, the resist is stripped in a state where the stripping solution does not stay on the substrate. Manufacturing method.